CN101920235B - Coating device and coating method - Google Patents

Coating device and coating method Download PDF

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Publication number
CN101920235B
CN101920235B CN2010102012645A CN201010201264A CN101920235B CN 101920235 B CN101920235 B CN 101920235B CN 2010102012645 A CN2010102012645 A CN 2010102012645A CN 201010201264 A CN201010201264 A CN 201010201264A CN 101920235 B CN101920235 B CN 101920235B
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China
Prior art keywords
substrate
aforesaid substrate
mentioned
portal
transported
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CN101920235A (en
Inventor
小菅忠男
前原信二
川隅幸宏
圆山勇
石田茂
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Hitachi Ltd
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Hitachi Plant Technologies Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention provides a coating device and coating method capable of reducing raised dust and reducing producing time. The door-shaped frame with various coating functions and the workwench loaded with a glass substrate (17) can be movably disposed along a X(T) axis on a basic table (1). When the workbench is at position A, a first coating action on the glass substrate is conducted by using the coating head (8) of a door-shaped frame (2a). When the workbench is at position B, a second coating action on the glass substrate is conducted by using the coating head (8) of a door-shaped frame (2b). When the workbench is at position C, a third coating action on the glass substrate is conducted by using the coating head (8) of a door-shaped frame (2c). Coated glass substrate is transported to the workbench from the transporting-in side a of the substrate through a transport band (18a) at an equal height, and processed glass substrate is transported to the transport band (18b) of the transporting-out side b from the workbench at an equal height.

Description

Applying device and coating method
Technical field
The present invention relates to the manufacturing of surface plates such as liquid crystal panel, particularly implement the applying device and the coating method that apply under the coating, liquid crystal drop of encapsulant etc. on the substrate.
Background technology
The technology before of manufacturing liquid crystal panel etc., the device (for example seeing patent documentation 1) of liquid crystal panel has been proposed to make as an one example, this device has a plurality of vacuum processing chambers of implementing processing under vacuum state, with a plurality of atmospheric process chambers of under atmospheric pressure state, implementing to handle, between these vacuum processing chambers, between the atmospheric pressure process chamber, between vacuum processing chamber and the atmospheric pressure process chamber, be respectively equipped be used to the manipulator chamber isolated with the outside of transporting glass substrate, when transporting glass substrate between these process chambers, the manipulator of manipulator chamber automatically is transported to another process chamber to glass substrate from a process chamber.
According to this technology before, the processing that becomes liquid crystal panel up to glass substrate all stays out of staff, all automatically handle, so, almost there are not particle contamination, molecular contamination.
In addition, as another example following technology has been proposed: in vacuum chamber, be provided with positioner, substrate is arranged at this positioner, encapsulant is coated on the substrate, the substrate that has applied encapsulant like this and these two baseplate-laminatings of another substrate, make sealing material curing, inject liquid crystal at last, when making panel in proper order with this, the coating operation that forms encapsulant at substrate is carried out under pressure below atmospheric pressure, in addition, the operation with two baseplate-laminatings is (for example the seeing patent documentation 2) that carries out under the pressure below the atmospheric pressure.
According to this technology before, under pressure below atmospheric pressure, carry out the coating of encapsulant, the applying of two substrates, so, can reduce the bubble of sneaking in the encapsulant, the cutting that is caused by this bubble is bad, the gap is bad or liquid crystal injects problems such as bad thereby can reduce, the foreign matters such as dust that minimizing is kicked up around substrate, it is bad also to reduce the panel that causes because of foreign matter.
[patent documentation 1] Japanese kokai publication hei 6-324297 communique
[patent documentation 2] Japanese kokai publication hei 2001-13507 communique
Summary of the invention
In the surface plate field of LCD (liquid crystal panel) etc., the maximization of the size of glass substrate advances hastily year by year, and thereupon, its manufacturing installation also maximizes.In addition, in order to reduce manufacturing cost, require to reduce the dust of kicking up at manufacturing installation inside, periphery, improve yield rate, simultaneously, require to suppress the manufacturing time of each piece panel.
In the technology before of above-mentioned patent documentation 1 record, when making panel from glass substrate, when glass substrate is transported to vacuum processing chamber from atmospheric pressure process chamber, vacuum formation time from the atmospheric pressure state to the vacuum state is the time of loss, therefore, the problem that exists total manufacturing time to increase.
In the technology before of above-mentioned patent documentation 2 records, when in vacuum chamber, applying the applying operation of operation, substrate, group in vacuum chamber is gone into, is taken out by staff, manipulator etc. and undertaken, because the substrate knee-action that is being kept by staff, manipulator etc. etc., ambient air produces big flowing, and dust is along with this air is kicked up.In addition, when the many table apparatus that do not adopt same vacuum chamber and will have a difference in functionality are made panel side by side, when the glass substrate of transferring as the object workpiece, similarly, if use manipulator etc., then flow owing to the action of the glass substrate that is being kept by manipulator etc. causes the big of surrounding air, along with ambient air flows, dust is kicked up.Kick up if produce such dust, then dust is attached on the panel, has improved the probability that becomes substandard products.
In addition, in the technology of above-mentioned patent documentation 2 records, as the 1st example, when under vacuum environment, applying operation, applied in a vacuum behind the encapsulant temporarily to atmosphere opening, scatter distance piece, the interim location to having carried out putting attached ultraviolet hardening resin irradiation ultraviolet radiation, and with two baseplate-laminatings.Then, from positioner, take out temporary fixed substrate, put into the Nylon Bag of other preparation, will reduce pressure in the bag, that is, become vacuum once again, like this, to two substrates pressurizations.Heat then, make the sealing material curing of coating, with two substrate bondings.At last, from bag, take out, namely open for atmospheric pressure state again, in atmospheric pressure, enclose liquid crystal material, make liquid crystal panel.Therefore, finish from the liquid crystal panel that is coated to of encapsulant, adopting through twice vacuum state, opening is the manufacturing sequence of twice atmospheric pressure state.
In addition, as the 2nd example, when in vacuum environment, fitting operation, in atmospheric pressure, applied encapsulant after, scatter distance piece, temporary fixed to having carried out putting attached ultraviolet hardening resin irradiation ultraviolet radiation, and in a vacuum with two baseplate-laminatings.Then, open towards atmospheric pressure state, from positioner, take out substrate, with vacuum-packed method, namely become vacuum state again, thus two substrates are pressurizeed.Then, under this vacuum packaging state, heat, make the sealing material curing of previous coating, with two substrate bondings.At last, take out from bag, namely open again is atmospheric pressure state, encloses liquid crystal material in atmospheric pressure, manufactures liquid crystal panel.In this example also with similarly above-mentioned, from encapsulant be coated to finishing of liquid crystal panel, adopting through twice vacuum state, opening is the manufacturing sequence of twice atmospheric pressure state.
As a result, no matter still the 2nd example of the 1st example is sneaked in the encapsulant in order to suppress bubble, is coated to the coating operation of operation of applying or the either party of applying operation from encapsulant, all carries out in a vacuum.But in fact, liquid crystal while become vacuum state again when pressurizeing crimping with thermosetting resin, need be used to form the time of vacuum environment before injecting.
Here, also have in the manufacture method that makes sealing material curing with thermosetting resin, under vacuum state, do not pressurize during with two substrate crimping.But, common liquid crystal injection mode, the such manufacture method of many employings: the liquid crystal in next stage injects the stage, for liquid crystal panel inside is formed vacuum, in chamber, make liquid crystal panel temporarily be in vacuum state, after liquid crystal injecting port immersed liquid crystal, to atmosphere opening, in atmospheric pressure, liquid crystal is pressed into and is filled to liquid crystal panel inside.
The objective of the invention is to address the above problem, the applying device and the coating method that reduce the dust of kicking up and can shorten manufacturing time are provided.
To achieve these goals, applying device of the present invention, at one or more pallet portal is set, on this portal, can be provided with one or more applicator heads movably, this applicator head have filling coating material the material storage tube and gush out from the nozzle ejiction opening of the coating material of coating material receiving cartridge; Portal moves with respect to the substrate that the substrate-placing platform that is arranged on the pallet carries, and applicator head moves with respect to portal, thereby applicator head moves with respect to substrate, sprays coating material from the nozzle ejiction opening to substrate; Wherein, be transported into substrate from the outside to substrate-placing platform and be from be transported into height that the side moving belt is transported into remain with substrate-placing platform on the state of substrate-placing face equal height under carry out, and, transport substrate from substrate-placing platform to the outside and be the height that transports the side moving belt from substrate-placing platform remain with substrate-placing platform on the state of substrate-placing face equal height under carry out; This applying device has the 1st travel mechanism and the 2nd travel mechanism; Above-mentioned the 1st travel mechanism under the state of substrate substrate-placing platform, moves to the position that substrate is transported the side moving belt from the position that is transported into the substrate-placing that the side moving belt is transported in mounting; Above-mentioned the 2nd travel mechanism makes the substrate rotating that is positioned on the substrate-placing platform.
