TW201314372A - Coating device - Google Patents

Abstract

The present invention provides a coating device which still can accurately apply the coating liquid to the substrate even in situation where the substrate to be coated has large warpage. In this invention, substrates are transferred to the stage (12) by the substrate transfer mechanism (14) and adsorbed and held on the holding surfaces (30). Then, under the state that the slit for spitting coating liquid in the slit nozzle (41) approaches and contacts the surface of the substrate which is adsorbed and held on the holding surfaces (30) of the stage (12), the slit nozzle (41) moves relative to the substrate. As such, the coating liquid is coated onto the substrate surface. During the period of slit nozzle (41) applying the coating liquid to the substrate, a plurality of suction disks (71) is used to adsorb and hold the back surface of the substrate at several positions to press the substrate against the holding surfaces (30) of the stage (12).

Description

Coating device

The present invention relates to a coating liquid for coating a substrate such as a glass substrate for an organic EL display device, a glass substrate for a liquid crystal display device, a panel substrate for a solar cell, a glass substrate for a PDP, a glass substrate for a photomask, and a substrate for an optical disk. Coating device.

In the coating apparatus, the substrate is placed on the stage, and the coating liquid discharge slit in the slit nozzle is brought close to the surface of the substrate placed on the stage, thereby making the narrow portion The slit nozzle is moved along the surface of the substrate, whereby the coating liquid is applied to the surface of the substrate.

In the above coating apparatus, when the substrate is carried onto the stage or the substrate is carried out from the stage, a lift pin that can be placed on the stage to be lifted and lowered, and a transfer substrate between the lift pins are used. The transfer robot (refer to Japanese Laid-Open Patent Publication No. 2007-287914).

In addition, a coating apparatus having a structure in which a coating liquid is applied to a surface of a substrate from a slit nozzle while the substrate is being conveyed by a roller is proposed (see Japanese Patent Laid-Open Publication No. 2009-61380).

Further, in order to adsorb and hold the substrate on the stage, the adsorption pad is moved toward the stage in a state in which the substrate is adsorbed by the adsorption pad, and the substrate is entirely pressed against the stage by the adsorption pad. In the state, the substrate is adsorbed and held on the stage, and then the substrate fixed by the pressure pad generated by the adsorption pad is released. The method (refer to Japanese Patent Laid-Open Publication No. 2004-179399).

When a panel substrate for a solar cell having a large thickness and a large warpage is used as a substrate, there is a case where the substrate cannot be completely adsorbed and held on the stage. In other words, as described in Japanese Laid-Open Patent Publication No. 2004-179399, even if the substrate is adsorbed and held on the stage, the thickness of the substrate is large and the warpage is severe. Therefore, there is a portion of the substrate and the stage. A situation in which a gap is formed. When this phenomenon occurs, the distance between the substrate and the slit nozzle cannot be made constant, and the coating accuracy of the coating liquid is deteriorated. Moreover, when the warpage of the substrate is large, there is a risk that the substrate collides with the slit nozzle. Moreover, this phenomenon is particularly likely to occur in a panel substrate for a solar cell having a thickness of 1.7 mm or more.

In order to cope with this problem, although film formation can be performed on the surface of the substrate by a spray coating method, a vacuum vapor deposition method, or a chemical vapor phase growth method, the use efficiency of the film forming material is not good, and manufacturing is also performed. The cost will also become higher.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a coating apparatus which can accurately apply a coating liquid, for example, even when a coating liquid is applied to a substrate having a large warpage like a panel substrate for a solar cell. The coating liquid was applied.

According to a first aspect of the invention, a coating apparatus is provided in a state in which a coating liquid discharge slit in a slit nozzle is brought close to a surface of a substrate placed on a stage. The coating liquid is applied to the surface of the substrate relative to the substrate, and the coating liquid is applied to the surface of the substrate. The coating liquid is provided with a plurality of adsorption members, and the coating liquid is applied to the substrate by the slit nozzle. In a state in which a plurality of positions on the back surface of the substrate are adsorbed and held, the substrate is pressed against the surface of the stage, and the substrate is held flat with respect to the stage.

According to a second aspect of the invention, the adsorption member includes a disk-shaped adsorption portion made of an elastic material and a base portion that communicates with the decompression means, and is formed in the hole portion of the stage, and the front end of the adsorption portion is from the above In a state in which the surface of the stage is protruded, the base portion is constituted by a suction cup fixed to the stage; and the adsorption unit and the substrate are provided in a state in which the front end of the adsorption unit is in contact with the back surface of the substrate. The inside of the formed space is evacuated, and the back surface of the substrate is pressed against the surface of the stage by the action of elastic deformation of the adsorption portion.

According to a third aspect of the invention, the outer peripheral portion pressing member is configured to press the outer peripheral portion of the substrate placed on the stage against the surface of the stage.

According to a fourth aspect of the present invention, the fourth aspect of the invention, further comprising: a substrate transfer mechanism that horizontally transports the substrate with respect to the stage; and a plurality of substrate transfer members disposed on the stage Elevating and lowering the transport position by transporting the substrate between the substrate transport mechanisms by at least partially disposing them over the surface of the stage, and by placing all of them below the surface of the stage The substrate adsorption is maintained above Between the retracted positions of the surface of the stage.

