CN102194705B - 具有保护性中介层的嵌入式裸片 - Google Patents

具有保护性中介层的嵌入式裸片 Download PDF

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Publication number
CN102194705B
CN102194705B CN201110068207.9A CN201110068207A CN102194705B CN 102194705 B CN102194705 B CN 102194705B CN 201110068207 A CN201110068207 A CN 201110068207A CN 102194705 B CN102194705 B CN 102194705B
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CN
China
Prior art keywords
nude film
lamination
die
substrate
intermediary layer
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Active
Application number
CN201110068207.9A
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English (en)
Chinese (zh)
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CN102194705A (zh
Inventor
吴亚伯
吴嘉洛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaiwei International Co
Marvell International Ltd
Marvell Asia Pte Ltd
Original Assignee
Mawier International Trade Co Ltd
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Publication of CN102194705A publication Critical patent/CN102194705A/zh
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/093Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • H10W70/614Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together the multiple chips being integrally enclosed
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/29Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/877Bump connectors and die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9413Dispositions of bond pads on encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/114Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/20Configurations of stacked chips
    • H10W90/22Configurations of stacked chips the stacked chips being on both top and bottom sides of a package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/20Configurations of stacked chips
    • H10W90/297Configurations of stacked chips characterised by the through-semiconductor vias [TSVs] in the stacked chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/722Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL

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  • Production Of Multi-Layered Print Wiring Board (AREA)
CN201110068207.9A 2010-03-18 2011-03-18 具有保护性中介层的嵌入式裸片 Active CN102194705B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US31531910P 2010-03-18 2010-03-18
US61/315,319 2010-03-18

Publications (2)

Publication Number Publication Date
CN102194705A CN102194705A (zh) 2011-09-21
CN102194705B true CN102194705B (zh) 2014-07-23

Family

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CN201110068207.9A Active CN102194705B (zh) 2010-03-18 2011-03-18 具有保护性中介层的嵌入式裸片

Country Status (4)

Country Link
US (1) US8338934B2 (enExample)
JP (1) JP5327654B2 (enExample)
CN (1) CN102194705B (enExample)
TW (1) TWI560824B (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5460388B2 (ja) * 2010-03-10 2014-04-02 新光電気工業株式会社 半導体装置及びその製造方法
US9721872B1 (en) * 2011-02-18 2017-08-01 Amkor Technology, Inc. Methods and structures for increasing the allowable die size in TMV packages
US9799592B2 (en) 2013-11-19 2017-10-24 Amkor Technology, Inc. Semicondutor device with through-silicon via-less deep wells
KR101366461B1 (ko) 2012-11-20 2014-02-26 앰코 테크놀로지 코리아 주식회사 반도체 디바이스 및 그 제조 방법
US8729714B1 (en) * 2012-12-31 2014-05-20 Intel Mobile Communications GmbH Flip-chip wafer level package and methods thereof
US9041207B2 (en) * 2013-06-28 2015-05-26 Intel Corporation Method to increase I/O density and reduce layer counts in BBUL packages
US9543373B2 (en) * 2013-10-23 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor structure and manufacturing method thereof
KR101607981B1 (ko) 2013-11-04 2016-03-31 앰코 테크놀로지 코리아 주식회사 반도체 패키지용 인터포저 및 이의 제조 방법, 제조된 인터포저를 이용한 반도체 패키지
US9852998B2 (en) 2014-05-30 2017-12-26 Taiwan Semiconductor Manufacturing Company, Ltd. Ring structures in device die
US9418965B1 (en) 2014-10-27 2016-08-16 Altera Corporation Embedded interposer with through-hole vias
US9633934B2 (en) 2014-11-26 2017-04-25 Taiwan Semiconductor Manufacturing Company, Ltd. Semicondutor device and method of manufacture
US9515017B2 (en) * 2014-12-18 2016-12-06 Intel Corporation Ground via clustering for crosstalk mitigation
CN104485320A (zh) * 2014-12-30 2015-04-01 华天科技(西安)有限公司 一种有垂直通孔的埋入式传感芯片封装结构及其制备方法
CN105097726B (zh) * 2015-06-16 2019-03-12 合肥矽迈微电子科技有限公司 封装结构及封装方法
US9984998B2 (en) * 2016-01-06 2018-05-29 Taiwan Semiconductor Manufacturing Company, Ltd. Devices employing thermal and mechanical enhanced layers and methods of forming same
US9922895B2 (en) * 2016-05-05 2018-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Package with tilted interface between device die and encapsulating material
CN105934095B (zh) * 2016-06-28 2019-02-05 Oppo广东移动通信有限公司 Pcb板及具有其的移动终端
JP2018018936A (ja) * 2016-07-27 2018-02-01 イビデン株式会社 配線基板
US9960328B2 (en) 2016-09-06 2018-05-01 Amkor Technology, Inc. Semiconductor device and manufacturing method thereof
US20190181093A1 (en) * 2016-09-30 2019-06-13 Intel Corporation Active package substrate having embedded interposer
WO2018063383A1 (en) * 2016-09-30 2018-04-05 Intel Corporation Active package substrate having anisotropic conductive layer
JP6822192B2 (ja) * 2017-02-13 2021-01-27 Tdk株式会社 電子部品内蔵基板
US10687419B2 (en) 2017-06-13 2020-06-16 Advanced Semiconductor Engineering, Inc. Semiconductor package device and method of manufacturing the same
DE102018108409B4 (de) 2017-06-30 2023-08-10 Taiwan Semiconductor Manufacturing Co., Ltd. Integrierte schaltkreis-packages und verfahren zu deren herstellung
US10872885B2 (en) * 2017-06-30 2020-12-22 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated circuit packages and methods of forming same
CN109786362B (zh) * 2017-11-14 2021-01-05 旺宏电子股份有限公司 无焊垫外扇晶粒叠层结构及其制作方法
US11393779B2 (en) 2018-06-13 2022-07-19 Invensas Bonding Technologies, Inc. Large metal pads over TSV
CN120413551A (zh) * 2018-06-13 2025-08-01 隔热半导体粘合技术公司 作为焊盘的tsv
CN111415908B (zh) * 2019-01-07 2022-02-22 台达电子企业管理(上海)有限公司 电源模块、芯片嵌入式封装模块及制备方法
US11239193B2 (en) * 2020-01-17 2022-02-01 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated circuit package and method
US11450615B2 (en) * 2020-06-12 2022-09-20 Taiwan Semiconductor Manufacturing Company, Ltd. Package structure and method of fabricating the same
CN113838829B (zh) * 2020-06-23 2025-01-24 欣兴电子股份有限公司 封装载板及其制作方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1158006A (zh) * 1995-11-30 1997-08-27 洛克希德马汀公司 具有降低应力成模衬底部分的挠性层的高密度互连电路模件

