CN104030558B - Base plate processing system and substrate inversion set - Google Patents

Base plate processing system and substrate inversion set Download PDF

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Publication number
CN104030558B
CN104030558B CN201410055154.0A CN201410055154A CN104030558B CN 104030558 B CN104030558 B CN 104030558B CN 201410055154 A CN201410055154 A CN 201410055154A CN 104030558 B CN104030558 B CN 104030558B
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Prior art keywords
substrate
retaining arm
inversion
pair
adsorption
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CN201410055154.0A
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CN104030558A (en
Inventor
成尾徹
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MATSUSHITA DIAMOND INDUSTRIAL Co Ltd
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MATSUSHITA DIAMOND INDUSTRIAL Co Ltd
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Priority to JP2013043127A priority Critical patent/JP6064684B2/en
Priority to JP2013-043127 priority
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Publication of CN104030558A publication Critical patent/CN104030558A/en
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/22Devices influencing the relative position or the attitude of articles during transit by conveyors
    • B65G47/24Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles
    • B65G47/248Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles by turning over or inverting them
    • B65G47/252Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles by turning over or inverting them about an axis substantially perpendicular to the conveying direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Abstract

The invention relates to a kind of base plate processing system and substrate inversion sets.Wherein the base plate processing system can be performed continuously the reversion of substrate, which has:1st and the 2nd carrying device transports substrate by multiple units conveyance element of separated by gap configuration;And substrate inversion set, have a pair of of retaining arm group, which is configured to rotational symmetry for rotary shaft, and with multiple retaining arms in the gap for transporting element when being rotated around rotary shaft by unit, freely by the lifting of lifting means;In the state that the multiple adsorption sections for making the retaining arm of the side of a pair of of retaining arm group have are adsorbed in inversion-object substrate, adsorption section is made to be adsorbed in inversion-object substrate, later, by making a pair of of retaining arm group rotate 180 degree around rotary shaft, substrate is made to invert;A pair of of retaining arm group, after substrate adsorption, reversion complete before during, rise ground compared with substrate transfer position height, after reversion, when desorbing, drop to substrate transfer position.

Description

Base plate processing system and substrate inversion set
Technical field
The present invention relates to a kind of base plate processing systems being processed to substrate two sides, more particularly to a kind of progress The substrate inversion set of the reversion of substrate.
Background technology
As the method that the brittle material substrate (hereinafter simply referred to as substrate) of glass substrate etc. is subject to disjunction, widely Substrate surface is set to carry on the back after even if break bar rotates while being crimped on the one side of substrate and forms score line using following methods Face inverts, and the surface position for the score line of another side being previously formed is pressed with brisement bar to carry out brisement.Said circumstances, must Need have and the mechanism for making the substrate surface back side invert is formed after score line to substrate side.
In the manufacturing process of liquid crystal display panel, it is however generally that, it is also referred to as bonded made of two brittle material substrate fittings The big mother substrate of substrate is the formation disjunction of the score line carried out by break bar, but as the method for above-mentioned disjunction, widely Using following methods, though break bar sequentially rotated while being crimped on the surface back side of mother substrate and formed score line namely So that break bar is sequentially rotated while being crimped on the surface for each brittle material substrate for constituting mother substrate and forms score line.This feelings Shape, it is also necessary to make substrate invert by reversing device.
For example, having substrate from the reversing device for sandwiching and making it to invert up and down, quarter will be formed in the one side of substrate The substrate of scribing line is temporarily installed at the reversing device from upstream side and makes its reversion, by the substrate delivery/reception after reversion to downstream side The substrate-cutting system of device has been known (for example, referring to patent document 1).
Patent document 1:Japanese Unexamined Patent Publication 2010-76957 bulletins
Invention content
The situation for the existing known reversing device that patent document 1 discloses inverts completed previous substrate from reversing device Before moving out, the reversion of next substrate can not be started.Therefore, continuous disjunction processing can not be carried out and operating efficiency is low by having Problem.
The present invention is constituted in view of the above subject, and its purpose is to provide a kind of new structural substrate inversion sets And have the base plate processing system of this substrate inversion set, the technical problem to be solved is that make its by continuously carrying out substrate Reversion and can with high treatment efficiency carry out substrate working process.
The object of the invention to solve the technical problems is realized using following technical scheme.It proposes according to the present invention A kind of base plate processing system, have:1st carrying device and the 2nd carrying device, respectively by brittle material substrate toward the 1st direction Conveyance;And substrate inversion set, it configures between the 1st carrying device and the 2nd carrying device, makes to be filled by the 1st conveyance The brittle material substrate moved is set to invert and be handover to the 2nd carrying device;1st carrying device is filled with the 2nd conveyance It sets, is supported on one side in lower section by multiple units conveyance element in the 2nd direction separated by gap configuration orthogonal with the 1st direction One brittle material substrate transports on one side;The substrate inversion set, has:A pair of of retaining arm group, relative to past 2nd direction The rotary shaft of extension is configured to rotational symmetry;Driving means are rotated, a pair of retaining arm group is made to be rotated around the rotary shaft;And lifting Means make a pair of retaining arm group between the 1st carrying device and the 2nd carrying device, are joining the brittle material substrate Height and position, that is, substrate transfer position and its top between lift;The a pair of retaining arm group be respectively provided with the 2nd direction that This configured separate and pass through multiple retaining arms in the gap when being rotated around the rotary shaft;Multiple retaining arm has adsorbable respectively In multiple adsorption sections of the brittle material substrate;In a pair of retaining arm group configuration in the state of the substrate transfer position, make Belong to multiple retaining arm of the side of a pair of retaining arm group multiple adsorption section be adsorbed in as inversion-object this is crisp Property material substrate, that is, inversion-object substrate by making a pair of retaining arm group rotate 180 degree around the rotary shaft, keep this anti-later Turn object substrate reversion;The a pair of retaining arm group, in the inversion-object substrate adsorption behind multiple adsorption section, the inversion-object During before the reversion completion of substrate, rises ground compared with substrate transfer position height, after the reversion of the inversion-object substrate, release When to the absorption of multiple adsorption section of the inversion-object substrate, the substrate transfer position is dropped to.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Being somebody's turn to do after reversion when base plate processing system above-mentioned, wherein a pair of retaining arm group are located at the substrate transfer position The conveyance height for the height and position and the 2nd carrying device by adsorption plane of inversion-object substrate adsorbed by multiple adsorption section Position is identical, is carried out to being somebody's turn to do after reversion while supporting the inversion-object substrate after inverting by the 2nd carrying device The releasing of the absorption of inversion-object substrate.
