ATE554427T1 - Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system - Google Patents

Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system

Info

Publication number
ATE554427T1
ATE554427T1 AT08707189T AT08707189T ATE554427T1 AT E554427 T1 ATE554427 T1 AT E554427T1 AT 08707189 T AT08707189 T AT 08707189T AT 08707189 T AT08707189 T AT 08707189T AT E554427 T1 ATE554427 T1 AT E554427T1
Authority
AT
Austria
Prior art keywords
optical system
imaging properties
improving imaging
deformed
optical
Prior art date
Application number
AT08707189T
Other languages
German (de)
English (en)
Inventor
Olaf Conradi
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE554427T1 publication Critical patent/ATE554427T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Lens Barrels (AREA)
  • Optical Elements Other Than Lenses (AREA)
AT08707189T 2007-01-22 2008-01-22 Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system ATE554427T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007004723 2007-01-22
PCT/EP2008/000459 WO2008089953A1 (en) 2007-01-22 2008-01-22 Method for improving imaging properties of an optical system, and optical system

Publications (1)

Publication Number Publication Date
ATE554427T1 true ATE554427T1 (de) 2012-05-15

Family

ID=39496034

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08707189T ATE554427T1 (de) 2007-01-22 2008-01-22 Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system

Country Status (7)

Country Link
US (3) US8462315B2 (enExample)
EP (1) EP2126635B1 (enExample)
JP (1) JP5193227B2 (enExample)
KR (1) KR101452534B1 (enExample)
CN (1) CN101589342A (enExample)
AT (1) ATE554427T1 (enExample)
WO (1) WO2008089953A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5193227B2 (ja) 2007-01-22 2013-05-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体リソグラフィシステム及びその使用方法
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
DE102010044969A1 (de) * 2010-09-10 2012-03-15 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung
KR101529807B1 (ko) 2011-01-20 2015-06-17 칼 짜이스 에스엠티 게엠베하 투영 노광 도구를 조작하는 방법
DE102011077784A1 (de) * 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
KR101398934B1 (ko) * 2014-01-23 2014-05-27 국방과학연구소 불균일 보정 기능이 제공되는 다 구간 시계 영상 확보 방식 적외선 광각 카메라
DE102015220537A1 (de) * 2015-10-21 2016-10-27 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
US10282822B2 (en) * 2016-12-01 2019-05-07 Almalence Inc. Digital correction of optical system aberrations
WO2018233997A1 (de) * 2017-06-23 2018-12-27 Jenoptik Optical Systems Gmbh Verfahren zur unterstützung einer justage eines strahlaufweiters, justageunterstützungsvorrichtung und strahlaufweiter
CN115494639B (zh) * 2022-11-04 2023-02-17 中国航天三江集团有限公司 高功率激光光束合成系统内通道热效应仿真方法

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Also Published As

Publication number Publication date
KR101452534B1 (ko) 2014-10-21
CN101589342A (zh) 2009-11-25
KR20090125042A (ko) 2009-12-03
US20090231565A1 (en) 2009-09-17
US20150125968A1 (en) 2015-05-07
JP5193227B2 (ja) 2013-05-08
EP2126635A1 (en) 2009-12-02
US9823579B2 (en) 2017-11-21
US8947633B2 (en) 2015-02-03
EP2126635B1 (en) 2012-04-18
US8462315B2 (en) 2013-06-11
US20130250261A1 (en) 2013-09-26
JP2010517279A (ja) 2010-05-20
WO2008089953A1 (en) 2008-07-31

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