CN101355858B - 电子部件内置基板及其制造方法 - Google Patents
电子部件内置基板及其制造方法 Download PDFInfo
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- CN101355858B CN101355858B CN2008101442136A CN200810144213A CN101355858B CN 101355858 B CN101355858 B CN 101355858B CN 2008101442136 A CN2008101442136 A CN 2008101442136A CN 200810144213 A CN200810144213 A CN 200810144213A CN 101355858 B CN101355858 B CN 101355858B
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- electronic unit
- insulating barrier
- matrix
- electronic component
- embedded board
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Abstract
本发明提供一种不需要繁杂的工序能够以低成本抑制弯曲的发生、生产率和经济性优异的电子部件内置基板的制造方法。工作片(100)在大致为矩形的基体(11)的一个面上具有绝缘层(21、31),在绝缘层(21)的内部埋设有电子部件(41)和板状框元件(51)(元件),在基体(11)的电子部件(41)的非载置部载置有满足下式(1)所示关系的板状框元件(51)。式中,α1、α2和α3分别表示电子部件(41),板状框元件(51)和基体11、各配线层或各绝缘层的线热膨胀系数(ppm/K)。α1<α3并且α2<α3……(1)。
Description
技术领域
本发明涉及电子部件内置基板及其制造方法。
背景技术
近年来,伴随着电子技术的进步,要求印制配线基板的高密度化,广泛使用层叠有多个配线图案和绝缘层的多层印制配线基板。
以往,为了提高生产率,在这种用途中使用的印制配线基板通过采用切割等分别分割设有多个印制配线基板用的配线图案组(配线层)的例如300~500mm的四面的工作片(集合基板)而得到多个印制配线基板(个别基板、单片、单件)的所谓多个获取制造。这种工作片通常通过交替地组合(build up)配线图案和绝缘层而多层化。而且,一般利用减去(subtractive)法或叠加(additive)法形成配线图案等,利用热固化性树脂的热固化形成绝缘层。
在上述现有的工作片的制造中,由于在形成绝缘层时施加应力,所以不可避免地产生工作片的弯曲。因此,为了抑制工作片的弯曲,例如在专利文献1和2中提出一种制法,在工作片上设置多个印制配线基板用的配线图案组(配线层),同时设置包围这些多个配线图案组的框状导电图案,并且以覆盖这些配线图案组和框状导电图案的方式涂布树脂并使其固化。
专利文献1:日本专利特开平09-135077号公报
专利文献2:日本专利特开2005-167141号公报
另一方面,例如在以携带式电话机等携带终端为代表的携带机器中,在由单一或多个树脂层构成的基板上,搭载安装有作为主动元件的裸芯片状态的半导体元件(Die:模型)的所谓电子部件内置基板。此外,为了与电子机器的高性能化和小型化的要求相应,以高密度安装半导体IC等的主动元件或变阻器、电阻、电容器等从动元件的模块化正在进行。特别是最近,对搭载有主动元件或从动元件的模块的薄型化的要求变得更高,进一步薄型化成为当务之急。
在这种状况下,可知当制造电子部件内置基板时,在使用上述现有的工作片的制法时,与期待相反,不能抑制电子部件内置基板的弯曲,与没有内置电子部件的基板的制造相比,电子部件内置基板的弯曲存在恶化的趋势。而且,根据本发明者们的认识可知,在将电子部件内置基板的厚度减薄为500μm以下,特别是400μm以下的情况下,作为工作片整体,存在产生几十mm数量级的过度弯曲的趋势。另外,如果产生这种工作片的过度弯曲,例如产生搬送不良、组合时的位置精度降低、表面安装时的安装位置精度降低等制造加工故障,不但引起成品率的下降,而且导致得到的电子部件内置基板的安装可靠性降低。
