CN102333844B - 共掺杂锆和铪的次氮基硅酸盐 - Google Patents

共掺杂锆和铪的次氮基硅酸盐 Download PDF

Info

Publication number
CN102333844B
CN102333844B CN2010800093824A CN201080009382A CN102333844B CN 102333844 B CN102333844 B CN 102333844B CN 2010800093824 A CN2010800093824 A CN 2010800093824A CN 201080009382 A CN201080009382 A CN 201080009382A CN 102333844 B CN102333844 B CN 102333844B
Authority
CN
China
Prior art keywords
compound
phosphor
zirconium
europium
hafnium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010800093824A
Other languages
English (en)
Other versions
CN102333844A (zh
Inventor
H·温克勒
R·派特里
T·沃斯格罗内
T·朱斯特尔
D·乌利希
D·杜兹扎克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
Original Assignee
Merck Patent GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH filed Critical Merck Patent GmbH
Publication of CN102333844A publication Critical patent/CN102333844A/zh
Application granted granted Critical
Publication of CN102333844B publication Critical patent/CN102333844B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0615Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
    • C01B21/062Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with chromium, molybdenum or tungsten
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/62605Treating the starting powders individually or as mixtures
    • C04B35/62645Thermal treatment of powders or mixtures thereof other than sintering
    • C04B35/62675Thermal treatment of powders or mixtures thereof other than sintering characterised by the treatment temperature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/59Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/77347Silicon Nitrides or Silicon Oxynitrides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7783Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing two or more rare earth metals one of which being europium
    • C09K11/77927Silicon Nitrides or Silicon Oxynitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/50Solid solutions
    • C01P2002/52Solid solutions containing elements as dopants
    • C01P2002/54Solid solutions containing elements as dopants one element only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/84Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by UV- or VIS- data
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3201Alkali metal oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3201Alkali metal oxides or oxide-forming salts thereof
    • C04B2235/3203Lithium oxide or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3208Calcium oxide or oxide-forming salts thereof, e.g. lime
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3213Strontium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3215Barium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3224Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3224Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
    • C04B2235/3229Cerium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3244Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/38Non-oxide ceramic constituents or additives
    • C04B2235/3852Nitrides, e.g. oxynitrides, carbonitrides, oxycarbonitrides, lithium nitride, magnesium nitride
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/38Non-oxide ceramic constituents or additives
    • C04B2235/3852Nitrides, e.g. oxynitrides, carbonitrides, oxycarbonitrides, lithium nitride, magnesium nitride
    • C04B2235/3873Silicon nitrides, e.g. silicon carbonitride, silicon oxynitride
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/44Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
    • C04B2235/444Halide containing anions, e.g. bromide, iodate, chlorite
    • C04B2235/445Fluoride containing anions, e.g. fluosilicate
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658Atmosphere during thermal treatment
    • C04B2235/6582Hydrogen containing atmosphere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/32257Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic the layer connector connecting to a bonding area disposed in a recess of the surface of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909Post-treatment of the connector or wire bonding area
    • H01L2224/8592Applying permanent coating, e.g. protective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Luminescent Compositions (AREA)

Abstract

本发明涉及式(I)Ma2-y(Ca,Sr,Ba)1-x-ySi5-zMezN8:EuxCey(I)化合物,其中Ma=Li、Na和/或K,Me=Hf4+和/或Zr4+,x=0.0015至0.20且y=0至0.15,z<4,和制备这些化合物的方法,及作为无机发光材料和转换无机发光材料在转换LED的蓝光或近UV发射中的用途。