Base plate processing system above-mentioned, wherein belonging to the multiple of multiple retaining arm of the side of a pair of retaining arm group Adsorption section, multiple adsorption section with the multiple retaining arm for the another party for belonging to a pair of retaining arm group, are arranged to each other The different 180 degree in direction and the end position of the two be located in the common plane parallel with the rotary shaft;1st carrying device Conveyance height and position and the conveyance height and position difference of the 2nd carrying device it is equal with the thickness of the brittle material substrate away from From;In a pair of retaining arm group configuration in the state of the substrate transfer position, substantially it is carried out at the same time to the reversion after reversion The releasing of the absorption of multiple adsorption section of object substrate, multiple retaining arm with the another party for belonging to a pair of retaining arm group The absorption that the new inversion-object substrate moved by the 1st carrying device is carried out of multiple adsorption section.
Base plate processing system above-mentioned, the wherein rotary shaft are that portion has disk-shaped lip portions and the other end at one end It is linked to the rodlike axis of the rotation driving means;The substrate inversion set has to be pivotally supported into this rotatable and includes the liter A pair of of bearing means of drop means;The lip portions slide freely relative to the cylindrical member of the side positioned at a pair of bearing means Ground is fitted into;The 1st through hole for being located at the lip portions attracts piping to be connect with the adsorption section by the 1st, and is located at the cylindrical member The 2nd through hole by the 2nd attract piping with attraction means connect.
The object of the invention to solve the technical problems is also realized using following technical scheme.It proposes according to the present invention A kind of substrate inversion set is the brittle material substrate reversion made toward the conveyance of the 1st direction, has:A pair of of retaining arm group, relatively It is configured to rotational symmetry in the rotary shaft that past 2nd direction orthogonal with the 1st direction extends;Driving means are rotated, a pair is made Retaining arm group rotates around the rotary shaft;And lifting means, make a pair of retaining arm group between external, joins the brittleness It is lifted between height and position, that is, substrate transfer position of material substrate and its top;The a pair of retaining arm group be respectively provided with this Pass through multiple retaining arms in the gap when 2 directions are separated from each other configuration and are rotated around the rotary shaft;Multiple retaining arm has respectively It is standby adsorbable in multiple adsorption sections of the brittle material substrate;A pair of retaining arm group configuration the substrate transfer position shape Under state, the multiple adsorption section for belonging to multiple retaining arm of the side of a pair of retaining arm group is made to be adsorbed in as inversion-object The brittle material substrate, that is, inversion-object substrate, later, by make a pair of retaining arm group around the rotary shaft rotate 180 degree, The inversion-object substrate is set to invert;The a pair of retaining arm group, the inversion-object substrate adsorption behind multiple adsorption section, this is anti- During turning before the reversion completion of object substrate, rise ground compared with substrate transfer position height, in the reversion of the inversion-object substrate When afterwards, releasing the absorption to multiple adsorption section of the inversion-object substrate, the substrate transfer position is dropped to.
The present invention has clear advantage and advantageous effect compared with prior art.By above-mentioned technical proposal, the present invention Base plate processing system and substrate inversion set at least have following advantages and advantageous effect:The present invention, which can be substantially carried out at the same time, to be intended to instead Transglutaminase substrate moves in holding action of the action with the substrate.It can substantially be carried out at the same time moving in, first for next substrate to be inverted again The handing-over of the preceding substrate for having inverted processing and retaining arm keep the absorption for having moved in substrate.That is, desire can be substantially carried out at the same time Invert the reversion of substrate moved in substrate.Whereby, it can be achieved that inverting the excellent processing substrate for the treatment of effeciency.
In conclusion the invention relates to a kind of base plate processing system and substrate inversion sets.The wherein processing substrate System can be performed continuously the reversion of substrate, which has:1st and the 2nd carrying device, matches by separated by gap The multiple units conveyance element conveyance substrate set;And substrate inversion set, have a pair of of retaining arm group, a pair of retaining arm group It is configured to rotational symmetry relative to rotary shaft, and with multiple guarantors in the gap for transporting element when being rotated around rotary shaft by unit Gripping arm, freely by the lifting of lifting means;It is adsorbed in the multiple adsorption sections for making the retaining arm of the side of a pair of of retaining arm group have In the state of inversion-object substrate, adsorption section is made to be adsorbed in inversion-object substrate, later, by make a pair of of retaining arm group around rotation Shaft rotates 180 degree, and substrate is made to invert;A pair of of retaining arm group, after substrate adsorption, reversion complete before during, rise ground compared with Substrate transfer position is high, after reversion, when desorbing, drops to substrate transfer position.The present invention technically has significantly Progress, and there is apparent good effect, really it is a new and innovative, progressive, practical new design.
Above description is only the general introduction of technical solution of the present invention, in order to better understand the technical means of the present invention, And can be implemented in accordance with the contents of the specification, and in order to allow the above and other objects, features and advantages of the present invention can It is clearer and more comprehensible, it is special below to lift preferred embodiment, and coordinate attached drawing, detailed description are as follows.
