CN101459193B - 有机el显示装置 - Google Patents

有机el显示装置 Download PDF

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Publication number
CN101459193B
CN101459193B CN2008101855285A CN200810185528A CN101459193B CN 101459193 B CN101459193 B CN 101459193B CN 2008101855285 A CN2008101855285 A CN 2008101855285A CN 200810185528 A CN200810185528 A CN 200810185528A CN 101459193 B CN101459193 B CN 101459193B
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CN
China
Prior art keywords
organic
film
resin
protection film
planarization film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008101855285A
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English (en)
Chinese (zh)
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CN101459193A (zh
Inventor
和泉望
由德大介
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Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN101459193A publication Critical patent/CN101459193A/zh
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Publication of CN101459193B publication Critical patent/CN101459193B/zh
Expired - Fee Related legal-status Critical Current
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321After treatment
    • H01L21/32115Planarisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN2008101855285A 2007-12-14 2008-12-12 有机el显示装置 Expired - Fee Related CN101459193B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007323676 2007-12-14
JP2007-323676 2007-12-14
JP2007323676 2007-12-14
JP2008266528 2008-10-15
JP2008266528A JP4458379B2 (ja) 2007-12-14 2008-10-15 有機el表示装置
JP2008-266528 2008-10-15

Publications (2)

Publication Number Publication Date
CN101459193A CN101459193A (zh) 2009-06-17
CN101459193B true CN101459193B (zh) 2011-10-05

Family

ID=40769923

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008101855285A Expired - Fee Related CN101459193B (zh) 2007-12-14 2008-12-12 有机el显示装置

Country Status (3)

