CN104030558A - Substrate processing system and substrate reverting device - Google Patents
Substrate processing system and substrate reverting device Download PDFInfo
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- CN104030558A CN104030558A CN201410055154.0A CN201410055154A CN104030558A CN 104030558 A CN104030558 A CN 104030558A CN 201410055154 A CN201410055154 A CN 201410055154A CN 104030558 A CN104030558 A CN 104030558A
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- substrate
- keeping arm
- pair
- reversion
- arm group
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/22—Devices influencing the relative position or the attitude of articles during transit by conveyors
- B65G47/24—Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles
- B65G47/248—Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles by turning over or inverting them
- B65G47/252—Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles by turning over or inverting them about an axis substantially perpendicular to the conveying direction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
Abstract
The present invention relates to a substrate processing system and a substrate reversing device. The substrate processing system is allowed to reverse a substrate continuously. The substrate processing system comprises a first conveying device and a second conveying device, which moves the substrate by using a plurality of unit conveying elements configured at intervals; and the substrate reversing device which is provided with a pair of maintaining arm groups configured in a symmetrical manner according to a rotation shaft, provided with a plurality of maintaining arms that goes through the unit moving elements when the rotation shaft rotates, and allowed to go up and down by using a lifting method. The maintain arms of one of the pair of maintain arm groups are provided with absorbing portions for absorb a reversing object substrate. The substrate is reversed by using the absorbing portion to absorb to the reversing object substrate and rotating the pair of maintaining arm groups around the rotation shaft for 180 DEG. The pair of maintaining groups goes up higher than a handover position after the absorption and before the finishing of the reversing, and goes down to the handover position when the reversing is finished, and the absorption is dismissed.
Description
Technical field
The present invention relates to a kind of base plate processing system that substrate two sides is carried out to processing treatment, particularly relate to a kind of substrate reversing gear of the reversion of carrying out substrate.
Background technology
As the brittle substrate of glass substrate etc. is (following, only be called substrate) method of disjunction in addition, use widely following method, rotate even if break bar is crimped on the one side of substrate and form after delineation line, make substrate surface back side reversion, press with brisement bar the previous formation of another side delineation line directly over position to carry out brisement.Said circumstances, must have pair substrate one side to form the mechanism that after delineation line, is reversed in this substrate surface back side.
In the making processes of liquid crystal panel, generally speaking, two brittle substrates large mother substrate also referred to as adhesive substrates forming of fitting, it is the formation disjunction of the delineation line that undertaken by break bar, but as the method for above-mentioned disjunction, use widely following method, even even break bar be sequentially crimped on the surperficial back side of mother substrate rotate and form delineation line, also break bar be sequentially crimped on form mother substrate each brittle substrate surface while rotate and form delineate line.This situation, also must make substrate reversion by reversing device.
For example, possess substrate from sandwiching up and down and make the reversing device of its reversion, the substrate that one side at substrate has been formed to delineation line is temporarily arranged on this reversing device and makes its reversion from upstream side, be known (for example,, with reference to patent documentation 1) by substrate delivery/reception to the substrate-cutting system of the device in downstream side after reversion.
Patent documentation 1: TOHKEMY 2010-76957 communique
Summary of the invention
The situation of the existing known reversing device that patent documentation 1 discloses, the completed first prebasal plate that reverses cannot start the reversion of next substrate before taking out of from reversing device.Therefore, have and cannot carry out continuous disjunction processing and the low problem of operating efficiency.
The present invention forms in view of above-mentioned problem, the base plate processing system that its object is to provide a kind of substrate reversing gear of novel texture and possesses this substrate reversing gear, technical problem to be solved is to make it can carry out substrate processing treatment with high treatment efficiency by carrying out the reversion of substrate continuously.
The object of the invention to solve the technical problems realizes by the following technical solutions.According to the present invention propose a kind of base plate processing system, possess: the 1st carrying device and the 2nd carrying device, respectively by brittle substrate toward the 1st direction conveyance; And substrate reversing gear, be configured between the 1st carrying device and the 2nd carrying device, make this brittle substrate being come by the 1st carrying device conveyance reverse and be handover to the 2nd carrying device; The 1st carrying device and the 2nd carrying device, by with orthogonal the 2nd direction of the 1st direction be separated by gap configuration multiple units conveyance key element on one side below support the conveyance on one side of this brittle substrate; This substrate reversing gear, possesses: a pair of keeping arm group, is configured to Rotational Symmetry with respect to the turning axle extending toward the 2nd direction; Rotary actuation means, make this pair of keeping arm group around this turning axle rotation; And lifting means, make this pair of keeping arm group between the 1st carrying device and the 2nd carrying device, above the height location of this brittle substrate of handing-over is substrate transfer position and its between lifting; This pair of keeping arm group passes through multiple keeping arms in this gap while having respectively in the configuration separated from one another of the 2nd direction and around this turning axle rotation; The plurality of keeping arm possesses respectively adsorbable in multiple adsorption sections of this brittle substrate; Under the state of this pair of keeping arm group configuration at this substrate transfer position, the plurality of adsorption section of a side's who belongs to this pair of keeping arm group the plurality of keeping arm is adsorbed in as this brittle substrate of reversion object object substrate that reverses, afterwards, by making this pair of keeping arm group around this turning axle Rotate 180 degree, make this reversion object substrate reversion; This pair of keeping arm group, be adsorbed in behind the plurality of adsorption section at this reversion object substrate, the reversion of this reversion object substrate complete before during, rising, this substrate transfer position is high on ground, after the reversion of this reversion object substrate, while removing the absorption of the plurality of adsorption section to this reversion object substrate, drop to this substrate transfer position.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Aforesaid base plate processing system, the height location of the face that is adsorbed being adsorbed by the plurality of adsorption section of this reversion object substrate after reversion when wherein this pair of keeping arm group is positioned at this substrate transfer position is identical with the conveyance height location of the 2nd carrying device, supports this reversion object substrate after reversion and carry out on one side the releasing of this absorption to this reversion object substrate after reversing by the 2nd carrying device.
