CN102205911A - Substrate processing apparatus, conversion method and load-shifting method - Google Patents

Substrate processing apparatus, conversion method and load-shifting method Download PDF

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Publication number
CN102205911A
CN102205911A CN2011100410661A CN201110041066A CN102205911A CN 102205911 A CN102205911 A CN 102205911A CN 2011100410661 A CN2011100410661 A CN 2011100410661A CN 201110041066 A CN201110041066 A CN 201110041066A CN 102205911 A CN102205911 A CN 102205911A
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CN
China
Prior art keywords
substrate
roller
carrying
bench board
carrying direction
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Granted
Application number
CN2011100410661A
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Chinese (zh)
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CN102205911B (en
Inventor
高木善则
辻雅夫
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Dainippon Screen Manufacturing Co Ltd
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Dainippon Screen Manufacturing Co Ltd
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Priority claimed from JP2010074259A external-priority patent/JP5165718B2/en
Priority claimed from JP2010074370A external-priority patent/JP5254269B2/en
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to CN201310087413.3A priority Critical patent/CN103177991B/en
Publication of CN102205911A publication Critical patent/CN102205911A/en
Application granted granted Critical
Publication of CN102205911B publication Critical patent/CN102205911B/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67793—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with orientating and positioning by means of a vibratory bowl or track

Abstract

The invention provides a substrate processing apparatus, a conversion method and a transferring method. The length of a part float supporting a substrate at the transportation direction during changing the supporting modes for the substrate can be suppressed and elevating rollers can be prevented from contacting with other components. A conversion portion 20 of the substrate processing apparatus 1 comprises a plurality of elevating rollers 21, a plurality of free rollers 24 and an entrance floating workbench 25. During changing the supporting mode for a substrate 9, the a part at the upstream of the substrate 9 along the transportation direction shifts load to the free rollers 24, so as to suppress the length of the entrance floating workbench 25 at the transportation direction and change the supporting mode of the substrate 9. Free roller 24 in a simple structure reliably supports the substrate 9 and can be arranged in a small region, so that free rollers 24 can be arranged at places without contacting the elevating rollers 21.

Description

Substrate board treatment, conversion method and method for shifting
Technical field
The method that the present invention relates to have the substrate board treatment of the mechanism of carrying substrate, the supporting way of substrate is changed and the method for shifting of transfer substrate.
Background technology
With in the Fabrication procedure of substrate, use the various substrate board treatments of mechanism with precision electronic devices such as substrates with substrate, used for solar batteries substrate, Electronic Paper with flexible base, board, base board for optical mask, colour filter with glass substrate, semiconductor wafer, film liquid crystal at liquid crystal indicator with carrying substrate.Along with the variation in epoch, the size that becomes the substrate of handling object in such substrate board treatment has the trend of maximization.In recent years, for the level and the substrate of carrying large stably, while proposed to make substrate on bench board, to float the carrying mechanism of carrying.
While substrate is floated in the substrate board treatment of carrying, the supporting way of substrate need be converted to the mechanism of floating supporting way from other supporting way on bench board.Technology as the supporting way of conversion baseplate has been put down in writing following substrate transfer apparatus in patent documentation 1, that is, this substrate transfer apparatus has from the carrying mechanism different with floating carrying and is converted to the mechanism of floating carrying.In patent documentation 1, descend by the roller that makes supporting substrate, the substrate floating on the roller is remained on be configured to the floating of curtain shape with on the plate.
In addition, while in the substrate board treatment that the end edge portion that substrate is floated keep substrate on bench board is carried, need the end edge portion of the substrate that will come by other carrying mechanisms carryings remain on mechanism on the maintaining part of regulation.Mechanism as the end edge portion that keeps substrate has put down in writing following mechanism in patent documentation 2, that is, this mechanism makes the absorption sucker rise to come near substrate by the sucker actuator, and described absorption sucker is adsorbed on the lower surface of substrate by vacuum adsorption force.
Patent documentation 1:JP spy opens the 2008-166348 communique;
Patent documentation 2:JP spy opens the 2009-117571 communique.
Summary of the invention
(1) first purpose
In the substrate transfer apparatus of patent documentation 1, on the position of the supporting way of conversion baseplate, need length to use plate more than or equal to the floating of size of substrate on the carrying direction.In addition, in the substrate transfer apparatus of patent documentation 1, be configured to floating of curtain shape dispose in the gap with plate can lifting roller.Be difficult to like this, in design alternately dispose and float with plate, roller and make the mechanism of roller lifting in mutually non-touching mode.
Therefore, first purpose provide in the converter section of the supporting way of conversion baseplate, suppress to float supporting substrate part on the carrying direction length and the substrate board treatment that can easily avoid dance roller to contact with other members.
(2) second purposes
In the substrate board treatment of patent documentation 2, make the lower surface of absorption sucker near static substrate.Thus, need be used to make the sucker actuator of absorption sucker lifting moving.The result makes the structure of the trucking department that comprises the sucker actuator become complicated.
In addition, in the substrate board treatment of patent documentation 2, the height of substrate requires the sucker actuator to have high accuracy of positioning during for regulation carrying critically.In addition, reckon with also that the duplicability of sucker actuator location can reduce by long use.If will keep the duplicability of sucker actuator location for a long time, then also need the mechanism of the height and position of sucker actuator supervision absorption sucker in addition.
Therefore, while second purpose provides the dislocation that need not make the maintaining part lifting moving and can suppress substrate keeps substrate from lower face side technology.
In order to reach above-mentioned first purpose, the application's first invention is a kind of substrate board treatment, has the mechanism of carrying substrate, have: first trucking department, its with board carrying to the assigned position of carrying on the path, second trucking department, it is in the carrying direction downstream of described assigned position, substrate is floated on one side on bench board, one side carrying substrate, converter section, the supporting way of its conversion baseplate between described first trucking department and described second trucking department, control part, it controls described converter section; Described converter section has: dance roller, the one edge joint touches supporting substrate, one side active rotation, can be between normal place and lowering position lifting moving, free roller (free roller), it on one side is supported on substrate contacts the height and position between the upper end of described dance roller of the upper end of described dance roller of normal place and lowering position, one side is corresponding to the mobile and driven rotation of substrate, inlet floats bench board, it is configured in the carrying direction downstream of described free roller, make substrate floating at the low height of bearing height on one side than the described dance roller supporting substrate that passes through normal place, on one side supporting substrate; Described control part is controlled described converter section, make and be configured to after the described dance roller of normal place and described inlet float on the bench board at substrate, described dance roller descends to described lowering position, with the part of the carrying direction upstream side of substrate to described free roller transfer.
The application's second invention for as the substrate board treatment of first invention, wherein, described inlet floats bench board and is shorter in length than the length of substrate on the carrying direction in carrying on the direction.
The application's the 3rd invention for as the substrate board treatment of first invention or second invention, wherein, the zone that disposes described dance roller and described free roller is being shorter in length than the length of substrate on the carrying direction on the carrying direction.
The application's the 4th invention is the substrate board treatment as first invention or second invention, wherein, described free roller comprises: the free roller in a plurality of downstreams, its lateral edge portion of floating the carrying direction upstream side of bench board along described inlet is arranged, the free roller of a plurality of upstream sides, it is arranged in the position of the carrying direction upstream side of the free roller in described a plurality of downstreams; The free roller of described a plurality of upstream side is configured to the density that density is lower than the free roller in described a plurality of downstreams.
The application's the 5th invention is the substrate board treatment as first invention or second invention, wherein, described converter section also has detent mechanism, this detent mechanism under substrate is configured to float across the described dance roller of normal place and described inlet state on the bench board, decision substrate position in the horizontal direction.
The application's the 6th invention is the substrate board treatment as first invention or second invention, wherein, to float the brace table of bench board different with supporting described inlet for the brace table that supports described dance roller and described free roller, and described dance roller and described free roller float bench board with described inlet and be not connected mutually.
The application's the 7th invention is the substrate board treatment as first invention or second invention, and wherein, described free roller is the roller of diameter less than the diameter of described dance roller.
In addition, in order to reach above-mentioned first purpose, the application's the 8th invention is conversion method, the supporting way of conversion baseplate between first trucking department and second trucking department, wherein, described first trucking department with board carrying to the assigned position of carrying on the path, described second trucking department is in the carrying direction downstream of described assigned position, substrate is floated on one side on bench board, one side carrying substrate, this conversion method is utilized dance roller, free roller and inlet float bench board, wherein, described dance roller contacts supporting substrate on one side, one side active rotation, can be between normal place and lowering position lifting moving, described free roller is supported on substrate contacts the height and position between the upper end of described dance roller of the upper end of described dance roller of normal place and lowering position on one side, one side is corresponding to the mobile and driven rotation of substrate, described inlet floats the carrying direction downstream that bench board is configured in described free roller, make on one side substrate floating to the low height of bearing height than the described dance roller supporting substrate of normal place, one side supporting substrate, this conversion method has: operation a, substrate is configured to float on the bench board across the described dance roller and the described inlet of normal place, operation b, behind described operation a, described dance roller is descended to described lowering position, with the part of the carrying direction upstream side of substrate to described free roller transfer.
In addition, in order to reach above-mentioned second purpose, the application's the 9th invention is substrate board treatment, has the mechanism of carrying substrate, has: first trucking department, its from carrying direction upstream side with board carrying to assigned position, second trucking department, its from described assigned position to carrying direction downstream carrying substrate, transfer portion, it transfers load to described second trucking department with substrate from described first trucking department at described assigned position; Described transfer portion has jacking mechanism, this jacking mechanism is touched under the situation of the state that is supported for flat-hand position in a part of keeping substrate, other parts of jack-up substrate, described second trucking department has the maintaining part that keeps substrate to move in the carrying direction from lower face side on one side on one side, this substrate board treatment also has control part, described control part is controlled described jacking mechanism and described maintaining part, make by described jacking mechanism partly the jack-up substrate and make described maintaining part enter substrate by the part of jack-up below after, by the jack-up of removing described jacking mechanism substrate is remained on the described maintaining part.
The application's the tenth invention as the substrate board treatment of the 9th invention, wherein, described transfer portion also has the detent mechanism that substrate is carried out the location on the horizontal direction, described control part is controlled described detent mechanism and described jacking mechanism, make after described detent mechanism positions substrate, by described jacking mechanism jack-up substrate.
The application's the 11 invention is the substrate board treatment as the tenth invention, wherein, described detent mechanism has the align member with the end edge portion butt of substrate, described control part is controlled described jacking mechanism and described detent mechanism, make after positioning by described detent mechanism, keep out of the way from substrate with the described align member of described other part butts of substrate, then, by described jacking mechanism jack-up substrate.