另一方面,可以认为使用支撑部件从外部保持工作片等,在保持基板形状为平坦的状态下,形成绝缘层,由此能够抑制工作片的弯曲。但是,在这种情况下,由于每当形成绝缘层时必需夹持工序,因此导致制造加工工艺繁杂,生产率和经济性降低。
发明内容
因此,本发明是鉴于这些问题而提出的,其目的在于提供不需要繁杂的工序,能够以低成本抑制弯曲的发生,生产率和经济性优异的电子部件内置基板的制造方法和电子部件内置基板。
为了解决上述问题,本发明者们反复进行深入研究,结果发现,以形成绝缘层等时施加的热为起因产生的热膨胀和热收缩的程度,在电子部件的载置部(在基体上载置有电子部件的区域)和非载置部(在基体上没有载置电子部件的区域)不同,由于这种可以说不均匀的性状变化,使施加到基板上的应力不均衡,结果,产生上述的弯曲,至此完成本发明。
即,本发明的电子部件内置基板的制造方法,包括:准备基体的工序;将电子部件载置在该基体上的工序;将满足下式(1)所示关系的元件载置在基体的电子部件的非载置部上的工序;在基体上,以覆盖电子部件和该元件的方式形成绝缘层的工序;和在基体和/或绝缘层上形成配线层的工序。
α1<α3并且α2<α3……(1)
式中,α1表示电子部件的线热膨胀系数(ppm/K),α2表示上述元件的线热膨胀系数(ppm/K),α3表示基体、配线层或绝缘层的线膨胀系数(ppm/K)。
其中,在本说明书中,所谓“电子部件内置基板”意味着在基体上设置有至少1个以上的电子部件的基板。包括形成有多个上述的个别基板(单片)的工作片那样的集合基板或形成有多个这种个别基板
(单片)的工作片的集合基板(工作板)。另外,“电子部件内置基板”的电子部件可以埋入基体的内部,也可以在外部露出,例如,用于电连接的端子等配线结构可以部分在外部露出。另外,所谓“在基体和/或绝缘层上形成配线层”意味着在基体表面、基体背面、绝缘层表面和绝缘层背面的任何一个部位以上形成配线层(图案)。
在本制法中,将电子部件载置在基体上,并且将满足式(1)的元件载置在电子部件的非载置部上,以覆盖这些电子部件和元件的方式形成绝缘层。这样,由于该元件的线热膨胀系数在电子部件的线热膨胀系数以上,且小于基体、配线层或绝缘层的线热膨胀系数,所以电子部件的全体非载置部(非载置区域,只是基体和绝缘层的区域,或基体、绝缘层和配线层的区域)的线热膨胀系数与电子部件的全体载置部(载置区域,成为制品区域的区域)的线热膨胀系数接近,电子部件全体载置部和全体非载置部的热膨胀和热收缩的程度的差异减小。结果,能够缓和形成绝缘层时产生的不均匀的内部应力,抑制电子部件内置基板的弯曲。即,根据本发明者的认识可以推测,在仅使用上述现有的工作片的制法的情况下弯曲恶化,是因为电子部件的线热膨胀系数小于基体或绝缘层、配线层的线热膨胀系数,如果内置电子部件,则电子部件的非载置区域和载置区域的线热膨胀系数的差与不内置电子部件的基板的制造相比,进一步增大。为了改善这种关系,在本制法中,在电子部件的非载置部上载置由线热膨胀系数小于基体或绝缘层、配线层的材料构成的元件,使得非载置区域的线热膨胀系数与制品区域的线热膨胀系数同样小。
并且,设置在绝缘层内的元件发挥着提高电子部件内置基板的机械强度的内部结构体的作用,由此,能够抵抗施加应力,抑制基板的形状变化,所以能够得到进一步抑制电子部件内置基板的弯曲的协同效果。并且,这样得到的电子部件内置基板的弯曲被抑制,且基板强度得到提高,所以搬送、组合、表面安装等制造加工时的处理性提高,能够抑制制造加工故障的发生,提高成品率,同时安装可靠性提高。
在本制法中,优选以包围电子部件的方式载置上述元件。如果这样例如将元件配置为框状,包围电子部件的非载置部的线热膨胀系数和机械强度不存在局部的不同(即没有各向异性)而平均化,因此,能够进一步缓和不均匀的内部应力,同时,基板强度进一步提高,能够进一步抑制电子部件内置基板的弯曲。
并且更优选将电子部件和元件载置在大致相同的平面上。这样,不仅是基板面方向,基板厚度方向的不均匀的内部应力也容易被缓和,因此能够进一步有效地抑制电子部件内置基板的弯曲。