Description of the drawings
Fig. 1 is the vertical view that the major part of display base plate processing system 1000 is constituted.
Fig. 2 is the vertical view of the composition near display base plate inversion set 100.
Fig. 3 is the YZ side views of the composition near display base plate inversion set 100.
Fig. 4 is the ZX side views of the sides-Y near substrate inversion set 100.
Fig. 5 is the ZX side views of the sides+Y near substrate inversion set 100.
Fig. 6 is the YZ side views of the appearance in the way shown when a pair of of retaining arm group rises from substrate transfer position.
Fig. 7 is to show the figure for making a pair of of retaining arm group rise the state after both set a distances.
Fig. 8 is the figure for the appearance that sequentially display base plate W is inverted in substrate inversion set 100.
Fig. 9 is the figure for the appearance that sequentially display base plate W is inverted in substrate inversion set 100.
Figure 10 is near the substrate inversion set 100 of the base plate processing system 1000 comprising carrying device 300 of variation YZ side views.
100:Substrate inversion set 101:Axis
101a:Lip portions 101b:Cylindrical portion
101c:Power transmission portion 102:Retaining arm
103:Absorption layer 110:Foot
120:It is pivotally supported portion 130:Rotate driving means
130a:Rotary shaft 140:Suction pump
200:Scoring device 201:Platform
202:Bridge portion 203:Engraving head
300:Carrying device 301:Unit conveying unit
302:Idler wheel 400:Shifting apparatus
401:Absorption layer 402:Adsorb arm
403:Guiding element 1000:Base plate processing system
W(W1,W2):Substrate
Specific implementation mode
It is of the invention to reach the technological means and effect that predetermined goal of the invention is taken further to illustrate, below in conjunction with Attached drawing and preferred embodiment, to the base plate processing system that proposes according to the present invention and substrate inversion set its specific implementation mode, Structure, feature and its effect are described in detail as after.
(summary of system)
Fig. 1 is the vertical view that the major part of display base plate processing system 1000 is constituted.The processing substrate of this implementation form System 1000 mainly has substrate inversion set 100, two scoring devices 200 (the 1st scoring device 200A and the 2nd scoring devices 200B), two carrying devices 300 (the 1st carrying device 300A and the 2nd carrying device 300B).
In summary base plate processing system 1000 for the system for handling following a succession of processing, i.e., is filled by the 1st delineation After 200A is set to the interarea formation score line of brittle material substrate (hereinafter simply referred to as substrate) W of glass substrate etc., with substrate Inversion set 100 makes substrate W invert, and then, score line is formed to another interarea by the 2nd scoring device 200B.
In addition, schema in Fig. 1 and later, assign with when base plate processing system 1000 sequentially carries out a succession of processing The direction of travel of substrate W in horizontal plane is Y-axis positive direction, using direction orthogonal to Y-axis in the horizontal plane as X-direction, with Vertical direction is the right-handed system XYZ coordinates of Z-direction.
Substrate inversion set 100 mainly has the rod member i.e. axis 101 of past X-direction extension, is extended vertically from axis 101 Multiple retaining arms 102.Multiple retaining arms 102 extend toward two directions of different 180 degree, and the retaining arm 102 of the same direction is set At being separated from each other.In this embodiment, it is illustrated in the composition that all directions are equipped with 6 retaining arms 102.In addition, later, have The multiple retaining arms 102 extended toward the same direction are suitably collectively referred to as to the situation of retaining arm group.In substrate inversion set 100, The different two retaining arm groups (a pair of of retaining arm group) of extending direction configured with retaining arm 102 affiliated respectively.
It is configured with absorption layer 103 in retaining arm 102.Substrate inversion set 100 is adsorbing guarantor with absorption layer 103 from below In the state of holding the substrate W moved by the 1st carrying device 300A, invert retaining arm 102 using axis 101 as rotary shaft 180 degree whereby inverts substrate W, substrate W is handover to the 2nd carrying device 300B at once.Substrate inversion set 100 it is detailed Thin constitute will be described later.
Scoring device 200 has platform in the state that mounting is fixed with substrate W above movably to Y-axis direction 201, it set up above the moving range of platform 201 into the bridge portion 202 that X-direction is long side direction, be attached to the bridge portion 202 At least one (being 4 in Fig. 1) engraving head 203.In the vertical lower part of engraving head 203, rotated certainly with vertical position and in face Such as being attached to discoid and outer peripheral portion becomes the scribe wheel (not shown) of knife front end.
In the scoring device 200 of above-mentioned composition, in the configuration of engraving head 203 in the state of the appropriate location in bridge portion 200, Substrate W mountings make platform so that scribe wheel crimping is rotated in while toward Y-axis positive direction movement in the state of being fixed on platform 201 Substrate W, whereby can be in the W-shaped score line at along Y direction of substrate.
In addition, the composition for constituting the scoring device 200 of base plate processing system 100 is not limited to this.For example, being configured in lower section In the state of having substrate W, the engraving head for having scribe wheel in lower part 203 is made to be moved toward X-direction, forms the shape of score line whereby State also may be used.Alternatively, the form in the multiple bridge portions 202 for having engraving head 203 of configuration also may be used.
Carrying device 300 is the device that substrate W is transported between substrate inversion set 100 and scoring device 200.It is specific and Speech, the 1st carrying device 300A transport the substrate W that score line is formed with the 1st scoring device 200A to substrate inversion set 100 Reversion starting position.2nd carrying device 300B is by the substrate W after being inverted by substrate inversion set 100 from substrate inversion set 100 reversion end position is transported towards the 2nd scoring device 200B.
Carrying device 300, which has, is configured to multiple (being seven in this implementation form) lists that are parallel with Y-axis and being separated from each other Position conveying unit (unit conveyance element) 301.In carrying device 300, in the state of bearing below by all unit conveying units 301 Transport each substrate W.More specifically, it is long side direction (conveyance direction) and synchronized with each other that constituent parts conveying unit 301, which is Y direction, The ribbon conveyer of ground action.
