CN101256953A - 半导体基板表面的化学处理方法及其装置 - Google Patents
半导体基板表面的化学处理方法及其装置 Download PDFInfo
- Publication number
- CN101256953A CN101256953A CNA2007101358362A CN200710135836A CN101256953A CN 101256953 A CN101256953 A CN 101256953A CN A2007101358362 A CNA2007101358362 A CN A2007101358362A CN 200710135836 A CN200710135836 A CN 200710135836A CN 101256953 A CN101256953 A CN 101256953A
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- semiconductor substrate
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- chemical solution
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 245
- 239000000758 substrate Substances 0.000 title claims abstract description 234
- 238000000034 method Methods 0.000 title claims abstract description 66
- 238000012993 chemical processing Methods 0.000 title claims abstract description 15
- 239000000126 substance Substances 0.000 claims abstract description 233
- 239000007788 liquid Substances 0.000 claims abstract description 65
- 239000000243 solution Substances 0.000 claims description 164
- 238000002347 injection Methods 0.000 claims description 77
- 239000007924 injection Substances 0.000 claims description 77
- 238000011282 treatment Methods 0.000 claims description 44
- 239000007921 spray Substances 0.000 claims description 29
- 238000009736 wetting Methods 0.000 claims description 23
- 238000005507 spraying Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000008569 process Effects 0.000 description 22
- 238000012545 processing Methods 0.000 description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 238000010304 firing Methods 0.000 description 9
- 230000002459 sustained effect Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 230000003068 static effect Effects 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Chemically Coating (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (13)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007101358362A CN100541730C (zh) | 2007-07-16 | 2007-07-16 | 半导体基板表面的化学处理方法及其装置 |
PCT/CN2007/002553 WO2009009931A1 (fr) | 2007-07-16 | 2007-08-23 | Procédé de traitement d'une surface de substrat semi-conducteur et dispositif de traitement chimique pour la surface de substrat semi-conducteur |
AU2007356732A AU2007356732B2 (en) | 2007-07-16 | 2007-08-23 | A method for processing a semiconductor substrate surface and a chemical processing device for the semiconductor substrate surface |
KR1020127009639A KR20120041810A (ko) | 2007-07-16 | 2007-08-23 | 반도체 기판 표면의 화학적 처리 방법 및 이를 위한 장치 |
EA201200923A EA201200923A1 (ru) | 2007-07-16 | 2007-08-23 | Способ химической обработки поверхности полупроводниковой подложки (варианты) |
JP2010516349A JP5032660B2 (ja) | 2007-07-16 | 2007-08-23 | 半導体基板表面に対するケミカル処理方法および装置 |
CA2693135A CA2693135A1 (en) | 2007-07-16 | 2007-08-23 | A method for processing a semiconductor substrate surface and a chemical processing device for the semiconductor substrate surface |
EA201000134A EA018327B1 (ru) | 2007-07-16 | 2007-08-23 | Способ химической обработки поверхностей полупроводников и устройство для его выполнения |
EP07800773A EP2175479A4 (en) | 2007-07-16 | 2007-08-23 | METHOD FOR PROCESSING A SEMICONDUCTOR SUBSTRATE SURFACE AND CHEMICAL PROCESSING DEVICE FOR THE SEMICONDUCTOR SUBSTRATE SURFACE |