In addition, applying device of the present invention is provided with many portals at pallet; Be located at the applicator head on any portal among above-mentioned many portals, ejection is different from the coating material of the kind of the applicator head on the portal that is located at other on the substrate.
In addition, applying device of the present invention is located at any applicator head among the applicator head on the same portal, a plurality of and other applicator head, the different types of coating material of ejection on the substrate.
In addition, applying device of the present invention, substrate-placing platform have substrate travel mechanism and substrate position fixed mechanism; Aforesaid substrate travel mechanism utilizes the roller that substrate is moved towards a direction on substrate-placing platform; Substrate is adsorbed at substrate-placing platform in aforesaid substrate fixed-site mechanism, and substrate position is fixed on the substrate-placing platform.
In addition, applying device of the present invention, substrate-placing platform have substrate travel mechanism and substrate position fixed mechanism; Aforesaid substrate travel mechanism to the substrate injection air, makes substrate move towards a direction on substrate-placing platform; Substrate is adsorbed at substrate-placing platform in aforesaid substrate fixed-site mechanism, and substrate position is fixed on the substrate-placing platform.
In addition, applying device of the present invention, cover the moving range of the substrate-placing platform on the pallet with pressure-resistant cover, attracting mechanism with air is the inner setting that is covered with by pressure-resistant cover subatmospheric air pressure, in hypobaric environment, with the applicator head of portal the substrate that is positioned on the substrate-placing platform is applied action.
To achieve these goals, coating method of the present invention, at one or more pallet portal is set, on this portal, can be provided with one or more applicator heads movably, this applicator head have filling coating material the coating material receiving cartridge and gush out from the nozzle ejiction opening of the coating material of coating material receiving cartridge; Portal moves with respect to the substrate that the substrate-placing platform that is arranged on the pallet carries, and applicator head moves with respect to portal, thereby applicator head moves with respect to substrate, sprays coating material from the nozzle ejiction opening to substrate; Wherein, be transported into substrate from the outside to substrate-placing platform and be from be transported into height that the side moving belt is transported into remain with substrate-placing platform on the state of substrate-placing face equal height under carry out, and, transport this substrate from substrate-placing platform to the outside and be the height that transports the side moving belt from substrate-placing platform remain with substrate-placing platform on the state of substrate-placing face equal height under carry out; Substrate-placing platform in mounting under the state of substrate, move to the position that substrate is transported the side moving belt from the position that is transported into the substrate-placing that the side moving belt is transported into; Make the substrate rotating that is positioned on the substrate-placing platform, revise θ axle deviation.
In addition, coating method of the present invention is provided with many portals at pallet; Be located at the applicator head on any portal among many portals, ejection is different from the coating material of the kind of the applicator head on the portal that is located at other on the substrate.
In addition, coating method of the present invention is located at any applicator head among a plurality of applicator heads on the same portal and other applicator head, the different types of coating material of ejection on the substrate.
In addition, coating method of the present invention by utilizing the substrate travel mechanism of roller, moves substrate towards a direction on substrate-placing platform, carry out the location of substrate on substrate-placing platform; Substrate behind the absorption location is fixed on substrate position on the substrate-placing platform.
In addition, coating method of the present invention on substrate-placing platform, to the substrate injection air, makes substrate move towards a direction, carries out the location of substrate on substrate-placing platform; Substrate behind the absorption location is fixed on substrate position on the substrate-placing platform.
In addition, coating method of the present invention, cover the moving range of the substrate-placing platform on the pallet with pressure-resistant cover, be the inner setting that is covered with by pressure-resistant cover subatmospheric air pressure, in hypobaric environment, with the applicator head of portal the substrate that is positioned on the substrate-placing platform is applied action.
According to the present invention, available common work stage (substrate-placing platform) is carried out the coating operation of three kinds of materials, for example encapsulant coating, conducting are with getting the various coating operations that apply under coating and the liquid crystal drop ready, in addition, the transfer of the substrate before and after this coating operation is undertaken by being transported into, transporting moving belt, like this, can be intensive in a device three functions under dust is kicked up to the state of minimum.
Like this, with the many table apparatus with a plurality of functions side by side, with a common manipulator ,] be arranged on many manipulators between device and carry out comparing as the manipulator method of shipment before of the substrate transfer of object workpiece, can shorten the moving-wire (portable cord) of substrate, the 1st, particle contamination in the time of can reducing substrate and transport improves the yield rate of liquid crystal panel, the 2nd, can dwindle that area being set, effectively utilize the toilet.
Description of drawings
Fig. 1 is the stereoscopic figure that wants portion of the 1st embodiment of expression applying device of the present invention and coating method.
Fig. 2 is the general structural map of unitary construction of the 1st embodiment of expression applying device of the present invention and coating method.
Fig. 3 is the stereoscopic figure of a concrete example of the work stage 6 among presentation graphs 1 and Fig. 2.
Fig. 4 is the stereoscopic figure of another concrete example of the work stage 6 among presentation graphs 1 and Fig. 2.
Fig. 5 is the figure of a concrete example of the structure of the air ejection/adsorption hole 28 in the presentation graphs 4.
Fig. 6 amplifies the stereogram of expression with the portion that wants of a concrete example of the applicator head 8 among Fig. 1.
Fig. 7 is in presentation graphs 1, the embodiment shown in Figure 2, the block diagram of a concrete example of the structure of master control part and control thereof.
Fig. 8 is the block diagram of the concrete example of the 34b of sub-control portion in the presentation graphs 7.
Fig. 9 is the flow chart of a concrete example of the molar behavior of presentation graphs 1, the 1st embodiment shown in Figure 2.
Figure 10 is the structural map of unitary construction of roughly representing the 2nd embodiment of applying device of the present invention and coating method.
The explanation of Reference numeral
1... pallet, 2a～2c... portal, 3... crossbeam, 4a, 4b...X direction of principal axis travel mechanism, 5a, 5b... linear guides, 6... work stage, 7... linear guides, 8... applicator head, 9... cover, 10... substrate is transported into mouth, 11... substrate transports mouth, 13...Z axle travelling carriage, 14... nozzle, 15,15a～15e... substrate adsorption plate, 16,16a～16d... roller, 17... glass substrate, 18a... are transported into the side moving belt, 18b... transport the side moving belt, 19... the substrate-placing parts, 20a～20d... attaching parts, 21... air adsorption hole, 22a, 22b... substrate orientation pin, 23... crossed roller bearing, 24a～24d...XY θ direction of principal axis micromotion mechanism, 25... crossed roller bearing, 26... quadrature bearing, 27... the substrate adsorption plate, 27a... substrate-placing face, 27b... leading flank, 28... air ejection/adsorption hole, 29... air adsorption hole, 30... air squit hole, 34af... portal move with X-axis linear motor driver, 34ag... the coating head moves with Y-axis linear motor driver, 34ah... the work stage rotation is moved with T axis linear motor driver, 34b... sub-control portion with θ axle motor driver, 34ai... work stage, 39...Z axle motor driver, 40... pressure-resistant cover, the 41a... substrate is transported into gate, and the 41b... substrate transports gate, 42... the attraction air blast, the 43... pipe arrangement
The specific embodiment
Glass substrate maximizes year by year, and from the tendency corresponding with present maximization, the detent mechanism in the device maximizes, and weight increases day by day.Thereupon; also maximize as the such bearing of motor maximization, ball-screw, the guide of drive source, Poewr transmission mechanism; in addition; the not only maximization of train of mechanism such as motor driver high capacity, the increase of distribution scale, and cause extensiveization of the substrate drive division in the control system.
On the other hand, the 2nd problem is that in the exchange of the inside and outside glass substrate of device, also there is the tendency of maximization, weightization in the mechanism that is transported into/transports this substrate.
From fabrication schedule, be the device that applies encapsulant on the glass substrate before, get the device of coated electrode point ready and the device of these three kinds of functions of device of applying under the liquid crystal drop is arranged side by side, these devices are connected with the laminating apparatus of glass substrate.Between these three kinds of devices, approached by transportation manipulator and to carry out being transported into, transporting of large-size glass substrate.In this action that is transported into, transports, not only move horizontally, and, in the movement between device, when glass substrate being carried on the platform of each device, keeping under the state of substrate also knee-action repeatedly, like this, current downflow on the ambient air, dust is kicked up thereupon.