Aforesaid base plate processing system, wherein belong to the plurality of adsorption section of this pair of keeping arm group's a side's the plurality of keeping arm, with the opposing party's the plurality of adsorption section of the plurality of keeping arm that belongs to this pair of keeping arm group, be that different 180 degree of direction and both end positions of being arranged to is each other positioned in the common plane parallel with this turning axle; The different distances that equate with the thickness of this brittle substrate of conveyance height location of the conveyance height location of the 1st carrying device and the 2nd carrying device; Under the state of this pair of keeping arm group configuration at this substrate transfer position, roughly carry out the releasing of the absorption of the plurality of adsorption section to this reversion object substrate after reversion simultaneously, with the opposing party's the plurality of adsorption section of the plurality of keeping arm that belongs to this pair of keeping arm group to the absorption carried out of new reversion object substrate being come by the 1st carrying device conveyance.
Aforesaid base plate processing system, wherein this turning axle is that at one end portion possesses discoideus lip portions and the other end and be linked to the bar-shaped axle of these rotary actuation means; This substrate reversing gear has this axle is supported to a pair of supporting means rotatable and that comprise these lifting means; This lip portions is chimeric sliding freely with respect to a side the cylindrical member that is positioned at these a pair of supporting means; The 1st communicating pores that is located at this lip portions attracts pipe arrangement to be connected with this adsorption section by the 1st, and the 2nd communicating pores that is located at this cylindrical member is connected with attraction means by the 2nd attraction pipe arrangement.
The object of the invention to solve the technical problems also realizes by the following technical solutions.A kind of substrate reversing gear proposing according to the present invention, is the brittle substrate reversion making toward the 1st direction conveyance, and it possesses: a pair of keeping arm group, with respect to being configured to Rotational Symmetry toward the turning axle extending with orthogonal the 2nd direction of the 1st direction; Rotary actuation means, make this pair of keeping arm group around this turning axle rotation; And lifting means, make this pair of keeping arm group and outside between, above the height location of this brittle substrate of handing-over is substrate transfer position and its between lifting; This pair of keeping arm group passes through multiple keeping arms in this gap while having respectively in the configuration separated from one another of the 2nd direction and around this turning axle rotation; The plurality of keeping arm possesses respectively adsorbable in multiple adsorption sections of this brittle substrate; Under the state of this pair of keeping arm group configuration at this substrate transfer position, the plurality of adsorption section of a side's who belongs to this pair of keeping arm group the plurality of keeping arm is adsorbed in as this brittle substrate of reversion object object substrate that reverses, afterwards, by making this pair of keeping arm group around this turning axle Rotate 180 degree, make this reversion object substrate reversion; This pair of keeping arm group, be adsorbed in behind the plurality of adsorption section at this reversion object substrate, the reversion of this reversion object substrate complete before during, rising, this substrate transfer position is high on ground, after the reversion of this reversion object substrate, while removing the absorption of the plurality of adsorption section to this reversion object substrate, drop to this substrate transfer position.
The present invention compared with prior art has obvious advantage and beneficial effect.By technique scheme, base plate processing system of the present invention and substrate reversing gear at least have following advantages and beneficial effect: the present invention can roughly carry out the action of moving into of wish reversion substrate simultaneously and move with the maintenance of this substrate.Handing-over and the keeping arm that can roughly carry out again the substrate of the processing of moving into, previously reversed of next wish reversion substrate keep the absorption of moving into substrate simultaneously.Also, can roughly carry out moving into and the reversion of substrate of wish reversion substrate simultaneously.Whereby, can realize the processing substrate of reversion processing efficiency excellence.
In sum, the invention relates to a kind of base plate processing system and substrate reversing gear.Wherein this base plate processing system carries out the reversion of substrate serially, and this base plate processing system possesses: the 1st and the 2nd carrying device, by multiple units conveyance key element conveyance substrate of the gap configuration of being separated by; And substrate reversing gear, possessing a pair of keeping arm group, this pair of keeping arm faciation is configured to Rotational Symmetry for turning axle, and has the multiple keeping arms that pass through the gap of unit conveyance key element in the time that turning axle rotates, by the lifting of lifting means freely; Be adsorbed in multiple adsorption sections that a pair of keeping arm group's a side keeping arm is possessed under the state of reversion object substrate, make adsorption section be adsorbed in reversion object substrate, afterwards, by making a pair of keeping arm group around turning axle Rotate 180 degree, make substrate reversion; A pair of keeping arm group, after substrate adsorption, reversed before during, the ground that rises is high compared with substrate transfer position, after reversion, remove when absorption, drops to substrate transfer position.The present invention has significant progress technically, and has obvious positively effect, is really a new and innovative, progressive, practical new design.
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to better understand technique means of the present invention, and can be implemented according to the content of specification sheets, and for above and other object of the present invention, feature and advantage can be become apparent, below especially exemplified by preferred embodiment, and coordinate accompanying drawing, be described in detail as follows.
Brief description of the drawings
Fig. 1 is the vertical view that the major portion of display base plate treatment system 1000 forms.
Fig. 2 is near the vertical view of formation display base plate reversing gear 100.
Fig. 3 is near the YZ side-view of formation display base plate reversing gear 100.
Fig. 4 near substrate reversing gear 100-the ZX side-view of Y side.
Fig. 5 near substrate reversing gear 100+the ZX side-view of Y side.
