CN102171812B - 半导体器件 - Google Patents

半导体器件 Download PDF

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Publication number
CN102171812B
CN102171812B CN200980139973.0A CN200980139973A CN102171812B CN 102171812 B CN102171812 B CN 102171812B CN 200980139973 A CN200980139973 A CN 200980139973A CN 102171812 B CN102171812 B CN 102171812B
Authority
CN
China
Prior art keywords
transistor
capacitor
electrically connected
film
terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980139973.0A
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English (en)
Chinese (zh)
Other versions
CN102171812A (zh
Inventor
松崎隆德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Publication of CN102171812A publication Critical patent/CN102171812A/zh
Application granted granted Critical
Publication of CN102171812B publication Critical patent/CN102171812B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/402—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration individual to each memory cell, i.e. internal refresh
    • G11C11/4023—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration individual to each memory cell, i.e. internal refresh using field effect transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B99/00—Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Dram (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Integrated Circuits (AREA)
CN200980139973.0A 2008-10-02 2009-09-01 半导体器件 Expired - Fee Related CN102171812B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008-257339 2008-10-02
JP2008257339 2008-10-02
PCT/JP2009/065548 WO2010038581A1 (en) 2008-10-02 2009-09-01 Semiconductor device

Publications (2)

Publication Number Publication Date
CN102171812A CN102171812A (zh) 2011-08-31
CN102171812B true CN102171812B (zh) 2014-02-12

Family

ID=42073354

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980139973.0A Expired - Fee Related CN102171812B (zh) 2008-10-02 2009-09-01 半导体器件

Country Status (6)

Country Link
US (2) US8199551B2 (enExample)
JP (2) JP5604071B2 (enExample)
KR (2) KR101596228B1 (enExample)
CN (1) CN102171812B (enExample)
TW (1) TWI501383B (enExample)
WO (1) WO2010038581A1 (enExample)

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WO2010038581A1 (en) * 2008-10-02 2010-04-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5470054B2 (ja) 2009-01-22 2014-04-16 株式会社半導体エネルギー研究所 半導体装置
US8928466B2 (en) * 2010-08-04 2015-01-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP2012059958A (ja) * 2010-09-09 2012-03-22 Rohm Co Ltd 半導体装置およびその製造方法
US8659015B2 (en) * 2011-03-04 2014-02-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US8488387B2 (en) * 2011-05-02 2013-07-16 Macronix International Co., Ltd. Thermally assisted dielectric charge trapping flash
CN105284056B (zh) * 2013-06-14 2017-09-05 瑞萨电子株式会社 通信控制装置和安装基板
WO2015138731A1 (en) * 2014-03-12 2015-09-17 QuTel, Inc. Compact memory structure including tunneling diode
US9460788B2 (en) * 2014-07-09 2016-10-04 Crossbar, Inc. Non-volatile memory cell utilizing volatile switching two terminal device and a MOS transistor
US10263065B2 (en) * 2015-11-04 2019-04-16 Globalfoundries Inc. Metal resistor forming method using ion implantation
JP6789729B2 (ja) * 2016-08-31 2020-11-25 キヤノン株式会社 半導体装置、液体吐出ヘッド用基板、液体吐出ヘッド、及び液体吐出装置
US10217723B2 (en) 2016-10-07 2019-02-26 Mediatek Inc. Semiconductor package with improved bandwidth
US10685983B2 (en) 2016-11-11 2020-06-16 Semiconductor Energy Laboratory Co., Ltd. Transistor, semiconductor device, and electronic device
JP7090473B2 (ja) 2018-05-24 2022-06-24 ラピスセミコンダクタ株式会社 フラグ保持回路及びフラグ保持方法
JP7079661B2 (ja) 2018-05-24 2022-06-02 ラピスセミコンダクタ株式会社 フラグ保持回路及びフラグ保持方法
JP2025088973A (ja) * 2023-12-01 2025-06-12 東芝テック株式会社 無線タグ通信装置、無線タグ通信システム及びプログラム

Citations (4)

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Publication number Priority date Publication date Assignee Title
US6055175A (en) * 1998-06-30 2000-04-25 Lg Semicon Co., Ltd. Nonvolatile ferroelectric memory
CN101069062A (zh) * 2004-12-03 2007-11-07 米克伦技术公司 用于在动态随机存取存储器件的延长的刷新期间降低功耗的系统和方法
JP2008141046A (ja) * 2006-12-04 2008-06-19 Semiconductor Energy Lab Co Ltd 半導体膜の結晶化方法、および半導体装置の作製方法
CN101278356A (zh) * 2005-10-05 2008-10-01 St电子有限公司 存储器的字块写入方法