For this reason, in the present invention, change the mode of transferring with manipulator, and adopt applying device or the application system that has one or more portals (door-shaped frame portion).Above-mentioned portal has coating function (below, if no special instructions, also comprise the coating function of dripping of liquid crystal) of above-mentioned each device.For each portal arranges common work stage, glass substrate is carried on this work stage, this work stage of carrying glass substrate is arranged on the position of distributing by above-mentioned functions, like this, carry out suitable coating action with suitable portal.The movement of substrate between the device of difference in functionality carried out in the movement that utilizes mounting the same work stage of substrate, thus, can carry out transporting of substrate without manipulator, staff.
In addition, in the present invention, substrate transporting with being transported into the side moving belt, transporting the side moving belt and carry out toward being transported into of work stage, substrate from work stage, in these moving belts, the height of keeping lift-launch glass substrate thereon be positioned in work stage on the time the glass substrate height identical.
This shows, apply action with each portal during, glass substrate is positioned on the same work stage and motionless with respect to work stage, thus in the coating action that glass substrate is carried out, dust is not kicked up.In addition, glass substrate is being transported into, when transporting work stage, is transporting on the work stage from being transported into moving belt, transport to transport from work stage and be with, it is highly constant not to be transported (namely do not lift, do not fall), and like this, dust is not kicked up.Therefore, can improve the yield rate of the plate of manufacturing.
In addition, comprise whole portals, work stage, their driving mechanism etc. is covered with cover in interior whole space, and the pressure ratio atmosphere in this space is forced down, thereby reduce the air capacity in this space, like this, can reduce the power of kicking up of dust, reduce the amount of dust of kicking up.
Below, with reference to the description of drawings embodiments of the present invention.
Fig. 1 is the stereoscopic figure that wants portion of the 1st embodiment of expression applying device of the present invention and coating method.The 1st, pallet, 2a, 2b, 2c are portals, the 3rd, crossbeam, 4a, 4b are X-direction travel mechanisms, 5a, 5b are linear guides, the 6th, work stage (substrate-placing platform), the 7th, linear guides, the 8th, applicator head.
In Fig. 1, the length direction of pallet 1 as X-direction, width as Y direction, Y direction on pallet 1 both sides portion in opposite directions is provided with linear guides 5a, the 5b along X-direction respectively, becomes the path of the work stage 6 of mounting glass substrate (not shown) between these linear guides 5a, the 5b.On this path, laying the linear guides 7 that extends along X-direction.In addition, in the rear side of work stage 6, be provided with the work stage travel mechanism (not shown) that is constituted by linear motor.Like this, work stage 6 is along this linear guides 7, and the substrate that is transported into from glass substrate is transported into the substrate that side a transported to glass substrate and transports the side b, can move along the length direction of pallet 1.
Here, the moving direction of work stage 6 is X-directions, still, hereinafter the moving direction of work stage 6 is called the T direction of principal axis.Therefore, the linear guides 7 that moves usefulness for work stage 6 also is to extend along the T direction of principal axis, and the above-mentioned work stage travel mechanism that makes that this work stage 6 moves is also referred to as T direction of principal axis travel mechanism.
On pallet 1, three portal 2a～2c arrange in the mode across the path of work stage 6, and, in both end sides separately, be provided with the X-direction travel mechanism (portal travel mechanism) 4a, the 4b that are constituted by linear motor.By the 4a of this X-direction travel mechanism, 4b, these portals 2a～2c can property guide rail 5a, 5b along the line move in X-direction independently respectively.
A side at the crossbeam separately 3 of portal 2a～2c is provided with a plurality of applicator heads 8.These applicator heads 8 can move along Y direction in the side of this crossbeam 3 by the Y direction travel mechanism (not shown) on the crossbeam 3 that is located at portal 2a～2c.Following state has been shown in illustrated example, respectively is provided with six applicator heads 8 on portal 2a～2c, wherein three applicator heads 8 are one distolateral near crossbeams 3, and three applicator heads 8 in addition are distolateral near another of crossbeams 3.
At this, portal 2a～2c bears function respectively.The portal 2a that the most close substrate is transported into side a is assigned with the function of coating encapsulant on the glass substrate, and the applicator head 8 of establishing thereon is respectively the applicator head of encapsulant.Secondly the portal 2b that is transported into side a near substrate is assigned with the function of getting ready that applies on the glass substrate as liquid crystal panel electrode portion, and the applicator head 8 of establishing thereon is respectively the applicator head of getting ready.The portal 2c that the most close substrate transports side b is assigned with the coating function of the liquid crystal that drips on the glass substrate, establishes thereon applicator head 8 and be respectively the applicator head of liquid crystal of dripping in the sealed material area surrounded on the glass substrate.
The glass substrate (not shown) of implementing to apply processing is transported into from being transported into side a by the side moving belt that is transported into that figure does not show.At this moment, work stage 6 is positioned at and is transported into side a, and the glass substrate that is transported into moves on on this work stage 6 from being transported into the side moving belt.Like this, the mounting work stage 6 of glass substrate moves to the precalculated position successively by T direction of principal axis travel mechanism.When being set in each precalculated position, on the glass substrate that is positioned on the work stage 6, by each applicator head 8 coating encapsulant of portal 2a; Each applicator head 8 coating by portal 2b are got ready; By each applicator head 8 of portal 2c coated with liquid crystal of dripping.Then, work stage 6 is positioned at substrate and is transported into side b, and the glass substrate that disposes moves on to transporting on the side moving belt that figure do not show from this work stage 6, is transported, transports.
Fig. 2 is the structural map of unitary construction of roughly representing the 1st embodiment of applying device of the present invention and coating method, the 9th, and cover, the 10th, substrate is transported into mouth, the 11st, substrate transports mouth, and the 12nd, fan filter, the 13rd, Z axle travelling carriage, the 14th, nozzle, the 15th, substrate adsorption plate, the 16th, roller, the 17th, glass substrate, 1 8a is transported into the side moving belt, 18b transports the side moving belt, annotates with same tag with part corresponding among Fig. 1, and its repeat specification is omitted.
In Fig. 2, the whole moving range quilt cover 9 of the portal 2a～2c on the pallet 1, work stage 6 is covered with.Be provided with a plurality of fan filters 12 at the top of this cover 9.Be transported into substrate that side a is provided with little opening (width is bigger slightly than the width of glass substrate 17, the opening that the thickness of aspect ratio glass substrate 17 is high slightly) at the substrate of this cover 9 and be transported into mouthfuls 10.By being transported into the glass substrate 17 that side moving belt 18a transports, being transported into mouth 10 from this substrate and being transported in the cover 9.Being transported into mouthful 10 glass substrates that are transported into 17 from this substrate is positioned on the work stage 6.In addition, the substrate of this cover 9 transport side b be provided with substrate be transported into mouthfuls 10 onesize openings, be that substrate transports mouthfuls 11.This substrate transports mouth 11 and is used for being discharged to the outside applying (i.e. coating finishes) glass substrate 17 of handling in 9 from covering.Transporting mouthfuls 11 glass substrates 17 that transport, that coating finishes from this substrate is positioned in and transports on the side moving belt 18b.
Here, the substrate-placing face above the work stage 6 and the substrate-placing face of moving belt 18a, 18b are the faces (face in the same plane) of equal height, and in addition, the substrate-placing face of work stage 6 as described later, is made of substrate adsorption plane 15 and roller 16.In addition, this moving belt 18a, 18b except employing has the roll-type moving belt of guide member, also can adopt the moving belt of ball shape or walking beam etc.
By this structure, when when being transported into glass substrate 17 that side moving belt 18a transports and will being transported in the cover 9, glass substrate 17 is keeping pushing in the cover 9 from being transported into mouthfuls 10 by being transported into side moving belt 18a to heavens at this moment, when this glass substrate 17 arrives on the work stage 6, keeping original moving in work stage 6 by roller 16 to heavens, in the precalculated position, be positioned on the substrate adsorption plate 15, be adsorbed fixing.