这里,优选上述元件的厚度比电子部件薄。如果这样,例如在使树脂加压固化、形成绝缘层时,树脂容易从电子部件的载置部的周边区域向非载置部流动。因此,容易均等地将压力施加在电子部件上,能够提高电子部件与绝缘层的粘合性以及电子部件内置基板的厚度均等性和平坦性。并且,在这种情况下,能够有效地排除存在、混入上述元件、配线层、绝缘层、电子部件等之间的气泡等,能够抑制制造加工故障的发生,提高成品率和安装可靠性。
并且,优选上述元件在绝缘层中占有的空间体积比向着基体外周(外缘)方向连续地或阶段地减小。这样,例如在使树脂加压固化、形成绝缘层时,上述树脂的流动性进一步提高,实现电子部件与绝缘层的粘合性以及电子部件内置基板的厚度均等性和平坦性的进一步改善。结果,能够抑制制造加工故障的发生,提高成品率和安装可靠性。
并且,本发明的电子部件内置基板能够有效地利用上述本发明的制造方法得到,包括;载置在基体上的电子部件;载置在基体的电子部件的非载置部上并且满足上式(1)所示关系的元件;以覆盖这些元件和电子部件的方式形成的绝缘层;和在基体和/或绝缘层上形成的配线层。
发明效果
采用本发明的电子部件内置基板及其制造方法,通过在基体的电子部件的非载置部上载置满足上式(1)所示的线热膨胀系数关系的元件,电子部件的全体载置部和全体非载置部的热膨胀和热收缩的程度均衡化,并且基板的机械强度提高,因此能够用简单的结构缓和加热、冷却时的不均匀的内部应力。这样能够不需要繁杂的工序,抑制电子部件内置基板的弯曲。由此,能够提高搬送、组合、表面安装等制造加工时的处理性,所以能够抑制制造加工故障的发生,能够提高成品率和安装可靠性。
附图说明
图1为表示本发明的电子部件内置基板的第一实施方式的主要部分的截面示意图。
图2为表示电子部件41的大致结构的立体图。
图3为表示板状框元件51的大致结构的立体图。
图4为表示制造工作片100的顺序的一个例子的工序图。
图5为表示制造工作片100的顺序的一个例子的工序图。
图6为表示制造工作片100的顺序的一个例子的工序图。
图7为沿着图6的VII-VII线的截面图。
图8为表示制造工作片100的顺序的一个例子的工序图。
图9为沿着图8的VIII-VIII线的截面图。
图10为沿着图6的X-X线的截面图。
图11为表示制造工作片100的顺序的一个例子的工序图。
图12为表示制造工作片100的顺序的一个例子的工序图。
图13为表示制造工作片100的顺序的一个例子的工序图。
图14为表示制造工作片100的顺序的一个例子的工序图。
图15为表示个别基板200的大致结构的截面图。
图16为表示电子部件内置模块201的大致结构的截面图。
图17为表示本发明的电子部件内置基板的第二实施方式的大致结构的平面图。
图18为表示本发明的电子部件内置基板的第三实施方式的大致结构的平面图。
图19为沿着图18的X IX-X IX线的截面图。
图20为表示本发明的电子部件内置基板的第三实施方式的变更例的大致结构的截面图。
符号说明
11:基体;12、13、21、31:绝缘层;12a、12b、21a、61a:配线层;14、24、34:通路(via);41:电子部件;41a:主面;41b:背面;42:焊盘(land)电极;43:凸起;51:板状框元件(元件);52:框部;52a:倾斜面;61:从动部件;81:元件;82:板元件;83:板元件;84:元件;85:框元件;85a:面;85b:贯通孔(凹部);85c:非贯通孔(凹陷、凹部);86:板元件;100、300、400:工作片(电子部件内置基板);200:个别基板(电子部件内置基板);201:电子部件内置模块(电子部件内置基板)。
具体实施方式
下面,参照附图对本发明的实施方式进行说明。这种实施方式是用于说明本发明的例示,本发明不仅限于该实施方式。即,只要不偏离其要点,本发明可以进行各种变更实施。其中,在图中,相同的要素用相同的符号表示,并省略重复的说明。此外,上下左右等位置关系,只要不特别说明,为根据图示的位置关系。另外,图的尺寸比率并不限于图示的比率。
(第一实施方式)
