CN103895350B - 喷墨打印头及其制造方法、所用的基板和喷墨打印设备 - Google Patents
喷墨打印头及其制造方法、所用的基板和喷墨打印设备 Download PDFInfo
- Publication number
- CN103895350B CN103895350B CN201310741565.0A CN201310741565A CN103895350B CN 103895350 B CN103895350 B CN 103895350B CN 201310741565 A CN201310741565 A CN 201310741565A CN 103895350 B CN103895350 B CN 103895350B
- Authority
- CN
- China
- Prior art keywords
- protective layer
- ink
- heating resistor
- indivedual
- ink jet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 238000007641 inkjet printing Methods 0.000 title claims abstract description 22
- 239000011241 protective layer Substances 0.000 claims abstract description 233
- 238000010438 heat treatment Methods 0.000 claims abstract description 147
- 239000011159 matrix material Substances 0.000 claims abstract description 29
- 238000003487 electrochemical reaction Methods 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 21
- 230000008859 change Effects 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 65
- 239000007788 liquid Substances 0.000 claims description 36
- 230000015572 biosynthetic process Effects 0.000 claims description 15
- 238000000926 separation method Methods 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- 238000005507 spraying Methods 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 238000010292 electrical insulation Methods 0.000 claims 5
- 238000007689 inspection Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 abstract description 11
- 239000012528 membrane Substances 0.000 description 52
- 230000008569 process Effects 0.000 description 13
- 230000009471 action Effects 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 230000004888 barrier function Effects 0.000 description 10
- 238000001259 photo etching Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 229910018182 Al—Cu Inorganic materials 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000021615 conjugation Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910004200 TaSiN Inorganic materials 0.000 description 1
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
- B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
- B41J2/0451—Control methods or devices therefor, e.g. driver circuits, control circuits for detecting failure, e.g. clogging, malfunctioning actuator
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
- B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
- B41J2/04513—Control methods or devices therefor, e.g. driver circuits, control circuits for increasing lifetime
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
- B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
- B41J2/0458—Control methods or devices therefor, e.g. driver circuits, control circuits controlling heads based on heating elements forming bubbles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14072—Electrical connections, e.g. details on electrodes, connecting the chip to the outside...
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/1412—Shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-285445 | 2012-12-27 | ||
| JP2012285445A JP6150519B2 (ja) | 2012-12-27 | 2012-12-27 | インクジェット記録ヘッド用基板、インクジェット記録ヘッド、インクジェット記録ヘッドの製造方法、インクジェット記録装置、およびインクジェット記録ヘッド用基板における個別部分と他の個別部分との電気的分離方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103895350A CN103895350A (zh) | 2014-07-02 |
| CN103895350B true CN103895350B (zh) | 2016-01-06 |
Family
ID=49989404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310741565.0A Active CN103895350B (zh) | 2012-12-27 | 2013-12-27 | 喷墨打印头及其制造方法、所用的基板和喷墨打印设备 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9085143B2 (enExample) |
| EP (1) | EP2749422B1 (enExample) |
| JP (1) | JP6150519B2 (enExample) |
| CN (1) | CN103895350B (enExample) |
| BR (1) | BR102013032705A2 (enExample) |
| RU (1) | RU2578122C2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6566709B2 (ja) | 2015-05-07 | 2019-08-28 | キヤノン株式会社 | インクジェット記録ヘッド用基板 |
| CN109562622B (zh) * | 2016-10-24 | 2021-03-09 | 惠普发展公司，有限责任合伙企业 | 流体喷射管芯的电流泄漏测试 |
| WO2018080423A1 (en) * | 2016-10-24 | 2018-05-03 | Hewlett-Packard Development Company, L.P. | Low voltage bias of nozzle sensors |
| US10710365B2 (en) * | 2017-07-13 | 2020-07-14 | Canon Kabushiki Kaisha | Ink jet recording method and ink jet recording apparatus |
| US10688787B2 (en) * | 2017-07-13 | 2020-06-23 | Canon Kabushiki Kaisha | Ink jet recording method and ink jet recording apparatus |