Fig. 6 is the YZ side-view that shows the appearance the way of a pair of keeping arm group when substrate transfer position rises.
Fig. 7 shows to make the rise figure of the state after both set a distances of a pair of keeping arm group.
Fig. 8 is the figure of the appearance that sequentially display base plate W reverses at substrate reversing gear 100.
Fig. 9 is the figure of the appearance that sequentially display base plate W reverses at substrate reversing gear 100.
Figure 10 is near the YZ side-view of substrate reversing gear 100 of the base plate processing system that comprises carrying device 300 1000 of variation.
100: substrate reversing gear 101: axle
101a: lip portions 101b: cylindrical portion
101c: power transmission portion 102: keeping arm
103: absorption layer 110: foot
120: axle support 130: rotary actuation means
130a: turning axle 140: suction pump
200: scoring device 201: platform
202: bridge portion 203: engraving head
300: carrying device 301: unit conveying unit
302: roller 400: shifting apparatus
401: absorption layer 402: absorption arm
403: guiding element 1000: base plate processing system
W (W1, W2): substrate
Embodiment
Technique means and effect of taking for reaching predetermined goal of the invention for further setting forth the present invention, below in conjunction with accompanying drawing and preferred embodiment, to base plate processing system and its embodiment of substrate reversing gear, structure, feature and effect thereof of proposing according to the present invention, be described in detail as follows.
(summary of system)
Fig. 1 is the vertical view that the major portion of display base plate treatment system 1000 forms.The base plate processing system 1000 of this example, mainly possesses substrate reversing gear 100, two scoring devices 200 (the 1st scoring device 200A and the 2nd scoring device 200B), two carrying devices 300 (the 1st carrying device 300A and the 2nd carrying device 300B).
Base plate processing system 1000, summary, for processing the system of following a succession of processing, by the 1st scoring device 200A, the brittle substrate to glass substrate etc. is (following, only be called substrate) W one interarea form delineation line after, make this substrate W reversion with substrate reversing gear 100, then, by the 2nd scoring device 200B, another interarea is formed to delineation line.
In addition, Fig. 1 and afterwards graphic, the direct of travel of giving the substrate W in the horizontal plane when sequentially to carry out a succession of processing at base plate processing system 1000 as Y-axis positive dirction, taking in horizontal plane with the orthogonal direction of Y-axis as X-direction, right-handed system XYZ coordinate taking vertical as Z-direction.
It is axle 101 that substrate reversing gear 100 mainly possesses the rod member that past X-direction extends, from the vertically extending multiple keeping arms 102 of axle 101.Multiple keeping arms 102 extend toward two directions of different 180 degree, and the keeping arm 102 of equidirectional is set as separated from one another.In this example, be illustrated in all directions and be provided with the formation of 6 keeping arms 102.In addition, after, have suitably multiple keeping arms 102 that will extend toward equidirectional and be generically and collectively referred to as keeping arm group's situation.At substrate reversing gear 100, dispose different two the keeping arm groups (a pair of keeping arm group) of bearing of trend of affiliated respectively keeping arm 102.
Dispose absorption layer 103 at keeping arm 102.Substrate reversing gear 100, with absorption layer 103 from below absorption maintain the state of substrate W that come by the 1st carrying device 300A conveyance, make the anti-turnback of keeping arm 102 using axle 101 as turning axle, make whereby substrate W reversion, at once this substrate W is handover to the 2nd carrying device 300B.The detailed formation of substrate reversing gear 100 will be narrated in the back.
Scoring device 200 possesses in the above under the state that mounting is fixed with substrate W toward Y direction and moves platform 201 freely, sets up into bridge portion 202 that X-direction is long side direction above the moving range of platform 201, is attached at least one (in Fig. 1 being 4) engraving head 203 of this bridge portion 202.In the vertical bottom of engraving head 203, with vertical position and in face rotation set up freely discoid and outer peripheral portion and become the scribe wheel (not shown) of cutter front end.
At the scoring device 200 of above-mentioned formation, be configured at engraving head 203 under the state of appropriate location of bridge portion 200, load at substrate W under the state that is fixed on platform 201 and make platform move on one side and make scribe wheel crimping rotate in substrate W toward Y-axis positive dirction on one side, can form the delineation line along Y direction at substrate W whereby.
In addition, the formation of the scoring device 200 of formation base plate processing system 100 is not limited to this.For example, below dispose under the state of substrate W, the engraving head 203 that possesses scribe wheel in bottom is moved toward X-direction, whereby form delineation line form also can.Or the form that configures multiple bridge portions 202 that possess engraving head 203 also can.
Carrying device 300 is the devices of conveyance substrate W between substrate reversing gear 100 and scoring device 200.Particularly, the 1st carrying device 300A will be formed with the substrate W conveyance of delineation line to the reversion starting position of substrate reversing gear 100 with the 1st scoring device 200A.The 2nd carrying device 300B by the substrate W after being reversed by substrate reversing gear 100 from the reversion end position of substrate reversing gear 100 towards the 2nd scoring device 200B conveyance.
Carrying device 300 possesses and is configured to multiple (in this example be seven) the unit conveying unit (unit conveyance key element) 301 parallel and separated from one another with Y-axis.At carrying device 300, the each substrate W of conveyance under the state of supporting below by all units conveying unit 301.More specifically, constituent parts conveying unit 301 be Y direction be long side direction (conveyance direction) and synchronously with one another action endless belt conveyor.
