JP5319706B2 - 照明光学系及び投影露光装置 - Google Patents

照明光学系及び投影露光装置 Download PDF

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JP5319706B2
JP5319706B2 JP2010544588A JP2010544588A JP5319706B2 JP 5319706 B2 JP5319706 B2 JP 5319706B2 JP 2010544588 A JP2010544588 A JP 2010544588A JP 2010544588 A JP2010544588 A JP 2010544588A JP 5319706 B2 JP5319706 B2 JP 5319706B2
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optical system
illumination
illumination optical
object field
displacement
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Japanese (ja)
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JP2011517843A5 (enExample
JP2011517843A (ja
Inventor
アルトゥル ヘーゲル
マルクス デギュンター
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2010544588A 2008-02-01 2008-11-22 照明光学系及び投影露光装置 Expired - Fee Related JP5319706B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US2534408P 2008-02-01 2008-02-01
DE102008007449.7 2008-02-01
US61/025,344 2008-02-01
DE102008007449A DE102008007449A1 (de) 2008-02-01 2008-02-01 Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
PCT/EP2008/009914 WO2009095052A1 (en) 2008-02-01 2008-11-22 Illumination optics and projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2011517843A JP2011517843A (ja) 2011-06-16
JP2011517843A5 JP2011517843A5 (enExample) 2012-01-12
JP5319706B2 true JP5319706B2 (ja) 2013-10-16

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ID=40847171

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JP2010544588A Expired - Fee Related JP5319706B2 (ja) 2008-02-01 2008-11-22 照明光学系及び投影露光装置

Country Status (6)

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US (2) US8705000B2 (enExample)
JP (1) JP5319706B2 (enExample)
KR (1) KR101541563B1 (enExample)
CN (1) CN101932975B (enExample)
DE (1) DE102008007449A1 (enExample)
WO (1) WO2009095052A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102010029765A1 (de) 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102011003928B4 (de) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011076145B4 (de) * 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012209132A1 (de) 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102012213937A1 (de) 2012-08-07 2013-05-08 Carl Zeiss Smt Gmbh Spiegel-Austauscharray
DE102012218074A1 (de) 2012-10-04 2013-08-14 Carl Zeiss Smt Gmbh Blenden-Vorrichtung
JP6410741B2 (ja) 2013-03-14 2018-10-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
JP6453251B2 (ja) 2013-03-14 2019-01-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影リソグラフィのための照明光学ユニット
DE102014204388A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102013223808A1 (de) 2013-11-21 2014-12-11 Carl Zeiss Smt Gmbh Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht
DE102016222033A1 (de) 2016-11-10 2016-12-29 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Feldfacetten zu Pupillenfacetten zur Schaffung von Beleuchtungslicht-Ausleuchtungskanälen in einem Be-leuchtungssystem in einer EUV-Projektionsbelichtungsanlage
DE102017200663A1 (de) 2017-01-17 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zur Zuordnung von Ausgangs-Kippwinkeln von kippbaren Feldfacetten eines Feldfacettenspiegels für eine Projektionsbelich-tungsanlage für die Projektionslithografie
DE102017209440A1 (de) * 2017-06-02 2018-12-06 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie
DE102020210829A1 (de) 2020-08-27 2022-03-03 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage
DE102023200548A1 (de) 2023-01-24 2024-07-25 Carl Zeiss Smt Gmbh Chromatisch korrigierte abbildende Beleuchtungsoptik zum Einsatz in einer Projektionsbelichtungsanlage für die Lithografie
WO2024227859A1 (en) * 2023-05-04 2024-11-07 Carl Zeiss Smt Gmbh Method for adjusting the telecentricity in a projection exposure system for microlithography

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
DE69933973T2 (de) * 1998-07-29 2007-06-28 Carl Zeiss Smt Ag Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
JP3599629B2 (ja) * 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP4888819B2 (ja) * 2000-04-12 2012-02-29 株式会社ニコン 露光装置、露光方法、露光装置の製造方法及びマイクロデバイスの製造方法
KR20020046932A (ko) * 2000-12-14 2002-06-21 시마무라 테루오 콘덴서 광학계, 및 그 광학계를 구비한 조명 광학 장치그리고 노광 장치
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置
JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
JP2005114922A (ja) * 2003-10-06 2005-04-28 Canon Inc 照明光学系及びそれを用いた露光装置
JP4684563B2 (ja) * 2004-02-26 2011-05-18 キヤノン株式会社 露光装置及び方法
JP4599936B2 (ja) 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102006025025A1 (de) * 2006-05-26 2007-11-29 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Mikrolithographie-Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
KR20090033165A (ko) * 2006-07-12 2009-04-01 가부시키가이샤 니콘 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie

Also Published As

Publication number Publication date
US20110019172A1 (en) 2011-01-27
KR101541563B1 (ko) 2015-08-03
WO2009095052A1 (en) 2009-08-06
KR20100119543A (ko) 2010-11-09
CN101932975B (zh) 2013-04-10
JP2011517843A (ja) 2011-06-16
CN101932975A (zh) 2010-12-29
US9588431B2 (en) 2017-03-07
US20140185027A1 (en) 2014-07-03
US8705000B2 (en) 2014-04-22
DE102008007449A1 (de) 2009-08-13

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