Description

共掺杂锆和铪的次氮基硅酸盐
本发明涉及由共掺杂有Hf4+、Zr4+、Li+、Na+和/或K+,用Eu和/或Ce活化的2-5-8碱土金属硅氮化物组成的化合物,其制备方法,及其作为无机发光材料(phosphors)和LED转换无机发光材料在暖白LED或所谓色彩需求应用中的用途。
色彩需求概念意指借助使用一种或多种无机发光材料的pcLED(=无机发光材料转换LED)实现具有某一色点的光。该概念例如用于产生某些公司设计,例如照明公司标志、商标等。
无机发光材料转换LED代表一种重要的光技术,其革新潜力是导致越来越多地替换传统人工光源(白炽灯、放电管等)。
而半导体技术对于LED而言基本用尽,所用无机发光材料提供改善空间。LED生产商重复地强调红色发光材料对(电力)LED的必要性。对于有效且有效用于LED中的红色发光材料所必须的性能尤其是:
波长范围为610-620nm(具有高CRI或高CCT的一般照明),或630nm和650nm(具有大颜色空间的LC显示器的背光照明)的发射带。
高荧光猝灭温度(TQ50>>150℃)。
对酸和湿气的高化学稳定性。
高光输出,这是由激发LED的发射带的光谱区中的高吸收、发射光从无机发光材料到环境中的高萃取和高转换效率(QE)导致的。
存在大量满足LED生产商所要求的一些,但不是所有上述条件的无机发光材料。然而,只有满足所有条件才会极大地促进LED替代传统电光源,导致世界范围内照明所需的电能降低。
发红色荧光且原则上可与蓝色(或UV)LED组合的市售无机发光材料特别是:
原硅酸盐:
该材料具有高亮度和效率,但最长发射波长为约610nm。
硫化物、硫代没食子酸盐和硫硒化物:
这些无机发光材料能够在上述波长范围发射。含硫材料的最大缺点是它们对大气氧和湿气不稳定。都非常容易通过扩散通过硅酮粘合剂材料(silicone binder material)进入LED而到达无机发光材料中并与其反应,在此期间其降解。另外,仅低掺杂度通常是可能的,这导致在高激发密度下的饱和现象。
氮化物和氧氮化物:
共价氮化物原则上可用作无机发光材料的基体,因为它们具有大带隙,活化剂离子的HOMO和LUMO位于该带隙中。由于高共价性,氮化物具有大电子云重排效应,因此,稀土活化剂如Eu2+、Ce3+的受激4f5d构型的最低晶体场组分的能降低。这导致氮化物无机发光材料的长波长激发和发射(参见Krevel等人,J.Alloys Compd.1998,268,272)。
硅氮化物特别地显示与氧代硅化合物的密切关系,因为两种体系都由SiX4四面体(X=O、N)构成。然而,由于较高的缩合度,硅氮化物具有比氧代硅化合物更高的化学稳定性(参见Xie等人,Sci.Tech.Adv.Mater.2007,8,588)。
特别地,硅氮化物适合掺杂活化剂离子如Eu2+和Ce3+,其中至少一个激发态的电子不被晶体场(5s和5d)的作用屏蔽。该活化剂具有光谱性质,其高度取决于环境(对称、共价性、配位、场强、键长、格座大小)。与氧(O2-)的较低形式电荷相反,氮(N3-)的高形式电荷导致上述活化剂在硅氮化物中的5d轨道经历更大的晶场分裂,5d轨道的能量中心移至比类似Si-O材料在这种情况下更低的能量。活化剂的激发和发射带因此显示出光谱红移。此外,与氧代硅化合物相比硅氮化物的更稳定且更刚性的晶格导致斯托克斯位移降低,因此,热猝灭仅在较高的温度下发生且转换效率提高。
公布的第一硅氮化物无机发光材料为CaSiN2·Eu2+(参见Lim等人,SPIE卷3241,1997,Photoluminescence of CaSiN2:Eu)。由于它显示出在这些波长范围中激发时在约630nm下发光,该无机发光材料适合用作蓝光-和UV发射LED的转换器。
EP 1153101和EP 1238041描述了具有组成(Ca,Sr,Ba)2-xSi5N8:Eux的所谓“2-5-8”硅氮化物。取决于化学组成,这些无机发光材料可激发近UV至蓝光谱区并发射橙色至深红色。
因此,本发明的目的是以使得上述2-5-8碱土金属硅氮化物实现甚至更高的光效率的方式改进这些化合物。
令人惊讶的是,已发现如果用四价和/或单价阳离子进行共掺杂,则可以满足关于(Ca,Sr,Ba)2-xSi5N8:Eux无机发光材料转换效率的经济上重要的进一步提高的要求。
因此,本发明涉及掺杂铕和/或铈的2-5-8碱土金属硅氮化物型化合物,其还包含铪、锆、锂、钠和/或钾作为共掺杂剂。
“2-5-8碱土金属硅氮化物”(也称作“2-5-8氮化物”或“2-5-8碱土金属次氮基硅酸盐”)意指组成M2Si5N8:Eu2+,其中M代表金土金属或多种碱土金属的混合物。
优选式I化合物:
Ma2-y(Ca,Sr,Ba)1-x-ySi5-zMezN8:EuxCey          (I)
其中:
Ma=Li、Na和/或K,
Me=Hf4+和/或Zr4+
x=0.0015至0.20,
y=0至0.15,
z<4。
优选z值(其代表共掺杂剂Me的原子浓度)<1,更优选<0.1,最优选为0.0002-0.02。
优选x=0.005至0.19且y=0至0.08。
与具有相同组成但不具有共掺杂剂Hf和/或Zr的那些相比,本发明式I化合物或无机发光材料的较大亮度可借助本领域技术人员已知的理论通过这些离子对活化剂离子的激发态寿命具有影响来解释:在发射荧光较短时间之后,该无机发光材料的受激电子回到基态,即这些电子可在相同时间间隔内进行更多激发和弛豫过程(参见S.Shionoya,W.M.Yen,Phosphor Handbook,CRC Press,New York,1999,ISBN 0-8493-7560-6)。
本领域技术人员已知使用Ce3+共活化Eu2+无机发光材料可导致Eu2+无机发光材料的有利性能,使得无机发光材料能够更有效或稳定。
此外,这些共掺杂剂具有效率提高的效果,即它们能够结合存在于硅氮化物中的不想要的氧(这导致亮度或效率和色点的位移降低)。
本发明化合物的粒度为50nm-30μm,优选1-20μm,更优选2-15μm。
可优选将单价离子如Li、Na和/或K及卤化物如F或Cl掺入本发明化合物的晶格中。这些单价离子优选在无机发光材料制备中用作助熔剂并用于提高晶体品质,一般说来设定粒度和粒子形态,因此具有提高无机发光材料效率的高势能。该程序是本领域技术人员已知的(例如参见H.S.Kang等人,Mater.Science and Engineering B 121(2005)81-85)。
此外,氧和碳可以以<0.2at-%的含量存在于本发明2-5-8氮化物的晶格中。已知这些物质通过使用助熔剂而适合作为氮化物的组分或来自原料(参见Hintzen等人,Chem.Mater.2005,17,3242-48“Synthese vonMe2Si5N8:Eu aus Me-Carbonaten”[由Me碳酸盐合成Me2Si5N8:Eu]或X.Piao等人,Applied Physis Lett.88,161908(2006)“characterisation andluminescence properties of Sr2Si5N8:Eu2+ phosphor for whitelight-emitting-diode illumination(用于白光发射二极管照明的Sr2Si5N8:Eu2+的特性和发光性能)”或R.Xie等人,Chem.Mater.2006,18(23),5578-5583“A simple,efficient synthetic route to SrSiN:Eu-basedred phosphors for white LED(用于白色LED的SrSiN:Eu基红色无机发光材料的简单有效的合成路线)”)。
2-5-8氮化物还可共掺杂有Mn、Mg、Be、Ni、Co、Th和/或Ru,其中在这里还可将F、O或C掺入晶格中。
此外,本发明涉及一种可通过将包含氮化硅、铕、铈和钙和/或锶-和/或钡的原料与至少一种包含铪、锆、锂、钠和/或钾的共掺杂剂通过固态扩散方法混合,随后热后处理而得到的化合物。
此外,本发明涉及一种制备掺杂有铕和/或铈的2-5-8碱土金属硅氮化物型化合物的方法,其具有以下工艺步骤:
·通过将选自包含氮硅化物、铕、铈、钙、锶、钡、铪、锆、锂、钠、钾的材料的至少4种原料混合而制备共掺杂有包含铪、锆、锂、钠和/或钾的材料的Eu-和/或Ce-掺杂的2-5-8碱土金属硅氮化物化合物,
·将共掺杂有Hf和/或Zr的化合物热后处理。
如上所述,用于制备该化合物的原料由氮化硅(Si3N4)、氢化钙、氟化铕和/或氟化铈和至少一种包含Hf、Zr、Li、Na和/或K的共掺杂剂组成。除了优选的氮化物、氢化物和氟化物之外,合适的原料还有其它无机和/或有机物质如氰胺、二氰胺、氰化物、草酸盐、丙二酸盐、富马酸盐、碳酸盐、柠檬酸盐、抗坏血酸盐和乙酰丙酮化物。
在还原条件下例如合成气体(例如90/10)、纯氢气和/或在氨气氛中和/或氮气或甲烷与氮气的混合物在具有或不具有上述气氛下进行上述热后处理(参见工艺步骤b)若干小时,其中该处理也可在超大气压力下进行。煅烧过程期间的温度为1000-1800℃,优选1200-1650℃。
借助上述方法,可生产任何所需外部形状的本发明化合物或无机发光材料,例如球形颗粒、薄片和结构材料和陶瓷。这些形状根据本发明汇总在术语“成型体”下。成型体优选为“无机发光材料元件”。