Constituent parts conveying unit 301 is arranged to can be by configuring the retaining arm 102 in substrate inversion set 100 by axis The gap of 101 rotation and two unit conveying units 301 of reversion action phase neighbour.However, the unit of the 1st carrying device 300A (the 2nd unit conveying unit of unit conveying unit 301 of conveying unit 301 (the 1st unit conveying unit 301A) and the 2nd carrying device 300B It 301B) is arranged to different in the allocation position (height and position) of vertical direction.Specifically, the 2nd unit conveying unit 301B phases It is compared to the 1st unit conveying unit 301A, configuration is being higher by the i.e. thickness t of substrate W of process object with base plate processing system 1000 The position of equal distance.
The base plate processing system 1000 of this implementation form is further equipped with two (the 1st shifting apparatus 400A of shifting apparatus 400 And the 2nd shifting apparatus 400B).Shifting apparatus 400 handles the substrate W's between scoring device 200 and adjacent carrying device 300 Transfer.Shifting apparatus 400, which has, to be extended toward X-direction and lifting freely has towards the absorption layer below vertical in front end 401 absorption arm 402 and by the absorption arm 402 be supported to can toward Y direction movement guiding element 403.
More specifically, the 1st shifting apparatus 400A absorption is maintained at the 1st scoring device 200A and forms the substrate after score line W simultaneously transfers load to the 1st carrying device 300A.2nd shifting apparatus 400B absorption is kept by the substrate W of the 2nd carrying device 300B conveyances And transfer load to the platform 201 of the 2nd scoring device 200B.
In addition, composition of the shifting apparatus 400 in base plate processing system 1000 not necessarily.With scoring device 200 with remove Send the mode for directly joining substrate W between device 300 constitute base plate processing system 1000 also can, said circumstances do not need transfer Device 400.
(the detailed composition of substrate inversion set)
Fig. 2 and Fig. 3 is the structure near the major part i.e. substrate inversion set 100 of display base plate processing system 1000 respectively At vertical view and YZ side views.In Fig. 2 and Fig. 3, it is shown between the 1st carrying device 300A and substrate inversion set 100 Join appearance when substrate W.
Furthermore Fig. 4 and Fig. 5 are the ZX of the sides-Y near Fig. 2 and the substrate inversion set 100 of situation shown in Fig. 3 respectively Side view and the ZX side views of the sides+Y.However, in Fig. 4 and Fig. 5, omits inscape of the configuration in the sides+Y and save in Figure 5 Slightly configure the inscape in the sides-Y.
As above-mentioned, substrate inversion set 100 has the axis that past X-direction is extended and can be rotated as rotary shaft using X-direction 101, and make from the retaining arm group that the multiple retaining arms 102 for having multiple absorption layers 103 respectively are constituted from axis 101 toward different 180 Two directions of degree extend.In addition, in fig. 2, each retaining arm faciation is set as comb teeth-shaped for axis 101.
However, belonging to the retaining arm 102 (these are especially referred to as retaining arm 102A) of the retaining arm group of a side and belonging to another Multiple retaining arms 102 (these are especially referred to as retaining arm 102B) of the retaining arm group of one side, are the absorption layers to have each other The 103 different 180 degree in direction and the end position (absorption position) of the absorption layer 103 of a side and the absorption layer 103 of another party End position (absorption position) though retaining arm 102A and the postural change of retaining arm 102B also be located at it is parallel with axis 101 common Mode in plane is fixedly arranged on axis 101.
For example, obtaining the situation of flat-hand position if the retaining arm 102 that Fig. 1 to Fig. 5 is illustrated, such as can be seen from Figure 3, keep The absorption layer 103 of arm 102A is towards (-Z direction) below vertical, in contrast, the absorption layer 103 of retaining arm 102B is towards vertical Top (+Z direction), but in the horizontal plane that is generally aligned in the same plane of the end (upper end) of the former end (lower end) and the latter. That is, being located at identical height and position.It rotates, the postural change of all retaining arms 102, but is configured in retaining arm by axis 101 The direction of the absorption layer 103 of 102A is with configuration in the permanent different 180 degree in the direction of the absorption layer 103 of retaining arm 102B.
That is, belonging to the retaining arm 102A of the retaining arm group of a side and belonging to the retaining arm 102B of the retaining arm group of another party It is the position for being set as becoming relative to axis 101 in the faces YZ rotational symmetry.
Substrate inversion set 100 is further equipped with a pair of of foot 110, a pair is pivotally supported portion 120 and rotation driving means 130。
A pair of of foot 110 is existed the axis 101 extended toward X-direction by being pivotally supported portion 120 in X-direction configured separate Its both ends part supports from below.In addition, in this embodiment, for simplified illustration, showing that a pair of of foot 110 independently matches The form set, but the form that a pair of of foot 110 is located on base station (not shown) also may be used.
A pair is pivotally supported the both ends part that portion 120 is connected to axis 101, and the form of previous vertical direction lifting freely is located at The upper side position of corresponding foot 110.That is, being pivotally supported portion 120 can lift while support shaft 101.Whereby, anti-in substrate Rotary device 100 can make axis 101 and be fixedly arranged on the height and position variation of this retaining arm 102.Lifting about the portion that is pivotally supported 120 Range will be described later in detail.In addition, above-mentioned lifting action can parallel be carried out with the spinning movement of axis 101.
Processing is pivotally supported the specific composition of the lifting in portion 120, can be realized by known technology.Preferably, it is pivotally supported portion 120 Lifting realized by linear motor mechanism.For example, fixing piece (not shown) is extended toward Z-direction in foot 110, in axis Movable member (not shown) is arranged in supporting part 120, and movable member is made to be moved along fixing piece, whereby such as the arrow AR institutes of Fig. 4 and Fig. 5 Show, can make to be pivotally supported the lifting of portion 120 in the given area of Z-direction.