Constituent parts conveying unit 301 is gaps of two unit conveying units 301 adjacent while being configured to reverse action by the rotation of axle 101 by the keeping arm 102 that is configured in substrate reversing gear 100.But the unit conveying unit 301 (the 1st conveying unit 301A of unit) of the 1st carrying device 300A and the unit conveying unit 301 (the 2nd conveying unit 301B of unit) of the 2nd carrying device 300B are that to be configured to allocation position (height location) in vertical different.Particularly, the 2nd conveying unit 301B of unit is compared to the 1st conveying unit 301A of unit, is configured in the position of the distance that thickness t that to exceed with the handling object of base plate processing system 1000 be substrate W equates.
The base plate processing system 1000 of this example further possesses two shifting apparatus 400 (the 1st shifting apparatus 400A and the 2nd shifting apparatus 400B).Shifting apparatus 400 is processed the transfer of the substrate W between scoring device 200 and adjacent carrying device 300.Shifting apparatus 400 possesses toward X-direction extension and in leading section lifting and possesses freely the absorption arm 402 of the absorption layer 401 below vertical and this absorption arm 402 is supported to the guiding element 403 that can move toward Y direction.
More specifically, the 1st shifting apparatus 400A absorption remains on the substrate W after the 1st scoring device 200A formation delineation line and transfers load to the 1st carrying device 300A.The 2nd shifting apparatus 400B absorption keeps by the substrate W of the 2nd carrying device 300B conveyance and transfers load to the platform 201 of the 2nd scoring device 200B.
In addition, shifting apparatus 400 is in base plate processing system 1000 nonessential formation.With scoring device 200 and carrying device 300 between directly the mode of handing-over substrate W form base plate processing system 1000 also can, said circumstances, does not need shifting apparatus 400.
(the detailed formation of substrate reversing gear)
Fig. 2 and Fig. 3 are respectively that the major portion of display base plate treatment system 1000 is near vertical view and the YZ side-view of formation substrate reversing gear 100.In Fig. 2 and Fig. 3, be presented at the appearance while joining substrate W between the 1st carrying device 300A and substrate reversing gear 100.
Moreover Fig. 4 and Fig. 5 be respectively near the substrate reversing gear 100 of the situation shown in Fig. 2 and Fig. 3-the ZX side-view of Y side and+the ZX side-view of Y side.But, in Fig. 4 and Fig. 5, omit the integrant of be configured in+Y side, in Fig. 5, omit the integrant of be configured in-Y side.
As above-mentioned, substrate reversing gear 100 possesses the axle 101 that past X-direction is extended and can be rotated taking X-direction as turning axle, and the keeping arm group who is made up of the multiple keeping arms 102 that possess respectively multiple absorption layers 103 is extended toward two directions of different 180 degree from axle 101.In addition,, in Fig. 2, each keeping arm faciation is set as comb teeth-shaped for axle 101.
But, the keeping arm 102 (these are called to keeping arm 102A especially) that belongs to a side keeping arm group and keeping arm group's the multiple keeping arms 102 (these are called to keeping arm 102B especially) that belong to the opposing party, be different 180 degree of direction of the absorption layer 103 that possesses each other and a side the end position (absorption position) of absorption layer 103 and the end position (absorption position) of the opposing party's absorption layer 103 even if keeping arm 102A is also positioned at the mode in the common plane parallel with axle 101 with the postural change of keeping arm 102B, be fixedly arranged on axle 101.
For example, if the illustrative keeping arm 102 of Fig. 1 to Fig. 5 is obtained the situation of flat-hand position, for example as can be seen from Figure 3, the absorption layer 103 of keeping arm 102A is towards vertical below (Z direction), with respect to this, the absorption layer 103 of keeping arm 102B is towards vertical top (+Z direction), but the former end (bottom) is positioned at conplane horizontal plane with the latter's end (upper end).Also, be positioned at equal height position.Rotate by axle 101, the postural change of all keeping arms 102, but be configured in the direction and permanent different 180 degree of direction of absorption layer 103 that are configured in keeping arm 102B of the absorption layer 103 of keeping arm 102A.
Also the keeping arm 102A that, belongs to a side keeping arm group is set as in YZ face to become rotational symmetric position with respect to axle 101 with keeping arm group's the keeping arm 102B that belongs to the opposing party.
Substrate reversing gear 100 further possesses a pair of foot 110, a pair of axle support 120 and rotary actuation means 130.
A pair of foot 110 is in X-direction configured separate, by axle support 120 by the axle 101 extending toward X-direction its two end portions from below supporting.In addition,, in this example, for simplicity of illustration, show the form that a pair of foot 110 configures independently, but the form that a pair of foot 110 is located on not shown base station also can.
A pair of axle support 120 is connected in the two end portions of axle 101, and the form freely of vertical lifting is in the past located at the upper side position of corresponding foot 110.Also, axle support 120 bolster 101 liftings on one side on one side.Whereby, at substrate reversing gear 100, can make axle 101 and be fixedly arranged on this keeping arm 102 height location change.Range about axle support 120 will describe in detail in the back.In addition, above-mentioned lifting action can carry out with the spinning movement of axle 101 is parallel.
The concrete formation of processing the lifting of axle support 120, can realize by known technology.Be preferably, the lifting of axle support 120 realizes by linear motor mechanism.For example, extend not shown mounting block is set toward Z-direction in foot 110, at axle support 120, not shown movable piece is set, movable piece is moved along mounting block, whereby as shown in the arrow A R of Fig. 4 and Fig. 5, can make 120 liftings of axle support in the set scope of Z-direction.
In addition, in this example, with a pair of axle support 120, in X-direction, the mode between a pair of foot 110 configures both, but both configuration relations are not limited to this.
Rotary actuation means 130 are to use so that the driving means that axle 101 rotates.As rotary actuation means 130, be preferably for example revolving cylinder.