According to a fifth aspect of the invention, the plurality of substrate transfer members are disposed in the hole portion formed in the stage, and are disposed in a plurality of rollers or belts that can be simultaneously raised and lowered.

According to a sixth aspect of the invention, the slit nozzle is reciprocated in the first direction with respect to the stage, and the substrate transfer mechanism and the plurality of substrate transfer members are orthogonal to the first direction. Transfer the substrate in 2 directions,

According to a seventh aspect of the invention, the substrate transfer mechanism is configured to reciprocate a transfer position of the transfer substrate adjacent to the stage, and to cause the slit nozzle to be along the first between the stage and the substrate transfer mechanism The direction moves back and forth between the separated positions.

According to an eighth aspect of the invention of the invention of the first aspect of the invention, the substrate for a solar cell panel.

According to a ninth invention of the eighth aspect of the invention, the substrate has a thickness of 1.7 mm or more.

According to the first aspect of the invention, since the substrate is pressed against the surface of the stage by a plurality of adsorption members during the application of the coating liquid, even a substrate having a large warpage can be positively caused by the coating operation. The warpage of the substrate is corrected, and the coating liquid is applied to the substrate in an accurate manner.

According to the second aspect of the invention, there is no special machine for lifting the suction cup relative to the stage The bottom surface of the substrate is pressed against the surface of the stage.

According to the third aspect of the invention, the outer peripheral portion of the substrate which is likely to be warped can be pressed against the surface of the stage.

According to the fourth and fifth aspects of the invention, since the substrate that has been transported to the stage by the substrate transfer member is adsorbed and held on the stage, the coating liquid can be applied by the slit nozzle, so that it is not necessary to increase the device cost. The coating liquid is applied with high precision in a short processing time.

According to the sixth aspect of the invention, the substrate can be efficiently transported by applying the coating liquid in the direction orthogonal thereto by the slit nozzle while the substrate is conveyed in one direction by the substrate transfer mechanism and the plurality of substrate transfer members.

According to the seventh aspect of the invention, the substrate can be reliably transported to the stage, and the slit nozzle that performs the coating process while reciprocating in the direction orthogonal to the substrate transfer direction can be prevented from interfering with each other. Thereby, application of a stable coating liquid can be performed.

According to the eighth and ninth aspects of the invention, the coating liquid can be accurately applied to the panel substrate for a solar cell which is thick and warped.

Hereinafter, embodiments of the present invention will be described based on the drawings. Fig. 1 is a perspective view of a coating apparatus according to a first embodiment of the present invention.

This coating apparatus is a device for applying a coating liquid to a solar cell panel substrate (hereinafter simply referred to as "substrate"), and mainly includes a stage 12 disposed on the main body 11 and a stage 12 opposite to the stage 12 The slit nozzle 41 that reciprocates the surface 30 in the horizontal direction is held. The coating device may further include: a substrate transfer machine The structure 14 carries the substrate onto the stage 12, and the substrate transfer mechanism 15 carries out the substrate from the stage 12. Further, the substrate on which the coating liquid is applied by the coating device generally has a thickness of 1.7 mm or more, and often causes large warpage. Further, for example, a nano metallic ink or a photoresist liquid can be used as the coating liquid.

Therefore, in this coating apparatus, the substrate is transferred to the stage 12 by the substrate transfer mechanism 14, and is adsorbed and held on the holding surface 30. In the state in which the coating liquid discharge slit in the slit nozzle 41 is brought close to the surface of the substrate held by the holding surface 30 of the stage 12, the slit nozzle 41 is horizontally oriented with respect to the substrate. Moving, the coating liquid is applied to the surface of the substrate. Then, the substrate on which the coating liquid is applied is carried out from the stage 12 by the substrate transfer mechanism 15.

The substrate transfer mechanism 14 is disposed on one side of the stage 12 . The substrate transfer mechanism 14 includes a pair of drive shafts 96 that are axially supported at both end portions of the pair of side plates 97 and that are rotated by driving of a motor (not shown). Each of the drive shafts 96 has three pulleys, and three belts 95 are wound between the pulleys. These three belts 95 are rotated in synchronization with each other as the pair of drive shafts 96 rotate, and the substrates placed on the upper portion of the belt 95 are horizontally carried onto the stage 12. Further, the pair of side plates 97 are slidably supported by the support portions 98 of the side plates 97, and are reciprocally movable to the respective stages of the belts 95 and the like, and the substrates placed on the belts 95 can be transferred to the stage 12 The transfer position is between the transfer position and the separation position of the moving member 50b which will be described later.