The application's the 12 invention for as the 9th invention each substrate board treatment to the 11 invention, wherein, described maintaining part has: maintenance face, the height and position of its lower surface of regulation substrate when keeping, the elasticity Adsorbing matter, it can stretch on above-below direction, and is adsorbed on the lower surface of substrate; Before described elasticity Adsorbing matter was adsorbed on the substrate, the upper end of described elasticity Adsorbing matter was positioned at the top of described maintenance face, and when described elasticity Adsorbing matter was adsorbed on the substrate, the upper end of described elasticity Adsorbing matter was positioned at the height identical with described maintenance face.
The application's the 13 invention for as the 9th invention each substrate board treatment to the 11 invention, wherein, described jacking mechanism with substrate perpendicular near the jack-up both ends on the direction of carrying direction.
In addition, in order to reach above-mentioned second purpose, the application's the 14 invention is method for shifting, substrate is transferred load to second trucking department from first trucking department, comprise: operation a, Yi Bian keep the part of substrate be touched be supported for flat-hand position state, Yi Bian with other part jack-up of substrate; Operation b, behind described operation a, make maintaining part enter substrate by the below of the part of jack-up; Operation c behind described operation b, by removing the jack-up to substrate, remains on the described maintaining part substrate.
The application's the 15 invention for as the method for shifting of the 14 invention, wherein, also have operation d, described operation d carried out location on the horizontal direction to substrate before described operation a.
The application's the 16 invention is the method for shifting as the 15 invention, wherein, in described operation d, make the end edge portion butt of align member and substrate, also have operation e between described operation d and described operation a, described operation e makes with the described align member of described other part butts of substrate and keeps out of the way from substrate.
According to the application first the invention to the 8th the invention, in converter section, the part of the carrying direction upstream side of substrate from the dance roller transfer to free roller.Thus, float the length of bench board on the carrying direction on one side can suppress to enter the mouth, Yi Bian the supporting way of conversion baseplate.Free roller can be by simple reliable in structure ground supporting substrate, and can be configured in the narrow and small zone.Thereby, be easy to free roller is configured in not and the dance roller position contacting.
Especially, according to the application's the 3rd invention, can suppress to dispose the length of zone on the carrying direction of dance roller and free roller.
Especially, according to the application's the 4th invention, can suppress enters the mouth floats the end edge portion and the substrate contacts of the carrying direction upstream side of bench board, and can suppress the quantity of free roller as a whole.
Especially, according to the application's the 5th invention, substrate is oriented to contact the state that is supported on the dance roller.Therefore, can be by the friction between dance roller and substrate, suppress substrate the moving in the horizontal direction behind the location.
Especially, according to the application's the 6th invention, the mechanical vibration that can suppress dance roller and free roller are transmitted to inlet and float bench board.
Especially, the 7th invention according to the application is easier to free roller is configured in not and the dance roller position contacting.
According to the application's the 9th invention～the ten six invention, by local jack-up substrate, can make maintaining part enter under the situation of lifting moving not substrate below.Thereby, on one side the fixing height and position of maintaining part, Yi Bian keep substrate from lower face side.In addition, with substrate jack-up the time, the part of substrate is touched and is supported for flat-hand position.The dislocation of the substrate in the time of therefore, can suppressing jack-up.
Especially, according to the application's the tenth invention or the 15 invention, maintaining part can keep the more accurate position of base lower surface.
Especially, the 11 invention or the 16 invention according to the application can prevent in substrate align member and substrate moving contact during by jack-up.
Especially, according to the application's the 12 invention, by making the elasticity Adsorbing matter be adsorbed on the lower surface of substrate and shrink, can be to the further lower surface of substrate of maintenance face.
Especially, according to the application's the 13 invention, with substrate jack-up the time, the power on the carrying direction is difficult for acting on substrate.Therefore, with substrate jack-up the time, can suppress the offset of substrate on the carrying direction.
Description of drawings
Fig. 1 is the birds-eye view of substrate board treatment.
Fig. 2 is near the birds-eye view first trucking department and the converter section.
Fig. 3 is near the lateral plan first trucking department and the converter section.
Fig. 4 is the figure that dance roller, lift drive mechanism, free roller and clamping mechanism are observed in the A-A position from Fig. 1.
Fig. 5 is the figure that dance roller, lift drive mechanism, free roller and clamping mechanism are observed in the A-A position from Fig. 1.
Fig. 6 is the block diagram of the electric connection structure between the each several part of expression control part and substrate board treatment.
Fig. 7 is the diagram of circuit of flow process of the action of expression substrate board treatment.
Fig. 8 is that substrate is configured near the lateral plan the converter section when floating on the bench board across dance roller and inlet.
Fig. 9 is near the lateral plan of converter section when a plurality of lift pins are risen.
Figure 10 is near the lateral plan the converter section that makes after dance roller descends.
Figure 11 is near the lateral plan converter section when clamping mechanism is configured in the downside at the both ends on the Width of substrate.
Near converter section when Figure 12 is the both ends that make on the Width of clamping mechanism absorption substrate lateral plan.
Figure 13 is the birds-eye view of substrate board treatment.
Figure 14 is near the birds-eye view first trucking department and the transfer portion.
Figure 15 is near the lateral plan first trucking department and the transfer portion.
Figure 16 is near the semi-sictional view enlarged drawing of upper surface of absorption maintaining part.
Figure 17 is near the semi-sictional view enlarged drawing of upper surface of absorption maintaining part.
Figure 18 is the block diagram of the electric connection structure between the each several part of expression control part and substrate board treatment.
Figure 19 is the diagram of circuit of flow process of the action of expression substrate board treatment.
Figure 20 is near the lateral plan the transfer portion.
Figure 21 is the figure that near the structure the transfer portion is observed in the B-B position from Figure 13.
Figure 22 is near the lateral plan the transfer portion.
Figure 23 is the figure that near the structure the transfer portion is observed in the B-B position from Figure 13.
Figure 24 is near the lateral plan the transfer portion.
Figure 25 is the figure that near the structure the transfer portion is observed in the B-B position from Figure 13.
Figure 26 is near the lateral plan the transfer portion.
Figure 27 is the figure that near the structure the transfer portion is observed in the B-B position from Figure 13.
Figure 28 is near the lateral plan the transfer portion.
Figure 29 is the figure that near the structure the transfer portion is observed in the B-B position from Figure 13.
The specific embodiment
Below, with reference to the description of drawings embodiments of the present invention.
＜1. first embodiment 〉
The structure of＜1-1. substrate board treatment 〉
Fig. 1 is the birds-eye view of the substrate board treatment 1 of first embodiment of the present invention.Upper surface at substrate 9 in the photo-mask process of the rectangle glass 9 that this substrate board treatment 1 is used for using at the etching liquid crystal device (below, only claim " substrate 9 ") applies liquid against corrosion (photoresist liquid).Substrate board treatment 1 has the mechanism that substrate 9 is supported for flat-hand position one side carrying substrate 9 on one side.Below, the direction of carrying substrate 9 is called " carrying direction ", will be called " Width " perpendicular to the horizontal direction of carrying direction.In each figure of the application, represent to carry direction and Width with arrow.
As shown in Figure 1, substrate board treatment 1 has first trucking department 10, converter section 20, second trucking department 30, liquid applying mechanism 40 against corrosion, takes out of portion 50 and control part 60.Fig. 2 is near the birds-eye view first trucking department 10 and the converter section 20.Fig. 3 is near the lateral plan first trucking department 10 and the converter section 20.In addition, Fig. 4 and Fig. 5 are the figure of A-A position observation dance roller 21, lift drive mechanism 23, free roller 24 and clamping mechanism 32 from Fig. 1.Below, see figures.1.and.2～Fig. 5.
First trucking department 10 is the substrate 9 of will take out of from the device 2 of front operation is transported to converter section 20 along the carrying path positions.The S. A. 11a that first trucking department 10 has to extend along Width is a plurality of conveying rollers 11 that the center is rotated.In the present embodiment, on a plurality of S. A. 11a that uniformly-spaced arrange along its length, in equally spaced mode on the Width 4 conveying rollers 11 are installed respectively.A plurality of conveying rollers 11 are configured in the fixing height and position of mono-.
On the S. A. 11a of conveying roller 11, connecting the rotary drive mechanism of schematically representing among Fig. 2 12.Rotary drive mechanism 12 for example is the mechanism that the synchronous band that will become the motor of drive source and transmission of drive force combines.If make rotary drive mechanism 12 actions, then a plurality of conveying rollers 11 are on one's own initiative to same direction rotation.Thus, contact the substrate 9 that is supported on the conveying roller 11 to the downstream carrying of carrying direction.
Converter section 20 is the positions that are used for the supporting way of conversion baseplate 9 between first trucking department 10 and second trucking department 30.As Fig. 1～shown in Figure 5, converter section 20 has a plurality of dance rollers 21, rotary drive mechanism 22, lift drive mechanism 23, a plurality of free roller 24, inlet and floats bench board 25,4 guide reels 26, detent mechanism 27 and a plurality of lift pins 28.
A plurality of dance rollers 21 are that to be arranged to can be the roller that the center is rotated and can oscilaltion moves with the S. A. 21a that extends along Width.In the present embodiment, on two S. A. 21a that arrange along its length respectively with Width on equally spaced mode 4 dance rollers 21 are installed.
On S. A. 21a, connecting the rotary drive mechanism of schematically representing among Fig. 2 22.Rotary drive mechanism 22 for example is the mechanism that the synchronous band that will become the motor of drive source and transmission of drive force combines.If make rotary drive mechanism 22 actions, then a plurality of dance rollers 21 are on one's own initiative to same direction rotation.Thus, contact the substrate 9 that is supported on the dance roller 21 to the downstream carrying of carrying direction.
As shown in Figure 4 and Figure 5, on the S. A. 21a of dance roller 21, connecting lift drive mechanism 23.Lift drive mechanism 23 has: arm 23a, and it is via bearings S. A. 21a; Cylinder 23b, it makes arm 23a lifting moving.If make cylinder 23b action, then a plurality of dance rollers 21 are lifting moving between normal place shown in Figure 4 and lowering position shown in Figure 5.In addition, lift drive mechanism 23 also can utilize the driver train (for example, motor) except cylinder.
The height and position of upper end that is configured in the height and position of upper end (with the position of the lower surface of substrate 9 contact) of the dance roller 21 of normal place and conveying roller 11 is roughly consistent.In addition, the height and position of upper end that is configured in the dance roller 21 of lowering position is positioned at the below of height and position of the upper end of free roller 24.