More specifically, at substrate reversing gear 100, be installed with discoideus lip portions 101a in an end of axle 101 (in this example being+X side end).On the other hand, be installed with the cylindrical portion 101b toward X-direction opening at axle support 120.In addition, the peripheral part of lip portions 101a is the inner face that the state that slides is freely entrenched in the peristome of cylindrical portion 101b.
Be installed with the 101c of power transmission portion in the other end of axle 101 (in this example being-X side end).At the 101c of power transmission portion, the turning axle 130a of the rotary actuation means 130 that past+directions X extends is supported in axle support 120 and links.
By thering is above formation, at substrate reversing gear 100, if rotary actuation means 130 are moved, the turning axle 130a by being supported on axle support 120 be connected in this 101c of power transmission portion, Neng Shi foot 110 and the axle 101 being supported by axle support 120 rotate.Whereby, can realize the rotation around the keeping arm 120 of axle 101.Now, in the other end of axle 101, lip portions 101a slides with respect to cylindrical portion 101b, therefore can stably be rotated action.
In addition, though omit diagram in Fig. 1 to Fig. 3, as shown in Figures 4 and 5, be provided with i.e. two the 1st port P1 of communicating pores at lip portions 101a, be provided with similarly i.e. the 2nd port P2 of communicating pores in the side of cylindrical portion 101b.In addition, be connected with the 1st at the 1st port P1 and attract with pipe T1, be connected with the 2nd at the 2nd port P2 and attract with pipe T2.Whereby, the 1st attraction is the coconnected state in space with pipe T1 and the 2nd attraction with managing between T2.
Moreover two the 1st attract to be connected in absorption layer 103 via the attraction path that is located at keeping arm 102 respectively with the other end of pipe T1.More specifically, the 1st of a side attracts to be connected in pipe T1 the absorption layer 103 of keeping arm 102A side, and the 1st of the opposing party attracts to be connected in pipe T1 the absorption layer 103 of keeping arm 102B side.The 2nd attracts to be connected in suction pump 140 with the other end of pipe T2.By thering is above-mentioned formation, at substrate reversing gear 100, load under the upper state of absorption layer 103 suction pump 140 is moved at substrate W, can adsorb fixing base W by absorption layer 103 whereby.In Fig. 4, illustrate conceptually the 1st and attract to attract the appearance being connected with suction pump 140 with pipe T2 with pipe T1 with the appearance being connected and the 2nd of a part of absorption layer 103.
And, as above-mentioned, be connected with the 1st lip portions 101a attracting with pipe T1, in the time that rotating, axle 101 attracts to slide freely by the cylindrical body of pipe T2 with respect to being connected with the 2nd, even if the state therefore rotating at axle 101 also keeps attraction state.Whereby, in the substrate reversing gear 100 of this example, even if the state that keeping arm 102 rotates also can keep substrate W by absorption layer 103 absorption.
(configuration relation of carrying device 300 and substrate reversing gear)
Then, the configuration relation of carrying device 300 and substrate reversing gear 100 is described, particularly, the configuration relation of unit conveying unit 301 of the 1st carrying device 300A and the 2nd carrying device 300B and the relation that axle support 120 lifting rear axles 101 rotate the allocation position of changed keeping arm 102A and keeping arm 102B are described.
As above-mentioned, in the base plate processing system 1000 of this example, the height location difference of the unit conveying unit 301 of the unit conveying unit 301 of the 1st carrying device 300A and the 2nd carrying device 300B is the amount of the thickness t of substrate W.On the other hand, at substrate reversing gear 100, keeping arm 102A and keeping arm 102B are that the mode to be positioned in common plane with respect to the end of axle 101 Rotational Symmetries and the absorption layer 103 that possesses respectively arranges.By rotary actuation means 130, axle 101 is rotated, can make whereby a pair of keeping arm group rotate around axle 101, by making 120 liftings of axle support, can make axle 101 and a pair of keeping arm group's height location change.
The configuration relation at these positions and a pair of keeping arm group's range is to set for can carry out expeditiously from the unit conveying unit 301 of the 1st carrying device 300A toward the handing-over of a pair of keeping arm group's a side's substrate, from the opposing party of a pair of keeping arm group toward the handing-over of the substrate W of the 2nd carrying device 300B and the reversion of the substrate W between these handing-over and the conveyance of the substrate W at the 1st carrying device 300A and the 2nd carrying device 300B.
Particularly, first, the appearance of Fig. 1 when Figure 5 shows that a pair of keeping arm group is positioned at substrate transfer position.Substrate transfer position, as shown in Figures 2 and 3, being defined as a pair of keeping arm group is that the height location of flat-hand position and absorption layer 103 lower ends that now possess compared with the keeping arm 102A of be positioned at-Y of axle 101 side is compared with the position that exceeds the thickness t of substrate W above of the 1st conveying unit 301A of unit of the 1st carrying device 300A.When a pair of keeping arm group is positioned at aforesaid substrate delivery position, at the 1st carrying device 300A, substrate W is by conveyance to+Y side end, and the height location of absorption layer 103 lower ends is consistent with the height location above substrate W, and therefore absorption layer 103 can carry out the absorption of substrate W.
And, now, according to above-mentioned configuration relation, height location above the 2nd carrying device 300B is identical with the height location of absorption layer 103 upper ends that possess compared with the keeping arm 102B of be positioned at+Y of axle 101 side, therefore as the situation that is adsorbed face and is adsorbed by this absorption layer 103 below the substrate W existence of maintenance, also can support this substrate W by the 2nd carrying device 300B.
Also,, when a pair of keeping arm group is positioned at substrate transfer position, can roughly carry out the handing-over of the handing-over of the substrate W from the 1st carrying device 300A toward substrate reversing gear 100, substrate from substrate reversing gear 100 toward the 2nd carrying device 300B simultaneously.
