CN103249713B - 适用于光聚合引发剂的化合物、光聚合引发剂和光固化性树脂组合物 - Google Patents
适用于光聚合引发剂的化合物、光聚合引发剂和光固化性树脂组合物 Download PDFInfo
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- CN103249713B CN103249713B CN201180058710.4A CN201180058710A CN103249713B CN 103249713 B CN103249713 B CN 103249713B CN 201180058710 A CN201180058710 A CN 201180058710A CN 103249713 B CN103249713 B CN 103249713B
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- compound
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- resin composition
- diglycidyl ether
- photocurable resin
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- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 claims abstract description 5
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/52—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
- C07C229/54—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring
- C07C229/60—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring with amino and carboxyl groups bound in meta- or para- positions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/064—Polymers containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
- C08G59/4035—Hydrazines; Hydrazides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/08—Polyhydrazides; Polytriazoles; Polyaminotriazoles; Polyoxadiazoles
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
- C08K5/378—Thiols containing heterocyclic rings
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Sealing Material Composition (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Liquid Crystal (AREA)
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JP2010275016 | 2010-12-09 | ||
JP2010-275016 | 2010-12-09 | ||
PCT/JP2011/078333 WO2012077720A1 (fr) | 2010-12-09 | 2011-12-07 | Composé adapté à l'élaboration d'un initiateur de photopolymérisation, initiateur de photopolymérisation et composition de résine photodurcissable |
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KR (2) | KR101672580B1 (fr) |
CN (1) | CN103249713B (fr) |
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JP6114107B2 (ja) * | 2013-05-17 | 2017-04-12 | 協立化学産業株式会社 | 液晶シール剤用光硬化性樹脂組成物 |
KR102255550B1 (ko) * | 2013-11-13 | 2021-05-24 | 세키스이가가쿠 고교가부시키가이샤 | 액정 표시 소자용 시일제, 상하 도통 재료, 및 액정 표시 소자 |
KR102240965B1 (ko) * | 2013-11-13 | 2021-04-15 | 세키스이가가쿠 고교가부시키가이샤 | 액정 표시 소자용 시일제, 상하 도통 재료, 및 액정 표시 소자 |
KR102256146B1 (ko) * | 2013-12-05 | 2021-05-25 | 세키스이가가쿠 고교가부시키가이샤 | 중합성 단량체, 고분자 화합물, 광경화성 수지 조성물, 액정 표시 소자용 시일제, 상하 도통 재료, 및 액정 표시 소자 |
JP6216260B2 (ja) * | 2014-02-12 | 2017-10-18 | 積水化学工業株式会社 | 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子 |
JP6454217B2 (ja) * | 2014-05-13 | 2019-01-16 | 積水化学工業株式会社 | 変性ジアルキルアミノ安息香酸系化合物、変性チオキサントン誘導体、光硬化性樹脂組成物、液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子 |
TWI589688B (zh) * | 2015-03-24 | 2017-07-01 | Lg化學股份有限公司 | 黏合組成物 |
JP6372887B2 (ja) * | 2015-05-14 | 2018-08-15 | 信越化学工業株式会社 | 有機膜材料、有機膜形成方法、パターン形成方法、及び化合物 |
JP6127223B1 (ja) | 2015-06-30 | 2017-05-10 | 三井化学株式会社 | 光硬化性樹脂組成物、表示素子シール剤、液晶シール剤、液晶表示パネル及び液晶表示パネルの製造方法 |
CN108292066B (zh) | 2015-12-01 | 2021-04-06 | 夏普株式会社 | 液晶密封用密封剂以及液晶显示装置 |
JP6197020B2 (ja) * | 2015-12-17 | 2017-09-13 | 三井化学株式会社 | 光硬化性樹脂組成物、表示素子シール剤、液晶シール剤及び液晶表示パネルとその製造方法 |
JP6554040B2 (ja) * | 2016-01-25 | 2019-07-31 | 三井化学株式会社 | 液晶表示パネル及び液晶表示パネルの製造方法 |
WO2018092508A1 (fr) * | 2016-11-21 | 2018-05-24 | 協立化学産業株式会社 | Composition de résine pour dispositif électronique |
