CN104340730B - 透明板清扫系统 - Google Patents

透明板清扫系统 Download PDF

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Publication number
CN104340730B
CN104340730B CN201410371557.6A CN201410371557A CN104340730B CN 104340730 B CN104340730 B CN 104340730B CN 201410371557 A CN201410371557 A CN 201410371557A CN 104340730 B CN104340730 B CN 104340730B
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lamella lucida
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handover region
lamella
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Chinese (zh)
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CN104340730A (zh
Inventor
萩原靖久
蛭子胜也
青山博司
林田徹
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Hallys Corp
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Hallys Corp
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201410371557.6A 2013-07-31 2014-07-30 透明板清扫系统 Active CN104340730B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-158753 2013-07-31
JP2013158753A JP6005007B2 (ja) 2013-07-31 2013-07-31 透明板清掃システム

Publications (2)

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CN104340730A CN104340730A (zh) 2015-02-11
CN104340730B true CN104340730B (zh) 2017-04-12

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CN201410371557.6A Active CN104340730B (zh) 2013-07-31 2014-07-30 透明板清扫系统

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JP (1) JP6005007B2 (ja)
CN (1) CN104340730B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106214078B (zh) * 2016-07-26 2019-06-21 哈尔滨万洲焊接技术有限公司 一种整体式地毯清洗机
CN107971294A (zh) * 2017-12-22 2018-05-01 湖北金成光电科技股份有限公司 一种木板双面去尘系统
CN108974938A (zh) * 2018-09-28 2018-12-11 苏州精创光学仪器有限公司 斜立式自动翻板装置
CN114308774A (zh) * 2021-12-28 2022-04-12 深圳市华东兴科技有限公司 一种液晶面板的清洗装置及其清洗方法
CN114405879B (zh) * 2021-12-30 2023-01-03 凯盛信息显示材料(洛阳)有限公司 一种导电玻璃清洗装置及导电玻璃清洗方法
CN114834857A (zh) * 2022-04-28 2022-08-02 安徽富乐德科技发展股份有限公司 用于半导体面板设备的清洗装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567375A (en) * 1978-11-17 1980-05-21 Harunobu Miura Automatic washer
JPH036577Y2 (ja) * 1986-01-16 1991-02-19
JPH01147344U (ja) * 1988-03-30 1989-10-12
JPH0385791A (ja) * 1989-08-29 1991-04-10 Fujitsu Ltd 基板の反転洗浄装置
JPH06135549A (ja) * 1992-10-26 1994-05-17 Omron Corp トレイ分離装置
JP3421460B2 (ja) * 1994-12-30 2003-06-30 三井企画株式会社 網体洗浄装置
JP4213779B2 (ja) * 1998-03-30 2009-01-21 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法
JP2002126662A (ja) * 2000-10-31 2002-05-08 Optrex Corp 液晶セルの洗浄装置
JP3443398B2 (ja) * 2000-11-08 2003-09-02 川崎重工業株式会社 反転積み重ね装置
JP4328472B2 (ja) * 2001-03-30 2009-09-09 芝浦メカトロニクス株式会社 基板反転装置、及びそれを用いたパネル製造装置
US8182009B2 (en) * 2008-03-13 2012-05-22 Xyratex Technology, Ltd. End effector
JP5334443B2 (ja) * 2008-04-02 2013-11-06 日本メクトロン株式会社 板状ワーク反転装置
JP5107122B2 (ja) * 2008-04-03 2012-12-26 大日本スクリーン製造株式会社 基板処理装置
CN101814586B (zh) * 2009-12-01 2011-09-28 东莞宏威数码机械有限公司 夹持式基板翻转装置
JP5792981B2 (ja) * 2011-04-05 2015-10-14 川崎重工業株式会社 板状部材反転システム及びその反転移送方法

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Publication number Publication date
JP6005007B2 (ja) 2016-10-12
CN104340730A (zh) 2015-02-11
JP2015029922A (ja) 2015-02-16

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