CN101932975B - 照明光学部件与投射曝光设备 - Google Patents

照明光学部件与投射曝光设备 Download PDF

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Publication number
CN101932975B
CN101932975B CN2008801259209A CN200880125920A CN101932975B CN 101932975 B CN101932975 B CN 101932975B CN 2008801259209 A CN2008801259209 A CN 2008801259209A CN 200880125920 A CN200880125920 A CN 200880125920A CN 101932975 B CN101932975 B CN 101932975B
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China
Prior art keywords
illumination optics
illumination
group
object field
rema1
Prior art date
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Expired - Fee Related
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CN2008801259209A
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English (en)
Chinese (zh)
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CN101932975A (zh
Inventor
阿特·霍格尔
马库斯·德冈瑟
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2008801259209A 2008-02-01 2008-11-22 照明光学部件与投射曝光设备 Expired - Fee Related CN101932975B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US2534408P 2008-02-01 2008-02-01
DE102008007449.7 2008-02-01
US61/025,344 2008-02-01
DE102008007449A DE102008007449A1 (de) 2008-02-01 2008-02-01 Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
PCT/EP2008/009914 WO2009095052A1 (en) 2008-02-01 2008-11-22 Illumination optics and projection exposure apparatus

Publications (2)

Publication Number Publication Date
CN101932975A CN101932975A (zh) 2010-12-29
CN101932975B true CN101932975B (zh) 2013-04-10

Family

ID=40847171

Family Applications (1)

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CN2008801259209A Expired - Fee Related CN101932975B (zh) 2008-02-01 2008-11-22 照明光学部件与投射曝光设备

Country Status (6)

Country Link
US (2) US8705000B2 (enExample)
JP (1) JP5319706B2 (enExample)
KR (1) KR101541563B1 (enExample)
CN (1) CN101932975B (enExample)
DE (1) DE102008007449A1 (enExample)
WO (1) WO2009095052A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102010029765A1 (de) 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102011003928B4 (de) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011076145B4 (de) * 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012209132A1 (de) 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102012213937A1 (de) 2012-08-07 2013-05-08 Carl Zeiss Smt Gmbh Spiegel-Austauscharray
DE102012218074A1 (de) 2012-10-04 2013-08-14 Carl Zeiss Smt Gmbh Blenden-Vorrichtung
WO2014139814A1 (en) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Illumination optical unit for projection lithography
DE102014204388A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
JP6453251B2 (ja) 2013-03-14 2019-01-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
DE102013223808A1 (de) 2013-11-21 2014-12-11 Carl Zeiss Smt Gmbh Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht
DE102016222033A1 (de) 2016-11-10 2016-12-29 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Feldfacetten zu Pupillenfacetten zur Schaffung von Beleuchtungslicht-Ausleuchtungskanälen in einem Be-leuchtungssystem in einer EUV-Projektionsbelichtungsanlage
DE102017200663A1 (de) 2017-01-17 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Ausgangs-Kippwinkeln von kippbaren Feldfacetten eines Feldfacettenspiegels für eine Projektionsbelich-tungsanlage für die Projektionslithografie
DE102017209440A1 (de) * 2017-06-02 2018-12-06 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie
DE102020210829A1 (de) 2020-08-27 2022-03-03 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage
DE102023200548A1 (de) 2023-01-24 2024-07-25 Carl Zeiss Smt Gmbh Chromatisch korrigierte abbildende Beleuchtungsoptik zum Einsatz in einer Projektionsbelichtungsanlage für die Lithografie
WO2024227859A1 (en) * 2023-05-04 2024-11-07 Carl Zeiss Smt Gmbh Method for adjusting the telecentricity in a projection exposure system for microlithography
DE102024205432A1 (de) 2024-06-13 2025-12-18 Carl Zeiss Smt Gmbh Achromatische abbildende Optik
DE102024205431A1 (de) 2024-06-13 2025-12-18 Carl Zeiss Smt Gmbh Achromatische abbildende Optik

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0940722A2 (de) * 1998-03-05 1999-09-08 Carl Zeiss Beleuchtungssystem und REMA- (Retikel-Maskierungs-) Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
EP1522893A2 (en) * 2003-10-06 2005-04-13 Canon Kabushiki Kaisha Illumination optical system and exposure apparatus having the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
JP3599629B2 (ja) * 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP4888819B2 (ja) * 2000-04-12 2012-02-29 株式会社ニコン 露光装置、露光方法、露光装置の製造方法及びマイクロデバイスの製造方法
KR20020046932A (ko) * 2000-12-14 2002-06-21 시마무라 테루오 콘덴서 광학계, 및 그 광학계를 구비한 조명 광학 장치그리고 노광 장치
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
JP4684563B2 (ja) * 2004-02-26 2011-05-18 キヤノン株式会社 露光装置及び方法
JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102006025025A1 (de) * 2006-05-26 2007-11-29 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Mikrolithographie-Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
JPWO2008007633A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0940722A2 (de) * 1998-03-05 1999-09-08 Carl Zeiss Beleuchtungssystem und REMA- (Retikel-Maskierungs-) Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
EP1522893A2 (en) * 2003-10-06 2005-04-13 Canon Kabushiki Kaisha Illumination optical system and exposure apparatus having the same

Also Published As

Publication number Publication date
US9588431B2 (en) 2017-03-07
CN101932975A (zh) 2010-12-29
KR20100119543A (ko) 2010-11-09
US20110019172A1 (en) 2011-01-27
KR101541563B1 (ko) 2015-08-03
WO2009095052A1 (en) 2009-08-06
JP2011517843A (ja) 2011-06-16
US20140185027A1 (en) 2014-07-03
JP5319706B2 (ja) 2013-10-16
DE102008007449A1 (de) 2009-08-13
US8705000B2 (en) 2014-04-22

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