KR1020107003401A KR101193229B1 (ko) | 2007-07-16 | 2007-08-23 | 반도체 기판 표면의 화학적 처리 방법 및 이를 위한 장치 |
US12/669,490 US20100307540A1 (en) | 2007-07-16 | 2007-08-23 | Method for processing a semiconductor substrate surface and a chemical processing device for the semiconductor substrate surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007101358362A CN100541730C (zh) | 2007-07-16 | 2007-07-16 | 半导体基板表面的化学处理方法及其装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101256953A true CN101256953A (zh) | 2008-09-03 |
CN100541730C CN100541730C (zh) | 2009-09-16 |
Family
ID=39891614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007101358362A Active CN100541730C (zh) | 2007-07-16 | 2007-07-16 | 半导体基板表面的化学处理方法及其装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US20100307540A1 (zh) |
EP (1) | EP2175479A4 (zh) |
JP (1) | JP5032660B2 (zh) |
KR (2) | KR20120041810A (zh) |
CN (1) | CN100541730C (zh) |
AU (1) | AU2007356732B2 (zh) |
CA (1) | CA2693135A1 (zh) |
EA (2) | EA201200923A1 (zh) |
WO (1) | WO2009009931A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102171798A (zh) * | 2008-09-30 | 2011-08-31 | 肖特太阳能股份公司 | 用于对衬底进行化学处理的方法 |
CN102315092A (zh) * | 2011-09-09 | 2012-01-11 | 深圳市华星光电技术有限公司 | 湿蚀刻装置及方法 |
CN102856238A (zh) * | 2011-06-27 | 2013-01-02 | 均豪精密工业股份有限公司 | 表面处理装置及方法 |
CN102955480A (zh) * | 2011-08-25 | 2013-03-06 | 睿纳有限责任公司 | 用于在连续式设备中进行液体液位调节的方法和装置 |
CN105592944A (zh) * | 2013-07-29 | 2016-05-18 | 贝克太阳能有限公司 | 对基板进行的空间有限的加工 |
CN112239068A (zh) * | 2019-07-19 | 2021-01-19 | 亚智科技股份有限公司 | 条棒式基板运输装置及其方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009050845A1 (de) * | 2009-10-19 | 2011-04-21 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Behandlung einer Substratoberfläche eines Substrats |
JP2011100872A (ja) * | 2009-11-06 | 2011-05-19 | Mitsubishi Electric Corp | 基板表面処理装置、基板処理方法および光起電力装置の製造方法 |
US9269851B2 (en) | 2011-11-15 | 2016-02-23 | Newsouth Innovations Pty Limited | Metal contact scheme for solar cells |
JP2013118209A (ja) * | 2011-12-01 | 2013-06-13 | Tokyo Ohka Kogyo Co Ltd | 基板洗浄装置 |
CN106783669B (zh) * | 2015-11-25 | 2019-04-12 | 无锡华瑛微电子技术有限公司 | 半导体处理装置及方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4519846A (en) * | 1984-03-08 | 1985-05-28 | Seiichiro Aigo | Process for washing and drying a semiconductor element |
JP2513934B2 (ja) * | 1991-03-30 | 1996-07-10 | 株式会社芝浦製作所 | 基板洗浄装置 |
JPH10296200A (ja) * | 1997-04-30 | 1998-11-10 | Shibaura Eng Works Co Ltd | 超音波洗浄方法およびその洗浄装置 |
US6090711A (en) * | 1997-09-30 | 2000-07-18 | Semitool, Inc. | Methods for controlling semiconductor workpiece surface exposure to processing liquids |
JP3159969B2 (ja) * | 1999-06-28 | 2001-04-23 | 三菱マテリアルシリコン株式会社 | 半導体ウェーハの片面エッチング方法およびその装置 |
JP2001319908A (ja) * | 2000-05-01 | 2001-11-16 | Sony Corp | 被処理物のウエット処理方法及びその装置 |
JP4232336B2 (ja) * | 2000-11-22 | 2009-03-04 | 株式会社デンソー | 半導体ウエハの表面処理方法 |
JP2002270998A (ja) * | 2001-03-13 | 2002-09-20 | Matsushita Electric Ind Co Ltd | プリント配線板の製造方法及び製造装置 |
KR20040110391A (ko) * | 2003-06-19 | 2004-12-31 | 삼성전자주식회사 | 기판 처리 장치 |
JP2006073753A (ja) * | 2004-09-01 | 2006-03-16 | Renesas Technology Corp | 基板洗浄装置 |
JP4872199B2 (ja) * | 2004-09-06 | 2012-02-08 | ルネサスエレクトロニクス株式会社 | 半導体製造装置 |