A plurality of free rollers 24 are the rollers that are used for when dance roller 21 has descended replacing the part of the carrying direction upstream side of 21 pairs of substrates 9 of dance roller to support.A plurality of free rollers 24 rotate freely with respect to the intrinsic S. A. that is arranged on each roller.Under the part of substrate 9 was supported on state on the free roller 24, if substrate 9 side shifting downstream, then a plurality of free rollers 24 correspondinglyly and drivenly rotated with the mobile phase of substrate 9.
A plurality of free rollers 24 are configured on the fixing height and position of mono-.The height and position of the upper end of free roller 24, be in the dance roller 21 that is configured in normal place the upper end height and position the below and be in the top of height and position of the upper end of the dance roller 21 that is configured in lowering position.In addition, the height and position of the upper end of free roller 24 is in and is supported on inlet and floats the lower surface of the substrate 9 on the bench board 25 and the upper end height and position in the roughly same height of clamping mechanism described later 32.
In addition, as depicted in figs. 1 and 2, each free roller 24 is configured in overlooks down the position that does not overlap with the S. A. 21a of a plurality of dance rollers 21 and dance roller 21.Therefore, the S. A. 21a of a plurality of dance rollers 21 and dance roller 21 can not with situation that a plurality of free rollers 24 contact under lifting moving.
As shown in Figure 2, a plurality of free rollers 24 comprise free roller 24a in a plurality of downstreams and the free roller 24b of a plurality of upstream side.The free roller 24a in a plurality of downstreams floats between the bench board 25 at dance roller 21 and the inlet in the downstream that is disposed at the carrying direction, the broad ways arrangement.That is, the free roller 24a in a plurality of downstreams floats the end edge portion arrangement of the carrying direction upstream side of bench board 25 along inlet.On the other hand, the free roller 24b of a plurality of upstream sides is arranged in the position of the carrying direction upstream side of the free roller 24a in downstream.
The interval on Width is narrow each other than the free roller 24b of adjacent upstream side at the interval on the Width each other for the free roller 24a in adjacent downstream.Therefore, substrate 9 in downwards bending between the free roller 24a in downstream less than substrate 9 downwards bending between the free roller 24b of upstream side.Thus, suppress the end edge portion of carrying direction upstream side and contacting of substrate 9 that inlet floats bench board 25.In addition, by with the free roller 24b of density configuration upstream side, come the whole quantity that reduces free roller 24 less than the free roller 24a in downstream.
In addition, in the present embodiment, use the free roller 24 of diameter less than the diameter of dance roller 21.Therefore, guarantee the space of dance roller 21 lifting moving, and be easy to a plurality of free rollers 24 are configured in not and dance roller 21 position contacting.Free roller 24 can disconnect fully with driver train, as long as still can remove the transmission of power from driver train, then can be connected with the driver train of some.But the mode that does not connect driver train on free roller 24 can more easily be guaranteed the space that dance roller 21 carries out lifting, preferred thus this mode.
As shown in Figure 3, a plurality of conveying rollers 11, a plurality of dance roller 21 and a plurality of free roller 24 are supported by shared roller brace table 71.On the other hand, inlet floats bench board 25, application job platform 31 described later and outlet described later and floats bench board 51 and supported by the bench board brace table 72 of the other setting different with roller brace table 71.
That is to say, in the present embodiment, the position by roller contact supporting substrate 9 and substrate 9 is floated be supported on position on the bench board by different brace table supports, and do not connect mutually.Thus, suppressing mechanical vibration from conveying roller 11, dance roller 21 and free roller 24 is transmitted to inlet and floats bench board 25, application job platform 31 and outlet and float bench board 51.
Inlet floats the carrying direction downstream that bench board 25 is configured in a plurality of free rollers 24.Inlet floats bench board 25 with dance roller 21, free roller 24 or application job platform described later 31 supporting substrates 9.The upper surface that floats bench board 25 at inlet is provided with and is used to spray compressed-air actuated a plurality of squit hole 25a.
When carrying substrate 9, never graphic supply source compressed and supplied air sprays towards the top from a plurality of squit hole 25a.By pressurized air supporting substrate 9, it is become from inlet float the state that the upper surface of bench board 25 floats from a plurality of squit hole 25a ejection.That is, inlet floats the mode supporting substrate 9 of bench board 25 not contact with the lower surface of substrate 9.
4 guide reels 26 are to be used in converter section 20 mechanism to substrate 9 channeling conducts on the carrying direction.4 guide reels 26 are configured in the both sides on the carrying path of substrate 9.Each guide reel 26 can the above S. A. that extends down be that the center is rotated.If substrate 9 breaks away from the carrying path, then guide reel 26 contacts with the end edge portion of substrate 9 on one side, Yi Bian be rotated.Thus, revise substrate 9 towards, thereby carrying substrate 9 on the carrying direction correctly.
Can make 4 guide reel 26 lifting moving by not shown driver train.During carrying substrate 9,4 guide reels 26 are in the state of the both sides on the carrying path that rises to substrate 9 in converter section 20.On the other hand, clamping mechanism 32 described later enter substrate 9 below the time, 4 guide reels 26 are in the state that drops to the height and position that does not contact with clamping mechanism 32.
Detent mechanism 27 is to be used for the mechanism that substrate 9 positioned at converter section 20.Detent mechanism 27 has a plurality of locating dowel pin 27a that extend up and down.A plurality of locating dowel pin 27a are configured in the position that surrounds the substrate 9 that is disposed in the converter section 20.Each locating dowel pin 27a can by not shown driver train and the position of the end edge portion butt of substrate 9 and leave between the position of end edge portion of substrate 9 and move.
When substrate 9 is configured to dance roller 21 on normal place and inlet and floats on the bench board 25, the end edge portion butt of a plurality of locating dowel pin 27a and substrate 9.Thus, determined substrate 9 position and posture in the horizontal direction.On the other hand, when carrying substrate 9 and clamping mechanism 32 enter substrate 9 below the time, a plurality of locating dowel pin 27a keep out of the way not and substrate 9 and clamping mechanism 32 position contacting.
A plurality of lift pins 28 are the mechanisms that are used for temporarily lifting the both ends on the Width of substrate 9 when the supporting way of converter section 20 conversion baseplate 9.A plurality of lift pins 28 are configured in following position, that is, under substrate 9 was positioned the state that mechanism 27 located, the both ends from the Width of substrate 9 relied on the inboard on the Width slightly.In addition, by not shown driver train, can make a plurality of lift pins 28 lifting moving integratedly.When a plurality of lift pins 28 are risen, the lower surface butt of lift pin 28 and substrate 9, the both ends on the Width of substrate 9 are lifted by lift pin 28.
In the present embodiment, a plurality of lift pins 28 are configured in the Width inboard at the both ends on the Width that floats bench board 25 that enters the mouth.Therefore, clamping mechanism 32 described later can with under the situation that a plurality of lift pins 28 contact not enter the position that inlet floats the Width outside of bench board 25.In addition, the part of being adsorbed by clamping mechanism 32 at least that needs only in the substrate 9 is exposed to the Width outside that inlet floats bench board 25.Therefore, can suppress substrate 9 and float the amount of exposing that bench board 25 exposes from inlet.
As shown in Figure 2, converter section 20 is set at the length (that is, being longer than the degree of the length of substrate 9 on the carrying direction slightly) that roughly can dispose a substrate 9 in the length L 1 on the carrying direction.It is all short than the length of substrate 9 on the carrying direction in the length L 3 on the carrying direction that bench board 25 is floated at length L 2 on the carrying direction and inlet in the zone that disposes dance roller 21 and free roller 24 in the converter section 20.Thus, can suppress the length of converter section 20 on the carrying direction.
Float the bench board of supporting substrate 9 as inlet floats bench board 25, need high process technology at aspects such as forming squit hole 25a, manufacturing cost is also high.In the present embodiment, can suppress inlet as described above and float the length of bench board 25 on the carrying direction.Thus, the manufacturing of substrate board treatment 1 becomes easily, also can suppress manufacturing cost.In addition, can also suppress to float the amount of bench board 25 compressed and supplied air to inlet.
Second trucking department 30 is to the position of carrying direction downstream carrying substrate 9 when applying liquid against corrosion on the upper surface of substrate 9.As shown in Figure 1, second trucking department 30 has application job platform 31 and a pair of clamping mechanism 32.
Application job platform 31 is configured in the carrying direction downstream that inlet floats bench board 25.The upper surface of application job platform 31 is provided with a plurality of attractions hole that is used to spray compressed-air actuated a plurality of squit hole and is used to attract the air on the application job platform 31.On application job platform 31 during carrying substrate 9, the pressure upward that produces from a plurality of squit holes ejection pressurized airs and air-breathing to a plurality of attractions hole and pressure downwards that produce acts on substrate 9.Thus, substrate 9 is supported for a little the state that floats from the upper surface of application job platform 31 with being stabilized.
The Width outside at application job platform 31 disposes pair of right and left clamping mechanism 32.In each clamping mechanism 32, the carrying direction is provided with a pair of adsorption section 32a of the lower surface of the end on the Width that is used to adsorb substrate 9.In addition, each clamping mechanism 32 can move by the guide rail 32b on the upper surface that is formed on bench board brace table 72 on the carrying direction by driver trains such as linear motors.As shown in Figure 1, guide rail 32b position from the Width of free roller 24 outside on the carrying direction extends to the position that the Width outside of bench board 51 is floated in outlet described later.A pair of clamping mechanism 32 can adsorb on one side and keep substrate 9, on one side substrate 9 is transported to the portion of taking out of 50 from converter section 20.
Liquid applying mechanism 40 against corrosion is the mechanisms that are used for to apply liquid against corrosion while the upper surface that is supported on the substrate 9 that is handled upside down on the application job platform 31.In Fig. 1,, dot liquid applying mechanism 40 against corrosion for application job platform 31 and clamping mechanism 32 clearly are shown.Liquid applying mechanism 40 against corrosion have Width put on the shelf above application job platform 31 bridge formation portion 41 and be installed in gap nozzle 42 in the bridge formation portion 41.Gap nozzle 42 sprays the liquid against corrosion of never graphic liquid supply source supply against corrosion via the ejiction opening of the slit-shaped of extending along Width to the upper surface of substrate 9.
Take out of portion 50 and be the substrate 9 that is used for to have applied liquid against corrosion from position that substrate board treatment 1 is taken out of.As shown in Figure 1, taking out of portion 50 has outlet and floats bench board 51 and a plurality of taking out of with pin 52.