此外,本发明因此涉及一种包含本发明化合物的成型体,其具有粗糙表面,所述粗糙表面带有包含SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物的纳米粒子和/或包含具有或不具有铕、铈、铪、锆、锂、钠和/或钾系列掺杂剂的本发明化合物的粒子。
在另一优选实施方案中,成型体在与LED芯片相反的一侧上具有结构(如金字塔形)表面(参见WO 2008/058619,Merck,通过引用将其全部范围并入本申请上下文中)。这使得尽可能多的光从无机发光材料中耦合出。
成型体上的结构表面通过随后用已结构化的合适材料涂覆或在随后的步骤中通过(光)石印法、蚀刻法或通过写入法使用能量束或材料射流或机械力的作用而产生。
在另一优选实施方案中,本发明成型体在LED芯片的相反侧上具有粗糙表面,所述表面带有包含SiO2、TiO2、Al2O3、ZnO2、ZrO2和/或Y2O3或这些材料的组合的纳米粒子和/或具有具有或不具有Mn、Mg、Be、Ni、Co、Th和/或Ru系列掺杂剂的式I无机发光材料组合物的粒子。这里粗糙表面的粗糙度为高达数百nm。涂覆表面的优点是可降低或防止总内反射且光可更好地从本发明无机发光材料中耦合出(参见WO2008/058619(Merck),通过引用将其全部范围并入本申请上下文中)。
此外,优选本发明成型体在背对芯片的表面上具有相匹配折射率的层,所述层简化原辐射和/或无机发光材料元件发射的辐射的耦合。
在另一优选实施方案中,成型体具有连续的表面涂层,所述表面涂层由SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物和/或不具有活化剂铕和/或铈的式I化合物组成。该表面涂层的优点是合适的涂料折射率分级能使折射率与环境相匹配。在这种情况下,无机发光材料表面的光散射降低且更大部分的光可透过无机发光材料并可在那里被吸收和转换。另外,由于总内反射降低,相匹配的折射率能使更多的光从无机发光材料中耦合出。
另外,如果必须将无机发光材料包封时,连续层是有利的。这可能是必须的以便计数无机发光材料或其部分在当前的环境中对水或其他材料扩散的敏感性。用封闭外壳包封的另一原因是由芯片中产生的热导致的实际无机发光材料的热退耦。该热导致无机发光材料的荧光输出降低,还可影响荧光的色彩。最后,这类涂层使得可通过防止无机发光材料中产生的晶格振动传播至环境中而提高无机发光材料的效率。
另外,优选成型体具有多孔表面涂层,所述表面涂层由SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物和/或具有或不具有Eu、Ce、Hf、Zr、Li、Na和/或K系列掺杂剂的式I化合物组成。这些多孔涂层提供进一步降低单层折射率的可能性。这类多孔涂层可通过三种常规方法产生,如WO 03/027015所述,通过引用将其全部范围并入本申请上下文中:玻璃蚀刻(例如钠钙玻璃(参见US 4019884)),施加多孔层,和多孔层与蚀刻法的组合。
在另一优选实施方案中,成型体具有带有官能团的表面,所述官能团促进与优选由环氧或有机硅树脂组成的环境化学或物理结合。这些官能团可以为例如经由桥氧基键合的酯或其他衍生物,所述桥氧基能与基于环氧化物和/或硅酮的粘合剂组分形成连接键。这类表面的优点是促进无机发光材料均匀混入粘合剂中。此外,无机发光材料/粘合剂体系的流变性能以及贮存期可因此调整至特定程度。因此简化了混合物的加工。就这点而言,与环境物理键合意指体系之间借助电荷起伏或部分电荷的静电相互作用。
由于施加在LED芯片上的本发明无机发光材料层优选由硅酮和均匀无机发光材料粒子的混合物组成且硅酮具有表面张力,该无机发光材料层在显微镜水平下是不均匀的或层的厚度不是到处恒定的。
作为另一优选实施方案,薄片形式的无机发光材料通过常规方法由相应金属和/或稀土盐制备。制备方法详细描述于EP 763573和WO2008/058620中,通过引用将它们的全部范围并入本申请上下文中。这些薄片形式的无机发光材料可通过通过在水分散体或悬浮液中沉淀反应而用无机发光材料层涂覆天然或合成生产的高度稳定载体或基质而制备,所述载体或基质例如包含具有非常大的长宽比、原子级光滑表面和可调节厚度的云母薄片、SiO2薄片、Al2O3薄片、ZrO2薄片、玻璃薄片或TiO2薄片。除云母、ZrO2、SiO2、Al2O3、玻璃或TiO2或其混合物之外,薄片还可由无机发光材料本身组成或由材料构成。如果薄片本身仅用作无机发光材料涂层的载体,后者必须由来自LED的原辐射可穿透的材料,或吸收原辐射并将该能传输至无机发光材料层的材料组成。薄片形式的无机发光材料分散在树脂(例如有机硅树脂或环氧树脂)中,并将该分散体施加在LED芯片上。
薄片形式的无机发光材料可以以50nm至约20μm,优选150nm-5μm的厚度以大工业规模制备。这里直径为50nm-20μm。
它们的长宽比(直径与粒子厚度之比)通常为1∶1-400∶1,特别是3∶1-100∶1。
薄片大小(长×宽)取决于构造。薄片还适合作为转换层内的散射中心,特别是如果它们具有特别小尺寸的话。
面向LED芯片的本发明薄片形式的无机发光材料表面可具有降低反射LED芯片发射的原辐射的作用的涂层。这导致原辐射的反散射降低,增强后者耦合到本发明无机发光材料元件内。
适于该目的的例如是折射率相匹配的涂层,其必须具有以下厚度d:d=[LED芯片原辐射的波长/(4*无机发光材料陶瓷的折射率)],例如参见Gerthsen,Physik[Physics],Springer Verlag,第18版,1995。该涂层也可由光子晶体组成,其还包括薄片形式无机发光材料表面的结构化以实现特定功能。
陶瓷元件形式的本发明成型体的生产类似于WO 2008/017353(Merck)中所述方法进行,通过引用将其全部范围并入本申请上下文中。这里无机发光材料如下制备:将相应原料与掺杂剂混合,随后等压压制该混合物并以均匀、薄且无孔薄片的形式直接施加在芯片表面上或距芯片一定距离处(远程无机发光材料(remote phosphor)概念)。相应构造尤其取决于LED器件的构造,本领域技术人员能选择有利的构造。因此没有发生无机发光材料激发和发射的位置相关性变化,导致具有它的LED发射恒定色彩的均匀光锥并具有高光功率。陶瓷无机发光材料元件可以以工业规模例如作为厚度为数百nm至约500μm的薄片制备。薄片大小(长×宽)取决于构造。在直接施加在芯片上的情况下,薄片的大小应根据芯片大小(从约100μm*100μm至数mm2)选择,在合适的芯片构造(例如倒装构造)的情况下或相应地具有芯片表面约10-30%的特定过量大小。如果无机发光材料薄片置于最终LED的顶部,则所有发射的光锥会击中薄片。
可将陶瓷无机发光材料元件的侧表面用轻或贵金属,优选铝或银金属化。金属化的作用是光不会从无机发光材料元件侧面发出。从侧面发出光可降低要从LED中耦合出的光通量。陶瓷无机发光材料元件的金属化在等压压制以得到条或薄片以后的工艺步骤中进行,其中如果需要的话可在金属化以前将条或薄片切成需要的大小。为此,将侧表面例如用硝酸银或葡萄糖的溶液润湿,随后在升高的温度下曝露在氨气氛中。在该操作期间,例如在侧表面上形成银涂层。
作为选择,无电金属化方法是合适的,例如参见Hollemann-Wiberg,Lehrbuch der anorganischen Chemie[无机化学教科书],Walter de GruyterVerlag,或Ullmanns
Figure BDA0000086380030000081
de chemischen Technologie[乌尔曼化工百科全书]。
如果需要的话可使用水玻璃溶液将陶瓷无机发光材料元件固定在LED芯片的基质上。
在另一实施方案中,陶瓷无机发光材料元件在LED芯片的相反侧上具有结构(例如金字塔形)表面。这能使尽可能多的光从无机发光材料元件中耦合出。无机发光材料元件上的结构表面通过使用具有结构压板的模进行等压压制,并因此将结构压进表面中而产生。如果目的是生产尽可能最薄的无机发光材料元件或薄片,则结构表面是理想的。压制条件为本领域技术人员已知的(参见J.Kriegsmann,Technische keramische Werkstoffe[工业陶瓷材料],第4章,Deutscher Wirtschaftsdienst,1998)。重要的是所用压制温度为待压制物质的熔点的2/3至5/6。
因此,本发明涉及一种生产成型体,优选无机发光材料元件的方法,其具有如下工艺步骤:
a)通过将至少4种选自包含氮化硅、铕、铈、钙、锶、钡、铪、锆、锂、钠和/或钾的材料的原料混合而制备共掺杂有包含铪和/或锆的材料的铕掺杂的2-5-8碱土金属硅氮化物化合物,
b)将共掺杂化合物热后处理并形成具有粗糙表面的成型体,
c)将粗糙表面用包含SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物的纳米粒子或用包含本发明化合物的纳米粒子涂覆。
另外,本发明无机发光材料可经从约250nm延伸至530nm,优选从430nm延伸至约500nm的宽范围激发。这些无机发光材料因此不仅适合通过UV或发蓝光原光源如LED或常规放电管(例如基于Hg)激发,而且适合光源如使用451nm的蓝色In3+线的那些。
