CN101920235B - 涂敷装置和涂敷方法 - Google Patents

涂敷装置和涂敷方法 Download PDF

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Publication number
CN101920235B
CN101920235B CN2010102012645A CN201010201264A CN101920235B CN 101920235 B CN101920235 B CN 101920235B CN 2010102012645 A CN2010102012645 A CN 2010102012645A CN 201010201264 A CN201010201264 A CN 201010201264A CN 101920235 B CN101920235 B CN 101920235B
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China
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substrate
aforesaid substrate
mentioned
portal
transported
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Expired - Fee Related
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CN2010102012645A
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English (en)
Chinese (zh)
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CN101920235A (zh
Inventor
小菅忠男
前原信二
川隅幸宏
圆山勇
石田茂
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Hitachi Ltd
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Hitachi Plant Technologies Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN2010102012645A 2009-06-10 2010-06-09 涂敷装置和涂敷方法 Expired - Fee Related CN101920235B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009139430A JP5525190B2 (ja) 2009-06-10 2009-06-10 塗布装置及び塗布方法
JP2009-139430 2009-06-10

Publications (2)

Publication Number Publication Date
CN101920235A CN101920235A (zh) 2010-12-22
CN101920235B true CN101920235B (zh) 2013-08-28

Family

ID=43335597

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010102012645A Expired - Fee Related CN101920235B (zh) 2009-06-10 2010-06-09 涂敷装置和涂敷方法

Country Status (4)

Country Link
JP (1) JP5525190B2 (ja)
KR (1) KR101161961B1 (ja)
CN (1) CN101920235B (ja)
TW (1) TWI460020B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5897263B2 (ja) * 2011-03-18 2016-03-30 株式会社日立製作所 ペースト塗布ヘッド，ペースト塗布装置及びペースト塗布方法
TW201314372A (zh) * 2011-09-26 2013-04-01 Dainippon Screen Mfg 塗佈裝置
JP5943855B2 (ja) * 2013-02-15 2016-07-05 中外炉工業株式会社 ロール搬送式コータ
CN105618300B (zh) * 2015-12-25 2018-10-30 天津滨海光热反射技术有限公司 专用于制作光热发电反射镜的喷涂设备及其运行方法
CN105728264B (zh) * 2016-04-18 2018-07-17 大连华工创新科技股份有限公司 太阳能玻璃板自动涂胶设备
US10881005B2 (en) * 2016-06-08 2020-12-29 Nordson Corporation Methods for dispensing a liquid or viscous material onto a substrate
CN105964501A (zh) * 2016-06-28 2016-09-28 海宁辛帝亚自动化科技有限公司 一种自动输料装置
JP6737649B2 (ja) * 2016-07-04 2020-08-12 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置および塗布方法
CN107952616A (zh) * 2018-01-16 2018-04-24 江苏中矿大正表面工程技术有限公司 一种用于大型桥隧钢沉管外表面的涂装设备
JP6931249B2 (ja) * 2019-03-28 2021-09-01 Ａｉメカテック株式会社 インクジェット方式の薄膜形成装置
US11282730B2 (en) 2019-08-02 2022-03-22 Rohinni, LLC Bridge apparatus for semiconductor die transfer
CN112742668B (zh) * 2020-12-24 2022-02-11 苏州桐力光电股份有限公司 显示屏点胶线

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1970167A (zh) * 2005-10-14 2007-05-30 株式会社日立工业设备技术 糊剂涂敷装置
CN101024212A (zh) * 2006-02-17 2007-08-29 株式会社日立工业设备技术 涂胶装置
CN101439330A (zh) * 2008-11-19 2009-05-27 塔工程有限公司 一种涂胶机以及使用这种涂胶机涂布密封胶的方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01125549U (ja) * 1988-02-22 1989-08-28
JP3701882B2 (ja) * 2001-05-25 2005-10-05 株式会社 日立インダストリイズ ペースト塗布機
JP3823050B2 (ja) * 2001-12-07 2006-09-20 株式会社 日立インダストリイズ ペースト塗布機
JP3690380B2 (ja) * 2002-08-02 2005-08-31 セイコーエプソン株式会社 材料の配置方法、電子装置の製造方法、電気光学装置の製造方法
JP4337343B2 (ja) * 2002-12-18 2009-09-30 セイコーエプソン株式会社 液滴吐出装置および電気光学装置の製造方法
JP2004298775A (ja) * 2003-03-31 2004-10-28 Dainippon Printing Co Ltd 塗布装置及び塗布方法
JP4971730B2 (ja) * 2006-09-06 2012-07-11 積水化学工業株式会社 プラズマ表面処理装置
TW200914146A (en) * 2007-02-06 2009-04-01 Shibaura Mechatronics Corp Paste applicator and paste application method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1970167A (zh) * 2005-10-14 2007-05-30 株式会社日立工业设备技术 糊剂涂敷装置
CN101024212A (zh) * 2006-02-17 2007-08-29 株式会社日立工业设备技术 涂胶装置
CN101439330A (zh) * 2008-11-19 2009-05-27 塔工程有限公司 一种涂胶机以及使用这种涂胶机涂布密封胶的方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2002-346452A 2002.12.03
JP特开2003-170095A 2003.06.17

Also Published As

Publication number Publication date
TWI460020B (zh) 2014-11-11
KR101161961B1 (ko) 2012-07-04
CN101920235A (zh) 2010-12-22
JP2010284580A (ja) 2010-12-24
TW201111061A (en) 2011-04-01
KR20100132929A (ko) 2010-12-20
JP5525190B2 (ja) 2014-06-18

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SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
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Owner name: HITACHI,LTD.

Free format text: FORMER OWNER: HITACHI PLANT TECHNOLOGIES LTD.

Effective date: 20140310

C41 Transfer of patent application or patent right or utility model
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Effective date of registration: 20140310

Address after: Tokyo, Japan

Patentee after: Hitachi Ltd.

Address before: Tokyo, Japan, Japan

Patentee before: Hitachi Plant Technologies Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130828

Termination date: 20170609