Like this, carrying the work stage 6 of glass substrate 17, by T direction of principal axis travel mechanism, moving and be positioned at the T direction of principal axis and be transported into the A position of side a by substrate on the pallet 1.In this position, carry out the coating of encapsulant by the applicator head 8 of portal 2a, at glass substrate 17 a plurality of (being six) the closed encapsulant pattern that draws here.The pattern of sealing material draws like this: on portal 2a, the nozzle 14 of lift-launch on Z axle travelling carriage 13 from applicator head 8 sprays encapsulants on one side, with Y direction travel mechanism applicator head 8 is moved in Y direction along the crossbeam 3 (Fig. 1) of portal 2a on one side, and, with the 4a of X-direction travel mechanism, 4b (Fig. 1) thus portal 2a is moved in X-direction makes applicator head 8 move in X-direction, like this, nozzle 14 is moved, the rectangular patterns of drawing along the track of rectangular patterns.At this moment, by Z-direction travel mechanism (not shown), regulate the height of the Z direction of Z axle travelling carriage 13, the encapsulant ejiction opening of nozzle 14 is always remained the height of regulation apart from the height on glass substrate 17 surfaces.
Then, work stage 6 moves at the T direction of principal axis by T direction of principal axis travel mechanism, is positioned at the B position of the central portion on the pallet 1.In this position, by the applicator head 8 of portal 2b, the pattern of describing to the rectangle of each encapsulant on the glass substrate 17 carries out the coating of getting ready of electrode material in this periphery precalculated position (for example position, four angles) of describing pattern.At this moment also with similarly above-mentioned, the applicator head 8 that is located on the portal 2b moves in X, Y direction, and its nozzle 14 is set in the position that pattern is got coating ready of describing of each encapsulant of reply, in this position, from the ejiction opening ejection electrode material of nozzle 14.At this moment also with similarly above-mentioned, the ejiction opening of nozzle 14 is always remained the height of regulation apart from the height on glass substrate 17 surfaces.
Then, work stage 6 moves at the T direction of principal axis by T direction of principal axis travel mechanism, is positioned to transport the C position of side b by substrate on the pallet 1.In this position, by the applicator head 8 of portal 2c, each of the encapsulant on the glass substrate 17 described pattern, described pattern institute area surrounded by this in, carry out the coating of dripping of liquid crystal.At this moment also with similarly above-mentioned, the applicator head 8 that is located on the portal 2c moves in X, Y direction, and its nozzle 14 is set in reply and is carried out position under the liquid crystal drop by the pattern area surrounded of each encapsulant, in this position, from the ejiction opening of nozzle 14 liquid crystal that drips.At this moment also with similarly above-mentioned, the ejiction opening of nozzle 14 is always remained the height of regulation apart from the height on glass substrate 17 surfaces.
After with aforesaid way the coating processing of glass substrate 17 being finished, the glass substrate 17 after this coating on the work stage 6 disposed transports mouthfuls 11 from substrate and is discharged to outside the cover 9.At this moment, transporting mouthfuls 11 by the roller 16 of work stage 6 from this substrate at the constant following glass substrate 17 of state of height that keeps glass substrate 17 is discharged to and covers outside 9, when these glass substrate 17 arrival transport on the side moving belt 18b, it is mobile to make it to transport side moving belt 18b with at this moment height at this, and fixed-site is in the precalculated position.
Like this, when glass substrate 17 moves on on the work stage 6 of cover in 9 from being transported into side moving belt 18a, move on to when transporting side moving belt 18b and going up from covering work stage 6 in 9, all without manipulator or staff, can only be undertaken by the axial movement of T highly remaining definitely, so, air in the cover 9 is not gone up current downflow, can not kick up a dust.In addition, similarly, glass substrate 17 is in the movement that has been assigned with between portal 2a, the 2b of difference in functionality, 2c, under the state that is equipped on the work stage 6, only undertaken by the axial movement of T, so the air in the cover 9 is not gone up current downflow, can not kick up a dust.Therefore, on the applicator surface of encapsulant of glass substrate 17 etc., can not adhere to the dust of kicking up, can avoid reducing yield rate because dust adheres to.
In addition, coating with encapsulant, the electrode material get coating ready, device (the portal 2a～2c) be located on the same pallet 1 of the different like this coating processing capacities of coating of dripping of liquid crystal, make glass substrate 17 mobile between these devices to carry at the state on the work stage 6, like this, handled by the coating that each device carries out separately, so, transporting glass substrate with the employing manipulator between device compares, can shorten since a device and move on to next device and time of handling, can shorten and make the required time, and, can shorten the interval between these devices, can make and carry out the device integral miniaturization that difference in functionality is handled.
Fig. 3 is the stereoscopic figure of a concrete example of the work stage 6 among presentation graphs 1 and Fig. 2.15a～15e is the substrate adsorption plate, 16a～16d is roller, the 19th, the substrate-placing parts, 20a～20d is attaching parts, the 21st, and air adsorption hole, 22a, 22b are the substrate orientation pins, the 23rd, crossed roller bearing, 24a～24d is XY θ direction of principal axis micromotion mechanism, the 25th, and crossed roller bearing, the 26th, quadrature bearing.
In Fig. 3, work stage 6 has substrate boarded parts 19.This substrate boarded parts 19 is to be a plurality of (a plurality of here) Y direction that the substrate adsorption plate 15a～15e of length direction couples together and constitutes with elongated flat attaching parts 20a～20d.Aforesaid substrate adsorption plate 15a～15e is parallel to each other and is equally spaced disposing in X-direction.These substrate adsorption plates 15a～15e is equivalent to the substrate adsorption plate 15 among Fig. 2, and its section shape is rectangle or square.Attaching parts 20a～20d is thinner than the height of substrate adsorption plate 15a～1 5e, and like this, the part of attaching parts 20a～20d has formed the recessed paddy portion of substrate-placing parts 19.These paddy portions (being the upper face side of attaching parts 20a～20d), the Y direction total length along paddy portion has disposed roller 16a～16d respectively.These rollers 16a～16d is equivalent to the roller 16 among Fig. 2, has constituted to be used for making the glass substrate 17 (Fig. 2) that is positioned on the substrate-placing parts 19 in the substrate travel mechanism that T (X) direction of principal axis moves, and the rotary drive mechanism of being schemed not show drives rotation.
On each substrate adsorption plate 15a～15e, respectively be provided with a plurality of (being four in the diagram) air adsorption hole 21, this air adsorption hole 21 is used for absorption and Locating Glass substrate 17 (Fig. 2).X-direction near this substrate boarded parts 19 is distolateral, be the substrate opposition side that is transported into side a (Fig. 1, Fig. 2) end substrate adsorption plate 15e lateral surface be provided with a plurality of (being two) substrate orientation pin 22a, 22b here.
In addition, the central part of this substrate boarded parts 19, by its rear side, supporting as the crossed roller bearing 23 of rotary part.In addition, substrate boarded parts 19 back sides, from this crossed roller bearing 23 towards different directions and mutual equidistant position, supported by XY θ direction of principal axis micromotion mechanism 24a～24d respectively.Crossed roller bearing 23 centered by its bearing position, makes substrate boarded parts 19 rotate towards the θ direction of principal axis.XY θ direction of principal axis micromotion mechanism 24a～24d is made of crossed roller bearing 25 and quadrature bearing 26, substrate boarded parts 19 is by crossed roller bearing 23, centered by its central part, rotate towards the θ direction of principal axis, and, by XY θ direction of principal axis micromotion mechanism 24a～24d, its bearing position is rotated towards the θ direction of principal axis, move at the XY direction of principal axis.Like this, substrate boarded parts 19 rotates centered by its center, can regulate the axial deviation of θ of the glass substrate 17 (Fig. 1) of lift-launch on work stage 6.
The substrate boarded parts 19 of this structure is positioned on the base station that figure do not show, is provided with T direction of principal axis illustrated in fig. 1 travel mechanism in the rear side of this base station.Like this, work stage 6 can move at the T direction of principal axis.
In addition, the position of roller 16a～16d is fixed with respect to this base station, but the substrate-placing parts 19 that are made of substrate adsorption plate 15a～15e and attaching parts 20a～20d, substrate orientation pin 22a, 22b can be with crossed roller bearing 23 and XY θ direction of principal axis micromotion mechanism 24a～24d with respect to the base station knee-actions.
As shown in Figure 2, the substrate that work stage 6 is positioned at cover 9 is transported into mouthful 10 sides, when being taken into glass substrate 17 from being transported into side moving belt 18a, substrate boarded parts 19 is to fall state, substrate orientation pin 22a, 22b are propradations, and roller 16a～16d, substrate orientation pin 22a, 22b are a part is projected into the top above the substrate adsorption plate 15a～15e of substrate-placing parts 19 states.