The carrying direction downstream that bench board 51 is configured in application job platform 31 is floated in outlet.The upper surface that bench board 51 is floated in outlet is provided with and is used to spray compressed-air actuated a plurality of squit hole.Substrate 9 is being supported on outlet when floating on the bench board 51, never graphic supply source compressed and supplied air sprays towards the top from a plurality of squit holes.By pressurized air supporting substrate 9, it is become from outlet float the state that the upper surface of bench board 51 floats from the ejection of a plurality of squit holes.That is, the mode supporting substrate 9 of bench board 51 not contact with the lower surface of substrate 9 floated in outlet.
A plurality of taking out of with pin 52 in the surface of bench board 51 is floated in outlet equally spaced arranged along carrying direction and Width.A plurality of taking out of with the upper end contact supporting substrate 9 of pin 52 by them.In addition, can make a plurality of taking out of use pin 52 lifting moving integratedly by not shown driver train.Therefore, a plurality of taking out of used pin 52 supporting substrate 9 on one side, Yi Bian substrate 9 is moved up and down.
From application job platform 31 when bench board 51 carrying substrates 9 are floated in outlet, contact with substrate 9 for fear of a plurality of taking out of with pins 52, a plurality of take out of to be in pin 52 keep out of the way the state of below that the upper surface of bench board 51 is floated in outlet.In addition, when floating bench board 51 from outlet and take out of substrate 9, a plurality of taking out of with pin 52 is projected into the top that the upper surface of bench board 51 is floated in outlet.Thus, lift substrate 9 to the top that bench board 51 is floated in outlet.Be supported on a plurality of taking out of and be configured in the device 4 that the shifting mechanical arm 3 that exports the carrying direction downstream of floating bench board 51 is carried to the back operation with the substrate on the pin 52 9.
Control part 60 is made of the computing machine with CPU and memory device.Fig. 6 is the block diagram of the electric connection structure between the each several part of expression control part 60 and substrate board treatment 1.As shown in Figure 6, control part 60 is connected with cylinder 23b with rotary drive mechanism 12,22.In addition, control part 60 also with in Fig. 1～Fig. 5, omitted graphic other driver trains, compressed-air actuated feed mechanism, exhaust gear, sensor etc. and be connected.Control part 60 is electrically controlled the action of each part mentioned above according to predefined program and data.Thus, in substrate board treatment 1, substrate 9 is handled.
The action of＜1-2. substrate board treatment 〉
The action of substrate board treatment 1 then, is described.Fig. 7 is the diagram of circuit of flow process of the action of expression substrate board treatment 1.
In substrate board treatment 1 during treatment substrate 9, at first, the substrate 9 (step S1) of taking out of from the device 2 of front operation by 10 carryings of first trucking department.Substrate 9 is transferred roller 11 contacts and supports, by the rotation of conveying roller 11, to carrying direction downstream carrying substrate 9.At this moment, dance roller 21 is configured in normal place, to the direction rotation identical with the hand of rotation of conveying roller 11.Therefore, continuously substrate 9 is transported to converter section 20 by conveying roller 11 and dance roller 21.
In addition, at this moment, 4 guide reels 26 are in the state of the both sides on the carrying path that rises to substrate 9.Substrate 9 is guided by these guide reels 26, thereby correctly carries to carrying direction downstream.
When substrate 9 arrived converter section 20, dance roller 21 stopped the rotation.Thus, substrate 9 stops (step S2) under the state that floats across dance roller 21 and inlet on the bench board 25.
Fig. 8 is that substrate 9 is configured near the lateral plan the converter section 20 when dance roller 21 and inlet float on the bench board 25.The part contact of the carrying direction upstream side of substrate 9 is supported on the dance roller 21 of normal place.On the other hand, the part in the carrying direction downstream of substrate 9 float being supported on the inlet float on the bench board 25.The being supported on height and position that inlet floats the part on the bench board 25 in the substrate 9 is lower than the height and position that is supported on the part on the dance roller 21.
Then, each end edge portion butt of the carrying direction upstream side of a plurality of locating dowel pin 27a and substrate 9, carrying direction downstream and Width both sides.Thus, decision substrate 9 position and posture (step S3) in the horizontal direction.
When finishing the location of substrate 9,4 guide reels 26 descend and keep out of the way to the retreating position of regulation.In addition, the locating dowel pin 27a of two end edge portion butts among a plurality of locating dowel pin 27a and Width substrate 9 also leaves substrate 9 and keeps out of the way to the retreating position of regulation.After locating dowel pin 27a kept out of the way, the part of the carrying direction upstream side of substrate 9 was also supported by dance roller 21 contacts.Therefore, the static friction by 21 of substrate 9 and dance rollers prevents the dislocation of substrate 9 on Width.
Then, make a plurality of lift pins 28 risings (step S4).The lower surface butt of lift pin 28 and substrate 9 lifts the both ends on the Width of substrate 9.Fig. 9 is near the lateral plan the converter section 20 when a plurality of lift pins 28 are risen.As shown in Figure 9, the upper end of a plurality of lift pins 28 rises to the top position of upper end of the dance roller 21 of normal place.
In addition, the substrate 9 of present embodiment is large-scale and have flexible.Therefore, in step S4, only be picked up near the both ends on the Width in the substrate 9.Middle body on the Width of substrate 9 is kept by dance roller 21 and inlet and is floated the state that bench board 25 supports.Thereby the static friction by 21 of substrate 9 and dance rollers prevents the dislocation of substrate 9 on Width.
In addition, in the present embodiment, after the locating dowel pin 27a of two end edge portion butts on the Width that makes with substrate 9 keeps out of the way, a plurality of lift pins 28 are risen.Therefore, when lift pin 28 was risen, end edge portion on the Width of substrate 9 and locating dowel pin 27a can moving contacts.Thus, can prevent to produce particle because of the moving contact of substrate 9 and locating dowel pin 27a.
Then, make dance roller 21 from normal place to lowering position descend (step S5).Figure 10 is near the lateral plan the converter section 20 that makes after dance roller 21 descends.The height and position of the upper end of dance roller 21 is positioned at the below of height and position of the upper end of free roller 24.At this moment, also constant near the both ends on the Width of substrate 9 by lift pin 28 supports, but near the central authorities on the Width, the part that a plurality of free rollers 24 replace a plurality of dance rollers 21 to come supporting substrate 9.
Then, as shown in Figure 11, clamping mechanism 32 is moved to carrying direction upstream side.Thus, make clamping mechanism 32 be configured in the downside at the both ends on the Width of substrate 9.Then, after making adsorption section 32a begin to attract action, as shown in Figure 12, a plurality of lift pins 28 are descended.Thus, make both ends (step S6) on the Width of adsorption section 32a absorption substrate 9 of clamping mechanism 32.Substrate 9 is in following state, that is, the part contact of carrying direction upstream side is supported on the free roller 24, and the part in carrying direction downstream is floated, and being supported on enters the mouth floats on the bench board 25, and the both ends absorption on the Width remains on the clamping mechanism 32.
In converter section 20, carry out during the action of step S3～S6 the end edge portion butt in the carrying direction upstream side of locating dowel pin 27a and substrate 9 and carrying direction downstream.Therefore, prevent the dislocation of substrate 9 on the carrying direction.In addition, during step S3～S6, substrate 9 is supported by dance roller 21 or 24 contacts of free roller constantly.Therefore, can pass through the static friction of 9 of dance roller 21 or free roller 24 and substrates, prevent the dislocation of substrate 9 on Width.
In addition, in the present embodiment, utilize a plurality of lift pins 28 temporarily to lift near the both ends on the Width of substrate 9, descend by making this lift pin 28, the lower surface that makes substrate 9 is near clamping mechanism 32.Therefore, do not need to make the adsorption section 32a of clamping mechanism 32 to move up and down.Thereby, can simplify the structure of clamping mechanism 32.
When substrate 9 is kept by a pair of clamping mechanism 32, keep out of the way to the retreating position of regulation with the carrying direction upstream side of substrate 9 and the locating dowel pin 27a of the end edge portion butt in carrying direction downstream.Then, clamping mechanism 32 moves to carrying direction downstream along guide rail 32b, comes to carrying direction downstream carrying substrate 9.
Substrate 9 floats on one side and is supported on above-mentioned inlet and floats bench board 25, application job platform 31 and outlet and float on bench board 51 each bench board, from inlet float bench board 25 and via application job platform 31 be transported to outlet float bench board 51 on one side.Gap nozzle 42 sprays liquid against corrosion towards the upper surface of the substrate 9 of carrying on application job platform 31.Thus, coating liquid against corrosion (step S7) on the upper surface of substrate 9.
In addition, in the present embodiment, before the lower position of gap nozzle 42 was closed in the end in the carrying direction downstream of substrate 9, the end portion supports of the carrying direction upstream side of substrate 9 was floated on the bench board 25 at inlet.That is, apply moment of liquid against corrosion at the upper surface to substrate 9, substrate 9 integral body are floated and being supported on inlet and floating on bench board 25 and the application job platform 31.Therefore, the mechanical vibration that suppress free roller 24 are transmitted on the substrate 9 in the coating liquid against corrosion.Thus, it is bad to suppress the coating of liquid against corrosion of upper surface of substrate 9.
The substrate 9 that has applied liquid against corrosion is moved to and stops after outlet is floated on the bench board 51.Then, a plurality of upper surfaces that float bench board 51 from outlet with pin 52 of taking out of are given prominence to.Thus, lift substrate 9 to the top that bench board 51 is floated in outlet.Then, shifting mechanical arm 3 is accepted by a plurality of substrates 9 that supporting with pin 52 of taking out of, from the shifting mechanical arm 3 device 4 transfer substrates 9 of operation rearwards.
As mentioned above, in the substrate board treatment 1 of present embodiment, in converter section 20, the part of the carrying direction upstream side of substrate 9 transfers load to a plurality of free rollers 24 from a plurality of dance rollers 21.Therefore, can suppress enters the mouth floats bench board 25 in the length of carrying on the direction, and supporting way that can conversion baseplate 9.In addition, free roller 24 can be with simple reliable in structure ground supporting substrate 9, and is configured in the narrow and small zone.Thereby, be easy to a plurality of free rollers 24 are configured in not and a plurality of dance roller 21 position contacting.
＜1-3. variation 〉
More than, first embodiment of the present invention has been described, but has the invention is not restricted to above-mentioned embodiment.
