CN103619498B - 用于多晶硅反应器的清洁工具 - Google Patents

用于多晶硅反应器的清洁工具 Download PDF

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Publication number
CN103619498B
CN103619498B CN201280032284.1A CN201280032284A CN103619498B CN 103619498 B CN103619498 B CN 103619498B CN 201280032284 A CN201280032284 A CN 201280032284A CN 103619498 B CN103619498 B CN 103619498B
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CN
China
Prior art keywords
clutch
reactor
brush
described reactor
actuating mechanism
Prior art date
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Application number
CN201280032284.1A
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English (en)
Chinese (zh)
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CN103619498A (zh
Inventor
E·博维奥
P·莫里诺
D·加瓦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GlobalWafers Co Ltd
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SunEdison Inc
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Publication date
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Publication of CN103619498A publication Critical patent/CN103619498A/zh
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Publication of CN103619498B publication Critical patent/CN103619498B/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
CN201280032284.1A 2011-06-29 2012-06-29 用于多晶硅反应器的清洁工具 Active CN103619498B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161502614P 2011-06-29 2011-06-29
US61/502,614 2011-06-29
PCT/EP2012/062720 WO2013001068A1 (en) 2011-06-29 2012-06-29 Cleaning tool for polysilicon reactor

Publications (2)

Publication Number Publication Date
CN103619498A CN103619498A (zh) 2014-03-05
CN103619498B true CN103619498B (zh) 2015-11-25

Family

ID=46465212

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280032284.1A Active CN103619498B (zh) 2011-06-29 2012-06-29 用于多晶硅反应器的清洁工具

Country Status (7)

Country Link
US (1) US20130000672A1 (enExample)
EP (1) EP2726223B1 (enExample)
JP (1) JP6391467B2 (enExample)
KR (1) KR20140033160A (enExample)
CN (1) CN103619498B (enExample)
TW (1) TWI547604B (enExample)
WO (1) WO2013001068A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013206436A1 (de) * 2013-04-11 2014-10-16 Wacker Chemie Ag Reinigung von CVD-Produktionsräumen
CN103302070B (zh) * 2013-05-30 2016-08-10 昆明冶研新材料股份有限公司 清洗设备
DE102014109349A1 (de) * 2014-07-04 2016-01-21 Aixtron Se Vorrichtung zum Reinigen einer Gasaustrittsfläche eines Gaseinlassorgans eines CVD-Reaktors
JP6424776B2 (ja) * 2015-08-18 2018-11-21 三菱マテリアル株式会社 反応炉洗浄装置及び反応炉洗浄方法
US9468957B1 (en) * 2016-02-01 2016-10-18 King Saud University Storage tank cleaning machine
CN105648420B (zh) * 2016-02-05 2018-03-16 安徽三安光电有限公司 一种mocvd反应腔室的清理装置及清理方法
EP3636594B1 (en) * 2017-06-08 2023-06-14 Tokuyama Corporation Cleaning device
CN107473323B (zh) * 2017-09-26 2020-07-03 界首市百乐泉纯净水厂 一种贴于原水箱内壁的吸附污垢装置及其方法
CN107552509B (zh) * 2017-09-26 2020-07-10 界首市百乐泉纯净水厂 一种用于原水箱内壁除垢的清洗装置及其方法
US10864640B1 (en) * 2017-12-26 2020-12-15 AGI Engineering, Inc. Articulating arm programmable tank cleaning nozzle
US11282728B2 (en) * 2018-06-29 2022-03-22 Taiwan Semiconductor Manufacturing Co., Ltd. Contamination control in semiconductor manufacturing systems
US11571723B1 (en) 2019-03-29 2023-02-07 AGI Engineering, Inc. Mechanical dry waste excavating end effector
KR102632549B1 (ko) * 2019-12-09 2024-01-31 주식회사 엘지화학 반응기 세척 장치 및 반응기 세척 방법
CN111112158B (zh) * 2019-12-31 2022-05-17 内蒙古中环领先半导体材料有限公司 一种避免拆清过程中发生爆燃的方法及装置
CN112853310B (zh) * 2021-01-08 2022-03-22 西南科技大学 一种金属有机化学气相沉淀设备
CN113385442B (zh) * 2021-05-26 2022-12-23 山东天岳先进科技股份有限公司 一种晶体炉清洁装置及方法
CN114042710A (zh) * 2021-11-10 2022-02-15 常州艾恩希纳米镀膜科技有限公司 一种用于cvd涂层反应腔体内壁自动清洁刷
CN115382865B (zh) * 2022-10-27 2023-01-24 泉州市堃晟检测技术有限公司 一种环保污水处理罐的清扫装置
CN115672218B (zh) * 2022-10-31 2025-05-09 济宁福顺化工有限公司 大型反应釜内壁清洁器械

