CN104025329B - 可反复充放电的量子电池 - Google Patents
可反复充放电的量子电池 Download PDFInfo
- Publication number
- CN104025329B CN104025329B CN201180074544.7A CN201180074544A CN104025329B CN 104025329 B CN104025329 B CN 104025329B CN 201180074544 A CN201180074544 A CN 201180074544A CN 104025329 B CN104025329 B CN 104025329B
- Authority
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- China
- Prior art keywords
- electrode
- metal
- layer
- quanta battery
- metal electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 113
- 239000002184 metal Substances 0.000 claims abstract description 113
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 36
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 36
- 239000004065 semiconductor Substances 0.000 claims abstract description 36
- 230000008859 change Effects 0.000 claims abstract description 24
- 230000005284 excitation Effects 0.000 claims abstract description 21
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 21
- 230000003647 oxidation Effects 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 19
- 230000003064 anti-oxidating effect Effects 0.000 claims abstract description 12
- 239000007769 metal material Substances 0.000 claims description 31
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 30
- 229910052802 copper Inorganic materials 0.000 claims description 30
- 239000010949 copper Substances 0.000 claims description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- 229910052804 chromium Inorganic materials 0.000 claims description 18
- 239000011651 chromium Substances 0.000 claims description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- 229910052750 molybdenum Inorganic materials 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000011733 molybdenum Substances 0.000 claims description 10
- 238000009413 insulation Methods 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- UNRNJMFGIMDYKL-UHFFFAOYSA-N aluminum copper oxygen(2-) Chemical compound [O-2].[Al+3].[Cu+2] UNRNJMFGIMDYKL-UHFFFAOYSA-N 0.000 claims description 2
- 238000007743 anodising Methods 0.000 claims description 2
- 241000790917 Dioxys <bee> Species 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 56
- 239000004408 titanium dioxide Substances 0.000 description 28
- 238000010276 construction Methods 0.000 description 19
- 238000010586 diagram Methods 0.000 description 17
- 230000004888 barrier function Effects 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 10
- 210000000981 epithelium Anatomy 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910000480 nickel oxide Inorganic materials 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 230000005641 tunneling Effects 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- JRBRVDCKNXZZGH-UHFFFAOYSA-N alumane;copper Chemical compound [AlH3].[Cu] JRBRVDCKNXZZGH-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920005597 polymer membrane Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 239000007773 negative electrode material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000007774 positive electrode material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M14/00—Electrochemical current or voltage generators not provided for in groups H01M6/00 - H01M12/00; Manufacture thereof
- H01M14/005—Photoelectrochemical storage cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/42—Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells
- H01M10/46—Accumulators structurally combined with charging apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/42—Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells
- H01M10/46—Accumulators structurally combined with charging apparatus
- H01M10/465—Accumulators structurally combined with charging apparatus with solar battery as charging system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M14/00—Electrochemical current or voltage generators not provided for in groups H01M6/00 - H01M12/00; Manufacture thereof
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J7/00—Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries
- H02J7/32—Circuit arrangements for charging or depolarising batteries or for supplying loads from batteries for charging batteries from a charging set comprising a non-electric prime mover rotating at constant speed
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Abstract
Description
