JP2013197594A5 - - Google Patents

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Publication number
JP2013197594A5
JP2013197594A5 JP2013057417A JP2013057417A JP2013197594A5 JP 2013197594 A5 JP2013197594 A5 JP 2013197594A5 JP 2013057417 A JP2013057417 A JP 2013057417A JP 2013057417 A JP2013057417 A JP 2013057417A JP 2013197594 A5 JP2013197594 A5 JP 2013197594A5
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JP
Japan
Prior art keywords
gas
needle
flow rate
injection system
valve
Prior art date
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Granted
Application number
JP2013057417A
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English (en)
Japanese (ja)
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JP2013197594A (ja
JP6196052B2 (ja
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Publication date
Priority claimed from US13/541,391 external-priority patent/US9275823B2/en
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Publication of JP2013197594A publication Critical patent/JP2013197594A/ja
Publication of JP2013197594A5 publication Critical patent/JP2013197594A5/ja
Application granted granted Critical
Publication of JP6196052B2 publication Critical patent/JP6196052B2/ja
Active legal-status Critical Current
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JP2013057417A 2012-03-21 2013-03-20 複数ガス注入システム Active JP6196052B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201261613823P 2012-03-21 2012-03-21
US61/613,823 2012-03-21
US13/541,391 2012-07-03
US13/541,391 US9275823B2 (en) 2012-03-21 2012-07-03 Multiple gas injection system

Publications (3)

Publication Number Publication Date
JP2013197594A JP2013197594A (ja) 2013-09-30
JP2013197594A5 true JP2013197594A5 (enExample) 2016-04-28
JP6196052B2 JP6196052B2 (ja) 2017-09-13

Family

ID=47901835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013057417A Active JP6196052B2 (ja) 2012-03-21 2013-03-20 複数ガス注入システム

Country Status (4)

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US (2) US9275823B2 (enExample)
EP (1) EP2642506B1 (enExample)
JP (1) JP6196052B2 (enExample)
CN (1) CN103325651B (enExample)

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US9105438B2 (en) 2012-05-31 2015-08-11 Fei Company Imaging and processing for plasma ion source
WO2014003937A1 (en) 2012-06-29 2014-01-03 Fei Company Multi Species Ion Source
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JP2016065279A (ja) * 2014-09-24 2016-04-28 スタンレー電気株式会社 成膜システム
JP6270154B2 (ja) 2014-10-16 2018-01-31 株式会社フィルテック ガス生成装置およびガス生成方法
JP2016222984A (ja) 2015-06-01 2016-12-28 株式会社フィルテック ヒートビーム成膜装置
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CN121065670A (zh) * 2019-08-12 2025-12-05 Meo工程股份有限公司 用于前体气体喷射的方法和装置
CN110486503B (zh) * 2019-08-15 2024-08-23 上海汇海真空机械设备有限公司 一种真空充氮杀虫灭菌消毒设备用的专用抽真空阀
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CN113035674B (zh) * 2021-02-07 2024-10-11 上海精测半导体技术有限公司 一种多气源气体注射装置
US20220305584A1 (en) * 2021-03-24 2022-09-29 Fei Company In-situ laser redeposition reduction by a controlled gas flow and a system for reducing contamination
TW202305989A (zh) 2021-06-21 2023-02-01 荷蘭商Asm Ip私人控股有限公司 用於提供氣體混合物至反應室之設備及使用其的方法
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