图1为表示本发明的电子部件内置基板的第一实施方式的主要部分的截面示意图。工作片100为在片的表面内包含棋盘状的按2×2配置的共计4个个别基板的电子部件内置集合基板,在大致矩形的基体11的一个面(图示上表面)上具有绝缘层21、31,在绝缘层21的内部的规定位置埋设有电子部件41和板状框元件51(元件)。
基体11,在绝缘层12的两个面上形成有配线层(图案)12a、12b,在配线层12a上具有通过真空压接绝缘性的树脂膜而层叠的绝缘层13。配线层12a和配线层12b通过贯通绝缘层12的通路14电连接。并且,在绝缘层21的一个面(图示上表面)上形成有配线层21a。配线层12a和配线层21a通过贯通绝缘层13和绝缘层21的通路24电连接。
在绝缘层12、13中使用的材料,只要是能够成型为片状或膜状的材料,则可以没有特别限制地使用。具体而言,例如可以列举出乙烯基苄基树脂、聚乙烯基苄基醚化合物树脂、双马来酸酐缩亚胺三嗪树脂(BT树脂)、聚苯醚(Polyphenylene ether Oxide)树脂(PPE、PPO)、氰酸酯树脂、环氧+活性酯固化树脂、聚苯醚树脂(PolyphenyleneOxide树脂)、固化性聚烯烃树脂、苯并环丁烯树脂、聚酰亚胺树脂、芳香族聚酯树脂、芳香族液晶聚酯树脂、聚苯硫醚树脂、聚醚酰亚胺树脂、聚丙烯酸酯树脂、聚醚醚酮树脂、氟树脂、环氧树脂、酚醛树脂或苯并噁嗪树脂的单体或者在这些树脂中添加有硅石、滑石、碳酸钙、碳酸镁、氢氧化铝、氢氧化镁、硼酸铝晶须、钛酸钾纤维、氧化铝、玻璃片、玻璃纤维、氮化钽、氮化铝等的材料,还可以是在这些树脂中添加有含镁、硅、钛、锌、钙、锶、锆、锡、钕、钐、铝、铋、铅、镧、锂和钽中的至少1种金属的金属氧化物粉末的材料,并且还可以是在这些树脂中配合有玻璃纤维、芳族聚酰胺纤维等树脂纤维等的材料,或者使这些树脂浸渍在玻璃布、芳族聚酰胺纤维、无纺布等中的材料等。可以从电气特性、机械特性、吸水性、耐逆流性等观点出发适当选择使用。
绝缘层21、31由热固化性树脂构成,作为该树脂材料,例如可以列举出环氧树脂、酚醛树脂、乙烯基苄基醚化合物树脂、双马来酸酐缩亚胺三嗪树脂、氰酸酯类树脂、聚酰亚胺、聚烯烃类树脂、聚脂、聚苯醚、液晶聚合物、有机硅树脂、氟类树脂等,可以将这些树脂单独使用或多个组合使用。并且,也可以是丙烯酸橡胶、乙烯丙烯酸橡胶等橡胶材料或含有部分橡胶成分的树脂材料。还可以是在这些树脂中添加有硅石、滑石、碳酸钙、碳酸镁、氢氧化铝、氢氧化镁、硼酸铝晶须、钛酸钾纤维、氧化铝、玻璃片、玻璃纤维、氮化钽、氮化铝等的材料,还可以是在这些树脂中添加有含镁、硅、钛、锌、钙、锶、锆、锡、钕、钐、铝、铋、铅、镧、锂和钽中的至少1种金属的金属氧化物粉末的材料,并且还可以是在这些树脂中配合有玻璃纤维、芳族聚酰胺纤维等树脂纤维等的材料,或者使这些树脂浸渍在玻璃布、芳族聚酰胺纤维、无纺布等中的材料等。可以从电气特性、机械特性、吸水性、耐逆流性等观点出发适当选择使用。
图2为示意性地表示电子部件41的结构的立体图。该电子部件41为裸芯片状态的半导体IC(模型),在形成大致矩形板状的主面41a上具有多个焊盘电极42。其中,在图示中,只在四个角处表示焊盘电极42和后述的凸起43(端子),省略除此之外的焊盘电极42的表示。另外,电子部件41的种类没有特别的限制,例如,可举出如CPU或DSP那样动作频率非常高的数字IC。
对电子部件41的背面41b进行研磨,由此,电子部件41的厚度t1(从主面41a至背面41b的距离)比通常的半导体IC薄。具体而言,电子部件41的厚度t1例如为200μm以下,更优选为100μm以下,特优选为20~50μm左右。另外,电子部件41的背面41b优选进行用于使其薄膜化或粘合性提高的蚀刻、等离子体处理、激光处理、喷砂研磨、抛光研磨、药品处理等使表面变粗的处理。
其中,优选电子部件41的背面41b的研磨,在晶片状态下对多个电子部件41同时进行,然后,利用切割分离成个别的电子部件41。在利用研磨变薄之前,利用切割切断分离成个别的电子部件41的情况下,可以在利用热固化性树脂等覆盖电子部件41的主面41a的状态下,研磨背面41b。
