CN103249674B - 合成非晶态二氧化硅粉末及其制造方法 - Google Patents

合成非晶态二氧化硅粉末及其制造方法 Download PDF

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Publication number
CN103249674B
CN103249674B CN201280004018.8A CN201280004018A CN103249674B CN 103249674 B CN103249674 B CN 103249674B CN 201280004018 A CN201280004018 A CN 201280004018A CN 103249674 B CN103249674 B CN 103249674B
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CN
China
Prior art keywords
powder
silica
sio
silica powder
less
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Expired - Fee Related
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CN201280004018.8A
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English (en)
Chinese (zh)
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CN103249674A (zh
Inventor
植田稔晃
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Publication of CN103249674A publication Critical patent/CN103249674A/zh
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Glass Compositions (AREA)
CN201280004018.8A 2011-03-23 2012-02-29 合成非晶态二氧化硅粉末及其制造方法 Expired - Fee Related CN103249674B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011064451 2011-03-23
JP2011-064456 2011-03-23
JP2011064456 2011-03-23
JP2011-064451 2011-03-23
PCT/JP2012/055059 WO2012128005A1 (ja) 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法

Publications (2)

Publication Number Publication Date
CN103249674A CN103249674A (zh) 2013-08-14
CN103249674B true CN103249674B (zh) 2015-03-11

Family

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Family Applications (1)

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CN201280004018.8A Expired - Fee Related CN103249674B (zh) 2011-03-23 2012-02-29 合成非晶态二氧化硅粉末及其制造方法

Country Status (7)

Country Link
US (1) US9446959B2 (enExample)
EP (1) EP2690066A4 (enExample)
JP (1) JP5825145B2 (enExample)
KR (1) KR20140002673A (enExample)
CN (1) CN103249674B (enExample)
TW (1) TWI525041B (enExample)
WO (1) WO2012128005A1 (enExample)

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JP6466635B2 (ja) * 2013-06-14 2019-02-06 信越化学工業株式会社 非水電解質二次電池用負極の製造方法及び非水電解質二次電池の製造方法
US9637405B2 (en) 2013-06-30 2017-05-02 Sumco Corporation Evaluation method of suitable silica powder in manufacturing vitreous silica crucible for pulling of silicon single crystal
KR20160113573A (ko) * 2014-01-29 2016-09-30 미쓰비시 마테리알 가부시키가이샤 합성 비정질 실리카 분말 및 그 제조 방법
CN104227006A (zh) * 2014-08-26 2014-12-24 苏州智研新材料科技有限公司 一种微细球形不锈钢粉体的制备方法
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
KR20180095880A (ko) * 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
CN110023239A (zh) * 2016-11-16 2019-07-16 三菱化学株式会社 定量供给用二氧化硅粉体、以及使用该粉体的生物物质的纯化试剂盒及其制造方法
CN107052225A (zh) * 2016-12-30 2017-08-18 天津泽希矿产加工有限公司 特种砂‑球形熔融硅砂及其制备方法和应用
JP2019182691A (ja) * 2018-04-04 2019-10-24 東ソ−・エスジ−エム株式会社 石英ガラスインゴット及び石英ガラス製品の製造方法
US20210403374A1 (en) * 2018-12-14 2021-12-30 Tosoh Quartz Corporation Method of manufacturing opaque quartz glass
CN111943214B (zh) * 2020-08-18 2022-08-30 苏州英纳特纳米科技有限公司 非晶态纳米球形二氧化硅的制备方法
WO2022181634A1 (ja) * 2021-02-25 2022-09-01 東レ株式会社 樹脂粉粒体を用いた３次元造形物の製造方法、３次元造形物、並びに樹脂粉粒体
JP7841400B2 (ja) * 2022-09-20 2026-04-07 株式会社Sumco 石英ガラスルツボの製造方法

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JP2005162593A (ja) * 2003-12-04 2005-06-23 Kiyoaki Shiraishi 加熱処理する事によって「角（かど）」無くしたシリカ
CN1642855A (zh) * 2002-03-18 2005-07-20 瓦克化学有限公司 高纯度硅石粉末、其制造方法及装置

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JPS62176929A (ja) 1986-01-30 1987-08-03 Olympus Optical Co Ltd 成形型の離型リング
JPH03275527A (ja) 1990-03-24 1991-12-06 Mitsubishi Kasei Corp 多孔質シリカガラス粉末
JPH0475848A (ja) 1990-07-17 1992-03-10 Toyoda Mach Works Ltd 適応制御装置
FR2693451B1 (fr) * 1992-07-07 1994-08-19 Alcatel Nv Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique.
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JPH09100105A (ja) * 1995-10-02 1997-04-15 Mitsubishi Chem Corp 超微粒金属酸化物粉の製造方法
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JP5013573B2 (ja) * 2005-09-30 2012-08-29 信越石英株式会社 高耐熱性石英ガラス粉の製造方法、高耐熱性石英ガラス粉及びガラス体
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JP2004225135A (ja) * 2003-01-24 2004-08-12 High Frequency Heattreat Co Ltd 熱プラズマによる粉末の合成／精製または球状化方法とその装置
JP2005162593A (ja) * 2003-12-04 2005-06-23 Kiyoaki Shiraishi 加熱処理する事によって「角（かど）」無くしたシリカ

Also Published As

Publication number Publication date
TW201242897A (en) 2012-11-01
CN103249674A (zh) 2013-08-14
JP2012211070A (ja) 2012-11-01
EP2690066A4 (en) 2014-08-20
KR20140002673A (ko) 2014-01-08
EP2690066A1 (en) 2014-01-29
TWI525041B (zh) 2016-03-11
JP5825145B2 (ja) 2015-12-02
WO2012128005A1 (ja) 2012-09-27
US20140065423A1 (en) 2014-03-06
US9446959B2 (en) 2016-09-20

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Granted publication date: 20150311