BRPI0619635A2 - produção de materiais de tamanho nano - Google Patents
produção de materiais de tamanho nano Download PDFInfo
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- BRPI0619635A2 BRPI0619635A2 BRPI0619635-7A BRPI0619635A BRPI0619635A2 BR PI0619635 A2 BRPI0619635 A2 BR PI0619635A2 BR PI0619635 A BRPI0619635 A BR PI0619635A BR PI0619635 A2 BRPI0619635 A2 BR PI0619635A2
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- 239000000463 material Substances 0.000 title claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 title abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 119
- 239000002245 particle Substances 0.000 claims abstract description 41
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 239000002105 nanoparticle Substances 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 239000000725 suspension Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 239000012530 fluid Substances 0.000 claims description 193
- 238000002156 mixing Methods 0.000 claims description 140
- 239000000203 mixture Substances 0.000 claims description 70
- 239000003153 chemical reaction reagent Substances 0.000 claims description 49
- 239000002086 nanomaterial Substances 0.000 claims description 48
- 239000002243 precursor Substances 0.000 claims description 45
- 238000006243 chemical reaction Methods 0.000 claims description 43
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 238000010438 heat treatment Methods 0.000 claims description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 238000009826 distribution Methods 0.000 claims description 13
- 239000003792 electrolyte Substances 0.000 claims description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 8
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 8
- 150000004703 alkoxides Chemical class 0.000 claims description 7
- 239000000376 reactant Substances 0.000 claims description 7
- 230000035484 reaction time Effects 0.000 claims description 7
- 229910021529 ammonia Inorganic materials 0.000 claims description 6
- 239000003381 stabilizer Substances 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 239000011236 particulate material Substances 0.000 claims description 3
- 238000001556 precipitation Methods 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 2
- 150000001298 alcohols Chemical class 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 230000008859 change Effects 0.000 claims description 2
- 230000008602 contraction Effects 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910001960 metal nitrate Inorganic materials 0.000 claims description 2
- 150000003891 oxalate salts Chemical class 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 239000012296 anti-solvent Substances 0.000 claims 2
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical group Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 claims 1
- 125000005595 acetylacetonate group Chemical group 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052745 lead Inorganic materials 0.000 claims 1
- 150000001247 metal acetylides Chemical class 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052711 selenium Inorganic materials 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 229910052712 strontium Inorganic materials 0.000 claims 1
- 238000001308 synthesis method Methods 0.000 claims 1
- 229910052714 tellurium Inorganic materials 0.000 claims 1
- 150000003568 thioethers Chemical class 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 6
- 230000008569 process Effects 0.000 description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 14
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 12
- 239000012071 phase Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- 229910044991 metal oxide Inorganic materials 0.000 description 8
- 150000004706 metal oxides Chemical class 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 239000011164 primary particle Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 6
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 6
- 239000000499 gel Substances 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- -1 electronics Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000000634 powder X-ray diffraction Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PBOWRTVDKQYEAG-UHFFFAOYSA-J 2-aminooxy-2-oxoacetate titanium(4+) Chemical compound [Ti+4].NOC(=O)C([O-])=O.NOC(=O)C([O-])=O.NOC(=O)C([O-])=O.NOC(=O)C([O-])=O PBOWRTVDKQYEAG-UHFFFAOYSA-J 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- 229910020289 Pb(ZrxTi1-x)O3 Inorganic materials 0.000 description 2