In addition, in this embodiment, being pivotally supported portion 120 with a pair and being located at the side between a pair of of foot 110 in X-direction Both formula configurations, but the configuration relation of the two is not limited to this.
Rotation driving means 130 are the driving means for making axis 101 rotate.As rotation driving means 130, preferably Such as revolving cylinder.
More specifically, in substrate inversion set 100, in the one end (being the side ends+X in this implementation form) of axis 101 It is installed with disk-shaped lip portions 101a.On the other hand, it is installed with the cylindrical portion toward X-direction opening in the portion that is pivotally supported 120 101b.In addition, the peripheral part of lip portions 101a is the inner face for the opening portion for being entrenched in cylindrical portion 101b with the state slid freely.
It is installed with power transmission portion 101c in the other end (being the side ends-X in this implementation form) of axis 101.In power The rotary shaft 130a of communication portion 101c, the rotation driving means 130 extended toward +X direction are supported in the portion of being pivotally supported 120 and connect Knot.
It is constituted by with above, in substrate inversion set 100, if rotation driving means 130 is made to act, passes through bearing In the portion that is pivotally supported 120 rotary shaft 130a and be connected to this power transmission portion 101c, foot 110 can be made and be pivotally supported portion The axis 101 of 120 bearings rotates.Whereby, it can be achieved that the rotation of the retaining arm 120 around axis 101.At this point, in the other end of axis 101 Portion, lip portions 101a is slided relative to cylindrical portion 101b, therefore can steadily carry out spinning movement.
In addition, though illustration omitted in Fig. 1 to Fig. 3 is equipped with through hole i.e. two in lip portions 101a as shown in Figures 4 and 5 A 1st port P1 is similarly equipped with through hole i.e. the 2nd port P2 in the side of cylindrical portion 101b.In addition, in the 1st port P1 It is connected with the 1st attraction pipe T1, the 2nd attraction pipe T2 is connected in the 2nd port P2.Whereby, the 1st attracts with the suctions of pipe T1 and the 2nd It is the coconnected state in space between reference pipe T2.
Furthermore the other end of two the 1st attraction pipe T1 is connected to suction via the attraction path for being located at retaining arm 102 respectively Attached pad 103.More specifically, the 1st attraction of a side is connected to the absorption layer 103 of the sides retaining arm 102A with pipe T1, another party's 1st attraction is connected to the absorption layer 103 of the sides retaining arm 102B with pipe T1.2nd attraction is connected to suction pump with the other end of pipe T2 140.By with above-mentioned composition, in substrate inversion set 100, substrate W be placed in absorption layer 103 it is upper in the state of make suction Pump priming 140 acts, and can adsorb fixed substrate W by absorption layer 103 whereby.In Fig. 4, the 1st is conceptually illustrated to attract with pipe T1 The appearance that the appearance and the 2nd attraction pipe T2 being connect with a part of absorption layer 103 are connect with suction pump 140.
Moreover, as above-mentioned, it is connected with the lip portions 101a of the 1st attraction pipe T1, when axis 101 is rotated relative to being connected with 2nd attraction is slid freely with the cylindrical body of pipe T2, therefore keeps attraction state the state rotated in axis 101.Whereby, exist In the substrate inversion set 100 of this implementation form, protected even if can be adsorbed by absorption layer 103 if the state of the rotation of retaining arm 102 Hold substrate W.
(configuration relation of carrying device 300 and substrate inversion set)
Then, illustrate the configuration relation of carrying device 300 and substrate inversion set 100, specifically, the 1st conveyance of explanation The configuration relation of the unit conveying unit 301 of device 300A and the 2nd carrying device 300B lifts the rotation of rear axle 101 with portion 120 is pivotally supported Turn the relationship of the allocation position of changed retaining arm 102A and retaining arm 102B.
As above-mentioned, in the base plate processing system 1000 of this implementation form, the unit conveying unit of the 1st carrying device 300A The height and position difference of the unit conveying unit 301 of 301 and the 2nd carrying device 300B is the amount of the thickness t of substrate W.On the other hand, In substrate inversion set 100, retaining arm 102A and retaining arm 102B is with relative to suction axis 101 rotational symmetry and had respectively The mode that the end of attached pad 103 is located in common plane is arranged.So that axis 101 is rotated by rotation driving means 130, can make whereby A pair of of retaining arm group rotates around axis 101, is lifted by making to be pivotally supported portion 120, can make the height position of axis 101 and a pair of of retaining arm group Set variation.
The range of the configuration relation at these positions and a pair of of retaining arm group are to be set to expeditiously carry out from the 1st The unit conveying unit 301 of carrying device 300A toward the handing-over of the substrate of the side of a pair of of retaining arm group, from a pair of of retaining arm group's The reversion of substrate W of the another party toward the handing-over of the substrate W of the 2nd carrying device 300B and between these handing-over is filled in the 1st conveyance Set the conveyance of the substrate W of 300A and the 2nd carrying device 300B.
Specifically, first, Fig. 1 to Fig. 5 show appearance when a pair of of retaining arm group is located at substrate transfer position.Substrate Delivery position, as shown in Figures 2 and 3, it is specified that being flat-hand position for a pair of of retaining arm group and being located at the guarantor of the sides-Y compared with axis 101 at this time The height and position for 103 lower end of absorption layer that gripping arm 102A has is upper compared with the 1st unit conveying unit 301A of the 1st carrying device 300A Face is higher by the position of the thickness t of substrate W.When a pair of of retaining arm group is located at aforesaid substrate delivery position, in the 1st carrying device 300A, after substrate W is transported to the side ends+Y, height and position and the height and position one above substrate W of 103 lower end of absorption layer It causes, therefore absorption layer 103 can carry out the absorption of substrate W.