在各焊盘电极42上形成有作为导电性突起物的一种的凸起43(端子)。凸起43的种类没有特别的限制,可以例示螺柱式(stud)凸起、板式凸起、电镀式凸起、球式凸起等各种凸起。在图示中,例示了螺柱式凸起。在使用螺柱式凸起作为凸起43的情况下,可以引线焊接银(Ag)或铜(Cu)而形成。在使用板式凸起的情况下,可以利用电镀、溅射或蒸镀而形成。另外,在使用电镀式凸起的情况下,可以利用电镀形成。在使用球式凸起的情况下,在将焊锡球载置在焊盘电极42上后使其熔融,或将膏状焊锡印刷在焊盘电极上后使其熔融而形成。另外,可以使用对导电性材料进行网板印刷使其固化的圆锥状、圆柱状等凸起,或印刷纳米膏利用加热使其烧结而形成的凸起。
作为可以在凸起43中使用的金属种类,没有特别的限制,例如可举出金(Au)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、铬(Cr)、镍铬合金、焊锡等。其中,当考虑连接性和迁移时,优选使用金或铜,更优选使用铜。当使用铜作为凸起43的材料时,例如与使用金的情况比较,能够得到与焊盘电极42的高的接合强度,能够提高电子部件41自身的可靠性。
凸起43的尺寸形状可以根据焊盘电极42间的间隔(间距)适当设定,例如,在焊盘电极42的间距约为100μm的情况下,凸起43的最大直径为10~90μm左右,高度为2~100μm左右即可。另外,凸起43在利用晶片的切割切断分离为个别的电子部件41后,可以利用焊线机与各焊盘电极42接合。
图3为示意性地表示板状框元件51结构的立体图。在本实施方式中使用的板状框元件51由分划为4个窗W的格子状的框部52构成。框部52的外形为与基体11的外形大致相似的大致矩形,其外部尺寸设计成比基体11稍小。另外,框部52具有向着框外周倾斜的倾斜面52a,这样,框部52的厚度向着框外周减薄。另外,优选框部52的厚度t2(最厚部分)比电子部件41的厚度t1稍薄。
作为能够在板状框元件51中使用的材料,只要是满足下述式(1)的材料即可,可以没有特别限制地使用。
α1<α3并且α2<α3……(1)
(式中,α1表示电子部件41的线热膨胀系数(ppm/K),α2表示板状框元件51的线热膨胀系数(ppm/K),α3表示上述基体11、各配线层或各绝缘层的线膨胀系数(ppm/K))。在用于这种用途中的电子部件、基体、配线层和绝缘层中,通常α1为1~8ppm/K左右,α3为14~20ppm/K左右,因此α2优选为3~16(ppm/K)。进一步具体而言,可以列举出线热膨胀系数为3~16(ppm/K)的金属、合金和树脂等,例如可以列举出SUS400(11ppm/K)、SUS410(11ppm/K)、SUS430(10.5ppm/K)、SUS630(11ppm/K)、SUS631(10ppm/K)、SUS316(16ppm/K)、42合金(4.5ppm/K)、镍铬铁耐热合金(14ppm/K)、镍(12.5ppm/K)、镍铬钼钢(11ppm/K)、铁(11ppm/K)、铸铁(10ppm/K)、钛(9ppm/K)、芳香族聚酰胺(制品名:MICTRON GQ,13ppm/K)、芳香族聚酰胺(制品名:MICTRON ML,3ppm/K)、PET(15ppm/K)、聚酰亚胺(3~15ppm/K)等。其中,从加工性和获得性、刚性、成本等观点出发,优选使用SUS430或镍铬铁耐热合金,其中更优选使用SUS430。
下面,参照图4~图14说明作述工作板100的制造方法,其包括共计4个的内置有3个电子部件41的个别基板。
首先,使用在两面贴铜的环氧玻璃上钻孔,再进行无电解电镀、电解电镀后,通过蚀刻除去不需要部分等的公知的方法,准备形成有配线层(图案)12a、12b和通路14的基体11(图4)。在此,在与板状框元件51的各窗W对应的4个部位分别离开地形成由配线层12a、12b和通路14构成的电路结构。并且,在基体11的配线层12a上形成绝缘层13(图5)。然后,将利用上述操作得到的基体11载置固定在图中未示的不锈钢制的工作台上的规定位置,并进行以下的工序。
接着,将电子部件41载置在基体11的绝缘层13上的制品区域S1~S4内的规定位置上(图6和图7)。在此,制品区域S1~S4为根据配线层12a、12b和通路14等电路结构划定的个别基板的制作区域。在此,如上所述,由于在基板11上,在与板状框元件51的各窗W对应的4个部位形成有4个相同的电路结构,因此与此对应,可以划定分别分离配置为2×2棋盘状的制品区域S1~S4和格子状的非制品区域T(除去制品区域S1~S4的区域)(图6)。