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JP2819520B2 (ja) 1991-05-07 1998-10-30 インターナショナル・ビジネス・マシーンズ・コーポレイション Ｄｒａｍセル
US7253440B1 (en) 1991-10-16 2007-08-07 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having at least first and second thin film transistors
US6759680B1 (en) 1991-10-16 2004-07-06 Semiconductor Energy Laboratory Co., Ltd. Display device having thin film transistors
US7071910B1 (en) 1991-10-16 2006-07-04 Semiconductor Energy Laboratory Co., Ltd. Electrooptical device and method of driving and manufacturing the same
JP2784615B2 (ja) 1991-10-16 1998-08-06 株式会社半導体エネルギー研究所 電気光学表示装置およびその駆動方法
JP3448248B2 (ja) * 1991-10-16 2003-09-22 株式会社半導体エネルギー研究所 アクティブマトリクス型電気光学表示装置の駆動方法
JPH06310673A (ja) * 1993-04-27 1994-11-04 Toshiba Corp 半導体記憶装置
JP3397516B2 (ja) * 1995-06-08 2003-04-14 三菱電機株式会社 半導体記憶装置及び半導体集積回路装置
US5883829A (en) * 1997-06-27 1999-03-16 Texas Instruments Incorporated Memory cell having negative differential resistance devices
JP3770721B2 (ja) * 1998-01-13 2006-04-26 沖電気工業株式会社 キャパシタ寄生抵抗の測定方法、およびその評価方法
DE19854418C2 (de) * 1998-11-25 2002-04-25 Infineon Technologies Ag Halbleiterbauelement mit zumindest einem Kondensator sowie Verfahren zu dessen Herstellung
AUPQ589400A0 (en) 2000-02-28 2000-03-23 Magellan Technology Pty Limited Rfid transponders
US7248145B2 (en) 2000-02-28 2007-07-24 Magellan Technology Oty Limited Radio frequency identification transponder
US7259654B2 (en) 2000-02-28 2007-08-21 Magellan Technology Pty Limited Radio frequency identification transponder
JP2002093154A (ja) * 2000-09-11 2002-03-29 Oki Electric Ind Co Ltd 強誘電体メモリ
US6980459B2 (en) * 2002-10-24 2005-12-27 Texas Instruments Incorporated Non-volatile SRAM
US6955967B2 (en) * 2003-06-27 2005-10-18 Freescale Semiconductor, Inc. Non-volatile memory having a reference transistor and method for forming
US7130234B2 (en) 2003-12-12 2006-10-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US7319633B2 (en) 2003-12-19 2008-01-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
EP1894147B1 (en) 2005-05-19 2015-10-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and wireless communication system using the same
US7209384B1 (en) * 2005-12-08 2007-04-24 Juhan Kim Planar capacitor memory cell and its applications
WO2007105607A1 (en) * 2006-03-10 2007-09-20 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
DE602007013986D1 (de) 2006-10-18 2011-06-01 Semiconductor Energy Lab ID-Funktransponder
JP2008123074A (ja) 2006-11-09 2008-05-29 Renesas Technology Corp 半導体集積回路装置
WO2010038581A1 (en) * 2008-10-02 2010-04-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5470054B2 (ja) 2009-01-22 2014-04-16 株式会社半導体エネルギー研究所 半導体装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6055175A (en) * 1998-06-30 2000-04-25 Lg Semicon Co., Ltd. Nonvolatile ferroelectric memory
CN101069062A (zh) * 2004-12-03 2007-11-07 米克伦技术公司 用于在动态随机存取存储器件的延长的刷新期间降低功耗的系统和方法
CN101278356A (zh) * 2005-10-05 2008-10-01 St电子有限公司 存储器的字块写入方法
JP2008141046A (ja) * 2006-12-04 2008-06-19 Semiconductor Energy Lab Co Ltd 半導体膜の結晶化方法、および半導体装置の作製方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2008-141046A 2008.06.19
JP特开平6-310673A 1994.11.04

Also Published As

Publication number Publication date
KR20110084412A (ko) 2011-07-22
JP5763817B2 (ja) 2015-08-12
TWI501383B (zh) 2015-09-21
TW201030943A (en) 2010-08-16
US8199551B2 (en) 2012-06-12
US20120236621A1 (en) 2012-09-20
JP5604071B2 (ja) 2014-10-08
KR101596227B1 (ko) 2016-02-22
US8842459B2 (en) 2014-09-23
CN102171812A (zh) 2011-08-31
JP2015015484A (ja) 2015-01-22
US20100085792A1 (en) 2010-04-08
KR101596228B1 (ko) 2016-02-22
WO2010038581A1 (en) 2010-04-08
JP2010109340A (ja) 2010-05-13
KR20140124811A (ko) 2014-10-27

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Granted publication date: 20140212

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CF01 Termination of patent right due to non-payment of annual fee