CN102605350B - 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 - Google Patents
阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 Download PDFInfo
- Publication number
- CN102605350B CN102605350B CN201210065267.XA CN201210065267A CN102605350B CN 102605350 B CN102605350 B CN 102605350B CN 201210065267 A CN201210065267 A CN 201210065267A CN 102605350 B CN102605350 B CN 102605350B
- Authority
- CN
- China
- Prior art keywords
- container
- barrier
- film forming
- dielectric members
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/14—Linings or internal coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Plasma Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
Abstract
Description
Claims (34)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007069462A JP5355860B2 (ja) | 2007-03-16 | 2007-03-16 | バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 |
JP2007-069462 | 2007-03-16 | ||
CN2007800521990A CN101636523B (zh) | 2007-03-16 | 2007-11-22 | 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800521990A Division CN101636523B (zh) | 2007-03-16 | 2007-11-22 | 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102605350A CN102605350A (zh) | 2012-07-25 |
CN102605350B true CN102605350B (zh) | 2016-01-20 |
Family
ID=39765594
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210065267.XA Active CN102605350B (zh) | 2007-03-16 | 2007-11-22 | 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 |
CN2007800521990A Active CN101636523B (zh) | 2007-03-16 | 2007-11-22 | 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800521990A Active CN101636523B (zh) | 2007-03-16 | 2007-11-22 | 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器 |
Country Status (8)
Country | Link |
---|---|
US (2) | US8950356B2 (zh) |
EP (1) | EP2147988B1 (zh) |
JP (1) | JP5355860B2 (zh) |
KR (1) | KR101171427B1 (zh) |
CN (2) | CN102605350B (zh) |
AU (1) | AU2007349770B2 (zh) |
RU (1) | RU2434080C2 (zh) |
WO (1) | WO2008114475A1 (zh) |
Families Citing this family (33)
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JP5355860B2 (ja) | 2007-03-16 | 2013-11-27 | 三菱重工食品包装機械株式会社 | バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 |
EP2398933B1 (en) * | 2009-02-18 | 2013-08-07 | Council of Scientific & Industrial Research | Process to deposit diamond like carbon as protective coating on inner surface of a shaped object |
JP5643528B2 (ja) * | 2009-03-30 | 2014-12-17 | 東京エレクトロン株式会社 | 基板処理装置 |
DE102009041132B4 (de) | 2009-09-14 | 2014-08-14 | Schott Ag | Verfahren zur Herstellung einer Gleitschicht und pharmazeutisches Packmittel mit Gleitschicht |
JP5865617B2 (ja) * | 2010-07-15 | 2016-02-17 | 太陽誘電ケミカルテクノロジー株式会社 | プラズマ発生方法及びそのための装置 |
US20120128896A1 (en) * | 2010-11-19 | 2012-05-24 | Tucker Edward B | Stain-resistant container and method |
JP5610345B2 (ja) * | 2010-12-01 | 2014-10-22 | 麒麟麦酒株式会社 | ガスバリア性を有するプラスチック容器の製造方法、小型容器用アダプター及び薄膜成膜装置 |
KR101523454B1 (ko) * | 2010-12-28 | 2015-05-27 | 기린비루 가부시키가이샤 | 가스 배리어성 플라스틱 성형체의 제조 방법 |
