CN103325651B - 向射束加工系统内的工件提供一种或多种气体的方法和设备 - Google Patents
向射束加工系统内的工件提供一种或多种气体的方法和设备 Download PDFInfo
- Publication number
- CN103325651B CN103325651B CN201310089789.8A CN201310089789A CN103325651B CN 103325651 B CN103325651 B CN 103325651B CN 201310089789 A CN201310089789 A CN 201310089789A CN 103325651 B CN103325651 B CN 103325651B
- Authority
- CN
- China
- Prior art keywords
- gas
- needle
- valve
- flow
- injection system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/30—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
- F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
- F16K11/06—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
- F16K11/065—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members
- F16K11/07—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members with cylindrical slides
- F16K11/0716—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members with cylindrical slides with fluid passages through the valve member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/023—Means for mechanically adjusting components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261613823P | 2012-03-21 | 2012-03-21 | |
| US61/613,823 | 2012-03-21 | ||
| US61/613823 | 2012-03-21 | ||
| US13/541391 | 2012-07-03 | ||
| US13/541,391 | 2012-07-03 | ||
| US13/541,391 US9275823B2 (en) | 2012-03-21 | 2012-07-03 | Multiple gas injection system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103325651A CN103325651A (zh) | 2013-09-25 |
| CN103325651B true CN103325651B (zh) | 2017-10-24 |
Family
ID=47901835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310089789.8A Active CN103325651B (zh) | 2012-03-21 | 2013-03-20 | 向射束加工系统内的工件提供一种或多种气体的方法和设备 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US9275823B2 (enExample) |
| EP (1) | EP2642506B1 (enExample) |
| JP (1) | JP6196052B2 (enExample) |
| CN (1) | CN103325651B (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9105438B2 (en) | 2012-05-31 | 2015-08-11 | Fei Company | Imaging and processing for plasma ion source |
| WO2014003937A1 (en) | 2012-06-29 | 2014-01-03 | Fei Company | Multi Species Ion Source |
| JP6158111B2 (ja) * | 2014-02-12 | 2017-07-05 | 東京エレクトロン株式会社 | ガス供給方法及び半導体製造装置 |
| JP2016065279A (ja) * | 2014-09-24 | 2016-04-28 | スタンレー電気株式会社 | 成膜システム |
| JP6270154B2 (ja) | 2014-10-16 | 2018-01-31 | 株式会社フィルテック | ガス生成装置およびガス生成方法 |
| JP2016222984A (ja) | 2015-06-01 | 2016-12-28 | 株式会社フィルテック | ヒートビーム成膜装置 |
| EP3366809B1 (en) * | 2015-10-19 | 2023-03-15 | Mitsubishi Heavy Industries Machinery Systems, Ltd. | Film forming device |
| US10103008B2 (en) * | 2016-01-12 | 2018-10-16 | Fei Company | Charged particle beam-induced etching |
| DE102016214146A1 (de) * | 2016-08-01 | 2018-02-01 | Kjellberg Stiftung | Plasmabrenner |
| JP6591686B2 (ja) * | 2016-08-29 | 2019-10-16 | 株式会社コガネイ | 切換弁および間欠エアブローガン |
| JP6710609B2 (ja) * | 2016-08-31 | 2020-06-17 | ナブテスコ株式会社 | スプール弁および弁システム |
| US9899181B1 (en) | 2017-01-12 | 2018-02-20 | Fei Company | Collision ionization ion source |
| US9941094B1 (en) | 2017-02-01 | 2018-04-10 | Fei Company | Innovative source assembly for ion beam production |
| JP6942347B2 (ja) * | 2018-02-09 | 2021-09-29 | 国立研究開発法人量子科学技術研究開発機構 | イオン源装置、粒子線発生装置、およびイオンビーム生成方法 |
| CN121065670A (zh) | 2019-08-12 | 2025-12-05 | Meo工程股份有限公司 | 用于前体气体喷射的方法和装置 |
| CN110486503B (zh) * | 2019-08-15 | 2024-08-23 | 上海汇海真空机械设备有限公司 | 一种真空充氮杀虫灭菌消毒设备用的专用抽真空阀 |