Fig. 6 is the YZ side-view that shows the appearance the way of a pair of keeping arm group when substrate transfer position shown in Fig. 1 to Fig. 5 rises.But, in Fig. 6, omit substrate W.
As shown in Figure 6, in this example, keeping arm 102 is rotated as shown in arrow RT and make a pair of keeping arm group increase simultaneously.More specifically, during making keeping arm 102A and the anti-turnback of keeping arm 102B, axle support 120 rises, and makes a pair of keeping arm group increase.Or, after making a pair of keeping arm group increase, keeping arm 102A and the anti-turnback of keeping arm 102B also can.
On the other hand, show that state that a pair of keeping arm group rises after both set a distances as shown in Figure 7.But, in Fig. 7, also omit substrate W.
Fig. 3 that Fig. 7 and a pair of keeping arm group are positioned to the state of substrate transfer position is contrasted, in the former, axle support 120 is positioned at higher position with respect to foot 110, a pair of keeping arm group's relative configuration relation is identical, but the configuration relation of keeping arm 102A and keeping arm 102B is replaced in the both sides of axle 101 in Y direction.
In addition, further confirm, the keeping arm 102 that can understand rotation from both configuration relation shown in Fig. 2 can not collide with unit conveying unit 301.
The distance that a pair of keeping arm group rises from substrate transfer position, as shown in Figure 7, the height location above the conveying unit 301B of unit of permanent and the 2nd carrying device 300B and equating compared with the distance d of the height location of absorption layer 103 upper ends of the keeping arm 102A of be positioned at+Y of axle 101 side.In addition, a pair of keeping arm group's rising be for positively prevent from carrying out at the 1st carrying device 300A past+absorption layer 103 of keeping arm 102A carries out with the interference of the substrate W of conveyance when the conveyance of the substrate W of Y-direction.Therefore, as long as a pair of keeping arm group's climb has several mm degree enough.In Fig. 7, be exaggerate show above-mentioned apart from d.
A pair of keeping arm group after temporary transient rising, toward the decline of substrate transfer position, is to carry out under the state that keeping arm 102 is held in to flat-hand position.In addition, static after not needing to make a pair of keeping arm group to rise, rise and carry out continuously also can with decline thereafter.
(substrate reversion order)
Then, illustrate and there is the reversion order of substrate W of substrate reversing gear 100 of above formation.Fig. 8 and Fig. 9 are the figure that is sequentially presented at the appearance of substrate reversing gear 100 substrate W reversions.In addition, the main display base plate reversing gear 100 of Fig. 8 starts action appearance originally, the standard state that the reversion of the main display base plate W of Fig. 9 is carried out continuously.
Illustrate, for convenient, as shown in Fig. 8 (a), a pair of keeping arm group rises from substrate transfer position, and carries out from the state in flat-hand position.At above-mentioned state, first, on the 1st conveying unit 301A of unit of the 1st carrying device 300A, mounting is delineated substrate W after treatment (W1) with the 1st scoring device 200A.Aforesaid substrate W1, as shown in arrow A R1, by the 1st conveying unit 301A of unit past+Y-direction conveyance.
Then, substrate W1 toward the 1st conveying unit 301A of unit+conveyance of Y side end side till during, as shown in arrow A R2 in Fig. 8 (b), a pair of keeping arm group declines towards substrate transfer position.Also, (walk abreast simultaneously) and carry out roughly simultaneously in the conveyance of substrate W1 and a pair of keeping arm group's the decline of the 1st carrying device 300A.This contributes to the efficient activity of processing in the substrate reversion of base plate processing system 1000.
A pair of keeping arm group arrives after substrate transfer position, as shown in Fig. 8 (c), is configured in the bottom of absorption layer 103 and contacting of substrate W1 of keeping arm 102A above.In addition, Fig. 8 (c) shows the situation identical with Fig. 3.As above-mentioned, under the state contacting with substrate W1 at absorption layer 103, by making suction pump 140 starts, make substrate W absorption be held in absorption layer 103.
In addition, now, keeping arm 102B is between the conveying unit 301B of unit, and the height location of the upper end of its absorption layer 103 is identical with the height location of the conveying unit 301B of unit.
After above-mentioned absorption keeps carrying out, then, drive rotary actuation means 130 that axle 101 is rotated, as shown in arrow RT1 in Fig. 8 (d), a pair of keeping arm group turns clockwise, anti-turnback whereby.Whereby, keeping arm 102A rotates under the state that keeps substrate W1 with absorption layer 103 absorption.On the other hand, keeping arm 102B rotates while passes through the gap of the conveying unit 301B of unit of the 1st carrying device 300A.With the above-mentioned rotation while, as shown in arrow A R3, make a pair of keeping arm group increase.
(a) of Fig. 9 is depicted as the appearance after the anti-turnback of a pair of keeping arm group and a pair of keeping arm group rising.Now, substrate W1 is by the state keeping from below absorption compared with the keeping arm 102A of be positioned at+Y of axle 101 side.Also, for the state of the anti-turnback of state that is configured at the beginning the 1st carrying device 300A.In addition,, compared with axle 101 lean on-Y sides, between keeping arm 102B and the 1st conveying unit 301A of unit, produce gap.
During before state realization shown in Fig. 9 (a), on the 1st conveying unit 301A of unit of the 1st carrying device 300A, the substrate W1 that continues mounting is delineated substrate W after treatment (W2) with the 1st scoring device 200A.Aforesaid substrate W2, as shown in arrow A R4, by the 1st conveying unit 301A of unit past+Y-direction conveyance.