进一步,将板状框元件51载置在基板11的绝缘层13上(图8~图10)。在此,将板状框元件51载置在作为电子部件41的非载置部的非制品区域T的规定位置上,使得板状框元件51的各窗W与制品区域S1~S4一致。这样,以包围电子部件41的方式载置板状框元件51(图8~图10)。另外,将电子部件41和板状框元件51载置在基板11的绝缘层13上的同一平面上(图9和图10)。其中,板状框元件51的载置可以在电子部件41的载置之前进行,也可以与电子部件41的载置同时进行。
然后,以覆盖如上所述载置在基体11的绝缘层13上的电子部件41和板状框元件51的方式,形成绝缘层21(图11)。具体而言,将未固化或半固化状态的热固化性树脂涂布在基体11的绝缘层13上,通过加热使其固化,从而形成绝缘层21。
接着,除去绝缘层21的一部分,使电子部件41的凸起43露出(图12)。该绝缘层21的除去方法可以适当选择公知的方法,具体而言,例如可以列举出使用研磨机的研磨、或喷砂处理、二氧化碳气体激光的照射等。
并且,利用公知的方法分别形成贯通绝缘层13、21的通路24(图13),然后,利用减去法或叠加法等公知的方法,在绝缘层31上形成配线层21a,由此使电子部件41、凸起43、配线层21a和12a通过通路24电连接(图14)。
然后,根据常规方法,在绝缘层21上形成绝缘层31,由此得到图1所示结构的工作片100。优选与上述绝缘层21同样,在绝缘层21上涂布作为热固化性树脂的绝缘性环氧树脂,加热使其固化,由此形成绝缘层31。
这里,优选绝缘层21、31的形成在涂布未固化或半固化状态的热固化性树脂后,加热使其半固化,然后利用压制装置固化成形。由此,能够提高配线层12a、12b、21a,绝缘层12、13、21、31,电子部件41,板状框元件51之间的粘合性。这种固化成形,也可以根据需要,一边加热一边进行。即,绝缘层21、31的形成可以采用各种公知的方法,例如除了网板印刷、旋涂等方法之外,也可以采用压制、真空层叠、常压层叠等。
此外,在使用比电子部件41的厚度t1薄且具有向框外周倾斜的倾斜面52a的板状框元件51的情况下,由于板状框元件51的厚度向着基体11的外周方向减小,换言之,在绝缘层21中占有的空间体积比向着基体11的外周方向减小,所以在固化压制成形时,未固化(半固化)树脂容易从制品区域S1~S4通过非制品区域T,向基体11的外周方向流动。因此,容易将压力均匀地施加在制品区域S1~S4上,配线层12a、12b、21a,绝缘层12、13、21、31,电子部件41、板状框元件51之间的粘合性提高,同时工作片100的厚度、制品区域S1~S4的厚度均匀性和平坦性提高。另外,能够有效地排除存在、混入配线层12a、12b、21a,绝缘层12、13、21、31,电子部件41,板状框元件51之间的气泡等,能够抑制制造加工故障的发生,能够提高成品率和安装可靠性。
并且,通过利用切割等公知的方法,将上述工作片100分割为每个制品区域S1~S4,能够得到各个别基板200(电子部件内置基板)(图15)。另外,通过在得到的个别基板200上表面安装所希望的电子部件,能够得到电子部件内置模块(电子部件内置基板)。作为一个例子,图示电子部件内置模块201,其形成有贯通配线层61a和绝缘层31的通路34,并且设置有电阻或电容其等被动元件61(图16)。
另外,在上述工作片100的制造方法中,由于将线热膨胀系数满足上式(1)的板状框元件51配置在非制品区域T中,制品区域S1~S4与非制品区域T之间的热腹胀和热收缩程度的差异减少,能够缓和形成绝缘层21、31时产生的不均匀的内部应力。并且,由于板状框元件51发挥着抵抗施加应力、缓和基板的形状变化的内部结构体的作用,所以基板强度提高。因此能够有效地抑制基板弯曲的发生。
另外,板状框元件51作为内部结构体缓和基板的形状变化。因此,在配线层21a或绝缘层31的组合时,或在被动元件61的表面安装时等,能够抵抗不希望的施加应力,抑制弯曲的发生。