And at this time, according to above-mentioned configuration relation, the height and position above the 2nd carrying device 300B is located at compared with axis 101 The height and position for 103 upper end of absorption layer that the retaining arm 102B of the sides+Y has is identical, thus as by below adsorption plane by this Situation existing for the substrate W that the absorption of absorption layer 103 is kept, also can support substrate W by the 2nd carrying device 300B.
That is, when a pair of of retaining arm group is located at substrate transfer position, can substantially be carried out at the same time past from the 1st carrying device 300A The handing-over of the substrate W of substrate inversion set 100, from substrate inversion set 100 toward the handing-over of the substrate of the 2nd carrying device 300B.
Fig. 6 is the appearance in the way shown when a pair of of retaining arm group rises from Fig. 1 to substrate transfer position shown in fig. 5 YZ side views.However, omitting substrate W in figure 6.
As shown in fig. 6, in this implementation form, so that retaining arm 102 is rotated as shown in arrow RT and make a pair of of retaining arm simultaneously Group rises.More specifically, during so that retaining arm 102A is inverted 180 degree with retaining arm 102B, it is pivotally supported the rising of portion 120, is made A pair of of retaining arm group rises.Alternatively, after making a pair of of retaining arm group rise, make retaining arm 102A and retaining arm 102B reversion 180 degrees Also may be used.
On the other hand, show that the state after a pair of of retaining arm group rises both set a distances is as shown in Figure 7.However, in the figure 7 Omit substrate W.
Fig. 3 of Fig. 7 states for being located at substrate transfer position with a pair of of retaining arm group is compared, Qian Zhezhong is pivotally supported Portion 120 is located at higher position relative to foot 110, and the relative configuration relationship of a pair of of retaining arm group is identical, but retaining arm 102A with The configuration relation of retaining arm 102B is replaced in Y direction in the both sides of axis 101.
In addition, further confirm that, it is understood that the retaining arm 102 of rotation will not be with from configuration relation both shown in Fig. 2 Unit conveying unit 301 is collided.
The distance that a pair of of retaining arm group rises from substrate transfer position, as shown in fig. 7, permanent with the 2nd carrying device 300B's Height and position above unit conveying unit 301B and be located at compared with axis 101 sides+Y retaining arm 102A 103 upper end of absorption layer height The distance d for spending position is equal.In addition, the rising of a pair of of retaining arm group be in order to certainly prevent the 1st carrying device 300A into When the conveyance of the substrate W of capable past +Y direction the absorption layer 103 of retaining arm 102A with conveyance substrate W interference and carry out.Cause This, as long as the climb of a pair of of retaining arm group has several mm degree i.e. enough.It is to exaggerate the above-mentioned distance d of display in Fig. 7.
A pair of of retaining arm group after temporarily rising is that retaining arm 102 is being kept into water toward the decline of substrate transfer position It is carried out in the state of flat posture.In addition, static after being not required to make a pair of of retaining arm group to rise, rise with decline thereafter continuously into Row also may be used.
(substrate reversal order)
Then, illustrate the reversal order in the substrate W with the substrate inversion set 100 constituted above.Fig. 8 and Fig. 9 are Sequentially it is shown in the figure of the appearance of 100 substrate W reversions of substrate inversion set.In addition, the main display base plate inversion sets of Fig. 8 100 Start to act appearance originally, the normal condition that the reversion of the main display base plate W of Fig. 9 is carried out continuously.
In explanation, for convenience, as shown in (a) of Fig. 8, a pair of of retaining arm group rises from substrate transfer position, and from It is carried out in the state of flat-hand position.In above-mentioned state, first, the 1st unit conveying unit 301A of the 1st carrying device 300A it On, mounting is with the 1st scoring device 200A delineation treated substrate W (W1).Aforesaid substrate W1, as shown in arrow AR1, by 1 unit conveying unit 301A is transported toward +Y direction.
Then during, until substrate W1 is toward the side ends+Y side conveyance of the 1st unit conveying unit 301A, such as (b) of Fig. 8 Shown in middle arrow AR2, a pair of of retaining arm group declines towards substrate transfer position.That is, in the substrate W1 of the 1st carrying device 300A The decline of conveyance and a pair of of retaining arm group (while parallel) carries out substantially simultaneously.This contributes in base plate processing system 1000 The efficient activity of substrate reversion processing.
After a pair of of retaining arm group reaches substrate transfer position, as shown in (c) of Fig. 8, the absorption in retaining arm 102A is configured The upper surface of the lower end of pad 103 and substrate W1 are contacted.In addition, (c) of Fig. 8 shows situation identical with Fig. 3.It is such as above-mentioned, it is inhaling In the state that attached pad 103 is contacted with substrate W1, by 140 start of suction pump is made, substrate W absorption is made to be held in absorption layer 103.
In addition, at this point, retaining arm 102B is located between unit conveying unit 301B, and the height of the upper end of its absorption layer 103 Position is identical as the height and position of unit conveying unit 301B.
Above-mentioned absorption is kept after carrying out, and then, driving rotation driving means 130 make axis 101 rotate, whereby such as (d) of Fig. 8 Shown in middle arrow RT1, a pair of of retaining arm group rotates clockwise, and inverts 180 degree.Whereby, retaining arm 102A is inhaled with absorption layer 103 It is rotated in the state of attached holding substrate W1.On the other hand, retaining arm 102B passes through the 1st carrying device 300A's while rotating The gap of unit conveying unit 301B.Simultaneously with above-mentioned rotation, as shown in arrow AR3, a pair of of retaining arm group is made to increase.