Substrate W2 toward the 1st conveying unit 301A of unit+conveyance of Y side end side after, as shown in arrow A R5 in Fig. 9 (b), a pair of keeping arm group declines towards substrate transfer position.The conveyance of these substrates W2 and a pair of keeping arm group's decline, identical during with the conveyance of substrate W1, parallel carrying out simultaneously, therefore contributes to the efficient activity of processing in the substrate reversion of the base plate processing system 1000 of this example.
A pair of keeping arm group arrives after substrate transfer position, as shown in Fig. 9 (c), is adsorbed pad 103 and contacts with the conveying unit 301B of unit of the 2nd carrying device 300B below the substrate W1 of below supporting.Obtaining the time point of above-mentioned contact condition, the absorption of the substrate W1 that releasing absorption layer 103 carries out keeps.Whereby, realize substrate W1 and load the state on the conveying unit 301B of unit.After above-mentioned mounting realizes, the conveying unit 301B of unit is at once as shown in arrow A R6, by the end conveyance of past substrate W1+Y side.Taken out of toward the 2nd scoring device 200B by the substrate W1 of conveyance.Also, being supplied to by the substrate W of substrate reversing gear 100 anti-turnbacks the delineation that the 2nd scoring device 200B carries out processes.
On the other hand, compared with axle 101 lean on-Y sides, realize the bottom of absorption layer 103 and the state contacting of substrate W2 that are configured in keeping arm 102B above.The releasing keeping in absorption to substrate W1 with carry out toward the conveyance of+Y side after time point, after suction pump 140 moves again, substrate W2 is adsorbed and is held in absorption layer 103.
Above-mentioned absorption keeps after the conveyance of the substrate W of the absorption releasing of keeping arm 102A and the 2nd carrying device 300B continuing, carrying out at once, therefore at substrate reversing gear 100, reverse substrate W after treatment toward the handing-over of the 2nd carrying device 300B and the absorption of the next substrate W as reversion object keep can be used as a series of continuous movement roughly side by side (without time lag) carry out.
Above-mentioned absorption then, drives rotary actuation means 130 that axle 101 is rotated after keeping carrying out again, and as shown in arrow RT2 in Fig. 9 (d), a pair of keeping arm group turns clockwise, anti-turnback whereby.So keeping arm 102B rotates under the state that keeps substrate W2.Meanwhile, as shown in arrow A R7, make a pair of keeping arm group increase.
Afterwards, the time point rising a pair of keeping arm group, except keeping arm 102A and keeping arm 102B replace, realizes the state identical with Fig. 9 (a).Therefore, afterwards, if the order shown in (a)～Fig. 9 of Fig. 9 (d) repeatedly, the substrate W moving into from the 1st scoring device 200A sequentially reverses, and can be supplied to the delineation processing that the 2nd scoring device 200B carries out.
As described above, according to the base plate processing system of this example, can roughly carry out the action of moving into of wish reversion substrate simultaneously and move with the maintenance of this substrate.Again, the handing-over, keeping arm that can roughly simultaneously carry out the moving into of next wish reversion substrate, the substrate after treatment that previously reversed keeps the absorption of moving into substrate and carrying out.It seen in summary, and the base plate processing system of this example roughly carries out the reversion of substrate and moving into of next wish reversion substrate simultaneously.Whereby, can realize the base plate processing system of reversion processing efficiency excellence.
(variation)
In above-mentioned example, the unit conveying unit 301 of carrying device 300 is configured to endless belt conveyor, but the formation of unit conveying unit 301 is not limited to this.Figure 10 is near the YZ side-view of substrate reversing gear 100 of the base plate processing system that comprises carrying device 300 1000 of variation.
At the base plate processing system 1000 shown in Figure 10, unit conveying unit 301 possesses the multiple cylinders 302 in Y direction configured separate.Above-mentioned cylinder 302 by not shown driving means rotarily actuate also can, or also can for moving the return idler driving under the state by substrate W contact.If the former situation rotates roller 302 by driving means under the state that is placed with substrate W, whereby can be by substrate W conveyance to want position.If the latter's situation, while also movement by maintenance substrate W such as such as shifting apparatus 400, the roller 302 contacting with the substrate W back side rotates, whereby the conveyance of assisting base plate W simultaneously.
In above-mentioned example, though the form setting of each keeping arm 102 directly to extend from axle 101 substitutes this, around axle 101, possess the framework rotating integratedly with axle, the form that keeping arm 102 is arranged on to this framework also can.
In above-mentioned example, it is rectangular-shaped that each keeping arm 102 is set as at the width of long side direction and even thickness and the section vertical with long side direction, but the shape of keeping arm 102 is not limited to this.For example, have more and also can towards the less shape of long side direction leading section thickness etc.
The above, it is only preferred embodiment of the present invention, not the present invention is done to any pro forma restriction, although the present invention discloses as above with preferred embodiment, but not in order to limit the present invention, any those skilled in the art, do not departing within the scope of technical solution of the present invention, when can utilizing the technology contents of above-mentioned announcement to make a little change or being modified to the equivalent embodiment of equivalent variations, in every case be not depart from technical solution of the present invention content, any simple modification of above embodiment being done according to technical spirit of the present invention, equivalent variations and modification, all still belong in the scope of technical solution of the present invention.