Similarly, the substrate transfer mechanism 15 is disposed on the other of the stage 12 side. The substrate transfer mechanism 15 includes a pair of drive shafts 92 that are axially supported by both end portions of the pair of side plates 93 and that are rotated by driving of a motor (not shown). Each of the drive shafts 92 is provided with three pulleys, and three belts 91 are wound between the pulleys. These three belts 91 rotate in synchronization with each other as the pair of drive shafts 92 rotate, and the substrate S placed on the upper portion of the belt 91 is carried out horizontally from the stage 12 . Further, the pair of side plates 93 are slidably supported by the support portions 94 of the side plates 93, and are reciprocally movable to the respective stages of the belts 91 and the like, and the substrates placed on the stage 12 can be transferred to the belt 91. The transfer position is between the transfer position and the separated position at which the mover 50b can be moved away from the stage 12.

Therefore, the substrate transfer mechanism 14 and the substrate transfer mechanism 15 can be reciprocated to a transfer position at which the substrate can be transferred to the stage 12 with respect to the stage 12, and a separated position at which the movable member 50b can be moved away from the stage 12. Therefore, when the substrate is transferred, the substrate can be reliably transferred to the stage 12 by approaching the stage 12 . Further, when the coating liquid is applied to the slit nozzle 41 to be described later, it can be separated from the stage 12 to prevent interference with the slit nozzle 41, thereby performing stable coating liquid application.

Further, the substrate transfer mechanisms 14 and 15 that transport the substrate to the stage 12 are not limited to this embodiment, and the substrate may be transferred to the stage 12 by other means. For example, the index robot can also be used to transport the substrate to the stage 12.

The slit nozzle 41 is supported by a nozzle support portion 40 having a bridge structure provided to extend across the stage 12 . That is, the slit nozzle 41 is attached to the lower surface of the nozzle support portion 40. The other side On the both sides of the stage 12, a pair of AC (alternating current) coreless linear motors (hereinafter simply referred to as "linear motors") 50 each having a stator 50a and a moving member 50b are disposed. Further, both ends of the nozzle support portion 40 are fixed to the pair of movable members 50b. Further, a pair of right and left lifting mechanisms (not shown) that are coupled to both ends of the nozzle support portion 40 are disposed in the movable member 50b. Therefore, the slit nozzle 41 is configured to reciprocate along the surface of the stage 12 by the action of the linear motor 50, and the stage 12 is raised and lowered by an elevating mechanism (not shown). Further, the reciprocating direction of the slit nozzles 41 is a direction orthogonal to the substrate transporting directions of the substrate transfer mechanisms 14 and 15.

FIG. 2 is an explanatory view schematically showing a supply operation of the coating liquid of the slit nozzle 41. Fig. 3 is a partially cutaway front view showing the slit nozzle 41.

The slit nozzle 41 has a slit-like discharge slit 44 extending in the longitudinal direction thereof (the direction perpendicular to the paper surface in FIG. 2 and in the left-right direction in FIG. 3). The length of the slit 44 in the longitudinal direction is greater than or equal to the length of the short side of the rectangular element-forming portion of the substrate S. As shown in FIG. 2, the coating liquid 45 supplied by the coating liquid supply pipe 46 is supplied to the surface of the substrate S via the slit-shaped discharge slit 44 which is disposed close to the surface of the substrate S. Then, a coating film is formed on the surface of the substrate S.

Referring again to Figure 1. An adsorption groove 72 for adsorbing and holding the substrate S is formed on the surface of the stage 12 described above. Further, a plurality of rollers 81 as substrate transfer members are disposed on the surface of the stage 12 in two rows. The rollers 81 can be raised and lowered in synchronization with each other, and a part thereof is disposed on the holding surface 30 of the comparison stage 12 The transport position above the surface is disposed between the retracted positions below the surface of the holding surface 30 of the stage 12. Moreover, the plurality of suction cups 71 as the adsorption members are disposed on the surface of the stage 12 in such a manner that a part thereof protrudes from the surface of the holding surface 30 of the stage 12. Further, the roller 81 may be arranged in two or more rows.

4 is a schematic view showing a lifting mechanism of the roller 81.

The plurality of rollers 81 arranged in a row are rotatably supported by the support member 82. Further, the support member 82 is raised and lowered by the driving of a pair of pneumatic cylinders 83. Therefore, as shown in Fig. 4, a plurality of rollers 81 are driven by a pair of pneumatic cylinders 83, and are moved up and down in synchronization with each other, and a part thereof is disposed above the surface of the holding surface 30 of the stage 12 shown by an imaginary line in Fig. 4; The transport position is disposed between the retracted positions below the surface of the holding surface 30 of the stage 12 .

5A and 5B are cross-sectional views of the suction cup 71. 6A and 6B are explanatory views showing the suction cup 71 disposed in the concave hole portion 33 formed in the stage 12. 5A and 6A show a state in which stress or adsorption force does not act on the suction cup 71. 5B and 6B show a state in which the substrate S is held by the suction pad 71.

