CN102026774B - 两头磨削装置及芯片的制造方法 - Google Patents

两头磨削装置及芯片的制造方法 Download PDF

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Publication number
CN102026774B
CN102026774B CN2009801169457A CN200980116945A CN102026774B CN 102026774 B CN102026774 B CN 102026774B CN 2009801169457 A CN2009801169457 A CN 2009801169457A CN 200980116945 A CN200980116945 A CN 200980116945A CN 102026774 B CN102026774 B CN 102026774B
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chip
groove
mentioned
crystal orientation
holder
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CN102026774A (zh
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小林健司
加藤忠弘
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Shin Etsu Handotai Co Ltd
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Shin Etsu Handotai Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/28—Work carriers for double side lapping of plane surfaces

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN2009801169457A 2008-05-22 2009-04-20 两头磨削装置及芯片的制造方法 Active CN102026774B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008-133954 2008-05-22
JP2008133954A JP4780142B2 (ja) 2008-05-22 2008-05-22 ウェーハの製造方法
PCT/JP2009/001793 WO2009141961A1 (ja) 2008-05-22 2009-04-20 両頭研削装置及びウェーハの製造方法

Publications (2)

Publication Number Publication Date
CN102026774A CN102026774A (zh) 2011-04-20
CN102026774B true CN102026774B (zh) 2013-04-17

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ID=41339904

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CN2009801169457A Active CN102026774B (zh) 2008-05-22 2009-04-20 两头磨削装置及芯片的制造方法

Country Status (7)

Country Link
US (1) US8562390B2 (enExample)
JP (1) JP4780142B2 (enExample)
KR (1) KR101605384B1 (enExample)
CN (1) CN102026774B (enExample)
DE (1) DE112009001195B4 (enExample)
TW (1) TWI445125B (enExample)
WO (1) WO2009141961A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5411739B2 (ja) * 2010-02-15 2014-02-12 信越半導体株式会社 キャリア取り付け方法
JP5627114B2 (ja) * 2011-07-08 2014-11-19 光洋機械工業株式会社 薄板状ワークの研削方法及び両頭平面研削盤
JP5979081B2 (ja) * 2013-05-28 2016-08-24 信越半導体株式会社 単結晶ウェーハの製造方法
JP6285375B2 (ja) * 2015-02-17 2018-02-28 光洋機械工業株式会社 両頭平面研削装置
JP6707831B2 (ja) * 2015-10-09 2020-06-10 株式会社Sumco 研削装置および研削方法
KR102468793B1 (ko) 2016-01-08 2022-11-18 삼성전자주식회사 반도체 웨이퍼, 반도체 구조체 및 이를 제조하는 방법
JP6493253B2 (ja) * 2016-03-04 2019-04-03 株式会社Sumco シリコンウェーハの製造方法およびシリコンウェーハ
KR101809956B1 (ko) * 2017-05-29 2017-12-18 (주)대코 평행되고 대향되게 장착되는 2개의 지석들을 용이하게 교환할 수 있는 연속 압축 선스프링 연마장치
US10783921B2 (en) * 2017-09-29 2020-09-22 Hoya Corporation Glass spacer and hard disk drive apparatus
CN112606233B (zh) * 2020-12-15 2022-11-04 西安奕斯伟材料科技有限公司 一种晶棒的加工方法及晶片
CN117226707A (zh) * 2023-11-10 2023-12-15 西安奕斯伟材料科技股份有限公司 驱动环、承载装置及双面研磨装置

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JP2000288921A (ja) * 1999-03-31 2000-10-17 Hoya Corp 研磨用キャリア及び研磨方法並びに情報記録媒体用基板の製造方法
CN1096108C (zh) * 1995-07-03 2002-12-11 三菱麻铁里亚尔硅材料株式会社 硅片的制造装置
JP2006332281A (ja) * 2005-05-25 2006-12-07 Komatsu Electronic Metals Co Ltd 半導体ウェーハの製造方法および両面研削方法並びに半導体ウェーハの両面研削装置
CN101128920A (zh) * 2005-02-25 2008-02-20 信越半导体股份有限公司 双面研磨装置用载具、使用该载具的双面研磨机及双面研磨方法

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JPS60259372A (ja) * 1984-06-04 1985-12-21 Yokogawa Hokushin Electric Corp 両面ポリツシング方法
JPH02178947A (ja) * 1988-12-29 1990-07-11 Fujitsu Ltd 半導体ウェーハのノッチ合わせ機構
US5508139A (en) 1993-03-25 1996-04-16 Canon Kabushiki Kaisha Magnetic toner for developing electrostatic image
JP3207787B2 (ja) 1997-04-04 2001-09-10 株式会社日平トヤマ ウエハの加工方法及び平面研削盤及びワーク支持部材
JPH11183447A (ja) 1997-12-19 1999-07-09 Nippei Toyama Corp 被加工材の割れ発生予知方法及びこれを利用したウエハの加工方法並びに研削盤
JP3856975B2 (ja) * 1999-02-18 2006-12-13 光洋機械工業株式会社 複合両頭平面研削方法および装置
JP2001155331A (ja) * 1999-11-30 2001-06-08 Mitsubishi Alum Co Ltd 磁気ディスク用基板およびその研磨方法
JP2003071704A (ja) * 2001-08-29 2003-03-12 Nippei Toyama Corp ウェーハ回転用駆動プレート
JP2003124167A (ja) * 2001-10-10 2003-04-25 Sumitomo Heavy Ind Ltd ウエハ支持部材及びこれを用いる両頭研削装置
US7355192B2 (en) * 2006-03-30 2008-04-08 Intel Corporation Adjustable suspension assembly for a collimating lattice
JP4935230B2 (ja) * 2006-08-03 2012-05-23 セイコーエプソン株式会社 透光性基板の製造方法

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CN1096108C (zh) * 1995-07-03 2002-12-11 三菱麻铁里亚尔硅材料株式会社 硅片的制造装置
JP2000288921A (ja) * 1999-03-31 2000-10-17 Hoya Corp 研磨用キャリア及び研磨方法並びに情報記録媒体用基板の製造方法
CN101128920A (zh) * 2005-02-25 2008-02-20 信越半导体股份有限公司 双面研磨装置用载具、使用该载具的双面研磨机及双面研磨方法
JP2006332281A (ja) * 2005-05-25 2006-12-07 Komatsu Electronic Metals Co Ltd 半導体ウェーハの製造方法および両面研削方法並びに半導体ウェーハの両面研削装置

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JP昭60-259372A 1985.12.21
JP特开2000-288921A 2000.10.17
JP特开2006-332281A 2006.12.07
JP特开平10-328988A 1998.12.15

Also Published As

Publication number Publication date
DE112009001195T5 (de) 2011-06-22
WO2009141961A1 (ja) 2009-11-26
TWI445125B (zh) 2014-07-11
JP2009279704A (ja) 2009-12-03
TW201009995A (en) 2010-03-01
US20110039476A1 (en) 2011-02-17
JP4780142B2 (ja) 2011-09-28
KR101605384B1 (ko) 2016-03-23
US8562390B2 (en) 2013-10-22
DE112009001195B4 (de) 2024-01-18
KR20110022563A (ko) 2011-03-07
CN102026774A (zh) 2011-04-20

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