JP6391467B2 - ポリシリコンリアクタの洗浄ツール - Google Patents
ポリシリコンリアクタの洗浄ツール Download PDFInfo
- Publication number
- JP6391467B2 JP6391467B2 JP2014517737A JP2014517737A JP6391467B2 JP 6391467 B2 JP6391467 B2 JP 6391467B2 JP 2014517737 A JP2014517737 A JP 2014517737A JP 2014517737 A JP2014517737 A JP 2014517737A JP 6391467 B2 JP6391467 B2 JP 6391467B2
- Authority
- JP
- Japan
- Prior art keywords
- brush
- reactor
- reactor bell
- bell
- actuator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Description
Claims (6)
- 化学気相堆積リアクタベルの内部表面を洗浄するための、垂直軸を備えたシステムであって、
リアクタベルのフランジを載置するためのフレームと、
フレームに接続された作動メカニズムであって、リアクタベルがフレームに載置された場合に、リアクタベルの内部空間内で垂直軸に沿った運動および回転運動ができるように形成された作動メカニズムと、
作動メカニズムに接続された少なくとも1つのブラシであって、リアクタベルの内部表面に接触するように形成されたブラシと、
少なくとも1つのブラシを作動メカニズムに接続し、垂直軸と直角にブラシを動かすリニアアクチュエータと、
作動メカニズムに接続された少なくとも1つのノズルであって、リアクタベルの内部表面に対して水流を向けるように形成されたノズルと、を含むシステム。 - さらに少なくとも1つのブラシに接続された回転アクチュエータを含み、回転アクチュエータはブラシを回転させるように形成される請求項1に記載のシステム。
- リアクタベルの中に形成されたウインドウの内部表面に対して気体の流れを向けるための乾燥ノズルを含む請求項1に記載のシステム。
- ブラシを用いた化学気相堆積リアクタベルの内部表面の洗浄方法であって、
フレームの上にリアクタベルを配置する工程と、
第1アクチュエータを操作して、ブラシをリアクタベルの内部表面に噛み合わせる工程であって、第1アクチェータはリアクタベルの長手方向の軸に平行に移動する工程と、
ノズルからリアクタベルの内部表面に対してノズルからの水流を向ける工程と、
第2アクチュエータを操作してブラシを回転させる工程と、を含む方法。 - さらに内部表面の汚染物の量を測定する工程と、内部表面の汚染物の量に基づいて、リアクタベルの長手方向の軸に沿って第1アクチュエータの回転および移動の速度を調整する工程とを含む請求項4に記載の方法。
- さらにリアクタベルの中に形成されたウインドウの内部表面に対して気体の流れを向ける工程を含む請求項5に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161502614P | 2011-06-29 | 2011-06-29 | |
US61/502,614 | 2011-06-29 | ||
PCT/EP2012/062720 WO2013001068A1 (en) | 2011-06-29 | 2012-06-29 | Cleaning tool for polysilicon reactor |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014518153A JP2014518153A (ja) | 2014-07-28 |
JP2014518153A5 JP2014518153A5 (ja) | 2015-08-27 |
JP6391467B2 true JP6391467B2 (ja) | 2018-09-19 |
Family
ID=46465212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014517737A Active JP6391467B2 (ja) | 2011-06-29 | 2012-06-29 | ポリシリコンリアクタの洗浄ツール |
Country Status (7)
Country | Link |
---|---|
US (1) | US20130000672A1 (ja) |
EP (1) | EP2726223B1 (ja) |
JP (1) | JP6391467B2 (ja) |
KR (1) | KR20140033160A (ja) |
CN (1) | CN103619498B (ja) |
TW (1) | TWI547604B (ja) |
WO (1) | WO2013001068A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013206436A1 (de) * | 2013-04-11 | 2014-10-16 | Wacker Chemie Ag | Reinigung von CVD-Produktionsräumen |
CN103302070B (zh) * | 2013-05-30 | 2016-08-10 | 昆明冶研新材料股份有限公司 | 清洗设备 |
DE102014109349A1 (de) * | 2014-07-04 | 2016-01-21 | Aixtron Se | Vorrichtung zum Reinigen einer Gasaustrittsfläche eines Gaseinlassorgans eines CVD-Reaktors |
JP6424776B2 (ja) * | 2015-08-18 | 2018-11-21 | 三菱マテリアル株式会社 | 反応炉洗浄装置及び反応炉洗浄方法 |
US9468957B1 (en) * | 2016-02-01 | 2016-10-18 | King Saud University | Storage tank cleaning machine |
CN105648420B (zh) * | 2016-02-05 | 2018-03-16 | 安徽三安光电有限公司 | 一种mocvd反应腔室的清理装置及清理方法 |
SG11201911753QA (en) * | 2017-06-08 | 2020-01-30 | Tokuyama Corp | Cleaning device and cleaning method |
CN107473323B (zh) * | 2017-09-26 | 2020-07-03 | 界首市百乐泉纯净水厂 | 一种贴于原水箱内壁的吸附污垢装置及其方法 |
CN107552509B (zh) * | 2017-09-26 | 2020-07-10 | 界首市百乐泉纯净水厂 | 一种用于原水箱内壁除垢的清洗装置及其方法 |