In the above-described embodiment, though the adsorption section 32a of clamping mechanism 32 is fixed on constant height and position, adsorption section 32a oscilaltion is moved.If can make adsorption section 32a lifting moving, then can make the lower surface of adsorption section 32a near substrate 9.Thereby, can omit structure by the support of 28 pairs of substrates 9 of lift pin.
In addition, in the above-described embodiment, clamping mechanism 32 is configured in lower surface one side of substrate 9, but clamping mechanism can be configured in upper surface one side of substrate 9.In addition, clamping mechanism 32 can keep substrate 9 from clipping up and down.In addition, the clamping mechanism 32 of above-mentioned embodiment has two adsorption section 32a on the carrying direction, but the quantity of adsorption section 32a both can be one, also can be more than 3.
In addition, in the above-described embodiment, show an example of conveying roller 11, dance roller 21 and free roller 24, the size of these rollers, quantity and arrangement can suitably be changed according to the kind that becomes the substrate of handling object and the relation of surrounding structure.
In addition, first trucking department 10 of above-mentioned embodiment is by a plurality of conveying roller 11 carrying substrates 9, but first trucking department of the present invention can pass through other mechanism's carrying substrates 9.For example, can on one side substrate 9 be supported on a plurality of free rollers, keep the both ends on the Width of substrate 9 on one side, to carrying direction downstream carrying substrate 9.In addition, substrate 9 can be loaded on the mobile member of some, substrate 9 is carried to carrying direction downstream with this mobile member.
In addition, " converter section " of the present invention if spatially or the temporal meaning be the part of between first trucking department and second trucking department, the supporting way of substrate being changed.For example, as long as in the time between carrying by first trucking department and carrying by second trucking department, the supporting way of conversion baseplate, first trucking department, converter section and the configuration spatially of second trucking department can have the part of mutual repetition.In addition, converter section spatially can separate with first trucking department or second trucking department.
In addition, above-mentioned substrate board treatment 1 is the device that applies liquid against corrosion to the upper surface of substrate 9, but substrate board treatment of the present invention also can be the device to the conditioning fluid of coating of substrates except liquid against corrosion.In addition, substrate board treatment of the present invention can also be the device that carries out the processing (for example, heat treatment or exposure-processed) except coating is handled.
In addition, the glass substrate 9 that aforesaid substrate processing equipment 1 is used with liquid crystal indicator is as handling object, but processing substrate of the present invention dress can be with semiconductor wafer, film liquid crystal with flexible base, board, base board for optical mask, colour filter with substrate, used for solar batteries substrate, Electronic Paper with other substrates such as substrates as handling object.
＜2. second embodiment 〉
The structure of＜2-1. substrate board treatment 〉
Figure 13 is the birds-eye view of the substrate board treatment 101 of second embodiment of the present invention.Upper surface at substrate 109 in the photo-mask process of the rectangle glass 109 that this substrate board treatment 101 is used for using at the etching liquid crystal device (below, only claim " substrate 109 ") applies liquid against corrosion (photoresist liquid).Substrate board treatment 101 has the mechanism that substrate 109 is supported for flat-hand position one side carrying substrate 109 on one side.Below, the direction of carrying substrate 109 is called " carrying direction ", will be called " Width " perpendicular to the horizontal direction of carrying direction.In each figure of the application, represent to carry direction and Width with arrow.
As shown in figure 13, substrate board treatment 101 has first trucking department 110, transfer portion 120, second trucking department 130, liquid applying mechanism 140 against corrosion, takes out of portion 150 and control part 160.Figure 14 is near the birds-eye view first trucking department 110 and the transfer portion 120.Figure 15 is near the lateral plan first trucking department 110 and the transfer portion 120.Below, with reference to Figure 13, Figure 14 and Figure 15.
First trucking department 110 is to be transported to the position of transfer portion 120 from the substrate 109 that the device 102 of carrying the direction upstream side is taken out of along the carrying path.The S. A. 111a that first trucking department 110 has to extend along Width is a plurality of conveying rollers 111 that the center is rotated.In the present embodiment, on a plurality of S. A. 111a that uniformly-spaced arrange along its length, in equally spaced mode on the Width 4 conveying rollers 111 are installed respectively.A plurality of conveying rollers 111 are configured in the fixing height and position of mono-.
On the S. A. 111a of conveying roller 111, connecting the rotary drive mechanism of schematically representing among Figure 14 112.Rotary drive mechanism 112 for example is to become the mechanism that the synchronous band of the motor of drive source and transmission of drive force combines.If make rotary drive mechanism 112 actions, then a plurality of conveying rollers 111 are on one's own initiative to same direction rotation.Thus, contact the substrate 109 that is supported on the conveying roller 111 to the downstream carrying of carrying direction.
Transfer portion 120 is used for from the position of first trucking department 110 to second trucking department, 130 transfer substrates 109.As Figure 13～shown in Figure 15, transfer portion 120 has a plurality of dance rollers 121, a plurality of free roller 124, inlet and floats bench board 125,4 guide reels 126, detent mechanism 127 and jacking mechanisms 128.
A plurality of dance rollers 121 are can be the roller that the center is rotated and can oscilaltion moves with the S. A. 121a that extends along Width.In the present embodiment, on two S. A. 121a that arrange along its length, in equally spaced mode on Width 4 dance rollers 121 are installed respectively.
On S. A. 121a, connecting the rotary drive mechanism of schematically representing among Figure 14 122.Rotary drive mechanism 122 for example is the mechanism that the synchronous band that will become the motor of drive source and transmission of drive force combines.If make rotary drive mechanism 122 actions, then a plurality of dance rollers 121 are on one's own initiative to same direction rotation.Thus, contact the substrate 109 that is supported on the dance roller 121 to the downstream carrying of carrying direction.
Figure 21, Figure 23, Figure 25, Figure 27 and Figure 29 are the figure that near the structure the transfer portion 120 is observed in the B-B position from Figure 13.As shown in these figures, on the S. A. 121a of dance roller 121, connecting lift drive mechanism 123.Lift drive mechanism 123 has: arm 123a, and it is via bearings S. A. 121a; Cylinder 123b, it makes arm 123a lifting moving.If make cylinder 123b action, then a plurality of dance rollers 121 are lifting moving between Figure 21 and normal place shown in Figure 23 and Figure 25, Figure 27 and lowering position shown in Figure 29.In addition, lift drive mechanism 123 also can utilize the driver train (for example, motor) except cylinder.
The height and position of upper end that is configured in the height and position of upper end (with the position of the lower surface of substrate 109 contact) of the dance roller 121 of normal place and conveying roller 111 is roughly consistent.In addition, the height and position of upper end that is configured in the dance roller 121 of lowering position is positioned at the below of height and position of the upper end of free roller 124.
A plurality of free rollers 124 are the rollers that are used for when dance roller 121 has descended replacing the part of the carrying direction upstream side of 121 pairs of substrates 109 of dance roller to support.A plurality of free rollers 124 rotate freely with respect to the intrinsic S. A. that is arranged on each roller.Under the part of substrate 109 was supported on state on the free roller 124, if substrate 109 side shifting downstream, then a plurality of free rollers 124 correspondinglyly and drivenly rotated with the mobile phase of substrate 109.
A plurality of free rollers 124 are configured in the fixing height and position of mono-.The height and position of the upper end of free roller 124, be in the dance roller 121 that is configured in normal place the upper end height and position the below and be in the top of height and position of the upper end of the dance roller 121 that is configured in lowering position.In addition, the height and position of the upper end of free roller 124 is in and is supported on inlet and floats the lower surface of the substrate 109 on the bench board 125 and the upper end height and position in the roughly same height of clamping mechanism described later 132.
In addition, as Figure 13 and shown in Figure 14, each free roller 124 is configured in overlooks down the position that does not overlap with the S. A. 121a of a plurality of dance rollers 121 and dance roller 121.Therefore, the S. A. 121a of a plurality of dance rollers 121 and dance roller 121 can not with situation that a plurality of free rollers 124 contact under lifting moving.
As shown in figure 14, a plurality of free rollers 124 comprise free roller 124a in a plurality of downstreams and the free roller 124b of a plurality of upstream side.The free roller 124a in a plurality of downstreams floats between the bench board 125 at dance roller 121 and the inlet in the downstream that is disposed at the carrying direction, the broad ways arrangement.That is, the free roller 124a in a plurality of downstreams floats the end edge portion arrangement of the carrying direction upstream side of bench board 125 along inlet.On the other hand, the free roller 124b of a plurality of upstream sides is arranged in the position of the carrying direction upstream side of the free roller 124a in downstream.
The interval on Width is narrow each other than the free roller 124b of adjacent upstream side at the interval on the Width each other for the free roller 124a in adjacent downstream.Therefore, substrate 109 in downwards bending between the free roller 124a in downstream less than substrate 109 downwards bending between the free roller 124b of upstream side.Thus, suppress the end edge portion of carrying direction upstream side and contacting of substrate 109 that inlet floats bench board 125.In addition, by disposing the free roller 124b of upstream side with density, the whole quantity that reduces free roller 124 less than the free roller 124a in downstream.
In addition, in the present embodiment, use the free roller 124 of diameter less than the diameter of dance roller 121.Therefore, guarantee the space of dance roller 121 lifting moving, and be easy to a plurality of free rollers 124 are configured in not and dance roller 121 position contacting.Free roller 124 can disconnect fully with driver train, as long as still can remove the transmission of power from driver train, then can be connected with the driver train of some.But the mode that does not connect driver train on free roller 124 can more easily be guaranteed the space that dance roller 121 carries out lifting, preferred thus this mode.
As shown in figure 15, a plurality of conveying rollers 111, a plurality of dance roller 121 and a plurality of free roller 124 are supported by shared roller brace table 171.On the other hand, inlet floats bench board 125, application job platform 131 described later and outlet described later and floats bench board 151 and supported by the bench board brace table 172 of the other setting different with roller brace table 171.
That is to say, in the present embodiment, the position by roller contact supporting substrate 109 and substrate 109 is floated be supported on position on the bench board by different brace table supports, and do not connect mutually.Thus, suppressing mechanical vibration from conveying roller 111, dance roller 121 and free roller 124 is transmitted to inlet and floats bench board 125, application job platform 131 and outlet and float bench board 151.
Inlet floats the carrying direction downstream that bench board 125 is configured in a plurality of free rollers 124.Inlet floats bench board 125 with dance roller 121, free roller 124 or application job platform described later 131 supporting substrates 109.The upper surface that floats bench board 125 at inlet is provided with and is used to spray compressed-air actuated a plurality of squit hole 125a.