| JP7271108B2 (ja) * | 2017-08-31 | 2023-05-11 | キヤノン株式会社 | ウルトラファインバブル含有液の製造装置及びウルトラファインバブル含有液の製造方法 |
| JP7183049B2 (ja) * | 2018-02-22 | 2022-12-05 | キヤノン株式会社 | 液体吐出ヘッド用基板および液体吐出ヘッド |
| JP7159060B2 (ja) * | 2018-02-22 | 2022-10-24 | キヤノン株式会社 | 液体吐出ヘッド用基板、液体吐出ヘッド、液体吐出ヘッド用基板の製造方法 |
| JP7134733B2 (ja) | 2018-06-25 | 2022-09-12 | キヤノン株式会社 | 記録素子基板、液体吐出ヘッド、および液体吐出装置 |
| JP7134752B2 (ja) * | 2018-07-06 | 2022-09-12 | キヤノン株式会社 | 液体吐出ヘッド |
| EP4110622B1 (en) * | 2020-02-24 | 2025-01-01 | Sicpa Holding Sa | A thermal inkjet printhead, and a printing assembly and printing apparatus comprising the same |
| KR102865068B1 (ko) * | 2020-03-27 | 2025-09-29 | 삼성디스플레이 주식회사 | 잉크젯 프린트 장치 |
| JP2021187121A (ja) | 2020-06-03 | 2021-12-13 | キヤノン株式会社 | 素子基板、液体吐出ヘッド、及び記録装置 |
| WO2022086546A1 (en) * | 2020-10-23 | 2022-04-28 | Hewlett-Packard Development Company, L.P. | Asymmetrical configuration of fluid-ejection element groups, ports, and channels of printhead |
| JP7620482B2 (ja) | 2021-04-06 | 2025-01-23 | キヤノン株式会社 | 液体吐出ヘッド用基板及び記録装置 |
| JP7760311B2 (ja) | 2021-09-29 | 2025-10-27 | キヤノン株式会社 | 液体吐出ヘッド用基板、液体吐出ヘッド、及び液体吐出ヘッド用基板の製造方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH062416B2 (ja) | 1984-01-30 | 1994-01-12 | キヤノン株式会社 | 液体噴射記録ヘッドの製造方法 |
| JPS62152864A (ja) * | 1985-12-27 | 1987-07-07 | Canon Inc | 液体噴射記録ヘツドの製造方法 |
| ES2144473T3 (es) | 1993-07-29 | 2000-06-16 | Canon Kk | Cabezal para chorros de tinta, cartucho para chorros de tinta y aparato para la impresion por chorros de tinta. |
| US5808640A (en) * | 1994-04-19 | 1998-09-15 | Hewlett-Packard Company | Special geometry ink jet resistor for high dpi/high frequency structures |
| US6022098A (en) | 1995-08-10 | 2000-02-08 | Fuji Xerox Co., Ltd. | Ink-jet recorder |
| JP3563960B2 (ja) | 1998-05-22 | 2004-09-08 | キヤノン株式会社 | インクジェットヘッド用基体、インクジェットヘッド、インクジェット装置およびインクジェットヘッド用基体の製造方法 |
| US6395148B1 (en) | 1998-11-06 | 2002-05-28 | Lexmark International, Inc. | Method for producing desired tantalum phase |
| US6512284B2 (en) | 1999-04-27 | 2003-01-28 | Hewlett-Packard Company | Thinfilm fuse/antifuse device and use of same in printhead |
| US6361150B1 (en) | 1999-08-30 | 2002-03-26 | Hewlett-Packard Company | Electrostatic discharge protection of electrically-inactive components in a thermal ink jet printing system |
| JP3812485B2 (ja) * | 2002-04-10 | 2006-08-23 | ソニー株式会社 | 液体吐出装置及びプリンタ |
| CN100496979C (zh) | 2002-12-27 | 2009-06-10 | 佳能株式会社 | 用于喷墨头的衬底、使用所述衬底的喷墨头及其制造方法 |
| JP4208793B2 (ja) | 2004-08-16 | 2009-01-14 | キヤノン株式会社 | インクジェットヘッド用基板、該基板の製造方法および前記基板を用いるインクジェットヘッド |
| JP4208794B2 (ja) | 2004-08-16 | 2009-01-14 | キヤノン株式会社 | インクジェットヘッド用基板、該基板の製造方法および前記基板を用いるインクジェットヘッド |
| JP4646602B2 (ja) | 2004-11-09 | 2011-03-09 | キヤノン株式会社 | インクジェット記録ヘッド用基板の製造方法 |
| JP4926669B2 (ja) * | 2005-12-09 | 2012-05-09 | キヤノン株式会社 | インクジェットヘッドのクリーニング方法、インクジェットヘッドおよびインクジェット記録装置 |
| JP4847360B2 (ja) | 2006-02-02 | 2011-12-28 | キヤノン株式会社 | 液体吐出ヘッド基体、その基体を用いた液体吐出ヘッドおよびそれらの製造方法 |
| JP2008149687A (ja) | 2006-12-20 | 2008-07-03 | Canon Inc | インクジェット記録ヘッド用基板および該基板を用いるインクジェット記録ヘッド |
| JP5147282B2 (ja) | 2007-05-02 | 2013-02-20 | キヤノン株式会社 | インクジェット記録用基板、該基板を備えた記録ヘッド及び記録装置 |
| JP4963679B2 (ja) | 2007-05-29 | 2012-06-27 | キヤノン株式会社 | 液体吐出ヘッド用基体及びその製造方法、並びに該基体を用いる液体吐出ヘッド |
| JP5103666B2 (ja) * | 2008-02-21 | 2012-12-19 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| US8075102B2 (en) | 2008-06-19 | 2011-12-13 | Canon Kabushiki Kaisha | Substrate for ink jet head and ink jet head |
| JP5393275B2 (ja) * | 2008-06-24 | 2014-01-22 | キヤノン株式会社 | 液体吐出ヘッド |
-
2012
- 2012-12-27 JP JP2012285445A patent/JP6150519B2/ja active Active
-
2013
- 2013-12-09 EP EP13005720.1A patent/EP2749422B1/en active Active
- 2013-12-13 RU RU2013155622/12A patent/RU2578122C2/ru active
- 2013-12-18 BR BR102013032705-0A patent/BR102013032705A2/pt not_active Application Discontinuation
- 2013-12-23 US US14/138,344 patent/US9085143B2/en active Active
- 2013-12-27 CN CN201310741565.0A patent/CN103895350B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2749422B1 (en) | 2016-03-16 |
| EP2749422A1 (en) | 2014-07-02 |
| US20140184702A1 (en) | 2014-07-03 |
| RU2013155622A (ru) | 2015-06-20 |
| CN103895350A (zh) | 2014-07-02 |
| JP6150519B2 (ja) | 2017-06-21 |
| US9085143B2 (en) | 2015-07-21 |
| JP2014124922A (ja) | 2014-07-07 |
| BR102013032705A2 (pt) | 2014-08-19 |
| RU2578122C2 (ru) | 2016-03-20 |
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