As shown in FIG. 5A and FIG. 5B, the suction cup 71 is made of an elastic material, and is formed of a disk-shaped adsorption portion 71a elastically deformable by stress and adsorption force, and a communication hole 71c formed to communicate with the decompression means. The base portion 71b is formed. As the elastic material, a resin material such as silicone rubber or fluororesin may be used. As shown in FIG. 6A and FIG. 6B, the suction cup 71 is formed in the hole portion 33 of the stage 12 to be the adsorption portion. The front end of the 71a is disposed in a state in which the holding surface 30 of the stage 12 is protruded. Further, a screw portion 74 is attached to the base portion 71b of the suction cup 71. The screw portion 74 is fixed to the support plate 34 disposed on the lower surface of the stage 12. Further, the amount by which the front end of the adsorption portion 71a protrudes from the holding surface 30 of the stage 12 can be adjusted by the screw 35. Further, the screw portion 74 has a hollow structure, and the communication hole 71c shown in FIGS. 5A and 5B communicates with a decompression means such as a fan or a vacuum pump via a pipe 73 shown in FIGS. 6A and 6B.

In the case where the holding substrate S is sucked and held by the suction cup 71, the suction cup 71 is changed from the state shown in Figs. 5A and 6A to the state of elastic deformation shown in Figs. 5B and 6B. At this time, when the base portion 71b of the suction cup 71 is fixed, the position of the abutting surface of the suction portion 71a of the suction cup 71 and the substrate S is moved to the side of the base portion 71b, and accordingly, the substrate for holding and holding the substrate is generated. S moves to the side of the base 71b.

In other words, in a state where the front end of the suction portion 71a of the suction cup 71 abuts against the back surface of the substrate S, the space inside the space formed by the adsorption portion 71a and the substrate S is discharged through the communication hole 71c by the action of the decompression means. As shown in Figs. 5B and 6B, the gas is elastically deformed by the stress generated by discharging the gas in the space by the adsorption portion 71a made of the elastic material. In other words, the opening area of the opening portion side of the adsorption portion 71a becomes large, and the disc shape having its own depth becomes a flat disk shape. In other words, the area of the abutting surface where the adsorption portion 71a abuts on the substrate S becomes large. Thereby, the adsorption force of the adsorption unit 71a to the substrate S is increased, and the substrate S can be surely adsorbed.

At this time, since the base portion 71b of the suction cup 71 is fixed to the support plate 34, when the adsorption portion 71a is elastically deformed, the substrate S adsorbed and held therein is also attracted to the support plate 34 side. Therefore, the height position of the suction portion 71a of the suction cup 71 is such that the front end of the adsorption portion 71a protrudes from the holding surface 30 of the stage 12, and the substrate S is warped, even when the substrate S is warped. The adsorption portion 71a can still adsorb the substrate S, and the back surface of the substrate S is pressed against the holding surface 30 of the stage 12 by the elastic deformation of the adsorption portion 71a. Therefore, even when the warpage of the substrate S is relatively large, the adsorption portion 71a can reliably adsorb the substrate S, and the substrate S can be held flat with respect to the stage 12 by elastic deformation of the adsorption portion 71a. Further, in the present invention, the pressing of the substrate S against the stage 12 also includes the substrate S being pressed against the stage 12 by the attraction force from the stage 12 side.

Next, the coating operation of applying the coating liquid onto the substrate S by the above coating apparatus will be described.

When the application of the substrate S is started, a plurality of rollers 81 are disposed at the transfer position for transporting the substrate S by the action of the pneumatic cylinder 83 shown in FIG. That is, the upper end of each of the rollers 81 is disposed at the same height position as the upper ends of the three belts 95 in the substrate transfer mechanism 14. At this time, the substrate transport mechanism 14 also moves to a position that is close to the stage 12, that is, the transfer position.

In this state, as the pair of drive shafts 96 rotate, the three belts 95 are rotated in synchronization with each other. Further, each of the rollers 81 is rotated in synchronization with the rotation of the belt 95. Then, by the action of the belt 95 and the roller 81, the substrate S is The substrate transfer mechanism 14 is transported to the holding surface 30 of the stage 12 .

When the substrate S moves to the upper portion of the stage 12, the belt 95 and the roller 81 are stopped. Then, as shown in FIG. 4, the respective rollers 81 are disposed from the upper end portion of the roller 81 to the substrate S transport position above the holding surface 30 of the stage 12 by the action of the pneumatic cylinder 83, and are moved to the upper end of the roller 81. The retracted position is disposed below the holding surface 30 of the stage 12 . In other words, the entire roller 81 is disposed below the holding surface 30 of the stage 12 . Thereby, the substrate S is in contact with the vicinity of the front end of the adsorption portion 71a of the chuck 71.

Further, after the substrate S is moved to the upper portion of the stage 12, the pair of side plates 97 of the substrate transfer mechanism 14 are moved, and the respective belts 95 are moved to the transfer position of the stage 12, and moved to separate from the stage 12 to move the parts. The separation position of the 50b movement. Further, the substrate transfer mechanism 15 is also disposed in advance at a separation position from the stage 12 to move the movable member 50b.

