CN102782966B - 在C‑方向错切小于+/‑15度的m‑平面基底上的半极性III‑氮化物光电子装置 - Google Patents
在C‑方向错切小于+/‑15度的m‑平面基底上的半极性III‑氮化物光电子装置 Download PDFInfo
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- CN102782966B CN102782966B CN201180012048.9A CN201180012048A CN102782966B CN 102782966 B CN102782966 B CN 102782966B CN 201180012048 A CN201180012048 A CN 201180012048A CN 102782966 B CN102782966 B CN 102782966B
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- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710215977.9A CN106972346B (zh) | 2010-03-04 | 2011-03-04 | 在C-方向错切小于+/-15度的m-平面基底上的半极性III-氮化物光电子装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31063810P | 2010-03-04 | 2010-03-04 | |
| US61/310,638 | 2010-03-04 | ||
| PCT/US2011/027267 WO2011109754A1 (en) | 2010-03-04 | 2011-03-04 | Semi-polar iii-nitride optoelectronic devices on m-plane substrates with miscuts less than +/-15 degrees in the c-direction |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710215977.9A Division CN106972346B (zh) | 2010-03-04 | 2011-03-04 | 在C-方向错切小于+/-15度的m-平面基底上的半极性III-氮化物光电子装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102782966A CN102782966A (zh) | 2012-11-14 |
| CN102782966B true CN102782966B (zh) | 2017-04-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201180012048.9A Active CN102782966B (zh) | 2010-03-04 | 2011-03-04 | 在C‑方向错切小于+/‑15度的m‑平面基底上的半极性III‑氮化物光电子装置 |
| CN201710215977.9A Active CN106972346B (zh) | 2010-03-04 | 2011-03-04 | 在C-方向错切小于+/-15度的m-平面基底上的半极性III-氮化物光电子装置 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710215977.9A Active CN106972346B (zh) | 2010-03-04 | 2011-03-04 | 在C-方向错切小于+/-15度的m-平面基底上的半极性III-氮化物光电子装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US9077151B2 (enExample) |
| EP (1) | EP2543119B1 (enExample) |
| JP (3) | JP5972798B2 (enExample) |
| KR (1) | KR101854419B1 (enExample) |
| CN (2) | CN102782966B (enExample) |
| TW (1) | TWI560963B (enExample) |
| WO (1) | WO2011109754A1 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US8143148B1 (en) | 2008-07-14 | 2012-03-27 | Soraa, Inc. | Self-aligned multi-dielectric-layer lift off process for laser diode stripes |
| US8767787B1 (en) | 2008-07-14 | 2014-07-01 | Soraa Laser Diode, Inc. | Integrated laser diodes with quality facets on GaN substrates |
| US8805134B1 (en) | 2012-02-17 | 2014-08-12 | Soraa Laser Diode, Inc. | Methods and apparatus for photonic integration in non-polar and semi-polar oriented wave-guided optical devices |
| EP2319086A4 (en) | 2008-08-04 | 2014-08-27 | Soraa Inc | WHITE LIGHTING DEVICES WITH NON POLAR OR SEMI-POLAR GALLIUM-HARDENED MATERIALS AND INFLUENCES |
| US8284810B1 (en) | 2008-08-04 | 2012-10-09 | Soraa, Inc. | Solid state laser device using a selected crystal orientation in non-polar or semi-polar GaN containing materials and methods |
| US8247886B1 (en) | 2009-03-09 | 2012-08-21 | Soraa, Inc. | Polarization direction of optical devices using selected spatial configurations |
| US8422525B1 (en) | 2009-03-28 | 2013-04-16 | Soraa, Inc. | Optical device structure using miscut GaN substrates for laser applications |
| US8634442B1 (en) | 2009-04-13 | 2014-01-21 | Soraa Laser Diode, Inc. | Optical device structure using GaN substrates for laser applications |
| US8837545B2 (en) | 2009-04-13 | 2014-09-16 | Soraa Laser Diode, Inc. | Optical device structure using GaN substrates and growth structures for laser applications |
| DE112010001615T5 (de) | 2009-04-13 | 2012-08-02 | Soraa, Inc. | Stuktur eines optischen Elements unter Verwendung von GaN-Substraten für Laseranwendungen |
| US8791499B1 (en) | 2009-05-27 | 2014-07-29 | Soraa, Inc. | GaN containing optical devices and method with ESD stability |
| US8427590B2 (en) | 2009-05-29 | 2013-04-23 | Soraa, Inc. | Laser based display method and system |
| US10108079B2 (en) | 2009-05-29 | 2018-10-23 | Soraa Laser Diode, Inc. | Laser light source for a vehicle |
| US9800017B1 (en) | 2009-05-29 | 2017-10-24 | Soraa Laser Diode, Inc. | Laser device and method for a vehicle |
| US9829780B2 (en) | 2009-05-29 | 2017-11-28 | Soraa Laser Diode, Inc. | Laser light source for a vehicle |
| US8509275B1 (en) | 2009-05-29 | 2013-08-13 | Soraa, Inc. | Gallium nitride based laser dazzling device and method |
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| CN106711764B (zh) * | 2015-11-16 | 2019-07-05 | 中国科学院苏州纳米技术与纳米仿生研究所 | GaN基激光器和超辐射发光二极管及其制备方法 |
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| US20090145476A1 (en) * | 2002-10-23 | 2009-06-11 | Fetzer Christopher M | Isoelectronic surfactant suppression of threading dislocations in metamorphic epitaxial layers |
| CN101652832A (zh) * | 2007-01-26 | 2010-02-17 | 晶体公司 | 厚的赝晶氮化物外延层 |
| US20090250686A1 (en) * | 2008-04-04 | 2009-10-08 | The Regents Of The University Of California | METHOD FOR FABRICATION OF SEMIPOLAR (Al, In, Ga, B)N BASED LIGHT EMITTING DIODES |
| US20090309105A1 (en) * | 2008-06-04 | 2009-12-17 | Edward Letts | Methods for producing improved crystallinity group III-nitride crystals from initial group III-Nitride seed by ammonothermal Growth |
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| JP6804413B2 (ja) | 2020-12-23 |
| CN106972346A (zh) | 2017-07-21 |
| JP2017216484A (ja) | 2017-12-07 |
| CN106972346B (zh) | 2019-12-10 |
| TW201136080A (en) | 2011-10-16 |
| US20180152004A1 (en) | 2018-05-31 |
| CN102782966A (zh) | 2012-11-14 |
| TWI560963B (en) | 2016-12-01 |
| JP2016129266A (ja) | 2016-07-14 |
| US11552452B2 (en) | 2023-01-10 |
| US9917422B2 (en) | 2018-03-13 |
| JP2013521665A (ja) | 2013-06-10 |
| US20150255959A1 (en) | 2015-09-10 |
| US9077151B2 (en) | 2015-07-07 |
| US20110216795A1 (en) | 2011-09-08 |
| JP5972798B2 (ja) | 2016-08-17 |
| WO2011109754A1 (en) | 2011-09-09 |
| KR101854419B1 (ko) | 2018-05-03 |
| EP2543119A4 (en) | 2015-08-12 |
| EP2543119A1 (en) | 2013-01-09 |
| EP2543119B1 (en) | 2020-02-12 |
| KR20130005281A (ko) | 2013-01-15 |
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