(a) of Fig. 9 show a pair of of retaining arm group and inverts the appearance after 180 degree and a pair of of retaining arm group rising.At this point, base Plate W1 is the state for adsorbing holding from below by the retaining arm 102A for being located at the sides+Y compared with axis 101.That is, being and configuring at the beginning The state of 180 degree is inverted in the state of the 1st carrying device 300A.In addition, leaning on the sides-Y compared with axis 101, in retaining arm 102B and the 1st Gap is generated between unit conveying unit 301A.
Shown in (a) of Fig. 9 state realize before during, the 1st unit conveying unit 301A of the 1st carrying device 300A it On, substrate W1 mounting is connected with the 1st scoring device 200A delineations treated substrate W (W2).Aforesaid substrate W2, such as arrow AR4 It is shown, it is transported toward +Y direction by the 1st unit conveying unit 301A.
Substrate W2 toward the 1st unit conveying unit 301A the side ends+Y side conveyance after, as Fig. 9 (b) in arrow AR5 institutes Show, a pair of of retaining arm group declines towards substrate transfer position.The decline of the conveyance of these substrates W2 and a pair of of retaining arm group, with base It is identical when the conveyance of plate W1, while parallel progress, therefore contribute to the substrate in the base plate processing system 1000 of this implementation form Invert the efficient activity of processing.
After a pair of of retaining arm group reaches substrate transfer position, as shown in (c) of Fig. 9, supported from below by absorption layer 103 It is contacted with the unit conveying unit 301B of the 2nd carrying device 300B below substrate W1.At the time point for obtaining above-mentioned contact condition, The absorption for desorbing the substrate W1 of the progress of pad 103 is kept.It is thereby achieved that substrate W1 is placed in the shape on unit conveying unit 301B State.After above-mentioned mounting is realized, as shown in arrow AR6, the end of the past sides+Y substrate W1 is transported at once by unit conveying unit 301B.Quilt The substrate W1 of conveyance is moved out toward the 2nd scoring device 200B.That is, being inverted the substrate W supplies of 180 degree by substrate inversion set 100 The delineation processing carried out to the 2nd scoring device 200B.
On the other hand, the sides-Y are being leaned on compared with axis 101, is realizing configuration in the lower end of the absorption layer 103 of retaining arm 102B and base The state of the upper surface of plate W2 contacts.Time point after the releasing kept to the absorption of substrate W1 is carried out with the conveyance toward the sides+Y, After suction pump 140 acts again, substrate W2 absorption is made to be held in absorption layer 103.
Above-mentioned absorption is kept can be the substrate W's for the 2nd carrying device 300B that the absorption of retaining arm 102A is released and connected It is carried out at once after conveyance, therefore in substrate inversion set 100, handing-over of reversion treated the substrate W toward the 2nd carrying device 300B A series of continuous action substantially simultaneously (no time is can be used as with the absorption of next substrate W as inversion-object holding Lag) it carries out.
Above-mentioned absorption is kept after carrying out, and then, driving rotation driving means 130 make axis 101 rotate again, whereby such as Fig. 9 (d) in shown in arrow RT2, a pair of of retaining arm group rotates clockwise, and inverts 180 degree.Then, retaining arm 102B is keeping substrate It is rotated in the state of W2.Meanwhile as shown in arrow AR7, a pair of of retaining arm group is made to increase.
Later, the time point risen in a pair of of retaining arm group, real other than retaining arm 102A replaces with retaining arm 102B The now identical state with (a) of Fig. 9.Therefore, later, if repeatedly shown in (d) of (a) of Fig. 9~Fig. 9 sequence, from the 1st quarter It draws the substrate W that device 200A is moved in sequentially to invert, can be supplied to the delineation processing that the 2nd scoring device 200B is carried out.
As described above, according to the base plate processing system of this implementation form, removing for substrate to be inverted can be substantially carried out at the same time Enter action and the holding of the substrate acts.Also, the moving in of next substrate to be inverted, previously reversion processing can be substantially carried out at the same time The handing-over of substrate afterwards, retaining arm keep the absorption for having moved in substrate progress.Outline sees it, the processing substrate of this implementation form System is substantially carried out at the same time the reversion of substrate and moving in for next substrate to be inverted.Whereby, it can be achieved that reversion treatment effeciency is excellent Different base plate processing system.
(variation)
In above-mentioned embodiment, the unit conveying unit 301 of carrying device 300 is configured to ribbon conveyer, but unit is removed The composition in portion 301 is sent to be not limited to this.Figure 10 is the substrate of the base plate processing system 1000 comprising carrying device 300 of variation YZ side views near inversion set 100.
In base plate processing system 1000 shown in Fig. 10, unit conveying unit 301 has in the multiple of Y direction configured separate Roller 302.Above-mentioned roller 302 by driving means (not shown) rotation driving also can, or for by the shape contacted in substrate W The driven roller for moving and driving under state also may be used.If the former situation, by driving means in the state of being placed with substrate W So that idler wheel 302 is rotated, substrate W can be transported whereby to be intended to position.If the situation of the latter, by such as shifting apparatus 400 When Deng keeping substrate W and simultaneously movement, rotated with the idler wheel 302 of substrate W rear-face contacts, the conveyance of assisting base plate W whereby.
In above-mentioned embodiment, though each retaining arm 102 substitutes this with the prominent form directly extended from axis 101, Has the frame integrally rotated with axis around axis 101, the form in the frame, which is arranged, in retaining arm 102 also may be used.
In above-mentioned embodiment, each retaining arm 102 be set as long side direction width and thickness uniformly and with long side side It is rectangular-shaped to vertical section, but the shape of retaining arm 102 is not limited to this.For example, with more towards long side direction front end Thickness smaller shape etc. in portion's also may be used.
The above described is only a preferred embodiment of the present invention, be not intended to limit the present invention in any form, though So the present invention has been disclosed as a preferred embodiment, and however, it is not intended to limit the invention, any technology people for being familiar with this profession Member, without departing from the scope of the present invention, when the technology contents using the disclosure above make a little change or modification For the equivalent embodiment of equivalent variations, as long as be without departing from technical solution of the present invention content, it is right according to the technical essence of the invention Any simple modification, equivalent change and modification made by above example, in the range of still falling within technical solution of the present invention.

Claims (5)

1. a kind of base plate processing system, it is characterised in that it has:
1st carrying device and the 2nd carrying device respectively transport brittle material substrate toward the 1st direction;And
Substrate inversion set configures between the 1st carrying device and the 2nd carrying device, makes to be transported by the 1st carrying device The brittle material substrate come inverts and is handover to the 2nd carrying device;
1st carrying device and the 2nd carrying device, by the 2nd direction separated by gap configuration orthogonal with the 1st direction Multiple units transport element, are transported while supporting the brittle material substrate in lower section;
The substrate inversion set, has:
A pair of of retaining arm group is configured to rotational symmetry relative to the rotary shaft extended toward the 2nd direction;
Driving means are rotated, a pair of retaining arm group is made to be rotated around the rotary shaft;And
Lifting means make a pair of retaining arm group between the 1st carrying device and the 2nd carrying device, are joining the brittleness It is lifted between height and position, that is, substrate transfer position of material substrate and its top;
The a pair of retaining arm group is respectively provided with when the 2nd direction is separated from each other configuration and is rotated around the rotary shaft through the gap Multiple retaining arms;
Multiple retaining arm has adsorbable in multiple adsorption sections of the brittle material substrate respectively;
A pair of retaining arm group configuration in the state of the substrate transfer position, is made to belong to a side in a pair of retaining arm group Multiple adsorption section of multiple retaining arm be adsorbed in the brittle material substrate i.e. inversion-object substrate as inversion-object, Later, by making a pair of retaining arm group rotate 180 degree around the rotary shaft, the inversion-object substrate is made to invert;
The a pair of retaining arm group, after the upper surface of the inversion-object substrate is adsorbed on multiple adsorption section, the inversion-object It during before the reversion completion of substrate, rises to compared with the substrate transfer position eminence, after the reversion of the inversion-object substrate, is somebody's turn to do Inversion-object base lower surface is contacted with the unit of the 2nd carrying device conveyance element, is released to the inversion-object base lower surface Multiple adsorption section absorption when, drop to the substrate transfer position.
2. base plate processing system according to claim 1, it is characterised in that wherein, which is located at the substrate The height and position by adsorption plane of the inversion-object substrate after reversion when delivery position adsorbed by multiple adsorption section with The conveyance height and position of 2nd carrying device is identical, the releasing to the absorption of the inversion-object substrate after reversion, be by means of It is carried out while supporting the inversion-object substrate after inverting by the 2nd carrying device.
3. base plate processing system according to claim 2, it is characterised in that wherein, belong to a side in a pair of retaining arm group Multiple retaining arm multiple adsorption section, with belong to multiple retaining arm of another party in a pair of retaining arm group this is more A adsorption section, be arranged to the different 180 degree in mutual direction and the two end position be located at it is parallel with the rotary shaft common Plane on;
The conveyance height and position of the conveyance height and position and the 2nd carrying device of 1st carrying device, difference and the fragile material The equal distance of the thickness of substrate;
In a pair of retaining arm group configuration in the state of the substrate transfer position, substantially it is carried out at the same time to the reversion after reversion The releasing of the absorption of multiple adsorption section of object substrate and the multiple retaining arm for belonging to another party in a pair of retaining arm group The absorption that the new inversion-object substrate moved by the 1st carrying device is carried out of multiple adsorption section.
4. the base plate processing system according to any claim in claims 1 to 3, it is characterised in that wherein, the rotation Axis is the rodlike axis that portion has disk-shaped lip portions at one end and the other end is linked to the rotation driving means;
The substrate inversion set has is pivotally supported into a pair of of bearing means that are rotatable and including the lifting means by this;
The lip portions are sliding freely fitted into relative to the cylindrical member of the side positioned at a pair of bearing means;
Be located at the 1st through hole of the lip portions attracts piping to be connect with the adsorption section by the 1st, and is located at the of the cylindrical member 2 through holes attract piping to be connect with means are attracted by the 2nd.
5. a kind of substrate inversion set is the brittle material substrate reversion made toward the conveyance of the 1st direction, it is characterised in that it has:
A pair of of retaining arm group, the opposite rotary shaft for extending 2nd direction orthogonal with the 1st direction are configured to rotational symmetry;
Driving means are rotated, a pair of retaining arm group is made to be rotated around the rotary shaft;And
Lifting means make a pair of retaining arm group between outside, in the height and position, that is, base for joining the brittle material substrate It is lifted between plate delivery position and its top;
The a pair of retaining arm group is respectively provided with when the 2nd direction is separated from each other configuration and is rotated around the rotary shaft through gap Multiple retaining arms;
Multiple retaining arm has adsorbable in multiple adsorption sections of the brittle material substrate respectively;
In a pair of retaining arm group configuration in the state of the substrate transfer position, make to belong to a side in a pair of retaining arm group Multiple adsorption section of multiple retaining arm is adsorbed in the brittle material substrate i.e. inversion-object substrate as inversion-object, it Afterwards, by making a pair of retaining arm group rotate 180 degree around the rotary shaft, the inversion-object substrate is made to invert;
The a pair of retaining arm group, after the upper surface of the inversion-object substrate is adsorbed on multiple adsorption section, the inversion-object It during before the reversion completion of substrate, rises to compared with the substrate transfer position eminence, after the reversion of the inversion-object substrate, is somebody's turn to do Inversion-object base lower surface is contacted with the unit of the 2nd carrying device conveyance element, is released to the inversion-object base lower surface Multiple adsorption section absorption when, drop to the substrate transfer position.
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