Further, when the substrate S subjected to the coating process on the stage 12 and the substrate S to be subjected to the coating process are simultaneously carried in and out, the substrate transfer mechanism 14 and the substrate transfer mechanism 15 are moved to approach the stage. The position of 12 is the transfer position, and the substrate S may be carried out from the stage 12 to the substrate transfer mechanism 15, and the substrate S may be moved from the substrate transfer mechanism 14 to the stage 12. Then, when the coating process is performed, the substrate transfer mechanism 14 and the substrate transfer mechanism 15 can be disposed at a separated position from the stage 12 .

Then, the inside of the space formed by the adsorption portion 71a and the substrate S is exhausted via the communication hole 71c by the action of the decompression means. Thereby, as shown in Figure 5B As shown in FIG. 6B, the adsorption portion 71a is elastically deformed, and the back surface of the substrate S is pressed against the holding surface 30 of the stage 12. Further, in parallel with this, the back side of the substrate S is brought to a negative pressure with respect to the atmospheric pressure by the exhaust from the adsorption tank 72, and the substrate S is adsorbed and held on the holding surface 30. Therefore, even when a relatively thick and warped panel substrate for a solar cell is used as the substrate S, the substrate S can be pressed against the holding surface 30 of the stage 12, thereby correcting the warpage of the substrate S.

In this state, the slit nozzle 41 is driven by the linear motor 50 in a state where the discharge slit 44 of the slit nozzle 41 is brought close to the surface of the substrate S that is adsorbed and held by the holding surface 30 of the stage 12. The surface of the substrate S moves. Then, as shown in FIG. 2, the coating liquid 45 supplied by the coating liquid supply pipe 46 is supplied to the surface of the substrate S. Thereby, a film of the coating liquid 45 is formed on the surface of the substrate S.

At this time, the suction and holding of the substrate S by the suction pad 71 is continued, and the back surface of the substrate S is pressed against the holding surface 30 of the stage 12 by the action of the suction pad 71. Therefore, even when a panel substrate for a solar cell having a relatively large warpage of 1.7 mm or more is used as the substrate S, the substrate S can be pressed against the stage 12 at any time during the continuous coating operation. The face 30 is held to correct the warpage of the substrate S. Therefore, the distance between the substrate S and the slit nozzle 41 can be made constant, the coating precision of the coating liquid 45 can be improved, and the substrate S and the slit can be avoided even when the warpage of the substrate S is large. There is a danger that the slit nozzle 41 will collide.

When the application of the coating liquid to the substrate S is completed, that is, the inside of the space formed by the adsorption portion 71a and the substrate S is communicated to the atmosphere via the communication hole 71c. Thereby, the suction cup 71 is returned to the state shown in FIG. 5A and FIG. 6A. Further, the upper end portion of the plurality of rollers 81 is disposed at a transport position above the surface of the holding surface 30 of the stage 12 . Further, the substrate transfer mechanism 15 is moved to a transfer position where each of the belts 91 approaches the stage 12. Then, the three belts 91 are rotated in synchronization with each other as the pair of drive shafts 92 rotate. Further, each of the rollers 81 is rotated in synchronization with the rotation of the belt 91. Then, by the action of the belt 91 and the roller 81, the substrate S is carried out from the stage 12 toward the substrate transfer mechanism 15.

Next, other embodiments of the present invention will be described. Fig. 7 is a perspective view of a coating device according to a second embodiment of the present invention. It is to be noted that the same reference numerals are given to members that are the same as those in the above embodiment, and the detailed description is omitted.

In the coating apparatus according to the first embodiment, the substrate S is transported by a plurality of rollers 81 arranged in two rows, and the coating device according to the second embodiment has one The structure of the substrate S is conveyed to the belt 84. Similarly to the elevating mechanism of the roller 81 shown in FIG. 4, the pair of belts 84 can be raised and lowered in synchronization with each other by a pneumatic cylinder or the like in a transfer position in which a part thereof is disposed above the surface of the holding surface 30 of the stage 12 And all of them are disposed between the retracted positions below the surface of the holding surface 30 of the stage 12 .

Further, in the coating apparatus of the second embodiment, the substrate S does not need to be transported by the lift pins or the transfer robot, so that the structure of the apparatus can be simplified. And the time required for coating can be shortened.

Further, in the above-described first and second embodiments, the substrate transfer mechanisms 14 and 15 can be moved back and forth to the respective stages such as the belts 91 and 95 in order to avoid interference with the support mechanism of the slit nozzle 41 constituting the bridge structure. The transfer position of 12 is separated from the separated position from the stage 12. However, when the rigidity of the substrate S is high, the gap between the stage 12 and the substrate transfer mechanism 14 and between the stage 12 and the substrate transfer mechanism 15 may be fixed by the gap between the movable member 50b. Substrate transfer mechanisms 14 and 15.

In addition, in the above-described first and second embodiments, the substrate S is carried into the stage 12 by the substrate transfer mechanism 14, and the substrate S is carried out from the stage 12 by the substrate transfer mechanism 15. The substrate S can be carried in and out of the stage 12 by a single substrate transfer mechanism. In this case, as in the above-described embodiments, instead of the direction in which the slit nozzle 41 reciprocates and the direction in which the substrate S of the substrate transport mechanisms 14 and 15 are transported, the direction is orthogonal to each other. The substrate transfer mechanism of the substrate S is transported (loading/removing) in the same direction of movement of the slit nozzles 41.

