CN104203391B - 中空颗粒的制备方法、减反射涂层的制备方法和光学元件的制备方法 - Google Patents

中空颗粒的制备方法、减反射涂层的制备方法和光学元件的制备方法 Download PDF

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Publication number
CN104203391B
CN104203391B CN201380016681.4A CN201380016681A CN104203391B CN 104203391 B CN104203391 B CN 104203391B CN 201380016681 A CN201380016681 A CN 201380016681A CN 104203391 B CN104203391 B CN 104203391B
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CN
China
Prior art keywords
core
particles
shell
hollow particles
preparation
Prior art date
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Expired - Fee Related
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CN201380016681.4A
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English (en)
Chinese (zh)
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CN104203391A (zh
Inventor
龟野优
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Canon Inc
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Canon Inc
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Publication of CN104203391A publication Critical patent/CN104203391A/zh
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Expired - Fee Related legal-status Critical Current
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/20—After-treatment of capsule walls, e.g. hardening
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • B01J13/18—In situ polymerisation with all reactants being present in the same phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/20—After-treatment of capsule walls, e.g. hardening
    • B01J13/203—Exchange of core-forming material by diffusion through the capsule wall
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Paints Or Removers (AREA)
CN201380016681.4A 2012-03-26 2013-02-26 中空颗粒的制备方法、减反射涂层的制备方法和光学元件的制备方法 Expired - Fee Related CN104203391B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-069662 2012-03-26
JP2012069662 2012-03-26
PCT/JP2013/001114 WO2013145548A1 (en) 2012-03-26 2013-02-26 Method of producing hollow particles, method of producing antireflection coating, and method of producing optical element

Publications (2)

Publication Number Publication Date
CN104203391A CN104203391A (zh) 2014-12-10
CN104203391B true CN104203391B (zh) 2017-03-01

Family

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CN201380016681.4A Expired - Fee Related CN104203391B (zh) 2012-03-26 2013-02-26 中空颗粒的制备方法、减反射涂层的制备方法和光学元件的制备方法

Country Status (5)

Country Link
US (1) US9802175B2 (enExample)
EP (1) EP2812108A1 (enExample)
JP (1) JP6103950B2 (enExample)
CN (1) CN104203391B (enExample)
WO (1) WO2013145548A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY198608A (en) 2012-05-22 2023-09-08 Covestro Netherlands Bv Composition and process for making a porous inorganic oxide coating
JP2014034488A (ja) * 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
PL3401369T3 (pl) * 2013-11-22 2024-02-12 Covestro (Netherlands) B.V. Sposób wytwarzania kompozycji powłoki przeciwodblaskowej i porowata powłoka z niej wykonana
WO2015138162A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Coating compositions comprising functionalized hollow silica particles with low porosity prepared using water-based silica precursors
WO2015138144A1 (en) * 2014-03-11 2015-09-17 E I Du Pont De Nemours And Company Coating compositions comprising functionalized hollow silica particles with low porosity
KR101672532B1 (ko) * 2015-04-27 2016-11-07 계명대학교 산학협력단 메조기공 중공형 나노 실리카 물질 합성에 사용되는 코어물질 합성방법 및 그 방법으로 제조된 코어물질
JP2017114950A (ja) * 2015-12-21 2017-06-29 旭化成株式会社 塗膜及び塗膜の製造方法
JP6953114B2 (ja) * 2016-06-21 2021-10-27 扶桑化学工業株式会社 シリカ系中空粒子、コアシェル粒子及びポリスチレン粒子、並びに、それらの製造方法
KR102166236B1 (ko) * 2018-12-19 2020-10-15 동의대학교 산학협력단 3d 스캔 및 스캔 이미지 보정 방법
JP7071418B2 (ja) * 2019-02-15 2022-05-18 ローム アンド ハース エレクトロニック マテリアルズ エルエルシー 反射防止コーティング
CN110064063B (zh) * 2019-03-15 2021-11-19 徐州医科大学 一种双层疏水-亲水改性中空纳米硅球、其制备方法及应用
CN110669362B (zh) * 2019-10-16 2021-11-23 宁波甬安光科新材料科技有限公司 一种减反射涂料及其制备方法和用途
JP2022164313A (ja) * 2021-04-16 2022-10-27 株式会社リコー 白色組成液、組成液収容容器、インクジェット記録方法、インクジェット記録装置及び記録物
US20230124794A1 (en) * 2021-10-14 2023-04-20 Lumileds Llc Micro-led with reflectance redistribution
CN120303334A (zh) 2022-12-19 2025-07-11 瓦克化学股份公司 中空硅酮树脂颗粒及其制备方法
KR20250145516A (ko) 2024-03-28 2025-10-13 니끼 쇼꾸바이 카세이 가부시키가이샤 규소를 포함하는 외각과, 그 내측에 공동을 갖는 입자 및 그 제조 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070036705A1 (en) * 2005-08-10 2007-02-15 Butts Matthew D Hollow silica particles and methods for making same
CN102046522A (zh) * 2008-06-03 2011-05-04 旭硝子株式会社 核—壳粒子的制造方法、核—壳粒子、中空粒子的制造方法、涂料组合物及物品
CN102196996A (zh) * 2008-10-31 2011-09-21 旭硝子株式会社 中空粒子、其制造方法、涂料组合物及物品
EP2386590A1 (en) * 2008-12-25 2011-11-16 Denki Kagaku Kogyo Kabushiki Kaisha Composite particles, process for producing the composite particles, hollow particles, process for producing the hollow particles, and use of the hollow particles

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939805A (ja) 1982-08-31 1984-03-05 Mitsui Toatsu Chem Inc 水田用除草剤組成物
JP4046921B2 (ja) 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
US9051490B2 (en) 2006-03-02 2015-06-09 Kaneka Corporation Method for producing hollow silicone fine particles
JP2008201908A (ja) * 2007-02-20 2008-09-04 Kaneka Corp 中空シリコーン系微粒子とフッ素系樹脂を含む被膜を有する被膜付基材
CN101679049B (zh) 2007-06-26 2013-09-25 电气化学工业株式会社 一种中空颗粒的制备方法
JP5194935B2 (ja) * 2008-03-27 2013-05-08 Ｊｓｒ株式会社 シリカ系中空粒子の製造方法およびシリカ系中空粒子分散体の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070036705A1 (en) * 2005-08-10 2007-02-15 Butts Matthew D Hollow silica particles and methods for making same
CN101282907A (zh) * 2005-08-10 2008-10-08 莫门蒂夫功能性材料公司 中空二氧化硅粒子及其制备方法
CN102046522A (zh) * 2008-06-03 2011-05-04 旭硝子株式会社 核—壳粒子的制造方法、核—壳粒子、中空粒子的制造方法、涂料组合物及物品
CN102196996A (zh) * 2008-10-31 2011-09-21 旭硝子株式会社 中空粒子、其制造方法、涂料组合物及物品
EP2386590A1 (en) * 2008-12-25 2011-11-16 Denki Kagaku Kogyo Kabushiki Kaisha Composite particles, process for producing the composite particles, hollow particles, process for producing the hollow particles, and use of the hollow particles

Also Published As

Publication number Publication date
EP2812108A1 (en) 2014-12-17
US9802175B2 (en) 2017-10-31
CN104203391A (zh) 2014-12-10
JP6103950B2 (ja) 2017-03-29
WO2013145548A1 (en) 2013-10-03
US20150056371A1 (en) 2015-02-26
JP2013226539A (ja) 2013-11-07

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Granted publication date: 20170301