When carrying substrate 109, never graphic supply source compressed and supplied air sprays towards the top from a plurality of squit hole 125a.By pressurized air supporting substrate 109, it is become from inlet float the state that the upper surface of bench board 125 floats from a plurality of squit hole 125a ejection.That is, inlet floats the mode supporting substrate 109 of bench board 125 not contact with the lower surface of substrate 109.
4 guide reels 126 are to be used for the mechanism to substrate 109 channeling conducts on the carrying direction in transfer portion 120.4 guide reels 126 are configured in the both sides on the carrying path of substrate 109.Each guide reel 126 can the above S. A. that extends down be that the center is rotated.If substrate 109 breaks away from the carrying path, then guide reel 126 contacts with the end edge portion of substrate 109 on one side, Yi Bian be rotated.Thus, revise substrate 109 towards, thereby carrying substrate 109 on the carrying direction correctly.
Can make 4 guide reel 126 lifting moving by not shown driver train.During carrying substrate 109,4 guide reels 126 are in the state of the both sides on the carrying path that rises to substrate 109 in transfer portion 120.On the other hand, clamping mechanism 132 described later enter substrate 109 below the time, 4 guide reels 126 are in the state that drops to the height and position that does not contact with clamping mechanism 132.
Detent mechanism 127 is to be used for the mechanism that substrate 109 positioned in transfer portion 120.Detent mechanism 127 has a plurality of locating dowel pin 127a that extend up and down.Locating dowel pin 127a is an example of " align member " of the present invention.A plurality of locating dowel pin 127a are configured in the position that surrounds the substrate 109 that is disposed in the transfer portion 120.Each locating dowel pin 127a can by not shown driver train and the position of the end edge portion butt of substrate 109 and leave between the position of end edge portion of substrate 109 and move.
When substrate 109 is configured to dance roller 121 on normal place and inlet and floats on the bench board 125, the end edge portion butt of a plurality of locating dowel pin 127a and substrate 109.Thus, determined substrate 109 position and posture in the horizontal direction.On the other hand, when carrying substrate 109 and clamping mechanism 132 enter substrate 109 below the time, a plurality of locating dowel pin 127a keep out of the way not and substrate 109 and clamping mechanism 132 position contacting.
Jacking mechanism 128 is the mechanisms that are used for the both ends on the Width of temporary transient jack-up substrate 109 when transfer portion 120 transfer substrates 109.Jacking mechanism 128 has a plurality of lift pin 128a that extend up and down.A plurality of lift pin 128a rely on the position of Width inboard slightly at the both ends from the Width of substrate 109 under substrate 109 is positioned the state that mechanism 127 located, arrange along its length.In addition, by not shown driver train, can make a plurality of lift pin 128a lifting moving integratedly.When a plurality of lift pin 128a are risen, the lower surface butt of lift pin 128a and substrate 109, the both ends on the Width of substrate 109 are neighbouring by lift pin 128a jack-up.
Near the state that Figure 23, Figure 25 and Figure 27 have shown the both ends of substrate 109 by jacking mechanism 128 jack-up.As shown in these figures, when a plurality of lift pin 128a have been risen, substrate 109 bendings, thus only near the both ends on the Width of substrate 109 by jack-up.Middle body on the Width of substrate 109 is maintained by dance roller 121 or free roller 124 and contacts the state that is supported for flat-hand position.
In addition, as Figure 13 and shown in Figure 14, a plurality of lift pin 128a are configured in the Width inboard at the both ends on the Width that floats bench board 125 that enters the mouth.Therefore, when a plurality of lift pin 128a had been risen, clamping mechanism 132 described later can with under the situation that a plurality of lift pin 128a contact not enter the position that inlet floats the Width outside of bench board 125.In addition, the part of being adsorbed by clamping mechanism 132 at least that needs only in the substrate 109 is exposed to the Width outside that inlet floats bench board 125.Therefore, can suppress substrate 109 and float the amount of exposing that bench board 125 exposes from inlet.
As shown in figure 14, transfer portion 120 is set at the length (that is, being longer than the degree of the length of substrate 109 on the carrying direction slightly) that roughly can dispose a substrate 109 in the length L 1 on the carrying direction.It is all short than the length of substrate 109 on the carrying direction in the length L 3 on the carrying direction that bench board 125 is floated at length L 2 on the carrying direction and inlet in the zone that disposes dance roller 121 and free roller 124 in the transfer portion 120.Thus, can suppress the length of transfer portion 120 on the carrying direction.
Float the bench board of supporting substrate 109 as inlet floats bench board 125, need high process technology at aspects such as forming squit hole 125a, manufacturing cost is also high.In the present embodiment, suppress inlet as described above and float the length of bench board 125 on the carrying direction.Thus, the manufacturing of substrate board treatment 101 becomes easily, also can suppress manufacturing cost.In addition, can also suppress to float the amount of bench board 125 compressed and supplied air to inlet.
Second trucking department 130 is to the position of carrying direction downstream carrying substrate 109 when applying liquid against corrosion on the upper surface of substrate 109.As shown in figure 13, second trucking department 130 has application job platform 131 and a pair of clamping mechanism 132.
Application job platform 131 is configured in the carrying direction downstream that inlet floats bench board 125.The upper surface of application job platform 131 is provided with a plurality of attractions hole that is used to spray compressed-air actuated a plurality of squit hole and is used to attract the air on the application job platform 131.On application job platform 131 during carrying substrate 109, the pressure upward that produces from a plurality of squit holes ejection pressurized airs and air-breathing to a plurality of attractions hole and pressure downwards that produce acts on substrate 109.Thus, substrate 109 is supported for a little the state that floats from the upper surface of application job platform 131 with being stabilized.
The Width outside at application job platform 131 disposes pair of right and left clamping mechanism 132.In each clamping mechanism 132, the carrying direction is provided with a pair of absorption maintaining part 132a that is used for adsorbing from lower face side the end on the Width that keeps substrate 109.In addition, each clamping mechanism 132 can move by the guide rail 132b on the upper surface that is formed on bench board brace table 172 on the carrying direction by driver trains such as linear motors.As shown in figure 13, guide rail 132b position from the Width of free roller 124 outside on the carrying direction extends to the position that the Width outside of bench board 151 is floated in outlet described later.A pair of clamping mechanism 132 can adsorb on one side and keep substrate 109, on one side substrate 109 is transported to the portion of taking out of 150 from transfer portion 120.
Figure 16 and Figure 17 are near the cutaway view Amplified images of the part of the upper surface of absorption maintaining part 132a.Shown in Figure 16 and Tu worker 7, absorption maintaining part 132a has the maintenance face 321 that contacts with the lower surface of substrate 109.The height and position of the lower surface of the part that is adsorbed maintaining part 132a maintenance in the substrate 109 is by maintenance face 321 regulations.In addition, on absorption maintaining part 132a, be formed with the groove 322 that caves in from maintenance face 321 and downwards in the attraction hole 323 of the bottom opening of groove 322.
At the flexible Adsorbing matter 324 of the internal configurations of groove 322, this elasticity Adsorbing matter 324 can stretch on above-below direction, and the lower surface of absorption substrate 109.Elasticity Adsorbing matter 324 forms the general cylindrical shape of the side with accordion-like.The peristome of elasticity Adsorbing matter 324 downsides is communicated with attracting hole 323.In addition, the peristome of elasticity Adsorbing matter 324 upsides is open towards the top.
Attract hole 323 to be connected with not shown asepwirator pump.If asepwirator pump is moved, then form negative pressure in the inside that attracts hole 323 and elasticity Adsorbing matter 324.Thus, the air of absorption maintaining part 132a top is attracted to attraction hole 323 via elasticity Adsorbing matter 324 as the arrow among Figure 16.
As shown in figure 16, before being adsorbed on the substrate 109, the upper end of elasticity Adsorbing matter 324 is outstanding upward from maintenance face 321.If on one side carry out above-mentioned attraction, make substrate 109 near the upper surfaces that adsorb maintaining part 132a on one side, then elasticity Adsorbing matter 324 is adsorbed on the lower surface of substrate 109 and shrinks.Then, when absorption, as shown in figure 17, the upper end of elasticity Adsorbing matter 324 is positioned at the height that equates with maintenance face 321.Thus, the lower surface of substrate 109 is held face 321 contact maintenances.
Like this, in the present embodiment, by making elasticity Adsorbing matter 324 be adsorbed on the lower surface of substrate 109 and shrink, with the lower surface of the substrate 109 maintenance face 321 that furthers.Therefore, for example,, also can the lower surface of substrate 109 be remained on the absorption maintaining part 132a with good reliability even tilt a little make the end edge portion of substrate 109 because of the jack-up of lift pin 128a near.
Preferably an absorption at clamping mechanism 132 keeps all having a plurality of elasticity Adsorbing matters 324 on the 132a.In that event, then can suppress the bending of the substrate 109 that the absorption itself because of elasticity Adsorbing matter 324 produced.Therefore, can substrate 109 be remained on the absorption maintaining part 132a with better reliability.
In addition, as shown in figure 13, absorption maintaining part 132a is provided with the dislocation sensor 325 that the dislocation to substrate 109 detects.Dislocation sensor 325 remains on when adsorbing on the maintaining part 132a on the position ground that substrate 109 departs from expectation the substrate 109 that exposes maintenance face 321 is detected.Control part 160 is from dislocation sensor 325 when receiving detection signal, makes clamping mechanism 132 stop to move etc., prevents that the coating of substrate 109 is bad.
Liquid applying mechanism 140 against corrosion is the mechanisms that are used for to apply liquid against corrosion while the upper surface that is supported on the substrate 109 that is handled upside down on the application job platform 131.In Figure 13,, dot liquid applying mechanism 140 against corrosion for application job platform 131 and clamping mechanism 132 clearly are shown.Liquid applying mechanism 140 against corrosion have Width put on the shelf above application job platform 131 bridge formation portion 141 and be installed in gap nozzle 142 in the bridge formation portion 141.Gap nozzle 142 sprays the liquid against corrosion of never graphic liquid supply source supply against corrosion via the ejiction opening of the slit-shaped of extending along Width to the upper surface of substrate 109.
Take out of portion 150 and be the substrate 109 that is used for to have applied liquid against corrosion from position that substrate board treatment 101 is taken out of.As shown in figure 13, taking out of portion 150 has outlet and floats bench board 151 and a plurality of taking out of with pin 152.