Further, in the above-described first and second embodiments, the substrate transport mechanism 14 and the substrate transport mechanism 15 carry the substrate S into or out of the stage 12 by the belts 91 and 95, but the present invention is not limited to this embodiment. In the present invention, the substrate S may be conveyed horizontally with respect to the stage 12, and may be, for example, transported by a roller using a roller, shuttled using a shuttle that reciprocates in a horizontal direction, or by a substrate S. The back side blows air to make it float and move It is composed of suspension and transportation.

Next, still another embodiment of the present invention will be described. Fig. 8 is a perspective view of a coating apparatus according to a third embodiment of the present invention, and Fig. 9 is a side view thereof. Further, Fig. 10 is a perspective view of the holding surface 30 of the stage 3. In addition, in FIG. 8, the suction cup 71 and the adsorption tank 72, the pre-dispensing mechanism 2, the nozzle cleaning apparatus 6, etc. which are mentioned later, are abbreviate|omitted. In addition, in FIG. 9, the illustration of the carrier 4 etc. which are mentioned later is abbreviate|omitted.

The coating device of the third embodiment includes a stage 3 . The stage 3 has a rectangular parallelepiped shape and is made of stone, and its upper surface is a horizontal surface, and constitutes a holding surface 30 of the substrate S. Similarly to the above-described embodiment, the holding surface 30 is formed with a concave hole portion, and the same suction cup 71 as that of Figs. 5A and 6A is disposed in the hole portion. Further, as shown in FIG. 10, a hole portion 33b having a predetermined length is formed on the holding surface 30, and a suction cup 71 is also disposed in the hole portion 33b. The chuck 71 disposed in the hole portion 33b has a structure in which the position of the substrate S can be adjusted according to the size of the substrate S.

Further, on the holding surface 30, a plurality of lifting pins (not shown) are provided at appropriate intervals. When the substrate S is loaded or unloaded, the lift pin supports the substrate S from below and rises above the surface of the stage 3 from the holding surface 30.

Above the stage 3, a carrier 4 that is substantially horizontally stacked from both side portions of the stage 3 is disposed. The carrier 4 includes a nozzle support portion 40 for supporting the slit nozzle 41, and a pair of right and left lift mechanisms 43 for supporting both ends of the nozzle support portion 40. Moreover, the two ends of the stage 3 are arranged along a substantially horizontal One of the extensions is a pair of transition rails 31. These traveling rails 31 reciprocate the carrier 4 in the X direction shown in Fig. 8 by guiding both ends of the carrier 4.

On both sides of the stage 3 and the carrier 4, one pair of the stator 50a and the movable member 50b are provided on the edge side of the both sides of the stage 3, respectively. Further, a pair of linear encoders 52 each having a scale portion and a detecting member are fixed to both side portions of the stage 3 and the carrier 4. The linear encoder 52 detects the position of the carrier 4.

Further, as shown in FIG. 9, a nozzle cleaning device 6 is disposed on the side surface of the holding surface 30 of the stage 3. The nozzle cleaning device 6 includes a cleaning block group 61 and a standby pod 62. In the coating apparatus, the slit nozzle 41 is washed by the nozzle cleaning device 6 before or after the execution of the coating operation.

Further, as shown in FIG. 9, a pre-distribution mechanism 2 is disposed on the side surface of the holding surface 30 of the stage 3. The pre-distribution mechanism 2 is provided with a pre-distribution roller 22 that immerses a part of the cleaning liquid stored in the storage tank 21, and a scraper 23. The pre-distribution roller 22 and the scraper 23 have the same length or more as the slit nozzle 41 with respect to the Y direction. Further, the pre-distribution roller 22 is rotated by driving of a motor (not shown). In the coating apparatus, before the processing operation is performed, a small amount of the coating liquid is ejected from the slit nozzle 41 that has moved to the upper portion of the pre-distribution roller 22, and the removal from the slit nozzle 41 is performed by the nozzle cleaning device 6. The step of containing the coating liquid of the cleaning liquid at the time of washing.

When the coating operation is performed by the coating apparatus of the third embodiment, the operation of the decompression means is performed via the communication hole as in the first embodiment. 71c exhausts the inside of the space formed by the adsorption portion 71a and the substrate S. Thereby, similarly to the case shown in FIGS. 5B and 6B, the adsorption portion 71a is elastically deformed, and the back surface of the substrate S is pressed against the holding surface 30 of the stage 3. Further, in parallel with this, the self-adsorption groove 72 is also evacuated, and the back surface side of the substrate S is brought to a negative pressure with respect to the atmospheric pressure, whereby the substrate S is adsorbed and held on the holding surface 30. Therefore, even when a relatively thick and warped panel substrate for a solar cell is used as the substrate S, the substrate S can be pressed against the holding surface 30 of the stage 3 to correct the warpage of the substrate S.