CN108333298B (zh) * | 2017-01-19 | 2021-03-09 | 上海新昇半导体科技有限公司 | 晶片放置装置和晶片定向仪 |
JP6190553B2 (ja) * | 2017-02-20 | 2017-08-30 | 協立化学産業株式会社 | 光重合開始剤 |
CN109503735A (zh) * | 2017-09-15 | 2019-03-22 | 常州强力先端电子材料有限公司 | 光引发剂、包含其的光固化组合物及其应用 |
JP6986756B2 (ja) * | 2018-11-05 | 2021-12-22 | 協立化学産業株式会社 | 液晶表示素子用シール剤組成物 |
WO2022196764A1 (fr) * | 2021-03-19 | 2022-09-22 | 三井化学株式会社 | Agent d'étanchéité à cristaux liquides, procédé de production d'un écran d'affichage à cristaux liquides et écran d'affichage à cristaux liquides |
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JPS5322536A (en) * | 1976-08-13 | 1978-03-02 | Tokyo Printing Ink Mfg Co Ltd | Ultraviolet hardenable coating composition |
JPS58170567A (ja) * | 1982-03-30 | 1983-10-07 | Nippon Paint Co Ltd | 複合塗膜形成方法 |
US4602097A (en) * | 1984-06-11 | 1986-07-22 | Ulano Corporation | Water soluble photoinitiator benzophenone and thioxanthenone ethoxy-ether derivatives |
DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
DE3844444A1 (de) * | 1988-12-31 | 1990-08-09 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung |
ES2074686T3 (es) * | 1990-04-10 | 1995-09-16 | Ciba Geigy Ag | Mezclas de materiales con resina epoxi que contienen complejos areno de hierro y determinadas aminas. |
JPH05264980A (ja) * | 1991-12-26 | 1993-10-15 | Dainippon Ink & Chem Inc | 液晶デバイス及びその製造方法 |
JPH06263813A (ja) * | 1993-03-12 | 1994-09-20 | Toyo Ink Mfg Co Ltd | 光開始剤組成物および光硬化性被覆組成物 |
WO1996004346A1 (fr) * | 1994-07-29 | 1996-02-15 | Minnesota Mining And Manufacturing Company | Sirop acrylique durcissable en materiau reticule viscoelastomere |
JPH08151404A (ja) * | 1994-11-28 | 1996-06-11 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化物 |
GB9613114D0 (en) * | 1996-06-21 | 1996-08-28 | Lambson Fine Chemicals Limited | Photoinitiators |
JP3892100B2 (ja) * | 1997-04-10 | 2007-03-14 | サカタインクス株式会社 | 紫外線硬化性樹脂、それを用いた紫外線硬化性樹脂組成物及び紫外線硬化性印刷インキ組成物 |
US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
JP4010547B2 (ja) | 2003-01-27 | 2007-11-21 | 日本化薬株式会社 | 自己重合型光重合開始剤及びそれを用いた感光性樹脂組成物 |
JP2004277483A (ja) * | 2003-03-13 | 2004-10-07 | Konica Minolta Holdings Inc | インク、画像形成方法、印刷物及び記録装置 |
CN1271069C (zh) * | 2003-12-12 | 2006-08-23 | 上海交通大学 | 含双环氧基团的硫杂蒽酮光引发剂及其制备方法 |
JP4241452B2 (ja) | 2004-03-18 | 2009-03-18 | 三井化学株式会社 | 光硬化性樹脂組成物およびこれを含む液晶シール剤組成物 |
CN1282664C (zh) * | 2004-07-01 | 2006-11-01 | 上海交通大学 | 树枝状高分子型硫杂蒽酮光引发剂及其制备方法 |
WO2010063612A1 (fr) | 2008-12-01 | 2010-06-10 | Basf Se | Photo-initiateurs silsesquioxanes |
JP5478061B2 (ja) * | 2008-12-19 | 2014-04-23 | 協立化学産業株式会社 | ヒドラジド系混晶 |
EP2246330A1 (fr) * | 2009-04-30 | 2010-11-03 | Siegwerk Benelux SA | Nouveaux photo-initiateurs |
JP4961458B2 (ja) * | 2009-06-10 | 2012-06-27 | 協立化学産業株式会社 | ヒドラジド化合物及びその製造方法、並びにそれを用いた硬化剤、樹脂組成物及び硬化体 |
CN101665575A (zh) * | 2009-10-15 | 2010-03-10 | 上海交通大学 | 两亲性超支化硫杂蒽酮光引发剂及其制备方法 |
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JP5886758B2 (ja) | 2016-03-16 |
KR20160086966A (ko) | 2016-07-20 |
CN103249713A (zh) | 2013-08-14 |
JP2016121347A (ja) | 2016-07-07 |
JPWO2012077720A1 (ja) | 2014-05-22 |
JP6125603B2 (ja) | 2017-05-10 |
WO2012077720A1 (fr) | 2012-06-14 |
KR101672580B1 (ko) | 2016-11-03 |
KR20130125788A (ko) | 2013-11-19 |
TW201237048A (en) | 2012-09-16 |
TWI561539B (fr) | 2016-12-11 |
KR101845646B1 (ko) | 2018-04-04 |
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