KR101713813B1 - 막 형성방법 및 막 형성장치 - Google Patents

막 형성방법 및 막 형성장치 Download PDF

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Publication number
KR101713813B1
KR101713813B1 KR1020140168740A KR20140168740A KR101713813B1 KR 101713813 B1 KR101713813 B1 KR 101713813B1 KR 1020140168740 A KR1020140168740 A KR 1020140168740A KR 20140168740 A KR20140168740 A KR 20140168740A KR 101713813 B1 KR101713813 B1 KR 101713813B1
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KR
South Korea
Prior art keywords
film material
outer edge
edge portion
layer
substrate
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KR1020140168740A
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English (en)
Korean (ko)
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KR20150106322A (ko
Inventor
유지 오카모토
Original Assignee
메이코 일렉트로닉스 컴파니 리미티드
스미도모쥬기가이고교 가부시키가이샤
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Application filed by 메이코 일렉트로닉스 컴파니 리미티드, 스미도모쥬기가이고교 가부시키가이샤 filed Critical 메이코 일렉트로닉스 컴파니 리미티드
Publication of KR20150106322A publication Critical patent/KR20150106322A/ko
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Publication of KR101713813B1 publication Critical patent/KR101713813B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking

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  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020140168740A 2014-03-11 2014-11-28 막 형성방법 및 막 형성장치 KR101713813B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-047088 2014-03-11
JP2014047088A JP6085578B2 (ja) 2014-03-11 2014-03-11 膜形成方法及び膜形成装置

Publications (2)

Publication Number Publication Date
KR20150106322A KR20150106322A (ko) 2015-09-21
KR101713813B1 true KR101713813B1 (ko) 2017-03-09

Family

ID=54076909

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140168740A KR101713813B1 (ko) 2014-03-11 2014-11-28 막 형성방법 및 막 형성장치

Country Status (4)

Country Link
JP (1) JP6085578B2 (zh)
KR (1) KR101713813B1 (zh)
CN (1) CN104907227B (zh)
TW (1) TWI564090B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6862041B2 (ja) * 2016-08-10 2021-04-21 住友重機械工業株式会社 膜形成方法及び膜形成装置
JP6925749B2 (ja) * 2018-01-30 2021-08-25 住友重機械工業株式会社 膜形成方法、及び膜形成装置
CN112437698A (zh) * 2019-06-26 2021-03-02 Abb瑞士股份有限公司 涂装机及涂装方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003318133A (ja) 2002-04-22 2003-11-07 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、半導体チップの実装構造、半導体装置、発光装置、電気光学装置、電子機器、並びに非接触型カード媒体
JP2009106846A (ja) 2007-10-30 2009-05-21 Seiko Epson Corp 膜形成方法および電気光学装置
JP2010184214A (ja) 2009-02-13 2010-08-26 Seiko Epson Corp 成膜方法

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JPH10138349A (ja) * 1996-11-11 1998-05-26 Meiko:Kk 積層光造形法
JP3985545B2 (ja) * 2002-02-22 2007-10-03 セイコーエプソン株式会社 薄膜形成装置と薄膜形成方法、液晶装置の製造装置と液晶装置の製造方法と液晶装置、及び薄膜構造体の製造装置と薄膜構造体の製造方法と薄膜構造体、及び電子機器
JP3988645B2 (ja) * 2002-03-06 2007-10-10 セイコーエプソン株式会社 吐出方法、吐出装置、カラーフィルタの製造方法、エレクトロルミネッセンス装置の製造方法、およびプラズマディスプレイパネルの製造方法
JP4505191B2 (ja) * 2003-03-31 2010-07-21 日立ビアメカニクス株式会社 電子回路基板の製造装置
US20050048195A1 (en) * 2003-08-26 2005-03-03 Akihiro Yanagita Dispensing system and method of controlling the same
JP3874003B2 (ja) * 2004-10-27 2007-01-31 セイコーエプソン株式会社 配線パターン形成方法、及び膜パターン形成方法
JP2006126692A (ja) * 2004-11-01 2006-05-18 Seiko Epson Corp 薄膜パターン基板、デバイスの製造方法、及び電気光学装置、並びに電子機器
JP4179288B2 (ja) * 2005-02-01 2008-11-12 セイコーエプソン株式会社 膜パターン形成方法
KR100866323B1 (ko) * 2007-02-05 2008-10-31 한국기계연구원 대면적 박막 코팅방법 및 그 장치
US20100015322A1 (en) * 2008-07-18 2010-01-21 Cheng Uei Precision Industry Co., Ltd. Method And Apparatus For Coating A Film On A Substrate
JP2010155926A (ja) * 2008-12-26 2010-07-15 Jsr Corp 光硬化性液状樹脂組成物およびインクジェット光造形法による立体造形物の製造方法
JP5332855B2 (ja) * 2009-04-20 2013-11-06 セイコーエプソン株式会社 製膜装置
JP5890990B2 (ja) * 2010-11-01 2016-03-22 株式会社キーエンス インクジェット光造形法における、光造形品形成用モデル材、光造形品の光造形時の形状支持用サポート材および光造形品の製造方法
KR101322198B1 (ko) * 2011-07-08 2013-10-28 스미도모쥬기가이고교 가부시키가이샤 박막형성방법 및 박막형성장치
KR20140024931A (ko) * 2011-07-15 2014-03-03 스미도모쥬기가이고교 가부시키가이샤 박막형성방법 및 박막형성장치
JP2014036171A (ja) * 2012-08-10 2014-02-24 Sumitomo Heavy Ind Ltd 基板製造方法及び薄膜形成装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003318133A (ja) 2002-04-22 2003-11-07 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、半導体チップの実装構造、半導体装置、発光装置、電気光学装置、電子機器、並びに非接触型カード媒体
JP2009106846A (ja) 2007-10-30 2009-05-21 Seiko Epson Corp 膜形成方法および電気光学装置
JP2010184214A (ja) 2009-02-13 2010-08-26 Seiko Epson Corp 成膜方法

Also Published As

Publication number Publication date
JP2015167944A (ja) 2015-09-28
CN104907227A (zh) 2015-09-16
CN104907227B (zh) 2017-04-19
JP6085578B2 (ja) 2017-02-22
TW201534402A (zh) 2015-09-16
TWI564090B (zh) 2017-01-01
KR20150106322A (ko) 2015-09-21

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