In this state, the slit nozzle 41 is driven by the linear motor 50 while the discharge slit 44 of the slit nozzle 41 is brought close to the surface of the substrate S that is adsorbed and held by the holding surface 30 of the stage 3. Move along the surface of the substrate S. Then, as shown in FIG. 9, the coating liquid 45 supplied from the coating liquid supply pipe 46 is supplied to the surface of the substrate S. Thereby, a film of the coating liquid 45 is formed on the surface of the substrate S.

At this time, the suction holding of the substrate S of the suction cup 71 is continued, and the back surface of the substrate S is pressed against the holding surface 30 of the stage 3 by the action of the suction pad 71. Therefore, even when a panel substrate for a solar cell having a thickness of 1.7 mm or more and having a large warpage is used as the substrate S, the substrate S can be pressed against the stage 3 at any time during the continuous coating operation. The face 30 is held to correct the warpage of the substrate S. Therefore, the distance between the substrate S and the slit nozzle 41 can be made constant, the coating precision of the coating liquid 45 can be improved, and the substrate S and the slit can be avoided even when the warpage of the substrate S is large. There is a danger that the nozzle 41 will collide.

11A and 11B are explanatory views showing another embodiment of the suction cup 71 disposed in the hole portion 33 formed in the stage 3. In addition, FIG. 11A shows a state in which stress and adsorption force do not act on the suction cup 71. Fig. 11B shows a state in which the substrate S is held by the suction pad 71.

The suction cup 71 of the present embodiment has the same structure as the suction cup 71 shown in Figs. 5A and 5B and Figs. 6A and 6B. Further, the base portion 71b of the suction cup 71 of this embodiment is coupled to the cylinder rod 37 of the pneumatic cylinder 36, and is driven by the pneumatic cylinder 36 to be movable up and down with respect to the holding surface 30 of the stage 3. Further, the communication hole 71c shown in FIG. 5A and FIG. 5B is formed in the suction cup 71, and the communication hole 71c is connected to a decompression means such as a fan or a vacuum pump via a pipe (not shown).

In the above embodiment, when the substrate S is adsorbed and held, the back surface of the substrate S is pressed against the holding surface 30 of the stage 3 by the action of the elastic deformation of the adsorption portion 71a. On the other hand, in the present embodiment, the suction cup 71 is driven up and down by the driving of the pneumatic cylinder 36, and the substrate S adsorbed and held by the suction cup 71 is positively pressed against the holding surface 30 of the stage 3.

Further, in the case where the suction cup 71 can be moved up and down with respect to the holding surface 30 of the stage 3, the substrate S can be supported from the lower side and raised to the stage 3 when the substrate S is carried in and out. The lift pins above the surface of the retaining surface 30.

Fig. 12 is an explanatory view showing still another embodiment of the coating apparatus of the present invention.

In the present embodiment, the outer peripheral portion pressing member 85 is further provided, and the outer peripheral portion pressing member 85 is attached to the substrate S of the holding surfaces 30 of the stages 12 and 3 of the first and third embodiments. The outer peripheral portion is pressed against the holding surface 30. Further, the peripheral pressing member 85 is configured to be movable up and down by the pneumatic cylinder 86. In the present embodiment, by the action of the outer peripheral portion pressing member 85, the vicinity of the outer peripheral portion of the substrate S which is particularly susceptible to warpage is pressed against the holding surface 30, and the warpage can be corrected over the entire substrate S.

In the above embodiments, a pair of AC coreless linear motors are used as the linear motor 50. However, the present invention is not limited thereto, and a core linear motor or the like may be employed depending on the required coating accuracy. Further, although the linear motor 50 is disposed on both side portions of the stage 12, the present invention is not limited thereto, and may be disposed on one side of the stage 12.

2‧‧‧Pre-distribution agency

3‧‧‧ stage

4‧‧‧Carriage

6‧‧‧Nozzle cleaning device

11‧‧‧Ontology

12‧‧‧ stage

14‧‧‧Substrate transport mechanism

15‧‧‧Substrate transport mechanism

21‧‧‧ storage tank

22‧‧‧Pre-allocation wheel

23‧‧‧Scraper

30‧‧‧ Keep face

31‧‧‧Travel track

33‧‧‧ Hole Department

33b‧‧‧孔部

34‧‧‧Support board

35‧‧‧ screws

36‧‧‧Pneumatic cylinder

37‧‧‧Cylinder rod

40‧‧‧Nozzle Support

41‧‧‧Slit nozzle

43‧‧‧ Lifting mechanism

44‧‧‧Slit slit

45‧‧‧ Coating solution

46‧‧‧ Coating liquid supply piping

50‧‧‧Linear motor

50a‧‧‧stator

50b‧‧‧Mobile parts

52‧‧‧Linear encoder

61‧‧‧Clean block group

62‧‧‧Standby slot

71‧‧‧Sucker

71a‧‧‧Adsorption Department

71b‧‧‧ base

71c‧‧‧Connected holes

72‧‧‧Adsorption tank

73‧‧‧Pipe

74‧‧‧ Screw Department

81‧‧‧Roller

82‧‧‧Support components

83‧‧‧ pneumatic cylinder

84‧‧‧Land

85‧‧‧External pressing member

86‧‧‧ pneumatic cylinder

91‧‧‧Land

92‧‧‧Drive shaft

93‧‧‧ side panels

94‧‧‧Support Department

95‧‧‧Land

96‧‧‧ drive shaft

97‧‧‧ side panels

98‧‧‧Support Department

S‧‧‧Substrate

Fig. 1 is a perspective view of a coating apparatus according to a first embodiment of the present invention.