并且,由于以包围电子元件41的方式载置板状框元件51,所以在片面内没有各向异性,能够使热膨胀和热收缩的程度逐渐接近,提高没有各向异性的基板强度。
并且,由于将板状框元件51配置在与电子部件41相同的平面上,能够缓和在基体11的厚度方向的不均匀的应力施加,能够更有效地抑制弯曲的发生。
另一方面,由于得到的工作片100的弯曲被抑制,基板强度提高,因此搬送、组合、表面安装等制造加工时的处理性提高。因此,通过使用这种工作片100,能够抑制以后的制造加工故障的发生,成品率提高,同时安装可靠性提高。
(第二实施方式)
图17为表示本发明的电子部件内置基板的第二实施方式的大致结构的平面图。工作片300除了具有满足上述式(1)的元件81代替板状框元件51以外,与上述第一实施方式的工作片100的结构相同。元件81由截面为矩形的板元件82和截面为矩形的十字形的板元件83构成。如图所示,多个板元件82呈框状配置在基体11的周边区域,在其框内配置十字形的板元件83。并且,板元件82的厚度比板元件83薄。
使用这种元件81,能够得到与上述第一实施方式同样的作用效果,并且由于元件81由呈直线形的板元件82和板元件83分割构成,所以元件81的处理性和通用性提高,有助于生产率的提高。
(第三实施方式)
图18和图19为表示本发明的电子部件内置基板的第三实施方式的大致结构的平面图和部分截面图。工作片400除了具有满足上述式(1)的元件84代替板状框元件51以外,与上述第一实施方式的工作片100的结构相同。元件84由在经过表面粗糙化的面85a上形成有各种多个贯通孔85b(凹部)的框元件85、和截面为矩形的板元件86构成。如图所示,在框元件85的框内配置板元件86。这里,在图18中,为了容易理解,省略了贯通孔85b的表示。设置在框元件85的面85a上的贯通孔85b,以凹部体积(内容积)向着基体11的外周方向增大的方式配置。
使用这种元件84,能够达到与上述第一和第二实施方式同样的作用效果。并且,由于元件84具有经过表面粗糙化的面85a,所以与绝缘层21的粘合性提高,能够降低由于元件84的浮起或剥落造成的处理时的强度下降或切出时绝缘层13、21的脱落或飞散,有助于处理性的提高。并且,如图20所示,可以形成非贯通孔85c(凹陷、凹部)代替贯通孔85b。
其中,在上述第一~第三实施方式中,说明了内置有半导体IC作为电子部件41的集合基板和个别基板,但本发明也可以代替这种半导体IC,和/或与该半导体IC一起,内置有变阻器、电阻、电容器、电感器、滤波器、天线、变压器等电子部件,同样可以实施。
产业上的可利用性
如上所述,根据本发明的电子部件内置基板及其制造方法,不需要繁杂的工序,以低成本和简单的结构,缓和加热时产生的不均匀的内部应力,并且能够提高基板强度,由此,能够有效地抑制弯曲的发生,能够提高生产率和经济性以及制品的可靠性,因此有助于在将电子部件模块化时的进一步薄膜化,并且能够在薄膜型的内置电子部件的电子机器、装置、系统、各种器件等,特别是要求小型化、薄膜化和高性能化的装置,以及它们的制造中广泛并且有效地利用。
Claims (6)
1.一种电子部件内置基板的制造方法,其特征在于,包括:
准备基体的工序;
将电子部件载置在所述基体上的工序;
将满足下式(1)所示关系的元件载置在所述基体的所述电子部件的非载置部上的工序;
在所述基体上,以覆盖所述电子部件和所述元件的方式形成所述绝缘层的工序;和
在所述基板和/或所述绝缘层上形成配线层的工序,
α1<α3并且α2<α3……(1)
α1:电子部件的线热膨胀系数,
α2:元件的线热膨胀系数,
α3:基体、配线层或绝缘层的线热膨胀系数,
所述线热膨胀系数的单位是ppm/K。
2.如权利要求1所述的电子部件内置基板的制造方法,其特征在于,在载置所述元件的工序中,以包围所述电子部件的方式载置所述元件。
3.如权利要求1所述的电子部件内置基板的制造方法,其特征在于,在载置所述元件的工序中,将所述电子部件和所述元件载置在相同平面上。
4.如权利要求1所述的电子部件内置基板的制造方法,其特征在于,作为所述元件,使用厚度比所述电子部件薄的元件。
5.如权利要求1所述的电子部件内置基板的制造方法,其特征在于,作为所述元件,使用在所述绝缘层中占有的空间体积比向着所述基体的外周方向减小的元件。