此外,本发明涉及具有发射最大值为250-530nm,优选430-约500nm的至少一个原光源的照明装置。特别优选440-480nm的范围,其中原辐射通过本发明化合物或无机发光材料部分或完全转换成更长波长的辐射。该照明装置优选发射白光或发射具有特定色点(色彩需求原则)的光。本发明照明装置的优选实施方案描述于图9-20中。
在本发明照明装置的优选实施方案中,光源为发光铟铝镓氮化物,特别是式IniGajAlkN,其中0≤i,0≤j,0≤k,且i+j+k=1。这类光源的可能形式为本领域技术人员已知的。它们可为具有各种结构的发光LED芯片。
在本发明照明装置的另一优选实施方案中,光源为基于ZnO、TCO(透明传导氧化物)、ZnSe或SiC的发光构造或有机发光构造(OLED)。
在本发明照明装置的另一优选实施方案中,光源为具有电致发光和/或光致发光的光源。此外,光源也可为等离子体或放电光源。
本发明无机发光材料可以分散在树脂(例如环氧树脂或有机硅树脂)中,或以给定的合适大小比直接排列在原光源上,或取决于应用排列在其远处(后一种构造还包括“远程无机发光材料技术”)。远程无机发光材料技术的优点是本领域技术人员已知的并显示于例如以下出版物中:Japanese Journ.Of Appl.Phys.第44卷,No.21(2005),L649-L651。
在另一实施方案中,优选无机发光材料与原光源之间照明装置的光学耦合通过光导构造实现。这能够使原光源安装在中心位置并借助光导器件如光导纤维与无机发光材料光学耦合。这样,可实现与照明愿望相匹配且仅由一种或不同可排列形成遮光板的无机发光材料和与原光源耦合的光导体组成的灯。这样,可使强原光源位于有利于电气装置的位置上且将包含与光导体耦合的无机发光材料的灯不另外铺设电缆,而是仅通过放置光导体而安装在任何所需位置上。
此外,本发明涉及本发明化合物和成型体作为无机发光材料或无机发光材料元件的用途。
此外,本发明涉及本发明化合物在部分或完全转换发光二极管蓝色或近UV发射中的用途。
此外,本发明化合物优选用于将蓝色或近UV发射转换为可见白色辐射。此外,本发明化合物优选用于根据“色彩需求”概念将原辐射转换为特定色点。
本发明式I化合物可单独或作为与以下本领域技术人员熟悉的无机发光材料的混合物使用:
Ba2SiO4:Eu2+、BaSi2O5:Pb2+、BaxSri1-xF2:Eu2+、BaSrMgSi2O7:Eu2+、BaTiP2O7、(Ba,Ti)2P2O7:Ti、Ba3WO6:U、BaY2F8Er3+,Yb+、Be2SiO4:Mn2+、Bi4Ge3O12、CaAl2O4:Ce3+、CaLa4O7:Ce3+、CaAl2O4:Eu2+、CaAl2O4:Mn2+、CaAl4O7:Pb2+,Mn2+、CaAl2O4:Tb3+、Ca3Al2Si3O12:Ce3+、Ca3Al2Si3Oi2:Ce3+、Ca3Al2Si3O,2:Eu2+、Ca2B5O9Br:Eu2+、Ca2B5O9Cl:Eu2+、Ca2B5O9Cl:Pb2+、CaB2O4:Mn2+、Ca2B2O5:Mn2+、CaB2O4:Pb2+、CaB2P2O9:Eu2+、Ca5B2SiO10:Eu3+、Ca0·5Ba0.5Al12O19:Ce3+,Mn2+、Ca2Ba3(PO4)3Cl:Eu2+、在SiO2中的CaBr2:Eu2+、在SiO2中的CaCl2:Eu2+、在SiO2中的CaCl2:Eu2+,Mn2+、CaF2:Ce3+、CaF2:Ce3+,Mn2+、CaF2:Ce3+,Tb3+、CaF2:Eu2+、CaF2:Mn2+、CaF2:U、CaGa2O4:Mn2+、CaGa4O7:Mn2+、CaGa2S4:Ce3+、CaGa2S4:Eu2+、CaGa2S4:Mn2+、CaGa2S4:Pb2+、CaGeO3:Mn2+、在SiO2中的CaI2:Eu2+、在SiO2中的CaI2:Eu2+,Mn2+、CaLaBO4:Eu3+、CaLaB3O7:Ce3+,Mn2+、Ca2La2BO6·5:Pb2+、Ca2MgSi2O7、Ca2MgSi2O7:Ce3+、CaMgSi2O6:Eu2+、Ca3MgSi2O8:Eu2+、Ca2MgSi2O7:Eu2+、CaMgSi2O6:Eu2+,Mn2+、Ca2MgSi2O7:Eu2+,Mn2+、CaMoO4、CaMoO4:Eu3+、CaO:Bi3+、CaO:Cd2+、CaO:Cu+、CaO:Eu3+、CaO:Eu3+,Na+、CaO:Mn2+、CaO:Pb2+、CaO:Sb3+、CaO:Sm3+、CaO:Tb3+,CaO:Tl、CaO:Zn2+、Ca2P2O7:Ce3+、α-Ca3(PO4)2:Ce3+、β-Ca3(PO4)2:Ce3+、Ca5(PO4)3Cl:Eu2+、Ca5(PO4)3Cl:Mn2+、Ca5(PO4)3Cl:Sb3+、Ca5(PO4)3Cl:Sn2+、β-Ca3(PO4)2:Eu2+,Mn2+、Ca5(PO4)3F:Mn2+、Cas(PO4)3F:Sb3+、Cas(PO4)3F:Sn2+、α-Ca3(PO4)2:Eu2+、β-Ca3(PO4)2:Eu2+、Ca2P2O7:Eu2+、Ca2P2O7:Eu2+,Mn2+、CaP2O6:Mn2+、α-Ca3(PO4)2:Pb2+、α-Ca3(PO4)2:Sn2+、β-Ca3(PO4)2:Sn2+、β-Ca2P2O7:Sn,Mn、α-Ca3(PO4)2:Tr、CaS:Bi3+、CaS:Bi3+,Na、CaS:Ce3+、CaS:Eu2+、CaS:Cu+,Na+、CaS:La3+、CaS:Mn2+、CaSO4:Bi、CaSO4:Ce3+、CaSO4:Ce3+,Mn2+、CaSO4:Eu2+、CaSO4:Eu2+Mn2+、CaSO4:Pb2+、CaS:Pb2+、CaS:Pb2+,Cl、CaS:Pb2+,Mn2+、CaS:Pr3+,Pb2+,Cl、CaS:Sb3+、CaCaS:Sb3+,Na、CaS:Sm3+、CaS:Sn2+、CaS:Sn2+,F、CaS:Tb3+、CaS:Tb3+,Cl、CaS:Y3+、CaS:Yb2+、CaS:Yb2+,Cl、CaSiO3:Ce3+、Ca3SiO4Cl2:Eu2+、Ca3SiO4Cl2:Pb2+、CaSiO3:Eu2+、CaSiO3:Mn2+,Pb、CaSiO3:Pb2+、CaSiO3:Pb2+,Mn2+、CaSiO3:Ti4+、CaSr2(PO4)2:Bi3+、β-(Ca,Sr)3(PO4)2:Sn2+Mn2+、CaTi0·9Al0·1O3:Bi3+、CaTiO3:Eu3+、CaTiO3:Pr3+、Ca5(VO4)3Cl、CaWO4、CaWO4:Pb2+、CaWO4:W、Ca3WO6:U、CaYAlO4:Eu3+、CaYBO4:Bi3+、CaYBO4:Eu3+、CaYB0·8O3·7:Eu3+、CaY2ZrO6:Eu3+、(Ca,Zn,Mg)3(PO4)2:Sn、CeF3、(Ce,Mg)BaAl11O18:Ce、(Ce,Mg)SrAl11O18:Ce、CeMgAl11O19:Ce:Tb、Cd2B6O11:Mn2+、CdS:Ag+,Cr、CdS:In、CdS:In、CdS:In,Te、CdS:Te、CdWO4、CsF、Csl、CsI:Na+、CsI:Tl、(ErCl3)0.25(BaCl2)0·75、GaN:Zn、Gd3Ga5O12:Cr3+、Gd3Ga5O12:Cr,Ce、GdNbO4:Bi3+、Gd2O2S:Eu3+、Gd2O2Pr3+、Gd2O2S:Pr,Ce,F、Gd2O2S:Tb3+、Gd2SiO5:Ce3+、KAI11O17:Tl+、KGa11O17:Mn2+、K2La2Ti3O10:Eu、KMgF3:Eu2+、KMgF3:Mn2+、K2SiF6:Mn4+、LaAl3B4O12:Eu3+、LaAlB2O6:Eu3+、LaAlO3:Eu3+、LaAlO3:Sm3+、LaAsO4:Eu3+、LaBr3:Ce3+、LaBO3:Eu3+、(La,Ce,Tb)PO4:Ce:Tb、LaCl3:Ce3+、La2O3:Bi3+、LaOBr:Tb3+、LaOBr:Tm3+、LaOCl:Bi3+、LaOCl:Eu3+、LaOF:Eu3+、La2O3:Eu3+、La2O3:Pr3+、La2O2S:Tb3+、LaPO4:Ce3+、LaPO4:Eu3+、LaSiO3Cl:Ce3+、LaSiO3Cl:Ce3+,Tb3+、LaVO4:Eu3+、La2W3O12:Eu3+、LiAlF4:Mn2+、LiAl2O8:Fe3+、LiAlO2:Fe3+、LiAlO2:Mn2+、LiAl5O8:Mn2+、Li2CaP2O7:Ce3+,Mn2+、LiCeBa4Si4O14:Mn2+、LiCeSrBa3Si4O14:Mn2+、LiInO2:Eu3+、LiInO2:Sm3+、LiLaO2:Eu3+、LuAlO3:Ce3+、(Lu,Gd)2SiO5:Ce3+、Lu2SiO5:Ce3+、Lu2Si2O7:Ce3+、LuTaO4:Nb5+、Lu1-xYxAlO3:Ce3+、MgAl2O4:Mn2+、MgSrAl10O17:Ce、MgB2O4:Mn2+、MgBa2(PO4)2:Sn2+、MgBa2(PO4)2:U、MgBaP2O7:Eu2+、MgBaP2O7:Eu2+,Mn2+、MgBa3Si2O8:Eu2+、MgBa(SO4)2:Eu2+、Mg3Ca3(PO4)4:Eu2+、MgCaP2O7:Mn2+、Mg2Ca(SO4)3:Eu2+、Mg2Ca(SO4)3:Eu2+,Mn2、MgCeAlnO19:Tb3+、Mg4(F)GeO6:Mn2+、Mg4(F)(Ge,Sn)O6:Mn2+、MgF2:Mn2+、MgGa2O4:Mn2+、Mg8Ge2O11F2:Mn4+、MgS:Eu2+、MgSiO3:Mn2+、Mg2SiO4:Mn2+、Mg3SiO3F4:Ti4+、MgSO4:Eu2+、MgSO4:Pb2+、MgSrBa2Si2O7:Eu2+、MgSrP2O7:Eu2+、MgSr5(PO4)4:Sn2+、MgSr3Si2O8:Eu2+,Mn2+、Mg2Sr(SO4)3:Eu2+、Mg2TiO4:Mn4+、MgWO4、MgYBO4:Eu3+、Na3Ce(PO4)2:Tb3+、NaI:Tl、Na1·23KO·42Eu0·12TiSi4O11:Eu3+、Na1.23K0.42Eu0.12TiSi5O13·xH2O:Eu3+、Na1.29K0.46Er0.08TiSi4O11:Eu3+、Na2Mg3Al2Si2O10:Tb、Na(Mg2-xMnx)LiSi4O10F2:Mn、NaYF4:Er3+、Yb3+、NaYO2:Eu3+、P46(70%)+P47(30%)、SrAl12O19:Ce3+、Mn2+、SrAl2O4:Eu2+、SrAl4O7:Eu3+、SrAl12O19:Eu2+、SrAl2S4:Eu2+、Sr2B5O9Cl:Eu2+、SrB4O7:Eu2+(F,Cl,Br)、SrB4O7:Pb2+、SrB4O7:Pb2+,Mn2+、SrB8O13:Sm2+、SrxBayClzAl2O4-z/2:Mn2+,Ce3+、SrBaSiO4:Eu2+、在SiO2中的Sr(Cl,Br,I)2:Eu2+、在SiO2中的SrCl2:Eu2+、Sr5Cl(PO4)3:Eu、SrwFxB4O6.5:Eu2+、SrwFxByOz:Eu2+,Sm2+、SrF2:Eu2+、SrGa12O19:Mn2+、SrGa2S4:Ce3+、SrGa2S4:Eu2+、SrGa2S4:Pb2+、SrIn2O4:Pr3+,Al3+、(Sr,Mg)3(PO4)2:Sn、SrMgSi2O6:Eu2+、Sr2MgSi2O7:Eu2+、Sr3MgSi2O8:Eu2+、SrMoO4:U、SrO·3B2O3:Eu2+,Cl、β-SrO·3B2O3:Pb2+、β-SrO·3B2O3:Pb2+,Mn2+、α-SrO·3B2O3:Sm2+、Sr6P5BO20:Eu、Sr5(PO4)3Cl:Eu2+、Sr5(PO4)3Cl:Eu2+Pr3+、Sr5(PO4)3Cl:Mn2+、Sr5(PO4)3Cl:Sb3+、Sr2P2O7:Eu2+、β-Sr3(PO4)2:Eu2+、Sr5(PO4)3F:Mn2+、Sr5(PO4)3F:Sb3+、Sr5(PO4)3F:Sb3+,Mn2+、Sr5(PO4)3F:Sn2+、Sr2P2O7:Sn2+、β-Sr3(PO4)2:Sn2+、β-Sr3(PO4)2:Sn2+,Mn2+(Al)、SrS:Ce3+、SrS:Eu2+、SrS:Mn2+、SrS:Cu+,Na、SrSO4:Bi、SrSO4:Ce3+、SrSO4:Eu2+、SrSO4:Eu2+,Mn2+、Sr5Si4O10Cl6:Eu2+、Sr2SiO4:Eu2+、SrTiO3:Pr3+、SrTiO3:Pr3+,Al3+、Sr3WO6:U、SrY2O3:Eu3+、ThO2:Eu3+、ThO2:Pr3+、ThO2:Tb3+、YAl3B4O12:Bi3+、YAl3B4O12:Ce3+、YAl3B4O12:Ce3+,Mn、YAl3B4O12:Ce3+,Tb3+、YAl3B4O12:Eu3+、YAl3B4O12:Eu3+,Cr3+、YAl3B4O12:Th4+,Ce3+,Mn2+、YAlO3:Ce3+、Y3Al5O12:Ce3+、Y3Al5O12:Cr3+、YAlO3:Eu3+、Y3Al5O12:Eu3r、Y4Al2O9:Eu3+、Y3Al5O12:Mn4+、YAlO3:Sm3+、YAlO3:Tb3+、Y3Al5O12:Tb3+、YAsO4:Eu3+、YBO3:Ce3+、YBO3:Eu3+、YF3:Er3+,Yb3+、YF3:Mn2+、YF3:Mn2+,Th4+、YF3:Tm3+,Yb3+、(Y,Gd)BO3:Eu、(Y,Gd)BO3:Tb、(Y,Gd)2O3:Eu3+、Y1.34Gd0.60O3(Eu,Pr)、Y2O3:Bi3+、YOBr:Eu3+、Y2O3:Ce、Y2O3:Er3+、Y2O3:Eu3+(YOE)、Y2O3:Ce3+,Tb3+、YOCl:Ce3+、YOCl:Eu3+、YOF:Eu3+、YOF:Tb3+、Y2O3:Ho3+、Y2O2S:Eu3+、Y2O2S:Pr3+、Y2O2S:Tb3+、Y2O3:Tb3+、YPO4:Ce3+、YPO4:Ce3+,Tb3+、YPO4:Eu3+、YPO4:Mn2+,Th4+、YPO4:V5+、Y(P,V)O4:Eu、Y2SiO5:Ce3+、YTaO4、YTaO4:Nb5+、YVO4:Dy3+、YVO4:Eu3+、ZnAl2O4:Mn2+、ZnB2O4:Mn2+、ZnBa2S3:Mn2+、(Zn,Be)2SiO4:Mn2+、Zn0.4Cd0.6S:Ag、Zn0.6Cd0.4S:Ag、(Zn,Cd)S:Ag,Cl、(Zn,Cd)S:Cu、ZnF2:Mn2+、ZnGa2O4、ZnGa2O4:Mn2+、ZnGa2S4:Mn2+、Zn2GeO4:Mn2+、(Zn,Mg)F2:Mn2+、ZnMg2(PO4)2:Mn2+、(Zn,Mg)3(PO4)2:Mn2+、ZnO:Al3+,Ga3+、ZnO:Bi3+、ZnO:Ga3+、ZnO:Ga、ZnO-CdO:Ga、ZnO:S、ZnO:Se、ZnO:Zn、ZnS:Ag+,Cl-、ZnS:Ag,Cu,Cl、ZnS:Ag,Ni、ZnS:Au,In、ZnS-CdS(25-75)、ZnS-CdS(50-50)、ZnS-CdS(75-25)、ZnS-CdS:Ag,Br,Ni、ZnS-CdS:Ag+,Cl、ZnS-CdS:Cu,Br、ZnS-CdS:Cu,I、ZnS:Cl-、ZnS:Eu2+、ZnS:Cu、ZnS:Cu+,Al3+、ZnS:Cu+,Cl-、ZnS:Cu,Sn、ZnS:Eu2+、ZnS:Mn2+、ZnS:Mn,Cu、ZnS:Mn2+,Te2+、ZnS:P、ZnS:P3-,Cl-、ZnS:Pb2+、ZnS:Pb2+,Cl-、ZnS:Pb,Cu、Zn3(PO4)2:Mn2+、Zn2SiO4:Mn2+、Zn2SiO4:Mn2+,As5+、Zn2SiO4:Mn,Sb2O2、Zn2SiO4:Mn2+,P、Zn2SiO4:Ti4+、ZnS:Sn2+、ZnS:Sn,Ag、ZnS:Sn2+,Li+、ZnS:Te,Mn、ZnS-ZnTe:Mn2+、ZnSe:Cu+,Cl、ZnWO4
以下实施例意欲阐明本发明。然而,它们应决不被认为是限定性的。可用于组合物中的所有化合物或组分是已知的和市售的,或可通过已知方法合成。实施例中指出的温度总是以℃给出。此外,不言而喻在说明书以及实施例中,组合物中组分的加入量总是合计达100%总数。给出的百分数数据应总是被认为是给定联系的。然而,它们通常总是涉及所述份量或总量的重量。
实施例
1.制备共掺杂的Ca2Si5N8:Eu(包含2%和10%Eu)
实施例1a:制备Ca2Si5N8:Eu(2%)作为参照无机发光材料
将2.8730g CaH2(Alfa Aesar 99.8%)、0.2479g EuF3(ChemPur 99.9%)和6.9356g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例1b:制备共掺杂有0.1%Hf的Ca2Si5N8:Eu(2%)
将2.4428g CaH2(Alfa Aesar 99.8%)、0.2477g EuF3(ChemPur 99.9%)、0.0151g HfF4(Alfa Aesar 99.9%)和6.9299g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例1c:制备共掺杂有0.1%Zr的Ca2Si5N8:Eu(2%)
将2.4441g CaH2(Alfa Aesar 99.8%)、0.2479g EuF3(ChemPur 99.9%)、0.0099g ZrF4(Alfa Aesar 98%)和6.9335g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例1d:制备Ca2Si5N8:Eu(10%)作为参照无机发光材料
将2.1342g CaH2(Alfa Aesar 99.8%)、1.1772g EuF3(ChemPur 99.9%)和6.5858g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例1e:制备共掺杂有0.1%Hf的Ca2Si5N8:Eu2+(10%)
将2.1302g CaH2(Alfa Aesar 99.8%)、1.1762g EuF3(ChemPur 99.9%)、0.0143g HfF4(Alfa Aesar 99.9%)和6.5807g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例1f:制备共掺杂有0.1%Zr的Ca2Si5N8:Eu2+(10%)