The carrying direction downstream that bench board 151 is configured in application job platform 131 is floated in outlet.The upper surface that bench board 151 is floated in outlet is provided with and is used to spray compressed-air actuated a plurality of squit hole.Substrate 109 is being supported on outlet when floating on the bench board 151, never graphic supply source compressed and supplied air sprays towards the top from a plurality of squit holes.Pressurized air supporting substrate 109 by from a plurality of squit hole ejections becomes from outlet it and floats the state that bench board 151 upper surfaces float.That is, the mode supporting substrate 109 of bench board 151 not contact with the lower surface of substrate 109 floated in outlet.
A plurality of taking out of with pin 152 in the surface of bench board 151 is floated in outlet equally spaced arranged along carrying direction and Width.A plurality of taking out of with the upper end contact supporting substrate 109 of pin 152 by them.In addition, can make a plurality of taking out of use pin 152 lifting moving integratedly by not shown driver train.Therefore, a plurality of taking out of with pin 152 can on one side be supported for flat-hand position with substrate 109, to top that outlet float bench board 151 lift substrate 109 on one side.
From application job platform 131 when bench board 151 carrying substrates 109 are floated in outlet, contact with substrate 109 for fear of a plurality of taking out of with pins 152, a plurality of take out of to be in pin 152 keep out of the way the state of below that the upper surface of bench board 151 is floated in outlet.In addition, when floating bench board 151 from outlet and take out of substrate 109, a plurality of taking out of with pin 152 is projected into the top that the upper surface of bench board 151 is floated in outlet.Thus, lift substrate 109 to the top that bench board 151 is floated in outlet.Be supported on a plurality of taking out of and be configured in the device 104 that the shifting mechanical arm 103 that exports the carrying direction downstream of floating bench board 151 is carried to the back operation with the substrate on the pin 152 109.
Control part 160 is made of the computing machine with CPU and memory device.Figure 18 is the block diagram of the electric connection structure between the each several part of expression control part 160 and substrate board treatment 101.As shown in figure 18, control part 160 is connected with the portion of taking out of 150 with first trucking department 110, transfer portion 120, second trucking department 130, liquid applying mechanism 140 against corrosion.More particularly, control part 160 is connected with various driver trains, sensor, compressed-air actuated feed mechanism, exhaust gear etc. on being arranged on above-mentioned each one.For example, the driver train that moves of control part 160 and a plurality of locating dowel pin 127a that are used to make detent mechanism 127, be used to make a plurality of lift pin 128a lifting moving of jacking mechanism 128 driver train, be used to make linear motor that clamping mechanism 132 moves etc. to be connected.Control part 160 is electrically controlled the action of each part mentioned above according to predefined program and data.Thus, in substrate board treatment 101, substrate 109 is handled.
The action of＜2-2. substrate board treatment 〉
The action of substrate board treatment 101 then, is described.Figure 19 is the diagram of circuit of flow process of the action of expression substrate board treatment 101.Figure 20, Figure 22, Figure 24, Figure 26 and Figure 28 are near the lateral plans the transfer portion 120 among step S102～S108.In addition, as mentioned above, Figure 21, Figure 23, Figure 25, Figure 27 and Figure 29 are the figure that near the structure the transfer portion 120 is observed in the B-B position from Figure 13.Figure 21, Figure 23, Figure 25, Figure 27 and Figure 29 be the state of expression and Figure 20, Figure 22, Figure 24, Figure 26 and Figure 28 synchronization respectively.
When substrate board treatment 101 treatment substrates 109, at first, carry the substrate 109 (step S101) of taking out of from the device 102 of front operation by first trucking department 110.Substrate 109 contacts are supported on the conveying roller 111, by the rotation of conveying roller 111, to carrying direction downstream carrying substrate 109.At this moment, dance roller 121 is configured in normal place, to the direction rotation identical with the hand of rotation of conveying roller 111.Therefore, continuously substrate 109 is transported to transfer portion 120 by conveying roller 111 and dance roller 121.
In addition, at this moment, 4 guide reels 126 are in the state of the both sides on the carrying path that rises to substrate 109.Substrate 109 is guided by these guide reels 126, thereby correctly carries to carrying direction downstream.
When substrate 109 arrived transfer portion 120, dance roller 121 stopped the rotation.Thus, substrate 109 stops (step S102, the state among Figure 20 and Figure 21) under the state that floats across dance roller 121 and inlet on the bench board 125.As shown in figure 20, the contact of the part of the carrying direction upstream side of substrate 109 is supported on the dance roller 121 of normal place.On the other hand, the part in the carrying direction downstream of substrate 109 float being supported on the inlet float on the bench board 125.The being supported on height and position that inlet floats the part on the bench board 125 in the substrate 109 is lower than the height and position that is supported on the part on the dance roller 121.
Then, each end edge portion butt of the carrying direction upstream side of a plurality of locating dowel pin 127a and substrate 109, carrying direction downstream and Width both sides.Thus, decision substrate 109 position and posture (step S103) in the horizontal direction.Like this, by substrate 109 is positioned, the more accurate position that in step S108 described later, can make absorption maintaining part 132a keep substrate 109 lower surfaces.
When finishing the location of substrate 109,4 guide reels 126 descend and keep out of the way the retreating position of regulation.In addition, the locating dowel pin 127a of two end edge portion butts among a plurality of locating dowel pin 127a and Width substrate 109 also leaves the retreating position (step S104) that substrate 109 is kept out of the way regulation.After locating dowel pin 127a kept out of the way, the part of the carrying direction upstream side of substrate 109 was also supported by dance roller 121 contacts.Therefore, the static friction by 121 of substrate 109 and dance rollers prevents the dislocation of substrate 109 on Width
Then, make a plurality of lift pin 128a risings (step S105, the state of Figure 22 and Figure 23).The lower surface butt of lift pin 128a and substrate 109 is near the both ends on the Width of jack-up substrate 109.As Figure 22 and shown in Figure 23, the upper end of a plurality of lift pin 128a rises to the top position of upper end of the dance roller 121 of normal place.
The substrate 109 of present embodiment is large-scale and have flexible.Therefore, in step S105, only the both ends on the Width in the substrate 109 are neighbouring by local jack-up.Middle body on the Width of substrate 109 is kept by dance roller 121 and inlet and is floated the state that bench board 125 supports.Especially, the part of the carrying direction upstream side in the middle body on the Width of substrate 109 is still supported by dance roller 121 contacts.Thereby the static friction by 121 of substrate 109 and dance rollers prevents the dislocation of substrate 109 on Width.
In addition, in the present embodiment, after the locating dowel pin 127a of two end edge portion butts on the Width that makes with substrate 109 keeps out of the way, a plurality of lift pin 128a are risen.Therefore, when lift pin 128a was risen, end edge portion on the Width of substrate 109 and locating dowel pin 127a can moving contacts.Thus, can prevent to produce particle because of the moving contact of substrate 109 and locating dowel pin 127a.
Then, make dance roller 121 drop to lowering position (step S106, the state of Figure 24 and Figure 25) from normal place.If dance roller 121 is descended, then the height and position of the upper end of dance roller 121 is in the below of height and position of the upper end of free roller 124.Therefore, a plurality of free rollers 124 replace a plurality of dance rollers 121 to come the part of the carrying direction upstream side in the middle body on the Width of supporting substrate 109.Be maintained the state that is supported by a plurality of lift pin 128a near the both ends on the Width of substrate 109.
Then, a pair of clamping mechanism 132 is moved to carrying direction upstream side.Thus, make absorption maintaining part 132a enter substrate 109 by the below of the part of jack-up (step S107, the state of Figure 26 and Figure 27).Then, after the attraction action that has begun absorption maintaining part 132a, a plurality of lift pin 128a are descended.That is, remove the jack-up of 128 pairs of substrates 109 of jacking mechanism.Thus, make both ends on the Width of substrate 109 near the absorption maintaining part 132a of clamping mechanism 132.
The elasticity Adsorbing matter 324 of absorption maintaining part 132a is adsorbed on the lower surface of substrate 109, then, shrinks by negative pressure.Thus, the lower surface of substrate 109 is furthered to the maintenance face 321 of absorption maintaining part 132a.As a result, the absorption of the end on the Width of substrate 109 remains on absorption maintaining part 132a and goes up (step S 108, the state of Figure 28 and Figure 29).Substrate 109 is in following state, that is, the part contact of carrying direction upstream side is supported on the free roller 124, and the part in carrying direction downstream is floated, and being supported on enters the mouth floats on the bench board 125, and the both ends absorption on the Width remains on the clamping mechanism 132.
In the present embodiment, in transfer portion 120, carry out between the action of step S103～S108 the end edge portion butt in the carrying direction upstream side of locating dowel pin 127a and substrate 109 and carrying direction downstream.Thus, prevent the dislocation of substrate 109 on the carrying direction.In addition, as present embodiment, under the situation of jack-up, be difficult near with the both ends on the Width of substrate 109 power on the substrate 109 effect carrying directions.Thereby, even when jack-up locating dowel pin 127a not with the end edge portion butt in the carrying direction upstream side of substrate 109 and carrying direction downstream, also be difficult for producing the dislocation of substrate 109 on the carrying direction.
In addition, between step S103～S108, substrate 109 is being supported by dance roller 121 or 124 contacts of free roller constantly.Therefore, can pass through the static friction of 109 of dance roller 121 or free roller 124 and substrates, prevent the dislocation of substrate 109 on Width.
In addition, in the present embodiment, utilize a plurality of lift pin 128a, descend, make the absorption maintaining part 132a of the lower surface of substrate 109 near clamping mechanism 132 by making this lift pin 128a temporarily with near the jack-up both ends on the Width of substrate 109.Thus, the height and position of absorption maintaining part 132a is fixed, and made absorption maintaining part 132a keep the lower surface of substrate 109.Therefore, remove the mechanism that is used to make absorption maintaining part 132a lifting moving, can make clamping mechanism 132 form simple structure.
When substrate 109 is kept by a pair of clamping mechanism 132, keep out of the way to the retreating position of regulation with the carrying direction upstream side of substrate 109 and the locating dowel pin 127a of the end edge portion butt in carrying direction downstream.Then, clamping mechanism 132 moves to carrying direction downstream along guide rail 132b, thus to carrying direction downstream carrying substrate 109.
Substrate 109 floats on one side and is supported on above-mentioned inlet and floats bench board 125, application job platform 131 and outlet and float on bench board 151 each bench board, from inlet float bench board 125 and via application job platform 131 be carried to outlet float bench board 151 on one side.Gap nozzle 142 sprays liquid against corrosion towards the upper surface of the substrate 109 of carrying on application job platform 131.Thus, coating liquid against corrosion (step S109) on the upper surface of substrate 109.