At this moment, roller 16a～16d is the state that is driven in rotation, as shown in Figure 2, glass substrate 17 is pushed on the work stage 6 from being transported into side moving belt 18a, when roller 16a～16d that this glass substrate 17 carries rotation is last, also by the rotation of this roller 16a～16d, this glass substrate 17 moves towards the direction of substrate orientation pin 22a, 22b.When glass substrate 17 with substrate orientation pin 22a, when 22b joins, roller 16a～16d stops the rotation, substrate-placing parts 19 rise, and become glass substrate 17 mountings to the state above it.Then, air adsorption hole 21 adsorbs action as the substrate position fixed mechanism, like this, glass substrate 17 be attracted to substrate-placing parts 19 above, become the state that is fixed on the work stage 6.
As described in Figure 2, the substrate that work stage 6 moves to pallet 1 transports side b, the glass substrate 17 that coating is disposed transports mouthfuls 11 by substrate and moves on to when transporting side moving belt 18b and going up, substrate orientation pin 22a, 22b are descended with substrate-placing parts 19, at the state that glass substrate 17 carries on roller 16a～16d, make these rollers 16a～16d rotation.Like this, glass substrate 17 transports mouthfuls 11 by substrate on the work stage 6 and moves to and transport on the side moving belt 18b.
Like this, just can be transplanted on glass substrate 17 on the work stage 6 from being transported into side moving belt 18a without manipulator or staff, and, just can be transplanted on the glass substrate 17 that coating disposes from work stage 6 without manipulator or staff and to transport on the side moving belt 18b.
Fig. 4 is the stereoscopic figure of another concrete example of the work stage 6 among presentation graphs 1 and Fig. 2.The 27th, substrate adsorption plate, 27a are the substrate-placing faces, and 27b is leading flank, the 28th, and air ejection/adsorption hole, the part corresponding with Fig. 3 annotated with same tag, and its repeat specification is omitted.
As shown in Figure 4, in this concrete example, a flat substrate adsorption plate 27, with concrete example shown in Figure 3 similarly, on the base station that do not show of figure, supported by crossed roller bearing 23 and XY θ direction of principal axis micromotion mechanism 24a～24d.But this substrate adsorption plate 27 is with respect to the position of base station and highly fix.Being tabular surface above this substrate adsorption plate 27, is the mounting surface 27a of not shown glass substrate, and this substrate-placing face 27a has whole glass substrate mounting area thereon.
With before concrete example shown in Figure 3 similarly, be provided with a plurality of (being two) substrate orientation pin 22a, 22b here with the leading flank 27b side joint near-earth that is transported into side a (Fig. 2) opposition side with substrate of this substrate adsorption plate 27.These substrate orientation pins 22a, 22b, with before concrete example shown in Figure 3 similarly, moving up and down with respect to base station, as shown in Figure 2, the substrate that work stage 6 is positioned at cover 9 is transported into mouthful 10 sides, when being taken into glass substrate 17 from being transported into side moving belt 18a, substrate orientation pin 22a, 22b are propradations, and be outstanding upward than the substrate-placing face 27a of substrate adsorption plate 27.Like this, be transported into the glass substrate 17 that mouthful 10 (Fig. 2) are transported into from substrate and join with these substrate orientation pins 22a, 22b, thereby with respect to substrate adsorption plate 27 location.In addition, as shown in Figure 2, work stage 6 is positioned at cover 9 substrate and transports mouthful 11 sides, and when glass substrate 17 transported side moving belt 18b and goes up from work stage 6, substrate orientation pin 22a, 22b were the decline states, below the substrate-placing face 27a of substrate adsorption plate 27.
On the substrate-placing face 27a of substrate adsorption plate 27, along X (T) direction of principal axis and Y direction, be provided with air ejection/adsorption hole 28 (among Fig. 4, X-direction respectively has nine, and Y direction respectively has seven, but is not limited to this) with predetermined space.When glass substrate carried on substrate-placing face 27a with positioning states, these air ejection/adsorption holes 28 used as the air adsorption hole, glass substrate is adsorbed on substrate-placing face 27a goes up fixing.When be transported into glass substrate 17 from being transported into side moving belt 18a, when glass substrate 17 is transported side moving belt 18b and goes up, for this glass substrate 17 is moved in substrate-placing face 27a upper edge X (T axle) direction, air ejection/adsorption hole 28 uses as the air squit hole.
Fig. 5 is the figure of a concrete example of the structure of the air ejection/adsorption hole 28 in the presentation graphs 4, the 29th, and the air adsorption hole, the 30th, the air squit hole is annotated with same tag with part corresponding in the earlier figures, and its repeat specification is omitted.
In Fig. 5 (a), air ejection/adsorption hole 28 is communicated with air adsorption hole 29 and air squit hole 30.At air adsorption hole 29, as shown by arrows, the air of the substrate-placing face 27a side of substrate adsorption plate 27 is attracted by the vacuum drive source (not shown) of vavuum pump etc.At air squit hole 30, by the air driven source (not shown) of air pump etc., from the air ejection/adsorption hole 28 of substrate adsorption plate 27 towards outside ejection air.Here, air adsorption hole 29 is arranged on the direction vertical with substrate-placing face 27a, and air squit hole 30 arranges towards T (X) direction of principal axis obliquely with respect to substrate-placing face 27a.Like this, the air from 30 ejections of air squit hole sprays towards T (X) direction of principal axis with respect to substrate-placing face 27a obliquely from air ejection/adsorption hole 28.
Fig. 5 (b), as shown in Figure 2, expression when moving on to glass substrate 17 on the work stage 6 from being transported into side moving belt 18a, glass substrate 17 that coating is disposed move on to state when transporting on the side moving belt 18b, air ejection/adsorption hole 28 from work stage 6.
At this moment, spray the clean air that has reduced amount of dust from air squit hole 30, shown in dotted arrow, air sprays towards T (X) direction of principal axis with respect to substrate-placing face 27a obliquely from air ejection/adsorption hole 28, with the back side collision of glass substrate 17.Like this, glass substrate 17 from the substrate-placing face 27a slightly (for example about 2 μ m) lift, and, pushed towards the T direction of principal axis.Therefore, glass substrate 17 is transported at T (X) direction of principal axis along substrate-placing face 27a.
Fig. 5 (c), as shown in Figure 2, expression is fixed on state on the substrate-placing face 27a of this work stage 6 being positioned at glass substrate 17 on the work stage 6.
At this moment, attract air from air adsorption hole 29, described in Fig. 5 (b), glass substrate 17 is transported at T (X) direction of principal axis, when having located with respect to substrate-placing face 27a by substrate orientation pin 22a, 22b (Fig. 4), stop from air squit hole 30 ejection air, and attract air from air adsorption hole 29.Like this, glass substrate 17 is positioned on the substrate-placing face 27a, attracts by further carrying out air, and glass substrate 17 is attracted to substrate-placing face 27a and goes up and locate.
Like this, by the effect of air, transport glass substrate 17 with respect to substrate-placing face 27a at T (X) direction of principal axis, and, glass substrate 17 is fixed on the substrate-placing face 27a.On substrate adsorption plate 27, be provided with the substrate travel mechanism and the substrate position fixed mechanism that utilize air ejection/adsorption hole 28.In addition, state shown in Fig. 5 (c), when the glass substrate 17 that disposes of coating is transported to and transports side moving belt 18b (Fig. 2) and go up, as long as switch to state shown in Fig. 5 (b) from state shown in Fig. 5 (c).The air of air adsorption hole 29 adsorbs/stops, the air of air squit hole 30 sprays/stops, and the change action of available magnetic valve carries out.
In addition, on substrate-placing face 27a, also air adsorption hole 29 and air squit hole 30 can be set respectively.In addition, in Fig. 5, air ejection/adsorption hole 28 is being communicated with the airport that air squit hole 30 tilts like that, also can be also used as air absorption and air ejection to this airport.
In this concrete example, do not need the roller 16 in the concrete example shown in Figure 3, also do not need to make substrate-placing parts 19 moving driving mechanism up and down, thereby structure is oversimplified more.
Fig. 6 amplifies the stereogram of expression with the portion that wants of a concrete example of the applicator head 8 among Fig. 1, and the 31st, the coating material receiving cartridge, the 32nd, nozzle support, the 33rd, rangefinder is annotated with same tag with part corresponding in the earlier figures, and its repeat specification is omitted.
In Fig. 6, with being provided with nozzle support 32 and the rangefinder 33 of coating material receiving cartridge 31, nozzle 14, be located on the Z axle travelling carriage 13 (Fig. 2).
In the applicator head 8 of portal 2a, encapsulant as coating material is housed in the coating material receiving cartridge 31, in the applicator head 8 of portal 2b, conductive liquid as coating material is housed in the coating material receiving cartridge 31, in the applicator head 8 of portal 2c, be housed in the coating material receiving cartridge 31 as the liquid crystal of coating material.