将2.1312g CaH2(Alfa Aesar 99.8%)、1.1768g EuF3(ChemPur 99.9%)、0.0094g ZrF4(Alfa Aesar 99.9%)和6.5839g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
2.制备共掺杂的Sr2Si5N8:Eu(包含2%Eu)
实施例2a:制备Sr2Si5N8:Eu(2%)作为参照无机发光材料
将4.4164g Sr3N2、0.1942g EuF3(ChemPur 99.9%)和5.4337gSi3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例2b:制备共掺杂有0.1%Hf的Sr2Si5N8:Eu(2%)
将4.4100g Sr3N2、0.1942g EuF3(ChemPur 99.9%)、0.0118g HfF4(AlfaAesar 99.9%)和5.4314g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例2c:制备共掺杂有0.1%Zr的Sr2Si5N8:Eu(2%)
将4.4118g Sr3N2、0.1942g EuF3(ChemPur 99.9%)、0.0078g ZrF4(AlfaAesar 99.9%)和5.4336g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
3.制备共掺杂的Ba2Si5N8:Eu(包含2%Eu)
实施例3a:制备Ba2Si5N8:Eu(2%)作为参照无机发光材料
将5.4472g Ba3N2、0.1584g EuF3(ChemPur 99.9%)和4.4305gSi3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例3b:制备共掺杂有0.1%Hf的Ba2Si5N8:Eu(2%)
将5.4408g Ba3N2,0.1584g EuF3(ChemPur 99.9%),0.0096g HfF4(AlfaAesar 99.9%)和4.4298g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例3c:制备共掺杂有0.1%Zr的Ba2Si5N8:Eu(2%)
将5.4426g Ba3N2、0.1584g EuF3(ChemPur 99.9%)、0.0063g ZrF4(AlfaAesar 99.9%)和4.4313g of Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例4:制备共掺杂有0.1%Zr的Na2Ca0.98Zr0.001Si4.999N8:Eu0.02(包含2%Eu)
将0.81469g CaH2(Alfa Aesar 99.8%)、0.9288g NaH(95%,SigmaAldrich)、0.2479g EuF3(ChemPur 99.9%)、0.0099g ZrF4(Alfa Aesar 98%)和6.9335g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
实施例5:制备共掺杂有0.1%Zr的Na1.99Ca0.97Zr0.001Si4.999N8:Eu0.02Ce0.01(包含2%Eu和1%Ce)
将0.7897g CaH2(Alfa Aesar 99.8%),0.9146g NaH(95%,SigmaAldrich),0.2479g EuF3(ChemPur 99.9%),0.1169g CeF3(Chempur 99.9%),0.0099g ZrF4(Alfa Aesar 98%)和6.9335g Si3N4(UBE 99.99%)在除去氧气和湿气的手套箱中相互密切混合,随后转移至排列有钼的刚玉坩埚中。然后将坩埚转移至用合成气体(N2/H2=90/10)冲洗的管式炉中,在关闭炉以后,在1400℃下煅烧14小时。最后,将所得烧结饼研磨、筛分并分类。
表1:与本发明共掺杂无机发光材料相比,M1.98Si5N8:Eu0.02(M=Ca,Sr,Ba)的光学性能(QY=量子产额)
附图描述
参考大量工作实施例更详细地解释本发明,其中:
图1:显示Ca1.98Si5N8:Eu0.02和共掺杂无机发光材料在450nm激发波长下的发射光谱。这里:
a)表示非共掺杂无机发光材料,
b)表示共掺杂有0.1%Zr的Ca1.98Si5N8:Eu0.02,且
c)表示共掺杂有0.1%Hf的Ca1.98Si5N8:Eu0.02
图2:显示图1的细节扩大以更好地区分。b)和c)的发射光谱大约相同。
图3:显示Sr1.98Si5N8:Eu0.02和共掺杂无机发光材料在450nm激发波长下的发射光谱,这里:
a)表示非共掺杂无机发光材料,
b)表示共掺杂有0.1%Zr的Sr1.98Si5N8:Eu0.02,且
c)表示共掺杂有0.1%Hf的Sr1.98Si5N8:Eu0.02
图4:显示Ba1.98Si5N8:Eu0.02和本发明共掺杂无机发光材料在450nm激发波长下的发射光谱,这里:
a)表示非共掺杂无机发光材料,b)表示共掺杂有0.1%Zr的Ba1.98Si5N8:Eu0.02,且c)表示共掺杂有0.1%Hf的Ba1.98Si5N8:Eu0.02
图5:显示图4的细节图扩大以更好地区分发射光谱。
图6:显示a)非共掺杂无机发光材料、b)共掺杂有0.1%Zr的Ca1.98Si5N8:Eu0.02、c)共掺杂有0.1%Hf的Ca1.98Si5N8:Eu0.02的X射线粉末衍射图。
图7:显示a)非共掺杂无机发光材料、b)共掺杂有0.1%Zr的Sr1.98Si5N8:Eu0.02、c)共掺杂有0.1%Hf的Sr1.98Si5N8:Eu0.02的X射线粉末衍射图。
图8:显示a)非共掺杂无机发光材料、b)共掺杂有0.1%Zr的Ba1.98Si5N8:Eu0.02、c)共掺杂有0.1%Hf的Ba1.98Si5N8:Eu0.02的X射线粉末衍射图。
图9:显示具有包含无机发光材料的涂层的发光二极管的图示。该组件包括片状LED 1作为辐射源。LED安装在由调整架2保持的杯型反射器上。芯片1借助扁电缆7连接在第一触点6上并直接连接在第二电触点6’上。已将包含本发明转换无机发光材料的涂层施加在反射器杯的内曲面上。无机发光材料相互分开或作为混合物使用。(零件号明细:1发光二极管,2反射器,3树脂,4转换无机发光材料,5扩散器,6电极,7扁电缆)
图10:显示用作白光光源(LED)的InGaN型COB(板上芯片(chip onboard))封装(1=半导体芯片;2、3=电连接;4=转换无机发光材料;7=板)。无机发光材料分布在粘合剂透镜上,其同时代表第二光学元件并影响作为透镜的发光特征。
图11:显示用作白光光源(LED)的InGaN型COB(板上芯片)封装(1=半导体芯片;2、3=电连接;4=转换无机发光材料;7=板)。无机发光材料位于直接分布LED芯片上的薄粘合剂层中。由透明材料组成的第二光学元件可置于其上。
图12:显示用作白光光源(LED)的封装(1=半导体芯片;2、3=电连接;4=在具有反射器的空穴中的转换无机发光材料)。转换无机发光材料分散在粘合剂中,其中混合物填充空穴。
图13:显示一种封装,其中1=外壳;2=电连接;4=半导体芯片,并且透镜下的空穴完全被本发明转换无机发光材料填充。该封装的优点是可使用更大量的转换无机发光材料。这也可充当远程无机发光材料。
图14:显示SMD封装(表面安装封装),其中1=外壳;2、3=电连接;4=转换层。半导体芯片完全被本发明无机发光材料覆盖。SMD设计的优点是它具有小物理形状,并因此适合常规灯。
图15:显示T5封装,其中1=转换无机发光材料;2=芯片;3、4=电连接;5=具有透明树脂的透镜。转换无机发光材料位于LED芯片的背面,其优点是无机发光材料经由金属连接冷却。
图16:显示发光二极管的图解,其中1=半导体芯片;2、3=电连接;4=转换无机发光材料;5=结合线,其中无机发光材料作为顶球应用在粘合剂中。该形式的无机发光材料/粘合剂层可充当第二光学元件,并可影响例如光导传输。
图17:显示发光二极管的图解,其中1=半导体芯片;2、3=电连接;4=转换无机发光材料;5=结合线,其中无机发光材料作为分散在粘合剂中的薄层应用。充当第二光学元件的另一组件,例如透镜可容易地应用于该层上。
图18:显示如原则上由US-B 6,700,322中已知的另一应用的实例。本发明无机发光材料在这里与OLED一起使用。光源为由实际有机薄膜30和透明物质32组成的有机发光二极管31。薄膜30特别是发射例如通过PVK:PBD:香豆素(PVK,聚(正乙烯基咔唑)的简写;PBD,2-(4-联苯基)-5-(4-叔丁基苯基)-1,3,4-
Figure BDA0000086380030000201
二唑的简写)产生的蓝色原光。该发射部分转换为由本发明无机发光材料层33形成的覆盖层的黄色二次发射光,使得白光发射全部通过初次和二次发射光的色彩混合实现。OLED基本由两个电极之间的至少一层发光聚合物或所谓的小分子组成,所述电极由本身已知的材料如ITO(氧化铟锡的简写)作为阳极和高反应性金属如Ba或Ca作为阴极组成。用作空穴传输层或在小分子区域中还用作电子传输层的多个层通常也用于电极之间。所用发射聚合物例如为聚芴或聚螺材料。