DE102011009056B4 (de) * | 2011-01-20 | 2016-04-07 | Schott Ag | Vorrichtung zur Plasmabehandlung von Hohlkörpern |
DE102011009057B4 (de) | 2011-01-20 | 2015-12-10 | Schott Ag | Plasma-Behandlungsvorrichtung zur Herstellung von Beschichtungen und Verfahren zur innenseitigen Plasmabehandlung von Behältern |
WO2012122559A2 (en) * | 2011-03-10 | 2012-09-13 | KaiaTech, Inc. | Method and apparatus for treating containers |
CA2860243C (en) * | 2011-12-27 | 2016-07-12 | Kirin Beer Kabushiki Kaisha | Apparatus for forming thin film |
DE102012201955A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung |
JP5897998B2 (ja) * | 2012-06-14 | 2016-04-06 | 三菱樹脂株式会社 | 成膜装置及び薄膜形成方法 |
JP6352816B2 (ja) * | 2013-01-18 | 2018-07-04 | 日精エー・エス・ビー機械株式会社 | 樹脂容器用コーティング装置および樹脂容器製造システム |
JP6086826B2 (ja) * | 2013-06-20 | 2017-03-01 | 三菱重工食品包装機械株式会社 | バリア膜形成装置 |
JP6226191B2 (ja) * | 2014-02-28 | 2017-11-08 | 三菱重工機械システム株式会社 | バリア膜形成装置、及び内部電極 |
JP6446289B2 (ja) * | 2015-02-26 | 2018-12-26 | 株式会社吉野工業所 | バリア膜形成装置、バリア膜形成方法 |
JP6566686B2 (ja) * | 2015-03-31 | 2019-08-28 | 三菱重工機械システム株式会社 | 容器に成膜する装置 |
TWI551712B (zh) * | 2015-09-02 | 2016-10-01 | 財團法人工業技術研究院 | 容器內部鍍膜裝置及其方法 |
JP2016074984A (ja) * | 2015-11-12 | 2016-05-12 | 三菱樹脂株式会社 | 誘電体部材、成膜装置及び薄膜形成方法 |
JP6927713B2 (ja) * | 2017-02-24 | 2021-09-01 | 三菱重工機械システム株式会社 | バリア膜形成装置 |
JP6949426B2 (ja) * | 2017-09-27 | 2021-10-13 | 株式会社吉野工業所 | バリア膜形成装置及びバリア膜形成方法 |
CN107662385A (zh) * | 2017-10-12 | 2018-02-06 | 丹阳市维尼光学有限公司 | 双层阻隔膜 |
DE102018103949A1 (de) * | 2018-02-21 | 2019-08-22 | Christof-Herbert Diener | Niederdruckplasmakammer, Niederdruckplasmaanlage und Verfahren zur Herstellung einer Niederdruckplasmakammer |
JP7081384B2 (ja) | 2018-08-03 | 2022-06-07 | 富士電機株式会社 | 把持機構 |
JP7159694B2 (ja) * | 2018-08-28 | 2022-10-25 | 日本電産株式会社 | プラズマ処理装置 |
US10748738B1 (en) * | 2019-03-18 | 2020-08-18 | Applied Materials, Inc. | Ion source with tubular cathode |
EP3946767A4 (en) | 2019-04-03 | 2023-01-18 | Kaiatech, Inc. | DEVICE, PROBE ASSEMBLY AND METHOD FOR TREATMENT OF CONTAINERS |
US11872524B2 (en) * | 2020-08-27 | 2024-01-16 | Kioxia Corporation | Exhaust pipe device |
JP2021008669A (ja) * | 2020-09-29 | 2021-01-28 | 三菱ケミカル株式会社 | ガスバリア性膜の成膜装置及び成膜方法とガスバリア性膜付プラスチック容器の製造方法 |
US20240066161A1 (en) * | 2021-08-09 | 2024-02-29 | TellaPure, LLC | Methods and apparatus for generating atmospheric pressure, low temperature plasma |
CN115810862A (zh) * | 2022-01-27 | 2023-03-17 | 宁德时代新能源科技股份有限公司 | 电极组件的隔离膜、制备电极组件的隔离膜的方法和设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US5798139A (en) * | 1994-08-11 | 1998-08-25 | Kirin Beer Kabushiki Kaisha | Apparatus for and method of manufacturing plastic container coated with carbon film |
JP2000230064A (ja) * | 1999-02-10 | 2000-08-22 | Toppan Printing Co Ltd | 成膜装置及び成膜方法 |
JP2005194606A (ja) * | 2004-01-09 | 2005-07-21 | Mitsubishi Heavy Ind Ltd | プラスチック容器内面へのバリヤ膜形成装置および内面バリヤ膜被覆プラスチック容器の製造方法 |
CN1697763A (zh) * | 2001-12-13 | 2005-11-16 | 三菱重工业株式会社 | 对塑料容器内面形成碳膜的装置及内面覆盖碳膜的塑料容器的制造方法 |