Claims (5)
1. a base plate processing system, is characterized in that it possesses:
The 1st carrying device and the 2nd carrying device, respectively by brittle substrate toward the 1st direction conveyance; And
Substrate reversing gear, is configured between the 1st carrying device and the 2nd carrying device, makes this brittle substrate being come by the 1st carrying device conveyance reverse and be handover to the 2nd carrying device;
The 1st carrying device and the 2nd carrying device, by be separated by multiple units conveyance key element of gap configuration of orthogonal the 2nd direction of the 1st direction, on one side below support the conveyance on one side of this brittle substrate;
This substrate reversing gear, possesses:
A pair of keeping arm group, is configured to Rotational Symmetry with respect to the turning axle extending toward the 2nd direction;
Rotary actuation means, make this pair of keeping arm group around this turning axle rotation; And
Lifting means, make this pair of keeping arm group between the 1st carrying device and the 2nd carrying device, above the height location of this brittle substrate of handing-over is substrate transfer position and its between lifting;
This pair of keeping arm group passes through multiple keeping arms in this gap while having respectively in the configuration separated from one another of the 2nd direction and around this turning axle rotation;
The plurality of keeping arm possesses respectively adsorbable in multiple adsorption sections of this brittle substrate;
By under the state of this pair of keeping arm group configuration at this substrate transfer position, the plurality of adsorption section that makes to belong to the plurality of keeping arm of the side in this pair of keeping arm group is adsorbed in as this brittle substrate of reversion object object substrate that reverses, afterwards, by making this pair of keeping arm group around this turning axle Rotate 180 degree, make this reversion object substrate reversion;
This pair of keeping arm group, be adsorbed on behind the plurality of adsorption section at this reversion object substrate, the reversion of this reversion object substrate complete before during, rise to this substrate transfer position eminence, after the reversion of this reversion object substrate, while removing the absorption of the plurality of adsorption section to this reversion object substrate, drop to this substrate transfer position.
2. base plate processing system according to claim 1, it is characterized in that wherein, the height location of the face that is adsorbed being adsorbed by the plurality of adsorption section of this reversion object substrate after reversion when this pair of keeping arm group is positioned at this substrate transfer position is identical with the conveyance height location of the 2nd carrying device, to the releasing of this absorption of this reversion object substrate after reversion, be to support this reversion object substrate after reversing by the 2nd carrying device while carry out.
3. base plate processing system according to claim 2, it is characterized in that wherein, belong to the plurality of adsorption section of the plurality of keeping arm of the side in this pair of keeping arm group, with belong to the plurality of adsorption section of the opposing party's the plurality of keeping arm in this pair of keeping arm group, be that different 180 degree of direction and both end positions of being arranged to is each other positioned in the common plane parallel with this turning axle;
The conveyance height location of the conveyance height location of the 1st carrying device and the 2nd carrying device, differs the distance equating with the thickness of this brittle substrate;
Under the state of this pair of keeping arm group configuration at this substrate transfer position, the absorption of roughly carrying out the releasing of the absorption of the plurality of adsorption section to this reversion object substrate after reversion simultaneously, the new reversion object substrate being come by the 1st carrying device conveyance being carried out with the plurality of adsorption section that belongs to the opposing party's the plurality of keeping arm in this pair of keeping arm group.
4. according to the base plate processing system described in arbitrary claim in claims 1 to 3, it is characterized in that wherein, this turning axle is that at one end portion possesses discoideus lip portions and the other end and be linked to the bar-shaped axle of these rotary actuation means;
This substrate reversing gear has this axle is supported to a pair of supporting means rotatable and that comprise these lifting means;
This lip portions is chimeric sliding freely with respect to a side the cylindrical member that is positioned at these a pair of supporting means;
The 1st communicating pores that is located at this lip portions attracts pipe arrangement to be connected with this adsorption section by the 1st, and the 2nd communicating pores that is located at this cylindrical member is connected with attraction means by the 2nd attraction pipe arrangement.
5. a substrate reversing gear, is the brittle substrate reversion making toward the 1st direction conveyance, it is characterized in that it possesses:
A pair of keeping arm group, the turning axle that relatively extends 2nd direction orthogonal with the 1st direction is configured to Rotational Symmetry;
Rotary actuation means, make this pair of keeping arm group around this turning axle rotation; And
Lifting means, make this pair of keeping arm group and outside between, above the height location of this brittle substrate of handing-over is substrate transfer position and its between lifting;
This pair of keeping arm group passes through multiple keeping arms in this gap while having respectively in the configuration separated from one another of the 2nd direction and around this turning axle rotation;
The plurality of keeping arm possesses respectively adsorbable in multiple adsorption sections of this brittle substrate;
Under the state of this pair of keeping arm group configuration at this substrate transfer position, the plurality of adsorption section that makes to belong to the plurality of keeping arm of the side in this pair of keeping arm group is adsorbed in as this brittle substrate of reversion object object substrate that reverses, afterwards, by making this pair of keeping arm group around this turning axle Rotate 180 degree, make this reversion object substrate reversion;
This pair of keeping arm group, be adsorbed in behind the plurality of adsorption section at this reversion object substrate, the reversion of this reversion object substrate complete before during, rise to this substrate transfer position eminence, after the reversion of this reversion object substrate, while removing the absorption of the plurality of adsorption section to this reversion object substrate, drop to this substrate transfer position.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-043127 | 2013-03-05 | ||
| JP2013043127A JP6064684B2 (en) | 2013-03-05 | 2013-03-05 | Substrate processing system and substrate inversion apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104030558A true CN104030558A (en) | 2014-09-10 |
| CN104030558B CN104030558B (en) | 2018-09-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410055154.0A Expired - Fee Related CN104030558B (en) | 2013-03-05 | 2014-02-18 | Base plate processing system and substrate inversion set |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6064684B2 (en) |
| KR (1) | KR101830598B1 (en) |
| CN (1) | CN104030558B (en) |
| TW (1) | TWI571954B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP6064684B2 (en) | 2017-01-25 |
| KR20140110711A (en) | 2014-09-17 |
| TWI571954B (en) | 2017-02-21 |
| CN104030558B (en) | 2018-09-28 |
| TW201436087A (en) | 2014-09-16 |
| KR101830598B1 (en) | 2018-02-22 |
| JP2014169177A (en) | 2014-09-18 |
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