Claims (20)

1.掺杂有铕和任选铈的M2Si5N8型化合物,其中M代表碱土金属或多种碱土金属的混合物,所述化合物还包含铪、锆、锂、钠和/或钾作为共掺杂剂,其中至少一种共掺杂剂选自由铪和锆组成的组。 
2.根据权利要求1的化合物,其特征在于式I: 
Ma2-y(Ca,Sr,Ba)1-x-ySi5-zMezN8:EuxCey    (I) 
其中: 
Ma=Li、Na和/或K, 
Me=Hf4+和/或Zr4+, 
x=0.0015至0.20且 
y=0至0.15, 
z<4。 
3.根据权利要求2的化合物,其特征在于z<1。 
4.根据权利要求3的化合物,其特征在于z=0.0002至0.02。 
5.根据权利要求1-4中任一项的化合物,其可通过将包含氮化硅、铕、铈和钙和/或锶-和/或钡的原料与至少一种包含铪、锆、锂、钠和/或钾的共掺杂剂通过固态扩散方法混合,随后热后处理而得到。 
6.制备根据权利要求1-5中任一项的化合物的方法,其具有以下工艺步骤: 
a)通过将选自包含氮化硅、铕、铈、钙、锶、钡、铪、锆、锂、钠和/或钾的材料的至少4种原料混合而制备共掺杂有包含铪和/或锆的材料的铕-和任选铈-掺杂的M2Si5N8型化合物, 
b)将共掺杂化合物热后处理。 
7.包含根据权利要求1-5中任一项的化合物的成型体,其特征在于它具有粗糙表面,所述粗糙表面带有包含SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物的纳米粒子和/或包含具有或不具有铕、铈、铪、锆、锂、钠和/或钾系列掺杂剂的根据权利要求1-5中任一项的化合物的粒子。 
8.包含根据权利要求1-5中任一项的化合物的成型体,其特征在于它具有连续表面涂层,所述表面涂层由SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物和/或由不具有铕的根据权利要求1-5中任一项的化合物组成。 
9.包含根据权利要求1-5中任一项的化合物的成型体,其特征在于它具有多孔表面涂层,所述表面涂层由SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物和/或由具有或不具有铕、铈、铪、锆、锂、钠和/或钾系列掺杂剂的根据权利要求1-5中任一项的化合物组成。 
10.包含根据权利要求1-5中任一项的化合物的成型体,其特征在于表面带有促进化学或物理结合至由环氧树脂或有机硅树脂组成的环境的官能团。 
11.生产根据权利要求7-10中任一项的成型体的方法,其具有以下工艺步骤: 
a)通过将至少4种选自包含氮化硅、铕、铈、钙、锶、钡、铪、锆、锂、钠和/或钾的材料的原料混合而制备共掺杂有包含铪和/或锆的材料的铕掺杂的M2Si5N8型化合物, 
b)将共掺杂化合物热后处理并形成具有粗糙表面的成型体, 
c)将粗糙表面用包含SiO2、TiO2、Al2O3、ZnO、ZrO2和/或Y2O3或其混合氧化物的纳米粒子或用包含具有或不具有掺杂剂的根据权利要求1-5中任一项的化合物的纳米粒子涂覆。 
12.具有至少一个最大发射为250-530nm的一次光源的照明装置,其中该辐射被根据权利要求1-11中任一项的化合物或成型体部分或完全转换成较长波长辐射。 
13.根据权利要求12的照明装置,其特征在于所述光源为发光铟铝镓氮化物,或基于ZnO、TCO(透明传导氧化物)、ZnSe或SiC的发光化合物。 
14.根据权利要求12的照明装置,其特征在于所述光源为有机发光装置或等离子体或放电灯。 
15.根据权利要求12-14中任一项的照明装置,其特征在于无机发光 材料直接布置在一次光源上和/或其远处。 
16.根据权利要求12-14中任一项的照明装置,其特征在于无机发光材料与一次光源之间的光学耦合通过光导装置实现。 
17.根据权利要求15的照明装置,其特征在于无机发光材料与一次光源之间的光学耦合通过光导装置实现。 
18.至少一种根据权利要求1-5中任一项的化合物作为无机发光材料或转换无机发光材料在部分或完全转换发光二极管的蓝光或UV发射中的用途。 
19.至少一种根据权利要求1-5中任一项的化合物作为转换无机发光材料在根据色彩需求概念将原辐射转换成特定色点中的用途。 
20.根据权利要求7-10中任一项的成型体作为无机发光材料元件的用途。 
CN2010800093824A 2009-02-27 2010-02-01 共掺杂锆和铪的次氮基硅酸盐 Expired - Fee Related CN102333844B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009010705A DE102009010705A1 (de) 2009-02-27 2009-02-27 Co-dotierte 2-5-8 Nitride
DE102009010705.3 2009-02-27
PCT/EP2010/000592 WO2010097157A1 (de) 2009-02-27 2010-02-01 Mit zirkonium und hafnium co-dotierte nitridosilikate