| CN111075940B (zh) * | 2019-12-17 | 2024-06-04 | 广东创智智能装备有限公司 | 一种便于抽真空和破真空的连接阀 |
| CN113035674B (zh) * | 2021-02-07 | 2024-10-11 | 上海精测半导体技术有限公司 | 一种多气源气体注射装置 |
| US20220305584A1 (en) * | 2021-03-24 | 2022-09-29 | Fei Company | In-situ laser redeposition reduction by a controlled gas flow and a system for reducing contamination |
| TW202305989A (zh) | 2021-06-21 | 2023-02-01 | 荷蘭商Asm Ip私人控股有限公司 | 用於提供氣體混合物至反應室之設備及使用其的方法 |
| DE102021132834B4 (de) * | 2021-12-13 | 2024-08-08 | Carl Zeiss Microscopy Gmbh | Gasreservoir, Gaszuführungseinrichtung mit einem Gasreservoir und Teilchenstrahlgerät mit einer Gaszuführungseinrichtung |
| US20250210303A1 (en) * | 2023-12-21 | 2025-06-26 | Fei Company | Mixed-gas species plasma source system |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4418924A (en) | 1980-10-20 | 1983-12-06 | Mack James F | Bi-surface sealing mechanism with rolling/sliding O-ring |
| JPS5980777A (ja) | 1982-10-29 | 1984-05-10 | Hitachi Ltd | ガス制御装置 |
| US4665296A (en) * | 1984-04-28 | 1987-05-12 | Neturen Co., Ltd. | Method of and apparatus for igniting a high-frequency torch to create a high-temperature plasma of high purity |
| US4670685A (en) | 1986-04-14 | 1987-06-02 | Hughes Aircraft Company | Liquid metal ion source and alloy for ion emission of multiple ionic species |
| JPH0748367B2 (ja) * | 1989-07-27 | 1995-05-24 | 日本電子株式会社 | 荷電粒子線装置におけるガス導入機構 |
| JPH03124463A (ja) | 1989-10-06 | 1991-05-28 | Seikosha Co Ltd | 磁気記録装置 |
| JPH03124463U (enExample) | 1990-03-28 | 1991-12-17 | ||
| US5230741A (en) * | 1990-07-16 | 1993-07-27 | Novellus Systems, Inc. | Gas-based backside protection during substrate processing |
| JP3113674B2 (ja) * | 1990-11-21 | 2000-12-04 | 株式会社日立製作所 | 荷電ビーム処理方法およびその装置 |
| JPH05206033A (ja) * | 1992-01-28 | 1993-08-13 | Kokusai Electric Co Ltd | Cvd膜生成方法及び装置 |
| JP3083401B2 (ja) * | 1992-05-12 | 2000-09-04 | 日本電子株式会社 | Fibアシストデポジション装置のガス供給装置 |
| US5435850A (en) | 1993-09-17 | 1995-07-25 | Fei Company | Gas injection system |
| JP3310136B2 (ja) | 1994-09-17 | 2002-07-29 | 株式会社東芝 | 荷電ビーム装置 |
| US5958799A (en) * | 1995-04-13 | 1999-09-28 | North Carolina State University | Method for water vapor enhanced charged-particle-beam machining |
| JP3124463B2 (ja) | 1995-04-14 | 2001-01-15 | 東海興業株式会社 | ウエザストリップの製造方法 |
| US5851413A (en) | 1996-06-19 | 1998-12-22 | Micrion Corporation | Gas delivery systems for particle beam processing |
| JP2000306884A (ja) * | 1999-04-22 | 2000-11-02 | Mitsubishi Electric Corp | プラズマ処理装置およびプラズマ処理方法 |
| US6414307B1 (en) * | 1999-07-09 | 2002-07-02 | Fei Company | Method and apparatus for enhancing yield of secondary ions |
| DE10042098A1 (de) | 2000-08-26 | 2002-03-14 | Deutsche Telekom Ag | Gasversorgung für Additive Lithographie |
| US7106939B2 (en) * | 2001-09-19 | 2006-09-12 | 3M Innovative Properties Company | Optical and optoelectronic articles |
| JP4011900B2 (ja) * | 2001-12-04 | 2007-11-21 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
| JP2003303788A (ja) * | 2002-04-11 | 2003-10-24 | Mitsubishi Electric Corp | エッチング装置 |
| US20050120805A1 (en) * | 2003-12-04 | 2005-06-09 | John Lane | Method and apparatus for substrate temperature control |
| EP1774538A4 (en) | 2004-07-29 | 2012-06-06 | Omniprobe Inc | MULTIPLE ELEMENT GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS |
| EP2041756B1 (en) | 2006-07-14 | 2015-05-13 | FEI Company | A multi-source plasma focused ion beam system |
| JP4928893B2 (ja) * | 2006-10-03 | 2012-05-09 | 株式会社日立ハイテクノロジーズ | プラズマエッチング方法。 |