US10864640B1 (en) * | 2017-12-26 | 2020-12-15 | AGI Engineering, Inc. | Articulating arm programmable tank cleaning nozzle |
US11571723B1 (en) | 2019-03-29 | 2023-02-07 | AGI Engineering, Inc. | Mechanical dry waste excavating end effector |
CN111112158B (zh) * | 2019-12-31 | 2022-05-17 | 内蒙古中环领先半导体材料有限公司 | 一种避免拆清过程中发生爆燃的方法及装置 |
CN112853310B (zh) * | 2021-01-08 | 2022-03-22 | 西南科技大学 | 一种金属有机化学气相沉淀设备 |
CN113385442B (zh) * | 2021-05-26 | 2022-12-23 | 山东天岳先进科技股份有限公司 | 一种晶体炉清洁装置及方法 |
CN114042710A (zh) * | 2021-11-10 | 2022-02-15 | 常州艾恩希纳米镀膜科技有限公司 | 一种用于cvd涂层反应腔体内壁自动清洁刷 |
CN115382865B (zh) * | 2022-10-27 | 2023-01-24 | 泉州市堃晟检测技术有限公司 | 一种环保污水处理罐的清扫装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56114815A (en) * | 1980-02-08 | 1981-09-09 | Koujiyundo Silicon Kk | Preliminary washing method of reaction furnace for preparing polycrystalline silicon |
JPS5976207A (ja) * | 1982-10-25 | 1984-05-01 | Kazuo Bando | プラスチツク成形金型面のクリ−ニング装置 |
JPH0663096B2 (ja) * | 1988-11-25 | 1994-08-17 | コマツ電子金属株式会社 | 気相成長用反応炉の洗浄方法 |
US5109562A (en) * | 1989-08-30 | 1992-05-05 | C.V.D. System Cleaners Corporation | Chemical vapor deposition system cleaner |
US6148832A (en) * | 1998-09-02 | 2000-11-21 | Advanced Micro Devices, Inc. | Method and apparatus for in-situ cleaning of polysilicon-coated quartz furnaces |
US6568409B1 (en) * | 1999-03-26 | 2003-05-27 | Mcf Systems Atlanta, Inc. | Ultrasonic parts washer apparatus |
US6738683B1 (en) * | 2000-09-05 | 2004-05-18 | Cxe Equipment Services, Llc | Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor |
EP1215683A3 (en) * | 2000-11-20 | 2003-05-21 | Framatome ANP | Segmented link robot for waste removal |
ITMI20010408A1 (it) * | 2001-02-28 | 2002-08-28 | C E B Impianti S R L | Apparecchiatura per la bonifica delle superfici interne di contenitori in genere |
WO2003002276A1 (en) * | 2001-06-27 | 2003-01-09 | Container Wash Systems Limited | Container washing apparatus |
US7055203B1 (en) * | 2001-11-15 | 2006-06-06 | Goodway Technologies Corporation | Tube cleaning machine |
EP2082814B1 (en) * | 2008-01-25 | 2011-04-27 | Mitsubishi Materials Corporation | Reactor cleaning apparatus |
DE202011002414U1 (de) * | 2011-02-04 | 2011-04-14 | Kathöfer, Felix | Reinigungsvorrichtung |
-
2012
- 2012-06-27 US US13/534,137 patent/US20130000672A1/en not_active Abandoned
- 2012-06-29 EP EP12732828.4A patent/EP2726223B1/en active Active
- 2012-06-29 KR KR1020137034370A patent/KR20140033160A/ko not_active Application Discontinuation
- 2012-06-29 WO PCT/EP2012/062720 patent/WO2013001068A1/en active Application Filing
- 2012-06-29 CN CN201280032284.1A patent/CN103619498B/zh active Active
- 2012-06-29 TW TW101123656A patent/TWI547604B/zh active
- 2012-06-29 JP JP2014517737A patent/JP6391467B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
CN103619498A (zh) | 2014-03-05 |
TW201307626A (zh) | 2013-02-16 |
JP2014518153A (ja) | 2014-07-28 |
US20130000672A1 (en) | 2013-01-03 |
KR20140033160A (ko) | 2014-03-17 |
WO2013001068A4 (en) | 2013-03-28 |
EP2726223A1 (en) | 2014-05-07 |
WO2013001068A1 (en) | 2013-01-03 |
TWI547604B (zh) | 2016-09-01 |
CN103619498B (zh) | 2015-11-25 |
EP2726223B1 (en) | 2015-06-10 |
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