KR101541563B1 - 조명 광학 기기 및 투사 노광 장치 - Google Patents

조명 광학 기기 및 투사 노광 장치 Download PDF

Info

Publication number
KR101541563B1
KR101541563B1 KR1020107017402A KR20107017402A KR101541563B1 KR 101541563 B1 KR101541563 B1 KR 101541563B1 KR 1020107017402 A KR1020107017402 A KR 1020107017402A KR 20107017402 A KR20107017402 A KR 20107017402A KR 101541563 B1 KR101541563 B1 KR 101541563B1
Authority
KR
South Korea
Prior art keywords
illumination
displacement
displaceable
rema1
object field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020107017402A
Other languages
English (en)
Korean (ko)
Other versions
KR20100119543A (ko
Inventor
아투르 헤겔
마르쿠스 데군테르
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20100119543A publication Critical patent/KR20100119543A/ko
Application granted granted Critical
Publication of KR101541563B1 publication Critical patent/KR101541563B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020107017402A 2008-02-01 2008-11-22 조명 광학 기기 및 투사 노광 장치 Expired - Fee Related KR101541563B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US2534408P 2008-02-01 2008-02-01
US61/025,344 2008-02-01
DE102008007449.7 2008-02-01
DE102008007449A DE102008007449A1 (de) 2008-02-01 2008-02-01 Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Publications (2)

Publication Number Publication Date
KR20100119543A KR20100119543A (ko) 2010-11-09
KR101541563B1 true KR101541563B1 (ko) 2015-08-03

Family

ID=40847171

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107017402A Expired - Fee Related KR101541563B1 (ko) 2008-02-01 2008-11-22 조명 광학 기기 및 투사 노광 장치

Country Status (6)

Country Link
US (2) US8705000B2 (enExample)
JP (1) JP5319706B2 (enExample)
KR (1) KR101541563B1 (enExample)
CN (1) CN101932975B (enExample)
DE (1) DE102008007449A1 (enExample)
WO (1) WO2009095052A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102010029765A1 (de) 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102011003928B4 (de) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011076145B4 (de) * 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012209132A1 (de) 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102012213937A1 (de) 2012-08-07 2013-05-08 Carl Zeiss Smt Gmbh Spiegel-Austauscharray
DE102012218074A1 (de) 2012-10-04 2013-08-14 Carl Zeiss Smt Gmbh Blenden-Vorrichtung
DE102014204388A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
WO2014139872A1 (en) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Illumination optical unit for projection lithography
JP6410741B2 (ja) 2013-03-14 2018-10-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
DE102013223808A1 (de) 2013-11-21 2014-12-11 Carl Zeiss Smt Gmbh Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht
DE102016222033A1 (de) 2016-11-10 2016-12-29 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Feldfacetten zu Pupillenfacetten zur Schaffung von Beleuchtungslicht-Ausleuchtungskanälen in einem Be-leuchtungssystem in einer EUV-Projektionsbelichtungsanlage
DE102017200663A1 (de) 2017-01-17 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Ausgangs-Kippwinkeln von kippbaren Feldfacetten eines Feldfacettenspiegels für eine Projektionsbelich-tungsanlage für die Projektionslithografie
DE102017209440A1 (de) * 2017-06-02 2018-12-06 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie
DE102020210829A1 (de) 2020-08-27 2022-03-03 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage
DE102023200548A1 (de) 2023-01-24 2024-07-25 Carl Zeiss Smt Gmbh Chromatisch korrigierte abbildende Beleuchtungsoptik zum Einsatz in einer Projektionsbelichtungsanlage für die Lithografie
CN121057979A (zh) * 2023-05-04 2025-12-02 卡尔蔡司Smt有限责任公司 用于调整微光刻的投射曝光系统中的远心的方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6281967B1 (en) 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
DE19809395A1 (de) 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
JP3599629B2 (ja) * 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP4888819B2 (ja) * 2000-04-12 2012-02-29 株式会社ニコン 露光装置、露光方法、露光装置の製造方法及びマイクロデバイスの製造方法
KR20020046932A (ko) * 2000-12-14 2002-06-21 시마무라 테루오 콘덴서 광학계, 및 그 광학계를 구비한 조명 광학 장치그리고 노광 장치
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
JP2005114922A (ja) * 2003-10-06 2005-04-28 Canon Inc 照明光学系及びそれを用いた露光装置
JP4684563B2 (ja) * 2004-02-26 2011-05-18 キヤノン株式会社 露光装置及び方法
JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102006025025A1 (de) * 2006-05-26 2007-11-29 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Mikrolithographie-Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
WO2008007633A1 (en) * 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6281967B1 (en) 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method

Also Published As

Publication number Publication date
JP5319706B2 (ja) 2013-10-16
US20110019172A1 (en) 2011-01-27
US20140185027A1 (en) 2014-07-03
US8705000B2 (en) 2014-04-22
JP2011517843A (ja) 2011-06-16
CN101932975A (zh) 2010-12-29
DE102008007449A1 (de) 2009-08-13
CN101932975B (zh) 2013-04-10
KR20100119543A (ko) 2010-11-09
US9588431B2 (en) 2017-03-07
WO2009095052A1 (en) 2009-08-06

Similar Documents

Publication Publication Date Title
KR101541563B1 (ko) 조명 광학 기기 및 투사 노광 장치
US6788389B2 (en) Production method of projection optical system
KR102707885B1 (ko) 투영 리소그래피 시스템을 위한 동공 패싯 미러, 광학 시스템 및 조명 광학 소자
US9235133B2 (en) Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
KR101428136B1 (ko) 마이크로리소그래피용 투사 대물렌즈, 투사 노광 장치, 투사 노광 방법 및 광학 보정 플레이트
EP2198344B1 (en) Microlithographic projection exposure apparatus
US6741394B1 (en) Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
EP1059550A1 (en) Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system
JP2001343582A (ja) 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP2012103724A (ja) マイクロリソグラフィ露光装置のための照明システム
EP3023824A1 (en) Catoptric imaging system for euv projection lithography
US8854605B2 (en) Illumination optical system, exposure apparatus, and device fabrication method
US7385672B2 (en) Exposure apparatus and method
EP1522893B1 (en) Illumination optical system and exposure apparatus having the same
KR20170114976A (ko) 투영 노광 방법 및 투영 노광 장치
WO2022248433A1 (en) Projection exposure apparatus and method for designing a component of a projection exposure apparatus
JP2002169083A (ja) 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
US20070126990A1 (en) Projection optical system and exposure apparatus with the same
JP2001176772A (ja) 照明光学装置および該照明光学装置を備えた投影露光装置
JP2008172004A (ja) 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
HK1105245A (en) Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20180719

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20190718

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20220729

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20220729