JP5825145B2 - 合成非晶質シリカ粉末及びその製造方法 - Google Patents
合成非晶質シリカ粉末及びその製造方法 Download PDFInfo
- Publication number
- JP5825145B2 JP5825145B2 JP2012043206A JP2012043206A JP5825145B2 JP 5825145 B2 JP5825145 B2 JP 5825145B2 JP 2012043206 A JP2012043206 A JP 2012043206A JP 2012043206 A JP2012043206 A JP 2012043206A JP 5825145 B2 JP5825145 B2 JP 5825145B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- silica powder
- synthetic amorphous
- siliceous gel
- average particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 854
- 239000000843 powder Substances 0.000 title claims description 736
- 229910002029 synthetic silica gel Inorganic materials 0.000 title claims description 126
- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 239000000377 silicon dioxide Substances 0.000 claims description 286
- 239000002245 particle Substances 0.000 claims description 231
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 124
- 238000001035 drying Methods 0.000 claims description 95
- 229910021485 fumed silica Inorganic materials 0.000 claims description 71
- 238000011282 treatment Methods 0.000 claims description 69
- 229910052786 argon Inorganic materials 0.000 claims description 62
- 238000005563 spheronization Methods 0.000 claims description 62
- 235000012239 silicon dioxide Nutrition 0.000 claims description 43
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 41
- 239000005049 silicon tetrachloride Substances 0.000 claims description 41
- 238000010304 firing Methods 0.000 claims description 39
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 37
- 229910052799 carbon Inorganic materials 0.000 claims description 37
- 239000000460 chlorine Substances 0.000 claims description 36
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 34
- 229910052801 chlorine Inorganic materials 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 30
- 238000005406 washing Methods 0.000 claims description 28
- 150000003377 silicon compounds Chemical class 0.000 claims description 17
- 238000010298 pulverizing process Methods 0.000 claims description 16
- 238000005469 granulation Methods 0.000 claims description 12
- 230000003179 granulation Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 238000009835 boiling Methods 0.000 claims description 6
- 239000010419 fine particle Substances 0.000 claims description 4
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 2
- 239000000499 gel Substances 0.000 description 106
- 238000003756 stirring Methods 0.000 description 101
- 229910021642 ultra pure water Inorganic materials 0.000 description 99
- 239000012498 ultrapure water Substances 0.000 description 99
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 96
- 239000007789 gas Substances 0.000 description 72
- 238000004506 ultrasonic cleaning Methods 0.000 description 54
- 239000002994 raw material Substances 0.000 description 50
- 229910052757 nitrogen Inorganic materials 0.000 description 48
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 37
- 230000000052 comparative effect Effects 0.000 description 37
- 239000010453 quartz Substances 0.000 description 33
- 238000004140 cleaning Methods 0.000 description 32
- 239000012299 nitrogen atmosphere Substances 0.000 description 25
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 21
- 239000001301 oxygen Substances 0.000 description 21
- 229910052760 oxygen Inorganic materials 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 20
- 239000012298 atmosphere Substances 0.000 description 20
- 239000000203 mixture Substances 0.000 description 20
- 238000011084 recovery Methods 0.000 description 18
- 230000000694 effects Effects 0.000 description 13
- 239000007788 liquid Substances 0.000 description 11
- 239000012535 impurity Substances 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 7
- 239000012300 argon atmosphere Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910002026 crystalline silica Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- -1 silicate ester Chemical class 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 238000001454 recorded image Methods 0.000 description 2
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Glass Compositions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012043206A JP5825145B2 (ja) | 2011-03-23 | 2012-02-29 | 合成非晶質シリカ粉末及びその製造方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011064451 | 2011-03-23 | ||
| JP2011064456 | 2011-03-23 | ||
| JP2011064456 | 2011-03-23 | ||
| JP2011064451 | 2011-03-23 | ||
| JP2012043206A JP5825145B2 (ja) | 2011-03-23 | 2012-02-29 | 合成非晶質シリカ粉末及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012211070A JP2012211070A (ja) | 2012-11-01 |
| JP2012211070A5 JP2012211070A5 (enExample) | 2014-10-30 |
| JP5825145B2 true JP5825145B2 (ja) | 2015-12-02 |
Family