In addition, in the present embodiment, before the lower position of gap nozzle 142 was closed in the end in the carrying direction downstream of substrate 109, the end portion supports of the carrying direction upstream side of substrate 109 was floated on the bench board 125 at inlet.That is, apply moment of liquid against corrosion at the upper surface to substrate 109, substrate 109 integral body are floated and being supported on inlet and floating on bench board 125 and the application job platform 131.Therefore, the mechanical vibration that suppress free roller 124 are transmitted to the substrate 109 in the coating liquid against corrosion.Thus, it is bad to suppress the coating of liquid against corrosion of upper surface of substrate 109.
The substrate 109 that has applied liquid against corrosion is moved to and stops after outlet is floated on the bench board 151.Then, the absorption maintaining part 132a of clamping mechanism 132 stops to attract action, thereby removes the absorption to substrate 109.After having removed absorption, because static friction effect between substrate 109 and elasticity Adsorbing matter 324, so can suppress departing from of substrate 109.
When removing the absorption of passing through 132 pairs of substrates 109 of clamping mechanism, a plurality of upper surfaces that float bench board 151 from outlet with pin 152 of taking out of are given prominence to.Thus, lift substrate 109 to the top that bench board 151 is floated in outlet.Then, shifting mechanical arm 103 accepts to be supported on a plurality of taking out of with the substrates 109 on the pin 152, from the shifting mechanical arm 103 device 4 transfer substrates 9 of operation rearwards.
＜2-3. variation 〉
More than, second embodiment of the present invention has been described, but has the invention is not restricted to above-mentioned embodiment.
First trucking department 110 of above-mentioned embodiment utilizes a plurality of conveying roller 111 carrying substrates 109, but " first trucking department " of the present invention can utilize other mechanism's carrying substrates 109.For example, can on one side substrate 109 be supported on a plurality of free rollers,, come to carrying direction downstream carrying substrate 109 Yi Bian utilize other devices that substrate 109 is applied to the thrust of carrying the direction downstream.In addition, can on one side substrate 109 be remained on the mobile member of some, on one side with this mobile member side carrying substrate 109 downstream.
In addition, in the above-described embodiment, in transfer portion 120, float middle body on the Width that bench board 125 or free roller 124 and inlet float bench board 125 supporting substrates 109 by dance roller 121 and inlet, but the middle body on the Width of substrate 109 can support by other supporting way.For example, the middle body on the Width of substrate 109 can only be supported by roller.
In addition, the jacking mechanism 128 of above-mentioned embodiment is near the jack-up both ends on the Width of substrate 109, but other positions that " jacking mechanism " of the present invention can jack-up substrate 109.For example, near the both ends on also can the carrying direction of jack-up substrate 109, clamping mechanism 132 enters near the below these both ends.
In addition, in the above-described embodiment, enumerated the example of locating dowel pin 127a as " align member " of the present invention.But " align member " of the present invention can be to have the tabular member that waits other shapes as long as can position with substrate 109 butts.
In addition, aforesaid substrate processing equipment 101 is the devices that apply liquid against corrosion to the upper surface of substrate 109, but substrate board treatment of the present invention also can be the device to the conditioning fluid of coating of substrates except liquid against corrosion.In addition, substrate board treatment of the present invention can also be the device that carries out the processing (clean, dry processing, heat treatment, exposure-processed, development treatment etc.) except coating is handled.
In addition, the glass substrate 109 that aforesaid substrate processing equipment 101 is used with liquid crystal indicator is as handling object, but processing substrate of the present invention dress can be with semiconductor wafer, film liquid crystal with flexible base, board, base board for optical mask, colour filter with substrate, used for solar batteries substrate, Electronic Paper with other substrates such as substrates as handling object.

Claims (16)

1. substrate board treatment has the mechanism of carrying substrate, it is characterized in that having:
First trucking department, its with board carrying to the assigned position of carrying on the path,
Second trucking department, it is in the carrying direction downstream of described assigned position, substrate is floated on bench board, and meanwhile carrying substrate,
Converter section, the supporting way of its conversion baseplate between described first trucking department and described second trucking department,
Control part, it controls described converter section;
Described converter section has:
Dance roller, the one edge joint touches supporting substrate, on one side active rotation, can be between normal place and lowering position lifting moving,
Free roller, it on one side is supported on substrate contacts the height and position between the upper end of described dance roller of the upper end of described dance roller of normal place and lowering position, on one side corresponding to the mobile and driven rotation of substrate,
Inlet floats bench board, and it is configured in the carrying direction downstream of described free roller, Yi Bian make substrate floating to the low height of bearing height than the described dance roller supporting substrate that passes through normal place, Yi Bian supporting substrate;
Described control part is controlled described converter section, make and be configured to after the described dance roller of normal place and described inlet float on the bench board at substrate, described dance roller descends to described lowering position, with the part of the carrying direction upstream side of substrate to described free roller transfer.
2. substrate board treatment as claimed in claim 1 is characterized in that,
Described inlet floats bench board and is shorter in length than the length of substrate on the carrying direction in carrying on the direction.
3. substrate board treatment as claimed in claim 1 or 2 is characterized in that,
The zone that disposes described dance roller and described free roller is being shorter in length than the length of substrate on the carrying direction on the carrying direction.
4. substrate board treatment as claimed in claim 1 or 2 is characterized in that,
Described free roller comprises:
The free roller in a plurality of downstreams, its lateral edge portion of floating the carrying direction upstream side of bench board along described inlet is arranged,
The free roller of a plurality of upstream sides, it is arranged in the position of the carrying direction upstream side of the free roller in described a plurality of downstreams;
The free roller of described a plurality of upstream side is configured to the density that density is lower than the free roller in described a plurality of downstreams.
5. substrate board treatment as claimed in claim 1 or 2 is characterized in that,
Described converter section also has detent mechanism, this detent mechanism under substrate is configured to float across the described dance roller of normal place and described inlet state on the bench board, decision substrate position in the horizontal direction.
6. substrate board treatment as claimed in claim 1 or 2 is characterized in that,
To float the brace table of bench board different with supporting described inlet for the brace table that supports described dance roller and described free roller, and described dance roller and described free roller float bench board with described inlet and be not connected mutually.
7. substrate board treatment as claimed in claim 1 or 2 is characterized in that, described free roller is the roller of diameter less than the diameter of described dance roller.
8. conversion method, the supporting way of conversion baseplate between first trucking department and second trucking department, wherein, described first trucking department with board carrying to the assigned position of carrying on the path, described second trucking department is in the carrying direction downstream of described assigned position, Yi Bian substrate is floated on bench board, Yi Bian carrying substrate, it is characterized in that
This conversion method utilizes dance roller, free roller and inlet to float bench board, wherein,
Described dance roller contacts supporting substrate on one side, on one side active rotation, can be between normal place and lowering position lifting moving,
Described free roller is supported on substrate contacts the height and position between the upper end of upper end and the described dance roller of lowering position of described dance roller of normal place on one side, one side corresponding to the mobile and driven rotation of substrate,
Described inlet floats the carrying direction downstream that bench board is configured in described free roller, make substrate floating to the low height of bearing height than the described dance roller supporting substrate that passes through normal place, and meanwhile supporting substrate,
This conversion method has:
Operation a is configured to substrate to float on the bench board across the described dance roller and the described inlet of normal place,
Operation b behind described operation a, makes described dance roller descend to described lowering position, with the part of the carrying direction upstream side of substrate to described free roller transfer.
9. substrate board treatment has the mechanism of carrying substrate, it is characterized in that having:
First trucking department, its from carrying direction upstream side with board carrying to assigned position,
Second trucking department, its from described assigned position to carrying direction downstream carrying substrate,
Transfer portion, it transfers load to described second trucking department with substrate from described first trucking department at described assigned position;
Described transfer portion has jacking mechanism, and this jacking mechanism is touched in a part of keeping substrate under the situation of the state that is supported for flat-hand position, other parts of jack-up substrate,
Described second trucking department has the maintaining part that keeps substrate to move in the carrying direction from lower face side on one side on one side,
This substrate board treatment also has control part, described control part is controlled described jacking mechanism and described maintaining part, make by described jacking mechanism partly the jack-up substrate and make described maintaining part enter substrate by the part of jack-up below after, by the jack-up of removing described jacking mechanism substrate is remained on the described maintaining part.
10. substrate board treatment as claimed in claim 9 is characterized in that,
Described transfer portion also has the detent mechanism that substrate is carried out the location on the horizontal direction,
Described control part is controlled described detent mechanism and described jacking mechanism, makes after described detent mechanism positions substrate, by described jacking mechanism jack-up substrate.
11. substrate board treatment as claimed in claim 10 is characterized in that,
Described detent mechanism has the align member with the end edge portion butt of substrate,
Described control part is controlled described jacking mechanism and described detent mechanism, makes after positioning by described detent mechanism, keep out of the way from substrate with the described align member of described other part butts of substrate, then, by described jacking mechanism jack-up substrate.
12. as each described substrate board treatment in the claim 9～11, it is characterized in that,
Described maintaining part has:
Maintenance face, the height and position of its lower surface of regulation substrate when keeping,
The elasticity Adsorbing matter, it can stretch on above-below direction, and is adsorbed on the lower surface of substrate;
Before described elasticity Adsorbing matter was adsorbed on the substrate, the upper end of described elasticity Adsorbing matter was positioned at the top of described maintenance face,
When described elasticity Adsorbing matter was adsorbed on the substrate, the upper end of described elasticity Adsorbing matter was positioned at the height identical with described maintenance face.
13. as each described substrate board treatment in the claim 9～11, it is characterized in that,
Described jacking mechanism with substrate perpendicular to the carrying direction direction on both ends near jack-up.
14. a method for shifting transfers load to second trucking department with substrate from first trucking department, it is characterized in that, comprising:
Operation a is touched the state that is supported for flat-hand position Yi Bian keep the part of substrate, Yi Bian with other part jack-up of substrate;
Operation b, behind described operation a, make maintaining part enter substrate by the below of the part of jack-up;
Operation c behind described operation b, by removing the jack-up to substrate, remains on the described maintaining part substrate.
15. method for shifting as claimed in claim 14 is characterized in that, also has operation d, described operation d carried out location on the horizontal direction to substrate before described operation a.
16. method for shifting as claimed in claim 15 is characterized in that,
In described operation d, make the end edge portion butt of align member and substrate,
Also have operation e between described operation d and described operation a, described operation e makes with the described align member of described other part butts of substrate and keeps out of the way from substrate.
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