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6148832A (en) * 1998-09-02 2000-11-21 Advanced Micro Devices, Inc. Method and apparatus for in-situ cleaning of polysilicon-coated quartz furnaces
EP1236521A1 (en) * 2001-02-28 2002-09-04 C.E.B. Impianti S.r.l. Device for cleaning the inner surfaces of containers in general
US6738683B1 (en) * 2000-09-05 2004-05-18 Cxe Equipment Services, Llc Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor
CN101497443A (zh) * 2008-01-25 2009-08-05 三菱麻铁里亚尔株式会社 反应炉清洗装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114815A (en) * 1980-02-08 1981-09-09 Koujiyundo Silicon Kk Preliminary washing method of reaction furnace for preparing polycrystalline silicon
JPS5976207A (ja) * 1982-10-25 1984-05-01 Kazuo Bando プラスチツク成形金型面のクリ−ニング装置
JPH0663096B2 (ja) * 1988-11-25 1994-08-17 コマツ電子金属株式会社 気相成長用反応炉の洗浄方法
US5109562A (en) * 1989-08-30 1992-05-05 C.V.D. System Cleaners Corporation Chemical vapor deposition system cleaner
US6568409B1 (en) * 1999-03-26 2003-05-27 Mcf Systems Atlanta, Inc. Ultrasonic parts washer apparatus
EP1215683A3 (en) * 2000-11-20 2003-05-21 Framatome ANP Segmented link robot for waste removal
WO2003002276A1 (en) * 2001-06-27 2003-01-09 Container Wash Systems Limited Container washing apparatus
US7055203B1 (en) * 2001-11-15 2006-06-06 Goodway Technologies Corporation Tube cleaning machine
DE202011002414U1 (de) * 2011-02-04 2011-04-14 Kathöfer, Felix Reinigungsvorrichtung

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6148832A (en) * 1998-09-02 2000-11-21 Advanced Micro Devices, Inc. Method and apparatus for in-situ cleaning of polysilicon-coated quartz furnaces
US6738683B1 (en) * 2000-09-05 2004-05-18 Cxe Equipment Services, Llc Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor
EP1236521A1 (en) * 2001-02-28 2002-09-04 C.E.B. Impianti S.r.l. Device for cleaning the inner surfaces of containers in general
CN101497443A (zh) * 2008-01-25 2009-08-05 三菱麻铁里亚尔株式会社 反应炉清洗装置

Also Published As

Publication number Publication date
KR20140033160A (ko) 2014-03-17
TWI547604B (zh) 2016-09-01
EP2726223A1 (en) 2014-05-07
JP6391467B2 (ja) 2018-09-19
WO2013001068A4 (en) 2013-03-28
WO2013001068A1 (en) 2013-01-03
US20130000672A1 (en) 2013-01-03
JP2014518153A (ja) 2014-07-28
CN103619498A (zh) 2014-03-05
EP2726223B1 (en) 2015-06-10
TW201307626A (zh) 2013-02-16

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PB01 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
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TR01 Transfer of patent right

Effective date of registration: 20190925

Address after: Taiwan, China Hsinchu Science Park industrial two East Road, No. 8

Patentee after: GLOBAL WAFERS CO., LTD.

Address before: Italy Novara

Patentee before: MEMC Electronic Materials, Inc.