FIG. 2 is an explanatory view schematically showing an operation of supplying the coating liquid to the slit nozzle 41.

Fig. 3 is a partially cutaway front view showing the slit nozzle 41.

4 is a schematic view showing a lifting mechanism of the roller 81.

Figure 5A is a cross-sectional view of the suction cup 71.

Figure 5B is a cross-sectional view of the suction cup 71.

FIG. 6A is an explanatory view showing the suction cup 71 disposed in the hole portion 33 formed in the stage 12.

FIG. 6B is an explanatory view showing the suction cup 71 disposed in the hole portion 33 formed in the stage 12.

Fig. 7 is a perspective view of a coating device according to a second embodiment of the present invention.

Fig. 8 is a perspective view of a coating apparatus according to a third embodiment of the present invention.

Fig. 9 is a side view of a coating apparatus according to a third embodiment of the present invention.

Figure 10 is a perspective view of the retaining surface 30.

FIG. 11A is an explanatory view showing the suction cup 71 disposed in the hole portion 33 formed in the stage 3.

FIG. 11B is an explanatory view showing the suction cup 71 disposed in the hole portion 33 formed in the stage 3.

Fig. 12 is an explanatory view showing still another embodiment of the coating apparatus of the present invention.

11‧‧‧Ontology

12‧‧‧ stage

14‧‧‧Substrate transport mechanism

15‧‧‧Substrate transport mechanism

30‧‧‧ Keep face

40‧‧‧Nozzle Support

41‧‧‧Slit nozzle

50a‧‧‧stator

50‧‧‧Linear motor

50b‧‧‧Mobile parts

71‧‧‧Sucker

72‧‧‧Adsorption tank

81‧‧‧Roller

91‧‧‧Land

92‧‧‧Drive shaft

93‧‧‧ side panels

94‧‧‧Support Department

95‧‧‧Land

96‧‧‧ drive shaft

97‧‧‧ side panels

98‧‧‧Support Department

Claims (9)

A coating apparatus which relatively moves in a horizontal direction with respect to a substrate in a state in which a coating liquid discharge slit in a slit nozzle is brought close to a surface of a substrate placed on a stage, The coating liquid is applied to the surface of the substrate, and is characterized in that it has a plurality of adsorption members, and the coating liquid is applied to the substrate by the slit nozzle, and the back surface of the substrate is adsorbed and held. In a state of a plurality of positions, the substrate is pressed against the surface of the stage, and the substrate is held flat with respect to the stage. The coating device according to claim 1, wherein the adsorption member includes a disk-shaped adsorption portion made of an elastic material and a base portion that communicates with the decompression means, and is formed in a hole portion of the stage, and the adsorption portion is The front end is formed by a suction cup fixed to the stage in a state in which the front end protrudes from the surface of the stage; and the adsorption is performed by a state in which the front end of the adsorption unit is in contact with the back surface of the substrate. The inside of the space formed by the substrate and the substrate is exhausted, and the back surface of the substrate is pressed against the surface of the stage by the elastic deformation of the adsorption portion. The coating device according to claim 2, further comprising an outer peripheral portion pressing member that presses a peripheral portion of the substrate placed on the stage against the surface of the stage. The coating device according to any one of claims 1 to 3, further comprising: The substrate transfer mechanism horizontally transports the substrate with respect to the stage; and the plurality of substrate transfer members are disposed on the stage, and are movable up and down so that at least a part thereof is disposed above the surface of the stage The substrate is transported between the transfer mechanism and the substrate transfer mechanism, and is disposed between the substrate and the retracted position of the surface of the stage by being disposed below the surface of the stage. The coating apparatus according to claim 4, wherein the plurality of substrate transfer members are disposed in the hole portion formed in the stage, and are disposed in a plurality of rollers or belts that can be simultaneously raised and lowered. The coating device of claim 4, wherein the slit nozzle reciprocates in a first direction with respect to the stage, and the substrate transfer mechanism and the plurality of substrate transfer members are along with the first The substrate is transported in the second direction orthogonal to the direction. The coating apparatus according to claim 6, wherein the substrate transfer mechanism reciprocates to a transfer position of the transfer substrate adjacent to the stage, and the slit nozzle is provided between the stage and the substrate transfer mechanism It can be moved back and forth between the separated positions along the first direction. The coating apparatus according to any one of claims 1 to 3, wherein the substrate is a panel substrate for a solar cell. The coating apparatus of claim 8, wherein the substrate has a thickness of 1.7 mm or more.