The contactless triangle telemetry instrumentation of rangefinder 33 usefulness from the leading section of nozzle 14 to carry glass substrate 17 surfaces on work stage 6 (Fig. 1) (above) distance.That is, be provided with light-emitting component in the framework of rangefinder 33, the instrumentation point S reflection of laser on glass substrate 17 from this light-emitting component radiation is subjected to light by the photo detector that is located at equally in this framework, according to this light receiving position, carries out instrumentation.In addition, position under the instrumentation point S of the laser on the glass substrate 17 and the nozzle 14, at very little distance, delta X and the Δ Y of glass substrate 17 skews, but this very the skew of small distance be in glass substrate 17 surfaces concavo-convex difference in the scope that can ignore, so, the instrumentation result of rangefinder 33 and from nozzle 14 leading sections to glass substrate 17 surfaces (above) distance do not exist basically poor.Therefore, control Z axle travelling carriage 13 (Fig. 2) according to the instrumentation result of this rangefinder 33, thus can corresponding to concavo-convex (fluctuating) on glass substrate 17 surfaces the surface from the leading section of nozzle 14 to glass substrate 17 (above) distance (at interval) keep necessarily.
Like this, the surface from the leading section of nozzle 14 to glass substrate 17 (above) distance (at interval) keep necessarily, and, be maintained the amount from the coating material of unit interval of nozzle 14 ejections a certain amount of, like this, width, the thickness that is coated in the pattern on the glass substrate 17 becomes the same.
In addition, the lens barrel that has a light source that can throw light on and image recognition camera (not shown) except the parallel adjusting that is used for each nozzle 14, at interval regulate, also for the aligned position of glass substrate 17, the shape recognition of describing pattern of coating material etc., arranging opposite to each other with glass substrate 17.
Turn back to Fig. 2, in this embodiment, have the control part of above each one of control.That is, be provided with master control part in pallet 1 inside, this master control part is controlled the linear motor of the driving of carrying out each mechanism and the motor that platform is moved.In this master control part, connecting sub-control portion by cable.The control of sub-control portion is used for driving the Z axle servo motor of Z axle travelling carriage 13 (Fig. 2).
Fig. 7 is the block diagram of a concrete example of the expression structure of this master control part and control thereof.34a is master control part, 34aa is microcomputer, 34ab is motor controller, 34ac is image process controller, and 34ad is external interface, and 34ae is data communication bus, 34af is that portal moves with the X-axis linear motor with driver (below abbreviate the X-axis driver as), 34ag is that the coating head moves with the Y-axis linear motor with driver (below, abbreviate the Y-axis driver as), 34ah be the work stage rotation with θ axle motor with driver (below, abbreviate θ axle driver as), 34ai is that work stage moves with T axis linear motor with driver (below, abbreviate T axle driver as), and 34b is sub-control portion, 34c is hard disk, 34d is USB (USB) memory, and 34f is monitor, and 34g is keyboard, the 35th, adjuster, the 36th, valve gear, the 37th, image recognition camera, the 38th, communication cable.
In Fig. 7, master control part 34a is built-in with microcomputer 34aa, motor controller 34ab, image process controller 34ac and external interface 34ad.Motor controller 34ab control Y-axis driver 34ag, X-axis driver 34af, θ axle driver 34ah and T axle driver 34ai.Y-axis driver 34ag is for the Y direction travel mechanism on the crossbeam 3 that drives portal 2a～2c.X-axis driver 34af is used for driving the X-direction travel mechanism of portal 2a～2c.θ axle driver 34ah is used for driving the work stage 6 (Fig. 1) of carrying glass substrate 17 at the θ direction of principal axis.T axle driver 34ai is used for driving work stage 6 at the T direction of principal axis.Image process controller 34ac handles the picture signal that is obtained by image recognition camera 37.External interface 34ad is used for communicating with the 34b of sub-control portion, adjuster 35, valve gear 36.Adjuster 35 is used for the coating action of the coating materials such as encapsulant of control applicator head 8 (Fig. 1).These microcomputers 34aa, motor controller 34ab, image process controller 34ac and external interface 34ad, 34ae is interconnecting by data communication bus.In addition, the 34b of sub-control portion is connected with this external interface 34ad by communication cable 38.
In addition, master control part 34a is connecting USB storage 34d, the hard disk 34c as external memory, monitor 34f, keyboard 34g etc.Shown by monitor 34f from the data of keyboard 34g input etc., and store keeping in the medium of hard disk 34c, USB storage 34d etc.
In microcomputer 34aa, have host computer portion, ROM, RAM and input and output portion (all not showing among the figure) etc.ROM has stored and has been used for carrying out the handling procedure that the aftermentioned coating is described.RAM is used for the result of storage host computer portion, from the data of external interface 34ad, motor controller 34ab input.Input and output portion is used for carrying out exchanges data with external interface 34ad, motor controller 34ab.
By the linear motor of the Y direction travel mechanism of each applicator head 8 of conduct of Y-axis driver 34ag driving, by the 4a of X-direction travel mechanism as portal 2a～2c (Fig. 1) of X-axis driver 34af driving, the linear motor of 4b, be provided with the linear staff of the position of detecting each applicator head 8, portal 2a～2c, its testing result is supplied with Y-axis driver 34ag, X-axis driver 34af respectively, carry out the Y direction of applicator head 8, the Position Control of X-direction.In addition, similarly, the rotation drive motor of the work stage 6 (Fig. 1) that is driven by θ axle driver 34ah is built-in with the encoder of the rotation amount that detects this glass substrate 17, and its testing result is supplied with θ axle driver 34ah, carries out the direction control of glass substrate 17.In addition, driven by T axle driver 34ai, as the linear motor of the T direction of principal axis travel mechanism of work stage 6, be provided with the linear staff of the position of detecting this work stage 6, its testing result is supplied with T axle driver 34ai, carry out the Position Control of work stage 6.By this Position Control, the substrate that work stage 6 is set at the glass substrate 17 that is transported into for lift-launch shown in Figure 2 is transported into position, A position, B position, the C position that substrate that the position of side a, the glass substrate 17 after being used for coating handled transport transports side b.
In addition, though do not illustrate among Fig. 7, but also be provided with in the structure shown in Figure 3, with respect to the rotary drive mechanism of the roller 16a～16d of work stage 6, the driving mechanism up and down of substrate-placing parts 19, substrate orientation pin 22a, 22b, these mechanisms are also controlled by motor controller 34ab.
Fig. 8 is the block diagram of the concrete example of the 34b of sub-control portion in the presentation graphs 7,34ba is microcomputer, 34bb is motor controller, 34bc is external interface, 34bd is data communication bus, the 39th, Z axle motor driver (below, abbreviate Z axle driver as), annotate with same tag with part corresponding in the earlier figures, its repeat specification is omitted.
In Fig. 8, the 34b of sub-control portion is built-in with microcomputer 34ba, motor controller 34bb and external interface 34bc, and these mechanisms are interconnecting by data communication bus 34bd.Said external interface 34bc carry out the altitude information that obtained by rangefinder 33 (Fig. 6) input, transmit with the signal of master control part 34a.In addition, in microcomputer 34ba, have host computer portion, ROM, RAM and input and output portion (all not showing among the figure) etc.Nozzle 14 (Fig. 2, Fig. 6) was apart from the handling procedure of the height control on glass substrate 17 surfaces when ROM had stored and has been used for carrying out the aftermentioned coating and describes.RAM is used for the result of storage host computer portion, from the data of external interface 34bc and motor controller 34bb input.Input and output portion is used for carrying out exchanges data with external interface 34bc, motor controller 34bb.Z axle driver 39 by motor controller 34bb control is located on each applicator head 8 (Fig. 1), drive its Z axle servo motor, be built-in with the encoder that detects its rotation amount at these Z axle servo motors, its testing result turns back to Z axle driver 39, carries out the height and position control of nozzle 14.
Control according to the associating of master control part 34a and the 34b of sub-control portion, each motor (linear motor, Z axle servo motor, θ axle servo motor etc.) move/rotate according to the data in the RAM that imports and be stored in microcomputer 34aa from keyboard 34g (Fig. 7), like this, the 4a of X-direction travel mechanism, 4b makes portal 2a～2c move any distance in X-direction, and, by the Z axle travelling carriage 13 (Fig. 2) that nozzle 14 (Fig. 2) is moved up and down, Y direction travel mechanism by the applicator head 8 on the crossbeam 3 (Fig. 1) that is located at portal 2a～2c, move any distance in Y direction, in it moves, with the pressure of setting coating material receiving cartridge 31 (Fig. 2) is continued pressurization, from the aqueous coating materials such as ejiction opening ejection encapsulant of nozzle 14 leading sections, depict the required pattern that is formed by this coating material at glass substrate 17.