6.一种电子部件内置基板,其特征在于,包括:
基体;
载置在所述基体上的电子部件;
载置在所述基体的所述电子部件的非载置部上,并且满足下式(1)所示关系的元件;
以覆盖所述电子部件和所述元件的方式形成的所述绝缘层;和
在所述基板和/或所述绝缘层上形成的配线层,
α1<α3并且α2<α3……(1)
α1:电子部件的线热膨胀系数,
α2:元件的线热膨胀系数,
α3:基体、配线层或绝缘层的线热膨胀系数,
所述线热膨胀系数的单位是ppm/K。
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JP2015018979A (ja) * | 2013-07-12 | 2015-01-29 | イビデン株式会社 | プリント配線板 |
KR102250997B1 (ko) | 2014-05-02 | 2021-05-12 | 삼성전자주식회사 | 반도체 패키지 |
KR101969730B1 (ko) * | 2014-12-19 | 2019-04-17 | 후지필름 가부시키가이샤 | 다층 배선 기판 |
KR101602377B1 (ko) | 2015-08-13 | 2016-03-15 | 주식회사 이오비스 | 3차원 형상 측정 방법 |
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TWI645973B (zh) * | 2017-12-15 | 2019-01-01 | 律勝科技股份有限公司 | 聚醯亞胺薄化軟性基板及其製造方法 |
WO2020067320A1 (ja) * | 2018-09-27 | 2020-04-02 | 株式会社村田製作所 | 樹脂多層基板 |
CN111511104B (zh) * | 2019-01-31 | 2024-05-28 | 奥特斯奥地利科技与系统技术有限公司 | 部件承载件以及制造部件承载件的方法 |
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JP7380681B2 (ja) * | 2019-04-26 | 2023-11-15 | Tdk株式会社 | 集合基板及びその製造方法 |
US10950551B2 (en) | 2019-04-29 | 2021-03-16 | Advanced Semiconductor Engineering, Inc. | Embedded component package structure and manufacturing method thereof |
US11296030B2 (en) | 2019-04-29 | 2022-04-05 | Advanced Semiconductor Engineering, Inc. | Embedded component package structure and manufacturing method thereof |
WO2021146894A1 (zh) * | 2020-01-21 | 2021-07-29 | 鹏鼎控股(深圳)股份有限公司 | 内埋电子元件的电路板及制作方法 |
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US20090025971A1 (en) | 2009-01-29 |
JP4518113B2 (ja) | 2010-08-04 |
EP2019571A3 (en) | 2010-04-14 |
JP2009032823A (ja) | 2009-02-12 |
US20120285013A1 (en) | 2012-11-15 |
EP2019571A2 (en) | 2009-01-28 |
EP2019571B1 (en) | 2012-09-05 |
US8237059B2 (en) | 2012-08-07 |
CN101355858A (zh) | 2009-01-28 |
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