KR100673391B1 (ko) * | 2004-12-01 | 2007-01-24 | 세메스 주식회사 | 기판 세정 장치 |
JP2006196781A (ja) * | 2005-01-14 | 2006-07-27 | Sharp Corp | 基板表面処理装置 |
DE102005062528A1 (de) * | 2005-12-16 | 2007-06-21 | Gebr. Schmid Gmbh & Co. | Vorrichtung und Verfahren zur Oberflächenbehandlung von Substraten |
-
2007
- 2007-07-16 CN CNB2007101358362A patent/CN100541730C/zh active Active
- 2007-08-23 CA CA2693135A patent/CA2693135A1/en not_active Abandoned
- 2007-08-23 WO PCT/CN2007/002553 patent/WO2009009931A1/zh active Application Filing
- 2007-08-23 JP JP2010516349A patent/JP5032660B2/ja not_active Expired - Fee Related
- 2007-08-23 EA EA201200923A patent/EA201200923A1/ru unknown
- 2007-08-23 KR KR1020127009639A patent/KR20120041810A/ko active IP Right Grant
- 2007-08-23 EP EP07800773A patent/EP2175479A4/en not_active Withdrawn
- 2007-08-23 EA EA201000134A patent/EA018327B1/ru not_active IP Right Cessation
- 2007-08-23 AU AU2007356732A patent/AU2007356732B2/en not_active Ceased
- 2007-08-23 KR KR1020107003401A patent/KR101193229B1/ko not_active IP Right Cessation
- 2007-08-23 US US12/669,490 patent/US20100307540A1/en not_active Abandoned
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102171798A (zh) * | 2008-09-30 | 2011-08-31 | 肖特太阳能股份公司 | 用于对衬底进行化学处理的方法 |
CN102171798B (zh) * | 2008-09-30 | 2013-09-18 | 肖特太阳能股份公司 | 用于对衬底进行化学处理的方法 |
CN102856238A (zh) * | 2011-06-27 | 2013-01-02 | 均豪精密工业股份有限公司 | 表面处理装置及方法 |
CN102955480A (zh) * | 2011-08-25 | 2013-03-06 | 睿纳有限责任公司 | 用于在连续式设备中进行液体液位调节的方法和装置 |
CN102315092A (zh) * | 2011-09-09 | 2012-01-11 | 深圳市华星光电技术有限公司 | 湿蚀刻装置及方法 |
CN105592944A (zh) * | 2013-07-29 | 2016-05-18 | 贝克太阳能有限公司 | 对基板进行的空间有限的加工 |
CN112239068A (zh) * | 2019-07-19 | 2021-01-19 | 亚智科技股份有限公司 | 条棒式基板运输装置及其方法 |
Also Published As
Publication number | Publication date |
---|---|
EA201000134A1 (ru) | 2010-06-30 |
KR20120041810A (ko) | 2012-05-02 |
KR101193229B1 (ko) | 2012-10-19 |
EP2175479A1 (en) | 2010-04-14 |
AU2007356732B2 (en) | 2012-07-12 |
CA2693135A1 (en) | 2009-01-22 |
EA201200923A1 (ru) | 2013-03-29 |
EP2175479A4 (en) | 2012-01-18 |
KR20100043237A (ko) | 2010-04-28 |
CN100541730C (zh) | 2009-09-16 |
EA018327B1 (ru) | 2013-07-30 |
JP5032660B2 (ja) | 2012-09-26 |
AU2007356732A1 (en) | 2009-01-22 |
JP2010533967A (ja) | 2010-10-28 |
US20100307540A1 (en) | 2010-12-09 |
WO2009009931A1 (fr) | 2009-01-22 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Wuxi Shangde Solar Electric Power Co., Ltd. Assignor: Suntech Solar Energy Power Co., Ltd. Contract record no.: 2010990000855 Denomination of invention: Semiconductor substrate surface chemical processing method apparatus Granted publication date: 20090916 License type: Exclusive License Open date: 20080903 Record date: 20101025 |
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EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Suntech Solar Energy Power Co., Ltd. Assignor: Wuxi Shangde Solar Electric Power Co., Ltd. Contract record no.: 2010990000855 Denomination of invention: Semiconductor substrate surface chemical processing method apparatus Granted publication date: 20090916 License type: Exclusive License Open date: 20080903 Record date: 20101025 |
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