| DE102008020145B4 (de) * | 2007-04-23 | 2012-11-08 | Hitachi High-Technologies Corporation | Ionenstrahlbearbeitungs- und Betrachtungsvorrichtung und Verfahren zum Bearbeiten und Betrachten einer Probe |
| WO2009114112A2 (en) | 2008-03-08 | 2009-09-17 | Omniprobe, Inc. | Method and apparatus for precursor delivery system for irradiation beam instruments |
| US8778804B2 (en) | 2009-01-30 | 2014-07-15 | Fei Company | High selectivity, low damage electron-beam delineation etch |
| US8253118B2 (en) | 2009-10-14 | 2012-08-28 | Fei Company | Charged particle beam system having multiple user-selectable operating modes |
| WO2011060444A2 (en) * | 2009-11-16 | 2011-05-19 | Fei Company | Gas delivery for beam processing systems |
| EP2341525B1 (en) | 2009-12-30 | 2013-10-23 | FEI Company | Plasma source for charged particle beam system |
| FR2956894B1 (fr) | 2010-03-01 | 2012-07-27 | Air Liquide | Dispositif, installation et procede de remplissage d'un reservoir de gaz |
| EP2492950B1 (en) | 2011-02-25 | 2018-04-11 | FEI Company | Method for rapid switching between a high current mode and a low current mode in a charged particle beam system |
| US8633452B2 (en) | 2011-07-13 | 2014-01-21 | Fei Company | Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source |
| US8822913B2 (en) | 2011-12-06 | 2014-09-02 | Fei Company | Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions |
-
2012
- 2012-07-03 US US13/541,391 patent/US9275823B2/en active Active
-
2013
- 2013-03-20 JP JP2013057417A patent/JP6196052B2/ja active Active
- 2013-03-20 CN CN201310089789.8A patent/CN103325651B/zh active Active
- 2013-03-20 EP EP13160075.1A patent/EP2642506B1/en active Active
-
2016
- 2016-01-22 US US15/004,143 patent/US9728375B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP2642506A1 (en) | 2013-09-25 |
| CN103325651A (zh) | 2013-09-25 |
| US9728375B2 (en) | 2017-08-08 |
| JP2013197594A (ja) | 2013-09-30 |
| JP6196052B2 (ja) | 2017-09-13 |
| US20160155607A1 (en) | 2016-06-02 |
| EP2642506B1 (en) | 2016-12-28 |
| US20130248490A1 (en) | 2013-09-26 |
| US9275823B2 (en) | 2016-03-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103325651B (zh) | 向射束加工系统内的工件提供一种或多种气体的方法和设备 | |
| JP5582684B2 (ja) | 半導体処理システムにガスを分配する装置及び半導体処理チャンバにガスを分配する装置 | |
| JP5330709B2 (ja) | 処理チャンバへのガスフローを制御する方法及び装置 | |
| US9150961B2 (en) | Gas delivery for beam processing systems | |
| CN101256937B (zh) | 用于控制流到处理腔室的气流的方法和装置 | |
| CN209490704U (zh) | 气体混合设备 | |
| KR20130077835A (ko) | 신속 가스 전환 장치를 구비한 가스 클러스터 이온 빔 시스템 | |
| TWI892504B (zh) | 前驅物遞送系統、前驅物供應套組及相關方法 | |
| JP3788988B2 (ja) | 全煙曝露装置 | |
| DE112012001861B4 (de) | Chemikalienbereitstellungssystem | |
| CN103377972A (zh) | 基板处理装置和供给处理溶液的方法 | |
| JP6125508B2 (ja) | ガス混合物の生成のための方法および装置 | |
| CN113311890A (zh) | 极紫外光刻机物料传递及污染控制系统、方法 | |
| JP2004508460A (ja) | 表面へ管を通して気体または液体を供給する装置、その管のセットおよびその方法 | |
| CN102224572B (zh) | 用于真空晶圆处理系统的液体输送机制 | |
| CN102053617A (zh) | 流量比例控制器在线校准方法、系统及等离子体处理设备 | |
| US20050067334A1 (en) | Treatment liquid supply system | |
| CN116973277A (zh) | 安全壳内气溶胶吸湿增长的测试系统及方法 | |
| JP2003503846A (ja) | ウェハ製作システムへの流体供給の安定化 | |
| CN116441133B (zh) | 涂布设备 | |
| CN119124942A (zh) | 一种气溶胶行为机理研究的试验装置及试验方法 | |
| CN102237244A (zh) | 设定束电流密度分布的调整目标的方法和离子注入装置 | |
| CN210198999U (zh) | 一种化学气相沉积和扫描电镜联用设备 | |
| CN107843473A (zh) | 多组分挥发性有机物重量法配气装置及配气方法 | |
| KR100484849B1 (ko) | 이온주입장치의 분석기 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |