CN102792470B - 氮化合物半导体发光元件及其制造方法 - Google Patents
氮化合物半导体发光元件及其制造方法 Download PDFInfo
- Publication number
- CN102792470B CN102792470B CN201180013599.7A CN201180013599A CN102792470B CN 102792470 B CN102792470 B CN 102792470B CN 201180013599 A CN201180013599 A CN 201180013599A CN 102792470 B CN102792470 B CN 102792470B
- Authority
- CN
- China
- Prior art keywords
- layer
- type
- compound semiconductor
- nitrogen compound
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/816—Bodies having carrier transport control structures, e.g. highly-doped semiconductor layers or current-blocking structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
- H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
Landscapes
- Led Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-090003 | 2010-04-09 | ||
| JP2010090003A JP5549338B2 (ja) | 2010-04-09 | 2010-04-09 | 紫外光放射用窒素化合物半導体ledおよびその製造方法 |
| PCT/JP2011/056388 WO2011125449A1 (ja) | 2010-04-09 | 2011-03-17 | 窒素化合物半導体発光素子およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102792470A CN102792470A (zh) | 2012-11-21 |
| CN102792470B true CN102792470B (zh) | 2015-07-29 |
Family
ID=44762409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180013599.7A Expired - Fee Related CN102792470B (zh) | 2010-04-09 | 2011-03-17 | 氮化合物半导体发光元件及其制造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20130037820A1 (enExample) |
| EP (1) | EP2568512A4 (enExample) |
| JP (1) | JP5549338B2 (enExample) |
| KR (1) | KR101399250B1 (enExample) |
| CN (1) | CN102792470B (enExample) |
| WO (1) | WO2011125449A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5315513B2 (ja) | 2011-07-12 | 2013-10-16 | 丸文株式会社 | 発光素子及びその製造方法 |
| WO2013134432A1 (en) * | 2012-03-06 | 2013-09-12 | Soraa, Inc. | Light emitting diodes with low refractive index material layers to reduce light guiding effects |
| WO2015008776A1 (ja) | 2013-07-17 | 2015-01-22 | 丸文株式会社 | 半導体発光素子及び製造方法 |
| JP5861947B2 (ja) * | 2014-02-05 | 2016-02-16 | ウシオ電機株式会社 | 半導体発光素子及びその製造方法 |
| KR101648079B1 (ko) * | 2014-03-06 | 2016-08-12 | 마루분 가부시키가이샤 | 심자외 led 및 그 제조 방법 |
| KR20190085170A (ko) * | 2014-06-13 | 2019-07-17 | 우시오덴키 가부시키가이샤 | 질화물 반도체 발광 소자 |
| JP2016039326A (ja) * | 2014-08-08 | 2016-03-22 | ウシオ電機株式会社 | 窒化物半導体発光素子 |
| TWI577046B (zh) * | 2014-12-23 | 2017-04-01 | 錼創科技股份有限公司 | 半導體發光元件及其製作方法 |
| KR101848034B1 (ko) | 2015-01-16 | 2018-04-11 | 마루분 가부시키가이샤 | 심자외 led 및 그 제조 방법 |
| JP5953447B1 (ja) * | 2015-02-05 | 2016-07-20 | Dowaエレクトロニクス株式会社 | Iii族窒化物半導体発光素子およびその製造方法 |
| JP2017050439A (ja) * | 2015-09-03 | 2017-03-09 | 豊田合成株式会社 | 紫外発光素子およびその製造方法 |
| KR102056414B1 (ko) | 2015-09-03 | 2020-01-22 | 마루분 가부시키가이샤 | 심자외 led 및 그 제조 방법 |
| CN108140695B (zh) | 2015-09-17 | 2021-02-09 | 晶体公司 | 包含二维空穴气体的紫外发光器件 |
| CN107534072B (zh) | 2016-03-30 | 2019-04-19 | 丸文株式会社 | 深紫外led及其制造方法 |
| AT519500B1 (de) * | 2017-01-03 | 2019-03-15 | Univ Linz | Lichtemittierendes Halbleiterelement |
| JP6438542B1 (ja) * | 2017-07-27 | 2018-12-12 | 日機装株式会社 | 半導体発光素子 |
| JP7316610B6 (ja) | 2018-01-26 | 2024-02-19 | 丸文株式会社 | 深紫外led及びその製造方法 |
| JP2020021798A (ja) * | 2018-07-31 | 2020-02-06 | 日機装株式会社 | 窒化物半導体発光素子及びその製造方法 |
| JP7140978B2 (ja) * | 2019-05-27 | 2022-09-22 | 日亜化学工業株式会社 | 窒化物半導体発光素子の製造方法 |
| JP2023184298A (ja) * | 2022-06-17 | 2023-12-28 | スタンレー電気株式会社 | 垂直共振器型発光素子及びその製造方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030085409A1 (en) * | 2001-11-02 | 2003-05-08 | Yu-Chen Shen | Indium gallium nitride separate confinement heterostructure light emitting devices |
| JP2003309071A (ja) * | 2002-04-15 | 2003-10-31 | Mitsubishi Cable Ind Ltd | GaN系半導体結晶基材 |
| CN100382343C (zh) * | 2003-10-28 | 2008-04-16 | 夏普株式会社 | 半导体器件的制造 |
| CN101515700A (zh) * | 2008-02-22 | 2009-08-26 | 住友电气工业株式会社 | Iii族氮化物发光器件及制造iii族氮化物基半导体发光器件的方法 |
| US20090251883A1 (en) * | 2008-03-13 | 2009-10-08 | Sharp Kabushiki Kaisha | Light-emitting device as well as lighting apparatus and display apparatus using the same |
| US20100059734A1 (en) * | 2008-09-09 | 2010-03-11 | Kei Kaneko | Semiconductor light emitting device and wafer |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3439161B2 (ja) * | 1999-08-03 | 2003-08-25 | 三洋電機株式会社 | 窒化物系発光素子 |
| JP3614070B2 (ja) | 2000-01-17 | 2005-01-26 | 日亜化学工業株式会社 | 窒化物半導体発光ダイオード |
| JP2003017741A (ja) * | 2001-03-21 | 2003-01-17 | Furukawa Electric Co Ltd:The | GaN系発光素子 |
| US7005685B2 (en) * | 2002-02-28 | 2006-02-28 | Shiro Sakai | Gallium-nitride-based compound semiconductor device |
| JP2003289156A (ja) * | 2002-03-28 | 2003-10-10 | Stanley Electric Co Ltd | 窒化ガリウム系半導体結晶の成長方法及び化合物半導体発光素子 |
| GB2407700A (en) * | 2003-10-28 | 2005-05-04 | Sharp Kk | MBE growth of nitride semiconductor lasers |
| JP2010258096A (ja) * | 2009-04-22 | 2010-11-11 | Panasonic Electric Works Co Ltd | 窒化物半導体発光素子 |
-
2010
- 2010-04-09 JP JP2010090003A patent/JP5549338B2/ja not_active Expired - Fee Related
-
2011
- 2011-03-17 KR KR1020127021947A patent/KR101399250B1/ko not_active Expired - Fee Related
- 2011-03-17 CN CN201180013599.7A patent/CN102792470B/zh not_active Expired - Fee Related
- 2011-03-17 EP EP11765351.9A patent/EP2568512A4/en not_active Withdrawn
- 2011-03-17 US US13/639,971 patent/US20130037820A1/en not_active Abandoned
- 2011-03-17 WO PCT/JP2011/056388 patent/WO2011125449A1/ja not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030085409A1 (en) * | 2001-11-02 | 2003-05-08 | Yu-Chen Shen | Indium gallium nitride separate confinement heterostructure light emitting devices |
| JP2003309071A (ja) * | 2002-04-15 | 2003-10-31 | Mitsubishi Cable Ind Ltd | GaN系半導体結晶基材 |
| CN100382343C (zh) * | 2003-10-28 | 2008-04-16 | 夏普株式会社 | 半导体器件的制造 |
| CN101515700A (zh) * | 2008-02-22 | 2009-08-26 | 住友电气工业株式会社 | Iii族氮化物发光器件及制造iii族氮化物基半导体发光器件的方法 |
| US20090251883A1 (en) * | 2008-03-13 | 2009-10-08 | Sharp Kabushiki Kaisha | Light-emitting device as well as lighting apparatus and display apparatus using the same |
| US20100059734A1 (en) * | 2008-09-09 | 2010-03-11 | Kei Kaneko | Semiconductor light emitting device and wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2568512A4 (en) | 2015-12-09 |
| US20130037820A1 (en) | 2013-02-14 |
| KR101399250B1 (ko) | 2014-05-27 |
| WO2011125449A1 (ja) | 2011-10-13 |
| JP2011222728A (ja) | 2011-11-04 |
| CN102792470A (zh) | 2012-11-21 |
| JP5549338B2 (ja) | 2014-07-16 |
| EP2568512A1 (en) | 2013-03-13 |
| KR20120117892A (ko) | 2012-10-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150729 Termination date: 20180317 |