CN104254912B - 移动平台 - Google Patents

移动平台 Download PDF

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Publication number
CN104254912B
CN104254912B CN201380019729.7A CN201380019729A CN104254912B CN 104254912 B CN104254912 B CN 104254912B CN 201380019729 A CN201380019729 A CN 201380019729A CN 104254912 B CN104254912 B CN 104254912B
Authority
CN
China
Prior art keywords
gas
air cushion
mobile platform
particle dust
process chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380019729.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN104254912A (zh
Inventor
伊藤大介
佐塚祐贵
泽井美喜
次田纯
次田纯一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSW acdina System Co.,Ltd.
Original Assignee
Japan Steel Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Steel Works Ltd filed Critical Japan Steel Works Ltd
Priority to CN201410710844.5A priority Critical patent/CN104538329B/zh
Publication of CN104254912A publication Critical patent/CN104254912A/zh
Application granted granted Critical
Publication of CN104254912B publication Critical patent/CN104254912B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
CN201380019729.7A 2012-04-13 2013-04-01 移动平台 Active CN104254912B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410710844.5A CN104538329B (zh) 2012-04-13 2013-04-01 移动平台

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012092360A JP5454971B2 (ja) 2012-04-13 2012-04-13 移動ステージ
JP2012-092360 2012-04-13
PCT/JP2013/059855 WO2013153979A1 (ja) 2012-04-13 2013-04-01 移動ステージ

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201410710844.5A Division CN104538329B (zh) 2012-04-13 2013-04-01 移动平台

Publications (2)

Publication Number Publication Date
CN104254912A CN104254912A (zh) 2014-12-31
CN104254912B true CN104254912B (zh) 2017-06-30

Family

ID=49327547

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201380019729.7A Active CN104254912B (zh) 2012-04-13 2013-04-01 移动平台
CN201410710844.5A Active CN104538329B (zh) 2012-04-13 2013-04-01 移动平台

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201410710844.5A Active CN104538329B (zh) 2012-04-13 2013-04-01 移动平台

Country Status (5)

Country Link
JP (1) JP5454971B2 (ja)
KR (2) KR101546395B1 (ja)
CN (2) CN104254912B (ja)
SG (1) SG11201406398QA (ja)
WO (1) WO2013153979A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101403458B1 (ko) * 2012-11-13 2014-06-30 삼성디스플레이 주식회사 기판 이송 장치 및 기판 처리 장치
JP6854605B2 (ja) * 2016-08-29 2021-04-07 株式会社日本製鋼所 レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法
JP7184678B2 (ja) * 2019-03-08 2022-12-06 Ｊｓｗアクティナシステム株式会社 レーザ処理装置
JP7333749B2 (ja) * 2019-12-13 2023-08-25 株式会社ディスコ 吸引力の測定方法
KR102435306B1 (ko) * 2020-07-07 2022-08-24 디앤에이 주식회사 파티클 제거용 기판이송장치
CN112206110B (zh) * 2020-09-25 2022-02-22 泗县微腾知识产权运营有限公司 一种移动气垫
CN116198779A (zh) * 2023-03-31 2023-06-02 西安奕斯伟材料科技股份有限公司 一种用于包装硅片盒的设备及方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100495680C (zh) * 2004-10-14 2009-06-03 琳得科株式会社 非接触型吸附保持装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3123141B2 (ja) 1991-09-20 2001-01-09 日本電気株式会社 半導体装置のビアホール形成方法
JP2004345814A (ja) 2003-05-23 2004-12-09 Murata Mach Ltd 浮上搬送装置
JP5178215B2 (ja) 2008-01-30 2013-04-10 京セラ株式会社 浮上用構造体、スライド部材およびステージ装置
JP2011133724A (ja) * 2009-12-25 2011-07-07 Nikon Corp 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置
JP5399963B2 (ja) * 2010-03-30 2014-01-29 大日本スクリーン製造株式会社 基板搬送装置および基板処理装置
JP5372824B2 (ja) 2010-03-30 2013-12-18 大日本スクリーン製造株式会社 基板処理装置および基板処理方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100495680C (zh) * 2004-10-14 2009-06-03 琳得科株式会社 非接触型吸附保持装置

Also Published As

Publication number Publication date
KR101630648B1 (ko) 2016-06-15
CN104538329B (zh) 2016-08-24
JP2013222769A (ja) 2013-10-28
KR20140115383A (ko) 2014-09-30
WO2013153979A1 (ja) 2013-10-17
KR101546395B1 (ko) 2015-08-21
CN104538329A (zh) 2015-04-22
CN104254912A (zh) 2014-12-31
SG11201406398QA (en) 2014-11-27
KR20140099330A (ko) 2014-08-11
JP5454971B2 (ja) 2014-03-26

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TR01 Transfer of patent right

Effective date of registration: 20220407

Address after: Kanagawa

Patentee after: JSW acdina System Co.,Ltd.

Address before: Tokyo

Patentee before: THE JAPAN STEEL WORKS, Ltd.

TR01 Transfer of patent right