Country Link
JP (1) JP4458379B2 (enExample)
KR (1) KR101014674B1 (enExample)
CN (1) CN101459193B (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5424738B2 (ja) * 2009-06-23 2014-02-26 キヤノン株式会社 表示装置
JP5409315B2 (ja) * 2009-12-11 2014-02-05 キヤノン株式会社 表示装置
KR101155904B1 (ko) 2010-01-04 2012-06-20 삼성모바일디스플레이주식회사 유기 발광 표시 장치
FR2958795B1 (fr) * 2010-04-12 2012-06-15 Commissariat Energie Atomique Dispositif optoelectronique organique et son procede d'encapsulation.
JP2012059692A (ja) * 2010-08-09 2012-03-22 Canon Inc 有機エレクトロルミネッセンス表示装置
KR101255537B1 (ko) 2010-11-26 2013-04-16 삼성디스플레이 주식회사 평판 표시 장치 및 그 제조방법
WO2013136697A1 (ja) * 2012-03-12 2013-09-19 パナソニック株式会社 有機エレクトロルミネッセンス素子
JP6142151B2 (ja) * 2012-07-31 2017-06-07 株式会社Joled 表示装置および電子機器
KR101473310B1 (ko) 2012-12-06 2014-12-16 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조방법
JP6231281B2 (ja) 2013-01-23 2017-11-15 株式会社ジャパンディスプレイ 表示装置
JP6054763B2 (ja) 2013-02-12 2016-12-27 株式会社ジャパンディスプレイ 有機el表示装置
KR102034253B1 (ko) 2013-04-12 2019-10-21 삼성디스플레이 주식회사 유기 발광 표시 장치 및 이의 제조 방법
JP6201411B2 (ja) * 2013-05-14 2017-09-27 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法、及び電子機器
JP2015046539A (ja) 2013-08-29 2015-03-12 ソニー株式会社 撮像素子、撮像装置、並びに、製造装置および方法
JP6220208B2 (ja) * 2013-09-30 2017-10-25 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置及びその製造方法
KR102109661B1 (ko) * 2013-12-02 2020-05-12 엘지디스플레이 주식회사 유기발광다이오드 표시장치의 제조방법
KR102317393B1 (ko) * 2014-10-17 2021-10-25 엘지디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치 제조 방법
KR102225848B1 (ko) * 2014-11-07 2021-03-09 엘지디스플레이 주식회사 유기 발광 표시 장치 및 유기 발광 표시 장치 제조 방법
US9991326B2 (en) 2015-01-14 2018-06-05 Panasonic Intellectual Property Management Co., Ltd. Light-emitting device comprising flexible substrate and light-emitting element
KR102396296B1 (ko) * 2015-03-06 2022-05-11 삼성디스플레이 주식회사 유기발광 디스플레이 장치 및 그 제조방법
KR102314470B1 (ko) 2015-03-09 2021-10-20 삼성디스플레이 주식회사 유기 발광 표시 장치
KR102477299B1 (ko) 2015-06-12 2022-12-14 삼성디스플레이 주식회사 디스플레이 장치
KR101818423B1 (ko) * 2015-09-23 2018-01-16 엘지디스플레이 주식회사 유기발광 표시장치
KR102450961B1 (ko) * 2015-09-30 2022-10-04 엘지디스플레이 주식회사 유기 발광 디스플레이 장치
KR102509079B1 (ko) * 2015-11-30 2023-03-09 엘지디스플레이 주식회사 유기 발광 표시 장치
JP6636807B2 (ja) * 2016-01-15 2020-01-29 株式会社ジャパンディスプレイ 有機el表示装置
KR102541448B1 (ko) * 2016-03-08 2023-06-09 삼성디스플레이 주식회사 디스플레이 장치
KR102524535B1 (ko) * 2016-03-29 2023-04-24 삼성디스플레이 주식회사 디스플레이 장치
KR102571085B1 (ko) 2016-04-04 2023-08-28 삼성디스플레이 주식회사 디스플레이 장치
KR102632616B1 (ko) 2016-06-27 2024-02-02 삼성디스플레이 주식회사 디스플레이 장치
KR102328679B1 (ko) 2016-11-23 2021-11-19 삼성디스플레이 주식회사 표시 장치
JP6343649B2 (ja) * 2016-12-01 2018-06-13 株式会社ジャパンディスプレイ 有機el表示装置
CN206179906U (zh) * 2016-12-01 2017-05-17 京东方科技集团股份有限公司 一种显示装置
WO2018123510A1 (ja) * 2016-12-28 2018-07-05 コニカミノルタ株式会社 電子デバイス
JP6947536B2 (ja) * 2017-05-26 2021-10-13 株式会社ジャパンディスプレイ 表示装置
JP2019003819A (ja) * 2017-06-14 2019-01-10 株式会社Joled 有機el表示パネル
WO2019054387A1 (ja) * 2017-09-12 2019-03-21 パイオニア株式会社 発光装置
CN207705199U (zh) * 2017-11-24 2018-08-07 昆山国显光电有限公司 显示器件
CN108448010B (zh) * 2018-05-11 2021-04-23 云谷(固安)科技有限公司 显示面板及显示终端
JP2019200849A (ja) 2018-05-14 2019-11-21 株式会社ジャパンディスプレイ 表示装置
WO2020053923A1 (ja) * 2018-09-10 2020-03-19 シャープ株式会社 表示装置
CN109727920B (zh) * 2018-12-18 2020-10-30 武汉华星光电半导体显示技术有限公司 Tft基板的制作方法及tft基板
JP2020184426A (ja) * 2019-04-26 2020-11-12 株式会社Joled 有機el表示パネルおよびその製造方法
TW202224224A (zh) * 2020-11-17 2022-06-16 日商半導體能源研究所股份有限公司 顯示面板、資訊處理裝置、顯示面板的製造方法
CN113394152B (zh) * 2021-06-15 2022-09-20 深圳市创一智能装备有限公司 一种载板的定位装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003271075A (ja) 2002-03-13 2003-09-25 Toshiba Corp 表示装置
JP4518747B2 (ja) * 2003-05-08 2010-08-04 三洋電機株式会社 有機el表示装置
JP4479381B2 (ja) * 2003-09-24 2010-06-09 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法、及び電子機器

Also Published As

Publication number Publication date
CN101459193A (zh) 2009-06-17
KR101014674B1 (ko) 2011-02-16
JP4458379B2 (ja) 2010-04-28
KR20090064320A (ko) 2009-06-18
JP2009164107A (ja) 2009-07-23

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