CN101589342A - 改善光学系统成像特性的方法以及光学系统 - Google Patents

改善光学系统成像特性的方法以及光学系统 Download PDF

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Publication number
CN101589342A
CN101589342A CNA2008800028512A CN200880002851A CN101589342A CN 101589342 A CN101589342 A CN 101589342A CN A2008800028512 A CNA2008800028512 A CN A2008800028512A CN 200880002851 A CN200880002851 A CN 200880002851A CN 101589342 A CN101589342 A CN 101589342A
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CN
China
Prior art keywords
optical system
thermal
optical
optical element
mechanical
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Pending
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CNA2008800028512A
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English (en)
Chinese (zh)
Inventor
奥拉夫·康拉迪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN101589342A publication Critical patent/CN101589342A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Lens Barrels (AREA)
  • Optical Elements Other Than Lenses (AREA)
CNA2008800028512A 2007-01-22 2008-01-22 改善光学系统成像特性的方法以及光学系统 Pending CN101589342A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007004723.3 2007-01-22
DE102007004723 2007-01-22

Publications (1)

Publication Number Publication Date
CN101589342A true CN101589342A (zh) 2009-11-25

Family

ID=39496034

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2008800028512A Pending CN101589342A (zh) 2007-01-22 2008-01-22 改善光学系统成像特性的方法以及光学系统

Country Status (7)

Country Link
US (3) US8462315B2 (enExample)
EP (1) EP2126635B1 (enExample)
JP (1) JP5193227B2 (enExample)
KR (1) KR101452534B1 (enExample)
CN (1) CN101589342A (enExample)
AT (1) ATE554427T1 (enExample)
WO (1) WO2008089953A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103620500A (zh) * 2011-06-20 2014-03-05 卡尔蔡司Smt有限责任公司 投射设备

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JP5193227B2 (ja) 2007-01-22 2013-05-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体リソグラフィシステム及びその使用方法
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
DE102010044969A1 (de) * 2010-09-10 2012-03-15 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung
KR101529807B1 (ko) 2011-01-20 2015-06-17 칼 짜이스 에스엠티 게엠베하 투영 노광 도구를 조작하는 방법
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
KR101398934B1 (ko) * 2014-01-23 2014-05-27 국방과학연구소 불균일 보정 기능이 제공되는 다 구간 시계 영상 확보 방식 적외선 광각 카메라
DE102015220537A1 (de) * 2015-10-21 2016-10-27 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
US10282822B2 (en) * 2016-12-01 2019-05-07 Almalence Inc. Digital correction of optical system aberrations
WO2018233997A1 (de) * 2017-06-23 2018-12-27 Jenoptik Optical Systems Gmbh Verfahren zur unterstützung einer justage eines strahlaufweiters, justageunterstützungsvorrichtung und strahlaufweiter
CN115494639B (zh) * 2022-11-04 2023-02-17 中国航天三江集团有限公司 高功率激光光束合成系统内通道热效应仿真方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103620500A (zh) * 2011-06-20 2014-03-05 卡尔蔡司Smt有限责任公司 投射设备

Also Published As

Publication number Publication date
ATE554427T1 (de) 2012-05-15
KR101452534B1 (ko) 2014-10-21
KR20090125042A (ko) 2009-12-03
US20090231565A1 (en) 2009-09-17
US20150125968A1 (en) 2015-05-07
JP5193227B2 (ja) 2013-05-08
EP2126635A1 (en) 2009-12-02
US9823579B2 (en) 2017-11-21
US8947633B2 (en) 2015-02-03
EP2126635B1 (en) 2012-04-18
US8462315B2 (en) 2013-06-11
US20130250261A1 (en) 2013-09-26
JP2010517279A (ja) 2010-05-20
WO2008089953A1 (en) 2008-07-31

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Application publication date: 20091125