ID=46879163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012043206A Expired - Fee Related JP5825145B2 (ja) | 2011-03-23 | 2012-02-29 | 合成非晶質シリカ粉末及びその製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9446959B2 (enExample) |
| EP (1) | EP2690066A4 (enExample) |
| JP (1) | JP5825145B2 (enExample) |
| KR (1) | KR20140002673A (enExample) |
| CN (1) | CN103249674B (enExample) |
| TW (1) | TWI525041B (enExample) |
| WO (1) | WO2012128005A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6466635B2 (ja) * | 2013-06-14 | 2019-02-06 | 信越化学工業株式会社 | 非水電解質二次電池用負極の製造方法及び非水電解質二次電池の製造方法 |
| EP3018468B1 (en) * | 2013-06-30 | 2017-12-20 | SUMCO Corporation | Method for evaluating suitability of silica powder for manufacturing of silica-glass crucible for pulling silicon single crystal |
| KR20160113573A (ko) * | 2014-01-29 | 2016-09-30 | 미쓰비시 마테리알 가부시키가이샤 | 합성 비정질 실리카 분말 및 그 제조 방법 |
| CN104227006A (zh) * | 2014-08-26 | 2014-12-24 | 苏州智研新材料科技有限公司 | 一种微细球形不锈钢粉体的制备方法 |
| KR20180095879A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 상승된 온도에서 탄소-도핑된 실리카 과립을 처리하여 실리카 과립의 알칼리 토금속 함량의 감소 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| TWI812586B (zh) | 2015-12-18 | 2023-08-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點 |
| CN109153593A (zh) * | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698890A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 利用在熔融烘箱中的露点监测制备石英玻璃体 |
| WO2017103166A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem mehrkammerofen |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| JP6881776B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラス体の調製 |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| WO2018092804A1 (ja) * | 2016-11-16 | 2018-05-24 | 日本化成株式会社 | 定量供給用シリカ粉体、並びにこれを用いた生体物質の精製キット及びその製造方法 |
| CN107052225A (zh) * | 2016-12-30 | 2017-08-18 | 天津泽希矿产加工有限公司 | 特种砂‑球形熔融硅砂及其制备方法和应用 |
| JP2019182691A (ja) * | 2018-04-04 | 2019-10-24 | 東ソ−・エスジ−エム株式会社 | 石英ガラスインゴット及び石英ガラス製品の製造方法 |
| DE112018008204T5 (de) * | 2018-12-14 | 2021-09-09 | Tosoh Quartz Corporation | Verfahren zum Herstellen eines opaken Quarzglases |
| CN111943214B (zh) * | 2020-08-18 | 2022-08-30 | 苏州英纳特纳米科技有限公司 | 非晶态纳米球形二氧化硅的制备方法 |
| JP2024043650A (ja) * | 2022-09-20 | 2024-04-02 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法及び石英ガラスルツボ用石英粉 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3525495C1 (de) * | 1985-07-17 | 1987-01-02 | Heraeus Schott Quarzschmelze | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
| JPS62176928A (ja) | 1986-01-29 | 1987-08-03 | Mitsubishi Metal Corp | 石英ガラス粉末の製造方法 |
| JPS62176929A (ja) | 1986-01-30 | 1987-08-03 | Olympus Optical Co Ltd | 成形型の離型リング |
| JPH03275527A (ja) | 1990-03-24 | 1991-12-06 | Mitsubishi Kasei Corp | 多孔質シリカガラス粉末 |
| JPH0475848A (ja) | 1990-07-17 | 1992-03-10 | Toyoda Mach Works Ltd | 適応制御装置 |
| FR2693451B1 (fr) * | 1992-07-07 | 1994-08-19 | Alcatel Nv | Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique. |
| JP3350139B2 (ja) * | 1993-03-31 | 2002-11-25 | 三菱レイヨン株式会社 | 球状シリカ粒子の製造方法 |
| JPH09100105A (ja) * | 1995-10-02 | 1997-04-15 | Mitsubishi Chem Corp | 超微粒金属酸化物粉の製造方法 |
| JP4154563B2 (ja) * | 2001-07-23 | 2008-09-24 | 信越化学工業株式会社 | シリカ含有複合酸化物球状微粒子及びその製造方法 |
| DE10211958A1 (de) | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| JP3639279B2 (ja) * | 2003-01-24 | 2005-04-20 | 高周波熱錬株式会社 | 熱プラズマによる粉末の合成／精製または球状化方法とその装置 |
| JP2005162593A (ja) * | 2003-12-04 | 2005-06-23 | Kiyoaki Shiraishi | 加熱処理する事によって「角（かど）」無くしたシリカ |
| JP5013573B2 (ja) * | 2005-09-30 | 2012-08-29 | 信越石英株式会社 | 高耐熱性石英ガラス粉の製造方法、高耐熱性石英ガラス粉及びガラス体 |
| EP2014622B1 (de) | 2007-07-06 | 2017-01-18 | Evonik Degussa GmbH | Verfahren zur Herstellung eines Kieselglasgranulats |
| JP2011157260A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
| JP5648640B2 (ja) * | 2010-01-07 | 2015-01-07 | 三菱マテリアル株式会社 | 合成非晶質シリカ粉末 |
| JP2011157261A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
-
2012
- 2012-02-29 JP JP2012043206A patent/JP5825145B2/ja not_active Expired - Fee Related
- 2012-02-29 EP EP12761100.2A patent/EP2690066A4/en not_active Withdrawn
- 2012-02-29 CN CN201280004018.8A patent/CN103249674B/zh not_active Expired - Fee Related
- 2012-02-29 US US14/004,551 patent/US9446959B2/en active Active
- 2012-02-29 KR KR1020137015585A patent/KR20140002673A/ko not_active Withdrawn
- 2012-02-29 WO PCT/JP2012/055059 patent/WO2012128005A1/ja not_active Ceased
- 2012-03-19 TW TW101109323A patent/TWI525041B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI525041B (zh) | 2016-03-11 |
| KR20140002673A (ko) | 2014-01-08 |
| TW201242897A (en) | 2012-11-01 |
| JP2012211070A (ja) | 2012-11-01 |
| EP2690066A4 (en) | 2014-08-20 |
| CN103249674A (zh) | 2013-08-14 |
| US9446959B2 (en) | 2016-09-20 |
| EP2690066A1 (en) | 2014-01-29 |
| CN103249674B (zh) | 2015-03-11 |
| US20140065423A1 (en) | 2014-03-06 |
| WO2012128005A1 (ja) | 2012-09-27 |
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