JP6196052B2 - 複数ガス注入システム - Google Patents

複数ガス注入システム Download PDF

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Publication number
JP6196052B2
JP6196052B2 JP2013057417A JP2013057417A JP6196052B2 JP 6196052 B2 JP6196052 B2 JP 6196052B2 JP 2013057417 A JP2013057417 A JP 2013057417A JP 2013057417 A JP2013057417 A JP 2013057417A JP 6196052 B2 JP6196052 B2 JP 6196052B2
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Japan
Prior art keywords
gas
needle
valve
flow rate
injection system
Prior art date
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JP2013057417A
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English (en)
Japanese (ja)
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JP2013197594A (ja
JP2013197594A5 (enExample
Inventor
ヨルゲン・ラスムッセン
ケヴィン・シー・マリナック
Original Assignee
エフ・イ−・アイ・カンパニー
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Publication of JP2013197594A publication Critical patent/JP2013197594A/ja
Publication of JP2013197594A5 publication Critical patent/JP2013197594A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/30—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/06—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
    • F16K11/065—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members
    • F16K11/07—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members with cylindrical slides
    • F16K11/0716—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members with cylindrical slides with fluid passages through the valve member
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/023—Means for mechanically adjusting components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
JP2013057417A 2012-03-21 2013-03-20 複数ガス注入システム Active JP6196052B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201261613823P 2012-03-21 2012-03-21
US61/613,823 2012-03-21
US13/541,391 2012-07-03
US13/541,391 US9275823B2 (en) 2012-03-21 2012-07-03 Multiple gas injection system

Publications (3)

Publication Number Publication Date
JP2013197594A JP2013197594A (ja) 2013-09-30
JP2013197594A5 JP2013197594A5 (enExample) 2016-04-28
JP6196052B2 true JP6196052B2 (ja) 2017-09-13

Family

ID=47901835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013057417A Active JP6196052B2 (ja) 2012-03-21 2013-03-20 複数ガス注入システム

Country Status (4)

Country Link
US (2) US9275823B2 (enExample)
EP (1) EP2642506B1 (enExample)
JP (1) JP6196052B2 (enExample)
CN (1) CN103325651B (enExample)

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US9105438B2 (en) 2012-05-31 2015-08-11 Fei Company Imaging and processing for plasma ion source
WO2014003937A1 (en) 2012-06-29 2014-01-03 Fei Company Multi Species Ion Source
JP6158111B2 (ja) * 2014-02-12 2017-07-05 東京エレクトロン株式会社 ガス供給方法及び半導体製造装置
JP2016065279A (ja) * 2014-09-24 2016-04-28 スタンレー電気株式会社 成膜システム
JP6270154B2 (ja) 2014-10-16 2018-01-31 株式会社フィルテック ガス生成装置およびガス生成方法
JP2016222984A (ja) 2015-06-01 2016-12-28 株式会社フィルテック ヒートビーム成膜装置
WO2017068608A1 (ja) * 2015-10-19 2017-04-27 三菱重工メカトロシステムズ株式会社 成膜装置
US10103008B2 (en) 2016-01-12 2018-10-16 Fei Company Charged particle beam-induced etching
DE102016214146A1 (de) * 2016-08-01 2018-02-01 Kjellberg Stiftung Plasmabrenner
KR102190802B1 (ko) * 2016-08-29 2020-12-14 가부시키가이샤 고가네이 스위칭 밸브 및 간헐 송풍 건
JP6710609B2 (ja) * 2016-08-31 2020-06-17 ナブテスコ株式会社 スプール弁および弁システム
US9899181B1 (en) 2017-01-12 2018-02-20 Fei Company Collision ionization ion source
US9941094B1 (en) 2017-02-01 2018-04-10 Fei Company Innovative source assembly for ion beam production
JP6942347B2 (ja) * 2018-02-09 2021-09-29 国立研究開発法人量子科学技術研究開発機構 イオン源装置、粒子線発生装置、およびイオンビーム生成方法
CN121065670A (zh) * 2019-08-12 2025-12-05 Meo工程股份有限公司 用于前体气体喷射的方法和装置
CN110486503B (zh) * 2019-08-15 2024-08-23 上海汇海真空机械设备有限公司 一种真空充氮杀虫灭菌消毒设备用的专用抽真空阀
CN111075940B (zh) * 2019-12-17 2024-06-04 广东创智智能装备有限公司 一种便于抽真空和破真空的连接阀
CN113035674B (zh) * 2021-02-07 2024-10-11 上海精测半导体技术有限公司 一种多气源气体注射装置
US20220305584A1 (en) * 2021-03-24 2022-09-29 Fei Company In-situ laser redeposition reduction by a controlled gas flow and a system for reducing contamination
TW202305989A (zh) 2021-06-21 2023-02-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 用於提供氣體混合物至反應室之設備及使用其的方法
DE102021132834B4 (de) * 2021-12-13 2024-08-08 Carl Zeiss Microscopy Gmbh Gasreservoir, Gaszuführungseinrichtung mit einem Gasreservoir und Teilchenstrahlgerät mit einer Gaszuführungseinrichtung
US20250210303A1 (en) * 2023-12-21 2025-06-26 Fei Company Mixed-gas species plasma source system

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Also Published As

Publication number Publication date
JP2013197594A (ja) 2013-09-30
US20130248490A1 (en) 2013-09-26
US20160155607A1 (en) 2016-06-02
EP2642506B1 (en) 2016-12-28
US9275823B2 (en) 2016-03-01
CN103325651B (zh) 2017-10-24
US9728375B2 (en) 2017-08-08
EP2642506A1 (en) 2013-09-25
CN103325651A (zh) 2013-09-25

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