Claims (8)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2011/075011 WO2013065093A1 (ja) | 2011-10-30 | 2011-10-30 | 繰り返し充放電できる量子電池 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104025329A CN104025329A (zh) | 2014-09-03 |
CN104025329B true CN104025329B (zh) | 2017-07-04 |
Family
ID=48191489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180074544.7A Expired - Fee Related CN104025329B (zh) | 2011-10-30 | 2011-10-30 | 可反复充放电的量子电池 |
Country Status (8)
Country | Link |
---|---|
US (1) | US9859596B2 (zh) |
EP (1) | EP2787546B1 (zh) |
JP (1) | JP5963765B2 (zh) |
KR (1) | KR101654114B1 (zh) |
CN (1) | CN104025329B (zh) |
CA (1) | CA2853599C (zh) |
TW (1) | TWI530007B (zh) |
WO (1) | WO2013065093A1 (zh) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101727204B1 (ko) * | 2010-10-07 | 2017-04-14 | 구엘라 테크놀로지 가부시키가이샤 | 태양 전지 |
KR101605765B1 (ko) * | 2010-10-07 | 2016-03-24 | 구엘라 테크놀로지 가부시키가이샤 | 이차 전지 |
JP6367575B2 (ja) * | 2014-02-25 | 2018-08-01 | 株式会社日本マイクロニクス | 二次電池搭載回路チップ及びその製造方法 |
KR101877151B1 (ko) | 2014-03-18 | 2018-07-10 | 가부시키가이샤 니혼 마이크로닉스 | 전지 |
JP6443798B2 (ja) | 2014-03-24 | 2018-12-26 | パナソニックIpマネジメント株式会社 | 蓄電素子及び蓄電素子の製造方法 |
JP2016028408A (ja) * | 2014-03-24 | 2016-02-25 | パナソニックIpマネジメント株式会社 | 蓄電素子及び蓄電素子の製造方法 |
WO2016198968A1 (en) * | 2015-06-11 | 2016-12-15 | Dan Haronian | Micro-electromechanical device, system and method for energy harvesting and sensing |
JP6572015B2 (ja) * | 2015-06-25 | 2019-09-04 | 株式会社日本マイクロニクス | 二次電池の製造方法 |
CN107735876B (zh) * | 2015-07-02 | 2020-05-26 | 日本麦可罗尼克斯股份有限公司 | 电池以及其充电和放电的方法 |
JP6502200B2 (ja) * | 2015-07-22 | 2019-04-17 | 株式会社日本マイクロニクス | 二次電池用中間構造体、及び二次電池の製造方法 |
JP6468966B2 (ja) * | 2015-07-31 | 2019-02-13 | 株式会社日本マイクロニクス | 二次電池搭載チップの製造方法 |
JP6656848B2 (ja) * | 2015-08-31 | 2020-03-04 | 株式会社日本マイクロニクス | 酸化物半導体二次電池の製造方法 |
JP2017059524A (ja) * | 2015-09-18 | 2017-03-23 | パナソニックIpマネジメント株式会社 | 蓄電素子およびその製造方法 |
JP6872388B2 (ja) * | 2016-05-19 | 2021-05-19 | 株式会社日本マイクロニクス | 二次電池の製造方法 |
JP6813982B2 (ja) * | 2016-08-01 | 2021-01-13 | 株式会社日本マイクロニクス | 二次電池 |
JP6854100B2 (ja) | 2016-08-31 | 2021-04-07 | 株式会社日本マイクロニクス | 二次電池 |
JP2018091631A (ja) | 2016-11-30 | 2018-06-14 | 株式会社日本マイクロニクス | スクリーニング方法、スクリーニング装置、及び二次電池の製造方法 |
JP7075717B2 (ja) * | 2017-03-15 | 2022-05-26 | 株式会社日本マイクロニクス | 蓄電デバイス |
JP7015673B2 (ja) | 2017-10-27 | 2022-02-03 | 株式会社日本マイクロニクス | 蓄電デバイス |
DE102019219391A1 (de) | 2019-12-11 | 2021-06-17 | Robert Bosch Gmbh | Verfahren zur Herstellung einer Membran für einen Ultraschallsensor und Membran für einen Ultraschallwandler |
TWI743861B (zh) * | 2020-06-30 | 2021-10-21 | 行政院原子能委員會核能研究所 | 核殼粒子儲能方法、儲電層製造方法、量子電池及其製造方法 |
JP7100170B2 (ja) * | 2021-03-10 | 2022-07-12 | 株式会社日本マイクロニクス | 二次電池 |
CN115548564A (zh) * | 2022-11-30 | 2022-12-30 | 国能世界(北京)科技有限公司 | 一种量子芯片电池储能模块 |
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CN101375407A (zh) * | 2005-12-16 | 2009-02-25 | 普林斯顿大学理事会 | 具有隧穿势垒嵌在无机基质中的量子点的中能带光敏器件 |
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US4888062A (en) * | 1987-08-31 | 1989-12-19 | Canon Kabushiki Kaisha | Pin junction photovoltaic element having I-type semiconductor layer comprising non-single crystal material containing at least Zn, Se and H in an amount of 1 to 4 atomic % |
JP2846651B2 (ja) * | 1989-03-31 | 1999-01-13 | 三洋電機株式会社 | 光起電力装置 |
JPH05210122A (ja) * | 1992-01-31 | 1993-08-20 | Ricoh Co Ltd | 液晶表示装置における非線形能動素子の構造及びその製造方法 |
EP0831538A3 (en) * | 1996-09-19 | 1999-07-14 | Canon Kabushiki Kaisha | Photovoltaic element having a specific doped layer |
JPH1173964A (ja) | 1997-08-29 | 1999-03-16 | Ricoh Co Ltd | 非水電解質二次電池 |
JP3616824B2 (ja) | 1999-08-06 | 2005-02-02 | スター精密株式会社 | pin型光電変換素子及び製造方法 |
JP2001167808A (ja) * | 1999-12-09 | 2001-06-22 | Fuji Photo Film Co Ltd | 光電変換素子および光電池 |
JP2002124256A (ja) | 2000-10-12 | 2002-04-26 | Mitsubishi Gas Chem Co Inc | 非水溶媒二次電池 |
AU2003240363A1 (en) * | 2002-07-01 | 2004-01-19 | Rolf Eisenring | Method for storing electricity in quantum batteries |
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EP2787546A4 (en) | 2015-09-23 |
TW201318255A (zh) | 2013-05-01 |
US20140352775A1 (en) | 2014-12-04 |
US9859596B2 (en) | 2018-01-02 |
EP2787546A1 (en) | 2014-10-08 |
KR20140095071A (ko) | 2014-07-31 |
JPWO2013065093A1 (ja) | 2015-04-02 |
CA2853599C (en) | 2017-07-04 |
WO2013065093A1 (ja) | 2013-05-10 |
CA2853599A1 (en) | 2013-05-10 |
CN104025329A (zh) | 2014-09-03 |
JP5963765B2 (ja) | 2016-08-03 |
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EP2787546B1 (en) | 2018-05-02 |
KR101654114B1 (ko) | 2016-09-05 |
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