CN101969038B - 支承一组集成电路单元的支承装置 - Google Patents

支承一组集成电路单元的支承装置 Download PDF

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Publication number
CN101969038B
CN101969038B CN2010101501235A CN201010150123A CN101969038B CN 101969038 B CN101969038 B CN 101969038B CN 2010101501235 A CN2010101501235 A CN 2010101501235A CN 201010150123 A CN201010150123 A CN 201010150123A CN 101969038 B CN101969038 B CN 101969038B
Authority
CN
China
Prior art keywords
unit
assembly
substrate
block
tray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2010101501235A
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English (en)
Chinese (zh)
Other versions
CN101969038A (zh
Inventor
杨海春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Luoke Semiconductor Co ltd
Original Assignee
Rokko Systems Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SG200405166A external-priority patent/SG120197A1/en
Priority claimed from SG200501802A external-priority patent/SG125997A1/en
Priority claimed from SG200505056A external-priority patent/SG129327A1/en
Application filed by Rokko Systems Pte Ltd filed Critical Rokko Systems Pte Ltd
Publication of CN101969038A publication Critical patent/CN101969038A/zh
Application granted granted Critical
Publication of CN101969038B publication Critical patent/CN101969038B/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0446—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3311—Horizontal transfer of a batch of workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7612—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by lifting arrangements, e.g. lift pins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00—Cutting or separating of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN2010101501235A 2004-08-23 2005-08-23 支承一组集成电路单元的支承装置 Expired - Lifetime CN101969038B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
SG200405166A SG120197A1 (en) 2004-08-23 2004-08-23 Supply mechanism for the chuck of an integrated circuit dicing device
SG200405166-0 2004-08-23
SG200501802A SG125997A1 (en) 2005-03-22 2005-03-22 Improved chuck table for an integrated circuit dicing device
SG200501802-3 2005-03-22
SG200505056A SG129327A1 (en) 2005-07-15 2005-07-15 Improved method and apparatus for an integrated circuit dicing device
SG200505056-2 2005-07-15

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB200580034750XA Division CN100521101C (zh) 2004-08-23 2005-08-23 用于切割集成电路的系统和方法

Publications (2)

Publication Number Publication Date
CN101969038A CN101969038A (zh) 2011-02-09
CN101969038B true CN101969038B (zh) 2012-02-15

Family

ID=35967934

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010101501235A Expired - Lifetime CN101969038B (zh) 2004-08-23 2005-08-23 支承一组集成电路单元的支承装置

Country Status (8)

Country Link
US (2) US7829383B2 (cg-RX-API-DMAC10.html)
EP (1) EP1789998B1 (cg-RX-API-DMAC10.html)
JP (1) JP5140428B2 (cg-RX-API-DMAC10.html)
KR (1) KR101299322B1 (cg-RX-API-DMAC10.html)
CN (1) CN101969038B (cg-RX-API-DMAC10.html)
MY (1) MY146842A (cg-RX-API-DMAC10.html)
TW (1) TWI387053B (cg-RX-API-DMAC10.html)
WO (1) WO2006022597A2 (cg-RX-API-DMAC10.html)

