CN104238278B - 曝光装置以及制造物品的方法 - Google Patents

曝光装置以及制造物品的方法 Download PDF

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Publication number
CN104238278B
CN104238278B CN201410245805.2A CN201410245805A CN104238278B CN 104238278 B CN104238278 B CN 104238278B CN 201410245805 A CN201410245805 A CN 201410245805A CN 104238278 B CN104238278 B CN 104238278B
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CN
China
Prior art keywords
substrate
exposure
substrate stage
control unit
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201410245805.2A
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English (en)
Chinese (zh)
Other versions
CN104238278A (zh
Inventor
伊藤觉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to CN201611027383.7A priority Critical patent/CN106444300B/zh
Publication of CN104238278A publication Critical patent/CN104238278A/zh
Application granted granted Critical
Publication of CN104238278B publication Critical patent/CN104238278B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F2009/005—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
CN201410245805.2A 2013-06-10 2014-06-05 曝光装置以及制造物品的方法 Expired - Fee Related CN104238278B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611027383.7A CN106444300B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-122024 2013-06-10
JP2013122024A JP5986538B2 (ja) 2013-06-10 2013-06-10 露光装置および物品の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201611027383.7A Division CN106444300B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法

Publications (2)

Publication Number Publication Date
CN104238278A CN104238278A (zh) 2014-12-24
CN104238278B true CN104238278B (zh) 2017-01-11

Family

ID=52005226

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201410245805.2A Expired - Fee Related CN104238278B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法
CN201611027383.7A Active CN106444300B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201611027383.7A Active CN106444300B (zh) 2013-06-10 2014-06-05 曝光装置以及制造物品的方法

Country Status (4)

Country Link
US (1) US9557657B2 (enExample)
JP (1) JP5986538B2 (enExample)
KR (1) KR101784045B1 (enExample)
CN (2) CN104238278B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020215274A1 (zh) * 2019-04-25 2020-10-29 深圳市大疆创新科技有限公司 无人机及其拍摄控制方法
JP7466403B2 (ja) 2020-08-03 2024-04-12 キヤノン株式会社 制御装置、リソグラフィー装置、制御方法および物品製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010000974A1 (en) * 1999-05-19 2001-05-10 Nikon Corporation Scanning exposure method with reduced time between scans
CN101221363A (zh) * 2006-09-20 2008-07-16 Asml荷兰有限公司 光刻设备和器件制造方法
JP2010272673A (ja) * 2009-05-21 2010-12-02 Canon Inc 露光装置及びデバイス製造方法
US20120170008A1 (en) * 2011-01-01 2012-07-05 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5343270A (en) * 1990-10-30 1994-08-30 Nikon Corporation Projection exposure apparatus
JPH06260384A (ja) * 1993-03-08 1994-09-16 Nikon Corp 露光量制御方法
US5617182A (en) * 1993-11-22 1997-04-01 Nikon Corporation Scanning exposure method
US6118515A (en) * 1993-12-08 2000-09-12 Nikon Corporation Scanning exposure method
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JPH0992611A (ja) * 1995-09-21 1997-04-04 Canon Inc 走査型露光装置および方法
JPH09115825A (ja) * 1995-10-19 1997-05-02 Nikon Corp 走査型投影露光装置
JP3514401B2 (ja) 1996-01-16 2004-03-31 キヤノン株式会社 走査型露光装置および方法ならびに半導体デバイスの製造方法
JP3728610B2 (ja) * 1996-07-04 2005-12-21 株式会社ニコン 走査型露光装置及び露光方法
US6646715B1 (en) * 1997-01-14 2003-11-11 Nikon Corporation Scanning exposure apparatus and method with run-up distance control
JP3428872B2 (ja) * 1997-08-29 2003-07-22 キヤノン株式会社 露光方法および装置
JPH11204421A (ja) * 1998-01-09 1999-07-30 Nikon Corp 露光装置の制御方法、露光装置、露光方法及び素子製造方法
JP4585649B2 (ja) * 2000-05-19 2010-11-24 キヤノン株式会社 露光装置およびデバイス製造方法
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
KR100585108B1 (ko) * 2003-11-14 2006-06-01 삼성전자주식회사 스캔 방식의 노광 장치를 이용한 웨이퍼 노광 방법
JP4625673B2 (ja) * 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
KR101479392B1 (ko) * 2005-04-28 2015-01-05 가부시키가이샤 니콘 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
JP2009010202A (ja) * 2007-06-28 2009-01-15 Canon Inc 露光方法、露光装置およびデバイス製造方法
JP5498243B2 (ja) 2010-05-07 2014-05-21 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010000974A1 (en) * 1999-05-19 2001-05-10 Nikon Corporation Scanning exposure method with reduced time between scans
CN101221363A (zh) * 2006-09-20 2008-07-16 Asml荷兰有限公司 光刻设备和器件制造方法
JP2010272673A (ja) * 2009-05-21 2010-12-02 Canon Inc 露光装置及びデバイス製造方法
US20120170008A1 (en) * 2011-01-01 2012-07-05 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device

Also Published As

Publication number Publication date
KR101784045B1 (ko) 2017-10-10
KR20140144145A (ko) 2014-12-18
US9557657B2 (en) 2017-01-31
JP2014239193A (ja) 2014-12-18
CN106444300B (zh) 2018-08-14
CN106444300A (zh) 2017-02-22
JP5986538B2 (ja) 2016-09-06
US20140362357A1 (en) 2014-12-11
CN104238278A (zh) 2014-12-24

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Granted publication date: 20170111