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000223645A (ja) * 1999-02-01 2000-08-11 Mitsubishi Electric Corp 半導体装置
US7161239B2 (en) * 2000-12-22 2007-01-09 Broadcom Corporation Ball grid array package enhanced with a thermal and electrical connector
US7202556B2 (en) * 2001-12-20 2007-04-10 Micron Technology, Inc. Semiconductor package having substrate with multi-layer metal bumps
SG104293A1 (en) * 2002-01-09 2004-06-21 Micron Technology Inc Elimination of rdl using tape base flip chip on flex for die stacking
US6506633B1 (en) * 2002-02-15 2003-01-14 Unimicron Technology Corp. Method of fabricating a multi-chip module package
TWI334638B (en) * 2005-12-30 2010-12-11 Ind Tech Res Inst Structure and process of chip package
SG135074A1 (en) * 2006-02-28 2007-09-28 Micron Technology Inc Microelectronic devices, stacked microelectronic devices, and methods for manufacturing such devices
US20080142946A1 (en) * 2006-12-13 2008-06-19 Advanced Chip Engineering Technology Inc. Wafer level package with good cte performance
TWI341577B (en) * 2007-03-27 2011-05-01 Unimicron Technology Corp Semiconductor chip embedding structure
US7687899B1 (en) * 2007-08-07 2010-03-30 Amkor Technology, Inc. Dual laminate package structure with embedded elements
JP5101240B2 (ja) * 2007-10-25 2012-12-19 日本特殊陶業株式会社 板状部品内蔵配線基板
US8230589B2 (en) * 2008-03-25 2012-07-31 Intel Corporation Method of mounting an optical device
JP2009289802A (ja) * 2008-05-27 2009-12-10 Tdk Corp 電子部品内蔵モジュール及びその製造方法
FR2938976A1 (fr) 2008-11-24 2010-05-28 St Microelectronics Grenoble Dispositif semi-conducteur a composants empiles
US8900921B2 (en) * 2008-12-11 2014-12-02 Stats Chippac, Ltd. Semiconductor device and method of forming topside and bottom-side interconnect structures around core die with TSV

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1158006A (zh) * 1995-11-30 1997-08-27 洛克希德马汀公司 具有降低应力成模衬底部分的挠性层的高密度互连电路模件

Also Published As

Publication number Publication date
TWI560824B (en) 2016-12-01
CN102194705A (zh) 2011-09-21
TW201145478A (en) 2011-12-16
US8338934B2 (en) 2012-12-25
JP5327654B2 (ja) 2013-10-30
JP2011199288A (ja) 2011-10-06
US20110227223A1 (en) 2011-09-22

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Patentee after: Marvell Asia Pte. Ltd.

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Patentee before: Kaiwei international Co.

Effective date of registration: 20200424

Address after: Ford street, Grand Cayman, Cayman Islands

Patentee after: Kaiwei international Co.

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Patentee before: Marvell International Ltd.

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Patentee before: MARVELL WORLD TRADE Ltd.

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