Publications (2)

Publication Number Publication Date
CN102333844A CN102333844A (zh) 2012-01-25
CN102333844B true CN102333844B (zh) 2013-07-31

Family

ID=42062329

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800093824A Expired - Fee Related CN102333844B (zh) 2009-02-27 2010-02-01 共掺杂锆和铪的次氮基硅酸盐

Country Status (9)

Country Link
US (1) US9028716B2 (zh)
EP (1) EP2401342B1 (zh)
JP (1) JP2012519216A (zh)
KR (1) KR20110126725A (zh)
CN (1) CN102333844B (zh)
DE (1) DE102009010705A1 (zh)
SG (1) SG173767A1 (zh)
TW (1) TWI464240B (zh)
WO (1) WO2010097157A1 (zh)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102725872A (zh) * 2010-03-10 2012-10-10 松下电器产业株式会社 Led包封树脂体,led装置和led装置的制造方法
US8512599B2 (en) * 2010-05-14 2013-08-20 Lightscape Materials, Inc. Carbonitride based phosphors and light emitting devices using the same
DE102010041236A1 (de) * 2010-09-23 2012-03-29 Osram Ag Optoelektronisches Halbleiterbauelement
US8329484B2 (en) * 2010-11-02 2012-12-11 Tsmc Solid State Lighting Ltd. Phosphor with Ce3+/Ce3+, Li+ doped luminescent materials
KR101772588B1 (ko) * 2011-08-22 2017-09-13 한국전자통신연구원 클리어 컴파운드 에폭시로 몰딩한 mit 소자 및 그것을 포함하는 화재 감지 장치
JP6083049B2 (ja) * 2012-02-09 2017-02-22 デンカ株式会社 蛍光体及び発光装置
DE102012101920A1 (de) * 2012-03-07 2013-09-12 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement
US9938460B2 (en) * 2012-04-02 2018-04-10 National Taiwan University Phosphor, light emitting apparatus and method of forming phosphor
CN103375708B (zh) * 2012-04-26 2015-10-28 展晶科技(深圳)有限公司 发光二极管灯源装置
DE102012213467B4 (de) * 2012-07-31 2023-12-07 Coretronic Corporation Vorrichtung zum bereitstellen elektromagnetischer strahlung
TWI448538B (zh) 2012-10-23 2014-08-11 Ind Tech Res Inst 螢光材料與紫外光發光裝置
CN104870604A (zh) * 2012-12-21 2015-08-26 默克专利有限公司 发光物质
WO2014094974A1 (de) * 2012-12-21 2014-06-26 Merck Patent Gmbh Leuchtstoffe
JP5783302B2 (ja) 2013-07-03 2015-09-24 日亜化学工業株式会社 フッ化物蛍光体及びそれを用いた発光装置並びに蛍光体の製造方法
CN104232087A (zh) * 2014-08-11 2014-12-24 北京大学工学院包头研究院 一种荧光材料及其制备方法和应用
CN104371712A (zh) * 2014-11-03 2015-02-25 天津理工大学 一种钙基氮化物红色荧光粉的常压制备方法
WO2016102295A1 (en) * 2014-12-24 2016-06-30 Koninklijke Philips N.V. Phosphor converted led
CN105062480B (zh) * 2015-08-21 2017-06-27 佛山市南海区联合广东新光源产业创新中心 多波长激发的高性能红色荧光粉及其制备方法
JP6645781B2 (ja) * 2015-09-11 2020-02-14 アルパッド株式会社 半導体発光装置
DE102016121692A1 (de) * 2016-08-12 2018-02-15 Osram Gmbh Leuchtstoff und Verfahren zur Herstellung eines Leuchtstoffs
US10711192B2 (en) 2016-08-12 2020-07-14 Osram Oled Gmbh Lighting device
US10644206B2 (en) 2016-08-12 2020-05-05 Osram Oled Gmbh Lighting device
KR102531061B1 (ko) 2016-08-12 2023-05-09 에이엠에스-오스람 인터내셔널 게엠베하 조명 장치
JP7050774B2 (ja) 2016-11-11 2022-04-08 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 蛍光体、照明装置および照明装置の使用
US10519371B2 (en) 2016-11-11 2019-12-31 Osram Opto Semiconductors Gmbh Phosphor, illumination device and use of an illumination device
JP6843351B2 (ja) * 2017-01-05 2021-03-17 太平洋セメント株式会社 蛍光体の製造法
TWI629339B (zh) * 2017-06-16 2018-07-11 信源陶磁股份有限公司 製備氮化物螢光體的方法
DE112018004067A5 (de) 2017-08-10 2020-04-23 Osram Oled Gmbh Dimmbare Lichtquelle
KR102359594B1 (ko) * 2017-09-19 2022-02-07 엘지디스플레이 주식회사 복합 무기 발광 재료, 발광 필름, 이를 포함하는 엘이디 패키지, 발광다이오드 및 발광장치
US10720554B2 (en) * 2017-09-20 2020-07-21 General Electric Company Green-emitting phosphors and devices thereof
DE102018205464A1 (de) 2017-11-10 2019-05-16 Osram Opto Semiconductors Gmbh Beleuchtungsvorrichtung und verwendung einer beleuchtungsvorrichtung
CN109370587B (zh) * 2018-09-06 2019-10-29 旭宇光电(深圳)股份有限公司 氮化物近红外荧光材料、含有氮化物近红外荧光材料的发光装置
CN110893339A (zh) * 2018-09-12 2020-03-20 华东理工大学 一种钼基耐硫甲烷化催化剂及其制备方法与应用
EP3943445A1 (en) * 2020-07-21 2022-01-26 Karlsruher Institut für Technologie Bulk materials of doped multinary nitrides and nitridosilicates, their production method and uses
CN115772403B (zh) * 2022-12-06 2023-09-29 广州医科大学 一类铬铥共掺杂蓝紫光转窄谱近红外荧光材料及其制备与应用
CN116042218A (zh) * 2023-01-19 2023-05-02 威海市泓淋电力技术股份有限公司 一种Bi3+和Pr3+共掺杂锗酸盐LiYGeO4光激励发光材料及其制备方法
CN117801820B (zh) * 2023-12-28 2024-07-05 广州珠江光电新材料有限公司 一种红色长余辉材料及其制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1918262A (zh) * 2003-11-26 2007-02-21 独立行政法人物质·材料研究机构 荧光体和使用荧光体的发光装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4019884A (en) 1976-01-22 1977-04-26 Corning Glass Works Method for providing porous broad-band antireflective surface layers on chemically-durable borosilicate glasses
JP3242561B2 (ja) 1995-09-14 2001-12-25 メルク・ジヤパン株式会社 薄片状酸化アルミニウム、真珠光沢顔料及びその製造方法
EP1104799A1 (en) 1999-11-30 2001-06-06 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Red emitting luminescent material
US6700322B1 (en) 2000-01-27 2004-03-02 General Electric Company Light source with organic layer and photoluminescent layer
KR100913641B1 (ko) 2001-09-21 2009-08-24 메르크 파텐트 게엠베하 내마모성 sio2 반사방지 층을 제조하기 위한 신규하이브리드 졸
EP1433831B1 (en) 2002-03-22 2018-06-06 Nichia Corporation Nitride phosphor and method for preparation thereof, and light emitting device
JP4214768B2 (ja) 2002-11-29 2009-01-28 日亜化学工業株式会社 窒化物蛍光体及びそれを用いた発光装置
DE60330892D1 (de) * 2002-11-08 2010-02-25 Nichia Corp Lichtemissionsbauelement, leuchtstoff und verfahren zur herstellung eines leuchtstoffs
DE10360546A1 (de) 2003-12-22 2005-07-14 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Leuchtstoff und Lichtquelle mit derartigem Leuchtstoff
US7229573B2 (en) 2004-04-20 2007-06-12 Gelcore, Llc Ce3+ and Eu2+ doped phosphors for light generation
US20070040502A1 (en) 2004-04-20 2007-02-22 Gelcore Llc High CRI LED lamps utilizing single phosphor
JP5081370B2 (ja) 2004-08-31 2012-11-28 日亜化学工業株式会社 発光装置
DE102006037730A1 (de) 2006-08-11 2008-02-14 Merck Patent Gmbh LED-Konversionsleuchtstoffe in Form von keramischen Körpern
US7579765B2 (en) * 2006-10-06 2009-08-25 Nemoto & Company, Ltd. Orange-emitting phosphor
DE102006054331A1 (de) 2006-11-17 2008-05-21 Merck Patent Gmbh Leuchtstoffkörper basierend auf plättchenförmigen Substraten
DE102006054330A1 (de) 2006-11-17 2008-05-21 Merck Patent Gmbh Leuchtstoffplättchen für LEDs aus strukturierten Folien
DE102007016229A1 (de) * 2007-04-04 2008-10-09 Litec Lll Gmbh Verfahren zur Herstellung von Leuchtstoffen basierend auf Orthosilikaten für pcLEDs

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1918262A (zh) * 2003-11-26 2007-02-21 独立行政法人物质·材料研究机构 荧光体和使用荧光体的发光装置

Also Published As

Publication number Publication date
US9028716B2 (en) 2015-05-12
US20110304261A1 (en) 2011-12-15
DE102009010705A1 (de) 2010-09-02
JP2012519216A (ja) 2012-08-23
CN102333844A (zh) 2012-01-25
KR20110126725A (ko) 2011-11-23
EP2401342B1 (de) 2013-06-12
EP2401342A1 (de) 2012-01-04
SG173767A1 (en) 2011-09-29
TWI464240B (zh) 2014-12-11
WO2010097157A1 (de) 2010-09-02
TW201038718A (en) 2010-11-01

Similar Documents

Publication Publication Date Title
CN102333844B (zh) 共掺杂锆和铪的次氮基硅酸盐
KR101168177B1 (ko) 형광체와 그 제조방법 및 발광기구
TWI384053B (zh) 螢光體、其製造方法及照明器具
KR101382915B1 (ko) 형광체 및 그 제조 방법, 및 그것을 이용한 발광 장치
TWI502052B (zh) 矽磷酸鹽磷光體
JP5578597B2 (ja) 蛍光体及びその製造方法、並びにそれを用いた発光装置
TWI399422B (zh) 螢光體、其製造方法及照明器具
CN102216419B (zh) 共掺杂的1-1-2氮化物
JP5885174B2 (ja) 蛍光体、その製造方法、発光装置および画像表示装置
CN102471681B (zh) 共掺杂的硅氧氮化物
WO2006126567A1 (ja) 蛍光体及びその利用
KR20060123209A (ko) 형광체 및 이 형광체를 이용한 발광 기구
KR20160094414A (ko) Eu2+ -활성화된 인광체
EP3640206A1 (en) Garnet silicate, garnet silicate phosphor, wavelength transformer using garnet silicate phosphor and light-emitting device
WO2016199406A1 (ja) 蛍光体およびその製造方法、ならびにledランプ
JP2017210529A (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料、および、紫外線吸収剤
JP6735487B2 (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料および紫外線吸収剤
JP5920773B2 (ja) 蛍光体、その製造方法、発光装置および画像表示装置
JP2010196049A (ja) 蛍光体及びその製造方法、蛍光体含有組成物、並びに、該蛍光体を用いた発光装置、画像表示装置及び照明装置
JP6700630B2 (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料および紫外線吸収剤
US20170084797A1 (en) Conversion phosphors
JP6700632B2 (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料および紫外線吸収剤
WO2022244523A1 (ja) 蛍光体、その製造方法、発光素子および発光装置
JP6700633B2 (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料および紫外線吸収剤
JP6700631B2 (ja) 蛍光体、その製造方法、発光装置、画像表示装置、顔料および紫外線吸収剤

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130731

Termination date: 20170201