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JPH0853116A (ja) | 1994-08-11 | 1996-02-27 | Kirin Brewery Co Ltd | 炭素膜コーティングプラスチック容器 |
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PL339616A1 (en) | 1997-09-30 | 2001-01-02 | Tetra Laval Holdings & Finance | Method of and apparatus for treating internal surface of a plastic bottle in a plasma-assisted process |
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JP3643813B2 (ja) | 2001-12-13 | 2005-04-27 | 三菱重工業株式会社 | プラスチック容器内面への炭素膜形成装置および内面炭素膜被覆プラスチック容器の製造方法 |
JP2003293135A (ja) * | 2002-03-29 | 2003-10-15 | Mitsubishi Heavy Ind Ltd | プラスチック容器内面への膜形成装置および内面膜被覆プラスチック容器の製造方法 |
JP3746725B2 (ja) | 2002-03-29 | 2006-02-15 | 三菱重工業株式会社 | 被覆容器の製造方法 |
JP4340764B2 (ja) | 2002-04-26 | 2009-10-07 | 北海製罐株式会社 | 内面被覆プラスチック容器の製造方法 |
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JP4131730B2 (ja) | 2005-04-15 | 2008-08-13 | 三菱重工業株式会社 | 被覆容器の製造装置 |
JP5355860B2 (ja) | 2007-03-16 | 2013-11-27 | 三菱重工食品包装機械株式会社 | バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 |
-
2007
- 2007-03-16 JP JP2007069462A patent/JP5355860B2/ja active Active
- 2007-11-22 US US12/524,784 patent/US8950356B2/en active Active
- 2007-11-22 EP EP07832348.2A patent/EP2147988B1/en active Active
- 2007-11-22 CN CN201210065267.XA patent/CN102605350B/zh active Active
- 2007-11-22 RU RU2009138244A patent/RU2434080C2/ru active
- 2007-11-22 CN CN2007800521990A patent/CN101636523B/zh active Active
- 2007-11-22 KR KR20097019253A patent/KR101171427B1/ko active IP Right Grant
- 2007-11-22 AU AU2007349770A patent/AU2007349770B2/en active Active
- 2007-11-22 WO PCT/JP2007/072619 patent/WO2008114475A1/ja active Application Filing
-
2014
- 2014-12-22 US US14/579,349 patent/US20150108031A1/en not_active Abandoned
Patent Citations (4)
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US5798139A (en) * | 1994-08-11 | 1998-08-25 | Kirin Beer Kabushiki Kaisha | Apparatus for and method of manufacturing plastic container coated with carbon film |
JP2000230064A (ja) * | 1999-02-10 | 2000-08-22 | Toppan Printing Co Ltd | 成膜装置及び成膜方法 |
CN1697763A (zh) * | 2001-12-13 | 2005-11-16 | 三菱重工业株式会社 | 对塑料容器内面形成碳膜的装置及内面覆盖碳膜的塑料容器的制造方法 |
JP2005194606A (ja) * | 2004-01-09 | 2005-07-21 | Mitsubishi Heavy Ind Ltd | プラスチック容器内面へのバリヤ膜形成装置および内面バリヤ膜被覆プラスチック容器の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
RU2434080C2 (ru) | 2011-11-20 |
CN101636523B (zh) | 2012-11-14 |
CN101636523A (zh) | 2010-01-27 |
EP2147988A4 (en) | 2015-04-29 |
RU2009138244A (ru) | 2011-04-27 |
EP2147988B1 (en) | 2019-03-27 |
US8950356B2 (en) | 2015-02-10 |
US20100096393A1 (en) | 2010-04-22 |
AU2007349770B2 (en) | 2012-02-09 |
KR20090116795A (ko) | 2009-11-11 |
JP5355860B2 (ja) | 2013-11-27 |
WO2008114475A1 (ja) | 2008-09-25 |
US20150108031A1 (en) | 2015-04-23 |
KR101171427B1 (ko) | 2012-08-06 |
AU2007349770A1 (en) | 2008-09-25 |
JP2008231468A (ja) | 2008-10-02 |
EP2147988A1 (en) | 2010-01-27 |
CN102605350A (zh) | 2012-07-25 |
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