- 229910020273 Pb(ZrxTi1−x)O3 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 238000010335 hydrothermal treatment Methods 0.000 description 2
- 238000011031 large-scale manufacturing process Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 230000000475 sunscreen effect Effects 0.000 description 2
- 239000000516 sunscreening agent Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004727 OSO3H Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical class CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000013270 controlled release Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000002778 food additive Substances 0.000 description 1
- 235000013373 food additive Nutrition 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000002082 metal nanoparticle Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/02—Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/006—Compounds containing zirconium, with or without oxygen or hydrogen, and containing two or more other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/1266—Particles formed in situ
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Nanotechnology (AREA)
- Dispersion Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Ceramic Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
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| DKPA200501755 | 2005-12-11 | ||
| DKPA200501755 | 2005-12-11 | ||
| PCT/DK2006/000706 WO2007065446A2 (en) | 2005-12-11 | 2006-12-11 | Production of nanosized materials |
Publications (1)
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|---|---|
| BRPI0619635A2 true BRPI0619635A2 (pt) | 2011-10-04 |
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| BRPI0619635-7A BRPI0619635A2 (pt) | 2005-12-11 | 2006-12-11 | produção de materiais de tamanho nano |
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| EP (1) | EP1960098A2 (enExample) |
| JP (1) | JP2009518167A (enExample) |
| KR (1) | KR20080077680A (enExample) |
| CN (1) | CN101326001A (enExample) |
| AU (1) | AU2006322458A1 (enExample) |
| BR (1) | BRPI0619635A2 (enExample) |
| CA (1) | CA2633809A1 (enExample) |
| EA (1) | EA013089B1 (enExample) |
| WO (1) | WO2007065446A2 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US8048192B2 (en) * | 2005-12-30 | 2011-11-01 | General Electric Company | Method of manufacturing nanoparticles |
| HU230862B1 (hu) * | 2008-04-28 | 2018-10-29 | DARHOLDING Vagyonkezelő Kft | Berendezés és eljárás nanorészecskék folyamatos üzemű előállítására |
| US8008237B2 (en) * | 2008-06-18 | 2011-08-30 | Afton Chemical Corporation | Method for making a titanium-containing lubricant additive |
| FR2940766B1 (fr) * | 2009-01-06 | 2011-05-27 | Commissariat Energie Atomique | Procede de realisation d'un depot de nanoparticules a adherence augmentee et dispositif pour la mise en oeuvre d'un tel procede |
| US9067263B2 (en) * | 2009-01-15 | 2015-06-30 | Gr Intellectual Reserve, Llc | Continuous, semicontinuous and batch methods for treating liquids and manufacturing certain constituents (e.g., nanoparticles) in liquids, apparatuses and nanoparticles and nanoparticle/liquid solution(s) and colloids resulting therefrom |
| IT1393040B1 (it) * | 2009-03-02 | 2012-04-11 | Colorobbia Italiana Spa | Processo per la preparazione di sospensioni stabili di nanoparticelle metalliche e sospensioni colloidali stabili cosi' ottenute |
| KR101009583B1 (ko) * | 2009-03-10 | 2011-01-20 | 충남대학교산학협력단 | 전이금속산화물 나노입자의 제조방법 |
| ES2457546T3 (es) * | 2009-03-23 | 2014-04-28 | Välinge Photocatalytic Ab | Producción de suspensiones coloidales de nanopartículas de titania con cristalinidad mantenida usando un molino de perlas con perlas de tamaño micrométrico |
| CN101618308B (zh) * | 2009-06-09 | 2011-12-21 | 宋玉军 | 用于纳米颗粒制备的微流体反应器及颗粒的可控制备工艺 |
| JP5479790B2 (ja) * | 2009-07-06 | 2014-04-23 | 紀本電子工業株式会社 | 超臨界マイクロ波反応装置 |
| TWI398469B (zh) * | 2009-10-19 | 2013-06-11 | Ind Tech Res Inst | 一階段固定ＴｉＯ2奈米結晶粒於高分子基材的方法及其應用 |
| RU2474010C2 (ru) * | 2010-03-09 | 2013-01-27 | Федеральное государственное бюджетное научное учреждение "Технологический институт сверхтвердых и новых углеродных материалов" (ФГБНУ ТИСНУМ) | Нанокомпозитный термоэлектрик и способ его получения |
| US8101680B1 (en) | 2010-10-12 | 2012-01-24 | Sabic Innovative Plastics Ip B.V. | Methods of preparing polymer nanocomposites |
| CN102173452B (zh) * | 2011-03-04 | 2012-12-26 | 北京工业大学 | 一种单一材料ZrO2纳米点、制备方法及应用 |
| KR101308020B1 (ko) | 2011-09-22 | 2013-09-12 | 한국과학기술연구원 | 코어-셀 구조의 복합 분말 및 그 제조 방법 |
| CN103917494B (zh) | 2011-10-26 | 2015-10-14 | 公立大学法人高知工科大学 | 球形多孔氧化钛纳米粒子的合成方法及由该合成方法制造的球形多孔氧化钛纳米粒子以及含有该球形多孔氧化钛纳米粒子的基因枪用载体 |