In the process that nozzle 14 moves horizontally towards Y direction, the interval between rangefinder 33 instrumentation nozzles 14 and glass substrate 17 surfaces, certain in order should always to remain at interval, with the height that moves up and down control nozzle 14 of Z axle travelling carriage 13.
The control of the Z-direction of being undertaken by the 34b of sub-control portion is pressed the function of portal and difference.Be installed in the applicator head 8 on the portal 2a, by the movement of Z-direction, the nozzle 14 of encapsulant applicator head 8 driven up and down.At portal 2b, similarly, by the movement of Z-direction, will drive up and down as the nozzle 14 that getting ready of electrode portion is coated with the applicator head 8 of application.At portal 2c, similarly, by the movement of Z-direction, the nozzle 14 of the applicator head 8 used under the liquid crystal drop is driven up and down.
Below, the example that is coated with the applicator head 8 of application with the encapsulant of portal 2a describes.Under the control of the associating of master control part 34a and the 34b of sub-control portion, each motor moves/rotates according to the data in the RAM that imports and be stored in microcomputer 34aa from keyboard 34g, like this, make the glass substrate 17 remain on the work stage 6 (Fig. 1) move any distance in X-direction, and, by the 4a of X-direction travel mechanism, 4b makes portal 2a～2c move in X-direction, thereby make the nozzle 14 (Fig. 2) that is being supported by the Z axle travelling carriage 13 (Fig. 2) that moves up and down nozzle 14 move any movement in X-direction, in it moves, with the air pressure of setting coating material receiving cartridge 31 (Fig. 6) is continued pressurization, ejiction opening ejection coating material from nozzle 14 leading sections, be encapsulant, apply out required coating material at glass substrate 17 and describe pattern.
In the process that nozzle 14 moves horizontally towards X-direction, the interval of rangefinder 33 (Fig. 6) instrumentation nozzle 14 and glass substrate 17, certain in order should always to remain at interval, with the position that moves up and down the Z-direction of controlling nozzle 14 of Z axle travelling carriage 13.
Fig. 9 is the flow chart of a concrete example of the molar behavior of above-mentioned the 1st embodiment of expression.Below, with reference to Fig. 2 etc., its action is described.
In Fig. 9, during the action beginning (step 100), at first, T axle driver 34ai action, making work stage 6 move to substrate on the pallet 1 is transported near the side a, is near the A position of Fig. 2, meanwhile, making portal 2b, 2c keep out of the way substrate transports near the side b, is near (step 101) the C position of Fig. 2.Then, from being transported into side moving belt 18a glass substrate 17 is introduced work stage 6, simultaneously, make portal 2a move to glass substrate 17 the position location, be near the A position of Fig. 2.At the assigned position of being located by substrate orientation pin 22a, 22b (Fig. 3, Fig. 4) of work stage 6, glass substrate 17 is located temporarily, adsorb fixing (step 102) with air adsorption hole 21 (Fig. 3), air ejection/adsorption hole 28 (Fig. 4).
Then, after having identified mark on the glass substrate 17 with image recognition camera 37 (Fig. 7), position, with θ axle driver 34ah (Fig. 7), crossed roller bearing 23, XY θ direction of principal axis micromotion mechanism 24a～24d by being located at below the work stage 6 revise the axial position deviation of θ (step 103).
If correctly revised position deviation, drive Y-axis driver 34ag (Fig. 7), Z axle driver 39 (Fig. 8), make y-axis shift actuation mechanism, 13 actions of Z axle travelling carriage of portal 2a, be the height setting of the nozzle 14 of applicator head 8 the pattern plotter height, with applicator head 8 encapsulant be coated on the glass substrate 17 (step 104).
After the encapsulant coating is handled, make X-axis driver 34af action, work stage 6 move to pallet 1 the centre position, be the B position of Fig. 2, simultaneously, make the portal 2a of the encapsulant coating of being through with just now keep out of the way pallet 1 be transported near the side a, be near (step 105) the A position of Fig. 2.
Then, make portal 2b move to pallet 1 the centre position, be near the B position of Fig. 2, that carries out the electrode material gets coating (step 106) ready.After getting the coating end of material ready, work stage 6 move to pallet 1 transport near the side b, be the C position of Fig. 2, simultaneously, make the electrode material that is through with get ready portal 2b that coating handles keep out of the way pallet 1 be transported near the side a, be near (step 107) the A position of Fig. 2.
Then, make portal 2c move to pallet 1 transport near the side b, be near the C position of Fig. 2, coating (step 108) under the liquid crystal drop is carried out in the inside that sealed material surrounds.
After the above-mentioned a series of coating release, glass substrate 17 is moved to from work stage 6 and transports side moving belt 18b upward (step 109).
Then, judge whether to stop above-mentioned whole operations (step 110), after a succession of processing end to whole glass substrates 17, all ends of job, action stops (step 111).
In above-mentioned the 1st embodiment, be provided with six applicator heads 8 at a portal, by the Y direction travel mechanism of these applicator head 8 usefulness of utilizing linear motor, applicator head 8 can be mobile along its length direction (Y direction) on the crossbeam 3 of portal.Change the stop position of applicator head 8 with this Y direction travel mechanism, coating that can be when making some panels from a big glass substrate 17 of the square size of profile 2～3 (m).
In addition, in this embodiment, respectively be provided with six applicator heads 8 on each portal 2a～2c, can be six applicator heads 8 of same portal, for example portal 2a all for the coating encapsulant, but, according to behaviour in service, can select that also six applicator heads 8 of six applicator heads 8 of portal 2a and portal 2b are amounted to 12 applicator heads 8 and all be used for the coating encapsulant or get material ready for applying.
In addition, in this embodiment, the applicator head 8 that is located on the same portal all is that identical coating material is coated on the glass substrate 17, still, also can the applicator head of coating variety classes coating material is set and make this portal have different functions at same portal.For example, on portal 2a, three applicator heads 8 among six applicator heads 8 are applicator heads of ejection encapsulant, remaining three applicator head 8 is applicator heads of ejection electrode material, like this, can make this portal 2a have encapsulant coating function and the such two kinds of different functions of electrode material coating function.In addition, also a portal can only be set on base station 1, similarly, this portal be had under encapsulant coating function, electrode material coating function and the liquid crystal drop apply function.
In addition, six applicator heads 8 that are arranged on the portal 2a are quit work, keep out of the way the distolateral of stroke together with portal 2a, only use two portal 2b, 2c, also can be used as training data and set, use with adjusting to changed conditions.
According to the 1st embodiment, coating is to carry out with common work stage 6 under coating, the liquid crystal drop with getting ready for the coating of some materials, the coating of for example encapsulant, conducting, like this, and can be intensive in a device three kinds of functions.
Figure 10 is the structural map of unitary construction of roughly representing the 2nd embodiment of applying device of the present invention and coating method, the 40th, pressure-resistant cover, 41a is that substrate is transported into gate, 41b is that substrate transports gate, the 42nd, attract air blast, the 43rd, pipe arrangement is annotated with same tag with part corresponding among Fig. 2, and its repeat specification is omitted.
As shown in figure 10, in the 2nd embodiment, the work stage 6 on the pallet 1 and the moving range of portal 2a～2c are covered by the pressure-resistant cover 40 of rigidity.Be transported into side a at the substrate of this pressure-resistant cover 40 and be provided with substrate and be transported into gate 41a, be transported into side b at the substrate of this pressure-resistant cover 40 and be provided with substrate and transport gate 41b.Substrate is transported into gate 41a and is used for upward glass substrate 17 being transported in the pressure-resistant cover 40 from being transported into side moving belt 18a, and is positioned on the work stage 6.Substrate transports the glass substrate 17 that gate 41b is used for coating is disposed and transports the outside from the work stage 6 in the pressure-resistant cover 40, and is positioned in and transports on the side moving belt 18b.These gates 41a, 41b can open and close, only glass substrate 17 be transported into, transport pass through the time open.
In addition, the inside of pressure-resistant cover 40 is passed through pipe arrangement 43 and is attracted the attraction air blast 42 of mechanism to be connected as air, utilizes this attraction air blast 42, is the inner setting of pressure-resistant cover 40 pressure environment that is lower than atmospheric pressure.Like this, inside becomes the pressure environment that is lower than atmospheric pressure, thereby atmospheric density reduces, and the ability that is kicked up a dust by moving of structure such as work stage 6, portal 2a～2c reduces.Compare with atmospheric pressure environment, the very little dust of only kicking up, in addition, the amount of dust of kicking up is also few, the panel of in clean environment, making yield rate also improve.