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SG142198A1 (en) * 2006-11-03 2008-05-28 Rokko Systems Pte Ltd A unit lifter assembly
SG143079A1 (en) * 2006-11-14 2008-06-27 Rokko Systems Pte Ltd Net block assembly
US8167523B2 (en) * 2007-07-12 2012-05-01 Asm Assembly Automation Ltd Singulation handler comprising vision system
JP2009200089A (ja) * 2008-02-19 2009-09-03 Towa Corp 基板の切断方法及び装置
SG156539A1 (en) * 2008-04-14 2009-11-26 Rokko Ventures Pte Ltd A system and process for dicing integrated circuits
NL2001790C2 (nl) * 2008-07-11 2010-01-12 Fico Bv Inrichting en werkwijze voor het zagen van elektronische componenten.
SG172499A1 (en) 2009-12-23 2011-07-28 Rokko Systems Pte Ltd Assembly and method for ic unit engagement
JP5657935B2 (ja) * 2010-07-08 2015-01-21 株式会社ディスコ 切削装置
KR101594965B1 (ko) * 2010-09-10 2016-02-18 한미반도체 주식회사 반도체 패키지 싱귤레이션 장치
KR20120108229A (ko) * 2011-03-23 2012-10-05 삼성디스플레이 주식회사 레이저 가공용 워크 테이블
KR101373393B1 (ko) * 2012-07-31 2014-03-13 세메스 주식회사 회전식 기판 이송 레일
KR101411157B1 (ko) * 2012-07-31 2014-06-23 세메스 주식회사 기판 처리 장치
ITTV20130048A1 (it) 2013-04-10 2014-10-11 Dario Toncelli Macchina per il taglio di materiale in lastra
CN107002227B (zh) * 2014-08-13 2019-09-24 洛克系统私人有限公司 用于加工经溅射的ic单元的装置及方法
CN106206392B (zh) * 2015-05-07 2021-04-30 梭特科技股份有限公司 晶粒定位布置设备以及晶粒定位布置方法
TWI577624B (zh) 2016-09-30 2017-04-11 均豪精密工業股份有限公司 翹曲板材搬送物流系統
CN107195580B (zh) * 2017-05-23 2023-05-05 商洛学院 一种可在不同衬底块同步生长的两用mocvd衬底架托盘结构
JP7339858B2 (ja) * 2019-11-08 2023-09-06 株式会社ディスコ 加工装置及び板状ワークの搬入出方法
US11107716B1 (en) * 2020-02-06 2021-08-31 Pyxis Cf Pte. Ltd. Automation line for processing a molded panel
KR102274543B1 (ko) * 2020-03-20 2021-07-07 ㈜토니텍 쏘 앤 플레이스먼트 시스템
CN112739003B (zh) * 2020-11-09 2022-04-26 昆山丘钛光电科技有限公司 一种将fpc连板进行分板的方法及装置
JP7723475B2 (ja) * 2020-12-02 2025-08-14 株式会社ディスコ 切削装置
TWI820522B (zh) * 2020-12-15 2023-11-01 新加坡商洛克系统私人有限公司 Ｉｃ單元切割與分類之方法及系統
KR102888135B1 (ko) * 2021-03-18 2025-11-19 토와 가부시기가이샤 가공 장치 및 가공품의 제조 방법

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US5953590A (en) * 1996-11-26 1999-09-14 Micron Technology, Inc. Method and apparatus to hold integrated circuit chips onto a chuck and to simultaneously remove multiple integrated circuit chips from a cutting chuck
US6196532B1 (en) * 1999-08-27 2001-03-06 Applied Materials, Inc. 3 point vacuum chuck with non-resilient support members

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Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5953590A (en) * 1996-11-26 1999-09-14 Micron Technology, Inc. Method and apparatus to hold integrated circuit chips onto a chuck and to simultaneously remove multiple integrated circuit chips from a cutting chuck
US6196532B1 (en) * 1999-08-27 2001-03-06 Applied Materials, Inc. 3 point vacuum chuck with non-resilient support members

Also Published As

Publication number Publication date
WO2006022597A3 (en) 2006-08-31
MY146842A (en) 2012-09-28
EP1789998B1 (en) 2014-04-09
US20080213975A1 (en) 2008-09-04
US7939374B2 (en) 2011-05-10
EP1789998A2 (en) 2007-05-30
JP5140428B2 (ja) 2013-02-06
KR101299322B1 (ko) 2013-08-26
US7829383B2 (en) 2010-11-09
US20110021003A1 (en) 2011-01-27
JP2008511164A (ja) 2008-04-10
KR20070048737A (ko) 2007-05-09
EP1789998A4 (en) 2011-09-14
TWI387053B (zh) 2013-02-21
WO2006022597A2 (en) 2006-03-02
CN101969038A (zh) 2011-02-09

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SE01 Entry into force of request for substantive examination
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GR01 Patent grant
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Effective date of registration: 20240318

Address after: 3rd Floor, No. 2123 Pudong Avenue, China (Shanghai) Pilot Free Trade Zone, Pudong New Area, Shanghai

Patentee after: Shanghai Luoke Semiconductor Co.,Ltd.

Country or region after: China

Address before: Singapore Commercial Centre

Patentee before: Rokko Systems Pte. Ltd.

Country or region before: Singapore

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CX01 Expiry of patent term

Granted publication date: 20120215

CX01 Expiry of patent term