CN101326001A - 纳米材料的生产 - Google Patents
纳米材料的生产 Download PDFInfo
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- CN101326001A CN101326001A CNA2006800465591A CN200680046559A CN101326001A CN 101326001 A CN101326001 A CN 101326001A CN A2006800465591 A CNA2006800465591 A CN A2006800465591A CN 200680046559 A CN200680046559 A CN 200680046559A CN 101326001 A CN101326001 A CN 101326001A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/02—Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing zirconium, with or without oxygen or hydrogen, and containing two or more other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C18/1216—Metal oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/1266—Particles formed in situ
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DKPA200501755 | 2005-12-11 | ||
| DKPA200501755 | 2005-12-11 |
Publications (1)
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| CN101326001A true CN101326001A (zh) | 2008-12-17 |
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| CNA2006800465591A Pending CN101326001A (zh) | 2005-12-11 | 2006-12-11 | 纳米材料的生产 |
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| Country | Link |
|---|---|
| US (1) | US7829598B2 (enExample) |
| EP (1) | EP1960098A2 (enExample) |
| JP (1) | JP2009518167A (enExample) |
| KR (1) | KR20080077680A (enExample) |
| CN (1) | CN101326001A (enExample) |
| AU (1) | AU2006322458A1 (enExample) |
| BR (1) | BRPI0619635A2 (enExample) |
| CA (1) | CA2633809A1 (enExample) |
| EA (1) | EA013089B1 (enExample) |
| WO (1) | WO2007065446A2 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102173452A (zh) * | 2011-03-04 | 2011-09-07 | 北京工业大学 | 一种单一材料ZrO2纳米点、制备方法及应用 |
| CN101618308B (zh) * | 2009-06-09 | 2011-12-21 | 宋玉军 | 用于纳米颗粒制备的微流体反应器及颗粒的可控制备工艺 |
| CN102325923A (zh) * | 2009-01-06 | 2012-01-18 | 法国原子能及替代能源委员会 | 具有提高的粘附性的纳米颗粒沉积物的制造方法及用于实施这种方法的装置 |
| CN102361686A (zh) * | 2009-03-23 | 2012-02-22 | 瓦林格光催化股份有限公司 | 使用具有微米级珠的珠磨机制备具有保持结晶度的二氧化钛纳米颗粒胶态悬浮体 |
| CN108149229A (zh) * | 2017-12-29 | 2018-06-12 | 南京理工大学 | 一种用于纳米薄膜沉积的液相基板火焰合成装置和方法 |
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| US8048192B2 (en) * | 2005-12-30 | 2011-11-01 | General Electric Company | Method of manufacturing nanoparticles |
| HU230862B1 (hu) * | 2008-04-28 | 2018-10-29 | DARHOLDING Vagyonkezelő Kft | Berendezés és eljárás nanorészecskék folyamatos üzemű előállítására |
| US8008237B2 (en) * | 2008-06-18 | 2011-08-30 | Afton Chemical Corporation | Method for making a titanium-containing lubricant additive |
| US9067263B2 (en) * | 2009-01-15 | 2015-06-30 | Gr Intellectual Reserve, Llc | Continuous, semicontinuous and batch methods for treating liquids and manufacturing certain constituents (e.g., nanoparticles) in liquids, apparatuses and nanoparticles and nanoparticle/liquid solution(s) and colloids resulting therefrom |
| IT1393040B1 (it) * | 2009-03-02 | 2012-04-11 | Colorobbia Italiana Spa | Processo per la preparazione di sospensioni stabili di nanoparticelle metalliche e sospensioni colloidali stabili cosi' ottenute |
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| TWI398469B (zh) * | 2009-10-19 | 2013-06-11 | Ind Tech Res Inst | 一階段固定ＴｉＯ2奈米結晶粒於高分子基材的方法及其應用 |
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| US203207A (en) | 1878-04-30 | Improvement in seed-drill teeth | ||