In addition, according to the coating processing time balance, in the time of need being declined to become high vacuum to pressure-resistant cover 40 pressure inside, also can attract to replace attracting air blast 42 with vavuum pump.
Except above-mentioned structure, all the other are identical with the 1st embodiment, and it moves also as shown in Figure 9.
In the respective embodiments described above, the many table apparatus (portal) with a plurality of functions are arranged side by side, these devices can be moved, and the work stage that use device makes mounting glass substrate move to the position that applies processing.So, needn't adopt a common manipulator or be arranged on the transfer that many manipulators between device utilize the glass substrate that (be used for to as the transfer of the glass substrate of object workpiece) manipulator transports, in addition, owing to shortened the moving-wire (portable cord) of glass substrate, so, the 1st, particle contamination in the time of can reducing glass substrate and transport, the yield rate the during manufacturing that improves liquid crystal panel, the 2nd, can dwindle that area being set, effectively utilize the toilet.
In above-mentioned present embodiment, be treated to example with the coating that is used for the making liquid crystal panel, but the present invention is not limited to this.Therefore, the substrate of coated processing also is not limited to glass substrate.

Claims (12)

1. applying device, at one or more pallet portal is set, on this portal, can be provided with one or more applicator heads movably, this applicator head have filling coating material the material storage tube and gush out from the nozzle ejiction opening of the coating material of this coating material receiving cartridge; This portal moves with respect to the substrate that the substrate-placing platform that is arranged on this pallet carries, above-mentioned applicator head moves with respect to this portal, thereby this applicator head moves with respect to this substrate, the above-mentioned coating material of ejection from the said nozzle ejiction opening to aforesaid substrate; It is characterized in that,
Be transported into aforesaid substrate from the outside to this substrate-placing platform and be from be transported into height that the side moving belt is transported into remain with this substrate-placing platform on the state of substrate-placing face equal height under carry out, and, transport this substrate from the aforesaid substrate mounting table to the outside and be the height that transports the side moving belt from this substrate-placing platform remain with the aforesaid substrate mounting table on the state of substrate-placing face equal height under carry out;
This applying device has the 1st travel mechanism and the 2nd travel mechanism;
Above-mentioned the 1st travel mechanism under the state of aforesaid substrate this substrate-placing platform, moves to the position that this substrate is transported the side moving belt from the position that is transported into this substrate-placing that the side moving belt is transported in mounting;
Above-mentioned the 2nd travel mechanism, by the crossed roller bearing of the central portion of the rear side that is arranged on this substrate-placing platform and, for this substrate-placing platform back side, from this crossed roller bearing towards different directions and the XY θ direction of principal axis micromotion mechanism that supports of mutual equidistant position constitute, this substrate that is positioned on this substrate-placing platform is rotated as the mode at center with the central part of this substrate-placing platform with this crossed roller bearing.
2. applying device as claimed in claim 1 is characterized in that,
Be provided with many above-mentioned portals at above-mentioned pallet;
Be located at the above-mentioned applicator head on any portal among above-mentioned many portals, ejection is different from the above-mentioned coating material of the coating kind of the above-mentioned applicator head on the above-mentioned portal that is located at other on the aforesaid substrate.
3. applying device as claimed in claim 1 or 2 is characterized in that, is located at any applicator head among the above-mentioned a plurality of applicator heads on the above-mentioned same portal and other above-mentioned applicator head, the different types of above-mentioned coating material of ejection on the aforesaid substrate.
4. applying device as claimed in claim 1 or 2 is characterized in that, the aforesaid substrate mounting table has substrate travel mechanism and substrate position fixed mechanism;
Aforesaid substrate travel mechanism utilizes the roller that aforesaid substrate is moved towards a direction on the aforesaid substrate mounting table;
Substrate is adsorbed in the aforesaid substrate mounting table in aforesaid substrate fixed-site mechanism, with the aforesaid substrate fixed-site on the aforesaid substrate mounting table.
5. applying device as claimed in claim 1 or 2 is characterized in that, the aforesaid substrate mounting table has substrate travel mechanism and substrate position fixed mechanism;
Aforesaid substrate travel mechanism to the aforesaid substrate injection air, makes aforesaid substrate move towards a direction on the aforesaid substrate mounting table;
Substrate is adsorbed in the aforesaid substrate mounting table in aforesaid substrate fixed-site mechanism, with the aforesaid substrate fixed-site on the aforesaid substrate mounting table.
6. applying device as claimed in claim 1 or 2, it is characterized in that, cover the moving range of the aforesaid substrate mounting table on the above-mentioned pallet with pressure-resistant cover, attracting mechanism with air is the inner setting that is covered with by this pressure-resistant cover subatmospheric air pressure, in this hypobaric environment, with the above-mentioned applicator head of above-mentioned portal the aforesaid substrate that is positioned on the aforesaid substrate mounting table is applied action.
7. coating method, at one or more pallet portal is set, on this portal, can be provided with one or more applicator heads movably, this applicator head have filling coating material the coating material receiving cartridge and gush out from the nozzle ejiction opening of the coating material of this coating material receiving cartridge; This portal moves with respect to the substrate that the substrate-placing platform that is arranged on this pallet carries, above-mentioned applicator head moves with respect to this portal, thereby this applicator head moves with respect to this substrate, the above-mentioned coating material of ejection from the said nozzle ejiction opening to aforesaid substrate; It is characterized in that,
Be transported into aforesaid substrate from the outside to this substrate-placing platform and be from be transported into height that the side moving belt is transported into remain with this substrate-placing platform on the state of substrate-placing face equal height under carry out, and, transport this substrate from the aforesaid substrate mounting table to the outside and be the height that transports the side moving belt from this substrate-placing platform remain with the aforesaid substrate mounting table on the state of substrate-placing face equal height under carry out;
This substrate-placing platform in mounting under the state of aforesaid substrate, move to the position that this substrate is transported the side moving belt from the position that is transported into this substrate-placing that the side moving belt is transported into;
The crossed roller bearing of the central part of the rear side by being arranged on this substrate-placing platform and, for this substrate-placing platform back side, from this crossed roller bearing towards different directions and the XY θ direction of principal axis micromotion mechanism that supports of mutual equidistant position, the aforesaid substrate that is positioned on the aforesaid substrate mounting table is rotated as the mode at center with the central part of this substrate-placing platform with this crossed roller bearing, revise θ axle deviation.
8. coating method as claimed in claim 7 is characterized in that, is provided with many above-mentioned portals at above-mentioned pallet;
Be located at the above-mentioned applicator head on any portal among above-mentioned many portals, ejection is different from the above-mentioned coating material of the coating kind of the above-mentioned applicator head on the above-mentioned portal that is located at other on the aforesaid substrate.
9. as claim 7 or 8 described coating methods, it is characterized in that, be located at any applicator head among the above-mentioned a plurality of applicator heads on the above-mentioned same portal and other above-mentioned applicator head, the different types of above-mentioned coating material of ejection on the aforesaid substrate.
10. as claim 7 or 8 described coating methods, it is characterized in that, by utilizing the substrate travel mechanism of roller, aforesaid substrate is moved on the aforesaid substrate mounting table towards a direction, carry out the location of aforesaid substrate on the aforesaid substrate mounting table;
Aforesaid substrate behind the absorption location, with the aforesaid substrate fixed-site on the aforesaid substrate mounting table.
11. as claim 7 or 8 described coating methods, it is characterized in that, on the aforesaid substrate mounting table, to the aforesaid substrate injection air, aforesaid substrate is moved towards a direction, carry out the location of aforesaid substrate on the aforesaid substrate mounting table;
Aforesaid substrate behind the absorption location, with the aforesaid substrate fixed-site on the aforesaid substrate mounting table.
12. as claim 7 or 8 described coating methods, it is characterized in that, cover the moving range of the aforesaid substrate mounting table on the above-mentioned pallet with pressure-resistant cover, be the inner setting that is covered with by this pressure-resistant cover subatmospheric air pressure, in this hypobaric environment, with the above-mentioned applicator head of above-mentioned portal the aforesaid substrate that is positioned on the aforesaid substrate mounting table is applied action.
CN2010102012645A 2009-06-10 2010-06-09 Coating device and coating method Expired - Fee Related CN101920235B (en)

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KR101161961B1 (en) 2012-07-04
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