| RU2494045C1 (ru) * | 2012-04-27 | 2013-09-27 | Федеральное государственное бюджетное учреждение науки Институт катализа им. Г.К. Борескова Сибирского отделения Российской академии наук | Способ получения диоксида титана |
| JP6044756B2 (ja) * | 2012-05-25 | 2016-12-14 | 高知県公立大学法人 | 多孔質無機酸化物ナノ粒子の合成方法、並びに該合成方法により製造される多孔質無機酸化物ナノ粒子及び球状多孔質無機酸化物ナノ粒子 |
| US11065588B2 (en) | 2013-04-30 | 2021-07-20 | M. Technique Co., Ltd. | Fluid processing method |
| WO2015012715A1 (ru) * | 2013-07-26 | 2015-01-29 | Общество С Ограниченной Ответственностью "Плазма-Ск" | Способ и устройство наноструктурированного углеродного покрытия |
| KR101455040B1 (ko) * | 2014-07-29 | 2014-10-27 | (주)일신오토클레이브 | 초고압 균질기를 이용한 연속식 금속산화물 나노입자의 제조 장치 및 이를 이용한 제조 방법 |
| JP2018508440A (ja) * | 2014-12-23 | 2018-03-29 | エシロール アンテルナシオナル （コンパニー ジェネラル ドプティック） | 超臨界溶媒熱合成により表面変性金属酸化物ナノ粒子を製造するための連続フロー式プロセス |
| CA3026454C (en) | 2015-06-04 | 2023-07-04 | Crititech, Inc. | Collection device and methods for use |
| BR112018069628A2 (pt) | 2016-04-04 | 2019-02-12 | Crititech, Inc. | métodos para tratamento de tumor sólido |
| RU2633582C1 (ru) * | 2016-06-23 | 2017-10-13 | Общество с ограниченной ответственностью "Инновационные Технологии Синтеза" | Способ получения нанодисперсных оксидов металлов |
| SG11201909840TA (en) | 2017-06-09 | 2019-11-28 | Crititech Inc | Treatment of epithelial cysts by intracystic injection of antineoplastic particles |
| KR102303762B1 (ko) | 2017-06-14 | 2021-09-23 | 크리티테크, 인크. | 폐 장애의 치료 방법 |
| WO2019070850A1 (en) | 2017-10-03 | 2019-04-11 | Crititech, Inc. | LOCAL ADMINISTRATION OF ANINEOPLASTIC PARTICLES IN COMBINATION WITH SYSTEMIC DELIVERY OF IMMUNOTHERAPEUTIC AGENTS FOR THE TREATMENT OF CANCER |
| CN108149229B (zh) * | 2017-12-29 | 2020-04-10 | 南京理工大学 | 一种用于纳米薄膜沉积的液相基板火焰合成装置和方法 |
| RU2724243C1 (ru) * | 2020-02-03 | 2020-06-22 | Федеральное государственное бюджетное учреждение науки Ордена Трудового Красного Знамени Институт химии силикатов им. И.В. Гребенщикова Российской академии наук (ИХС РАН) | Способ получения фотокаталитически активного нанокристаллического диоксида титана в кристаллической модификации анатаз |
| JP2023061896A (ja) * | 2021-10-20 | 2023-05-02 | 財團法人工業技術研究院 | コアシェル型量子ドットの調製装置および調製方法 |
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| US203207A (en) | 1878-04-30 | Improvement in seed-drill teeth | ||
| US4338199A (en) * | 1980-05-08 | 1982-07-06 | Modar, Inc. | Processing methods for the oxidation of organics in supercritical water |
| JP3047110B2 (ja) * | 1990-06-15 | 2000-05-29 | 株式会社東北テクノアーチ | 金属酸化物微粒子の製造方法 |
| JP2777044B2 (ja) * | 1993-04-19 | 1998-07-16 | 日産化学工業株式会社 | バリウムフェライト微粒子の製造方法 |
| JP3483282B2 (ja) * | 1993-11-12 | 2004-01-06 | 高周波熱錬株式会社 | 超微粒子二酸化酸化チタン複合化酸化物の製造方法 |
| JP3484025B2 (ja) * | 1996-01-10 | 2004-01-06 | 仲道 山崎 | 連続水熱合成方法および装置 |
| BE1014525A3 (fr) * | 2001-12-04 | 2003-12-02 | Ct Rech Metallurgiques Asbl | Procede de revetement de surface metallique. |
| JP4102872B2 (ja) * | 2002-03-08 | 2008-06-18 | 独立行政法人産業技術総合研究所 | 高結晶性チタン酸バリウム超微粒子とその製造方法 |
| US6967172B2 (en) * | 2002-07-03 | 2005-11-22 | Honeywell International Inc. | Colloidal silica composite films for premetal dielectric applications |
| KR100460102B1 (ko) * | 2002-07-15 | 2004-12-03 | 한화석유화학 주식회사 | 금속산화물 초미립자의 제조방법 |
| GB0402963D0 (en) * | 2004-02-11 | 2004-03-17 | Univ Nottingham | Counter current mixing device for two different fluids |
| DE102004030104A1 (de) | 2004-06-22 | 2006-01-12 | Degussa Ag | Wässerig/organische Metalloxid-Dispersion und mit damit hergestellte beschichtete Substrate und Formkörper |
| EP1809793A2 (en) | 2004-09-27 | 2007-07-25 | Auburn University | Selection and deposition of nanoparticles using co2-expanded liquids |
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2006
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- 2006-12-11 WO PCT/DK2006/000706 patent/WO2007065446A2/en not_active Ceased
- 2006-12-11 KR KR1020087016996A patent/KR20080077680A/ko not_active Ceased
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- 2006-12-11 BR BRPI0619635-7A patent/BRPI0619635A2/pt not_active IP Right Cessation
- 2006-12-11 JP JP2008543663A patent/JP2009518167A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US7829598B2 (en) | 2010-11-09 |
| KR20080077680A (ko) | 2008-08-25 |
| CA2633809A1 (en) | 2007-06-14 |
| AU2006322458A1 (en) | 2007-06-14 |
| WO2007065446A2 (en) | 2007-06-14 |
| CN101326001A (zh) | 2008-12-17 |
| WO2007065446A3 (en) | 2007-09-13 |
| EP1960098A2 (en) | 2008-08-27 |
| US20090004099A1 (en) | 2009-01-01 |
| EA200801383A1 (ru) | 2008-10-30 |
| EA013089B1 (ru) | 2010-02-26 |
| JP2009518167A (ja) | 2009-05-07 |
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