| US4338199A (en) * | 1980-05-08 | 1982-07-06 | Modar, Inc. | Processing methods for the oxidation of organics in supercritical water |
| JP3047110B2 (ja) * | 1990-06-15 | 2000-05-29 | 株式会社東北テクノアーチ | 金属酸化物微粒子の製造方法 |
| JP2777044B2 (ja) * | 1993-04-19 | 1998-07-16 | 日産化学工業株式会社 | バリウムフェライト微粒子の製造方法 |
| JP3483282B2 (ja) * | 1993-11-12 | 2004-01-06 | 高周波熱錬株式会社 | 超微粒子二酸化酸化チタン複合化酸化物の製造方法 |
| JP3484025B2 (ja) * | 1996-01-10 | 2004-01-06 | 仲道 山崎 | 連続水熱合成方法および装置 |
| BE1014525A3 (fr) * | 2001-12-04 | 2003-12-02 | Ct Rech Metallurgiques Asbl | Procede de revetement de surface metallique. |
| JP4102872B2 (ja) * | 2002-03-08 | 2008-06-18 | 独立行政法人産業技術総合研究所 | 高結晶性チタン酸バリウム超微粒子とその製造方法 |
| US6967172B2 (en) * | 2002-07-03 | 2005-11-22 | Honeywell International Inc. | Colloidal silica composite films for premetal dielectric applications |
| KR100460102B1 (ko) * | 2002-07-15 | 2004-12-03 | 한화석유화학 주식회사 | 금속산화물 초미립자의 제조방법 |
| GB0402963D0 (en) * | 2004-02-11 | 2004-03-17 | Univ Nottingham | Counter current mixing device for two different fluids |
| DE102004030104A1 (de) | 2004-06-22 | 2006-01-12 | Degussa Ag | Wässerig/organische Metalloxid-Dispersion und mit damit hergestellte beschichtete Substrate und Formkörper |
| EP1809793A2 (en) | 2004-09-27 | 2007-07-25 | Auburn University | Selection and deposition of nanoparticles using co2-expanded liquids |
-
2006
- 2006-12-11 US US12/096,897 patent/US7829598B2/en not_active Expired - Fee Related
- 2006-12-11 WO PCT/DK2006/000706 patent/WO2007065446A2/en not_active Ceased
- 2006-12-11 KR KR1020087016996A patent/KR20080077680A/ko not_active Ceased
- 2006-12-11 AU AU2006322458A patent/AU2006322458A1/en not_active Abandoned
- 2006-12-11 EA EA200801383A patent/EA013089B1/ru not_active IP Right Cessation
- 2006-12-11 CA CA002633809A patent/CA2633809A1/en not_active Abandoned
- 2006-12-11 CN CNA2006800465591A patent/CN101326001A/zh active Pending
- 2006-12-11 EP EP06818165A patent/EP1960098A2/en not_active Withdrawn
- 2006-12-11 BR BRPI0619635-7A patent/BRPI0619635A2/pt not_active IP Right Cessation
- 2006-12-11 JP JP2008543663A patent/JP2009518167A/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102325923A (zh) * | 2009-01-06 | 2012-01-18 | 法国原子能及替代能源委员会 | 具有提高的粘附性的纳米颗粒沉积物的制造方法及用于实施这种方法的装置 |
| CN102361686A (zh) * | 2009-03-23 | 2012-02-22 | 瓦林格光催化股份有限公司 | 使用具有微米级珠的珠磨机制备具有保持结晶度的二氧化钛纳米颗粒胶态悬浮体 |
| CN102361686B (zh) * | 2009-03-23 | 2014-10-15 | 瓦林格光催化股份有限公司 | 使用具有微米级珠的珠磨机制备具有保持结晶度的二氧化钛纳米颗粒胶态悬浮体 |
| CN101618308B (zh) * | 2009-06-09 | 2011-12-21 | 宋玉军 | 用于纳米颗粒制备的微流体反应器及颗粒的可控制备工艺 |
| CN102173452A (zh) * | 2011-03-04 | 2011-09-07 | 北京工业大学 | 一种单一材料ZrO2纳米点、制备方法及应用 |
| CN102173452B (zh) * | 2011-03-04 | 2012-12-26 | 北京工业大学 | 一种单一材料ZrO2纳米点、制备方法及应用 |
| CN108149229A (zh) * | 2017-12-29 | 2018-06-12 | 南京理工大学 | 一种用于纳米薄膜沉积的液相基板火焰合成装置和方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0619635A2 (pt) | 2011-10-04 |
| US7829598B2 (en) | 2010-11-09 |
| KR20080077680A (ko) | 2008-08-25 |
| CA2633809A1 (en) | 2007-06-14 |
| AU2006322458A1 (en) | 2007-06-14 |
| WO2007065446A2 (en) | 2007-06-14 |
| WO2007065446A3 (en) | 2007-09-13 |
| EP1960098A2 (en) | 2008-08-27 |
| US20090004099A1 (en) | 2009-01-01 |
| EA200801383A1 (ru) | 2008-10-30 |
| EA013089B1 (ru) | 2010-02-26 |
| JP2009518167A (ja) | 2009-05-07 |
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