CN101214484B - 基板清洗装置 - Google Patents
基板清洗装置 Download PDFInfo
- Publication number
- CN101214484B CN101214484B CN2007101947371A CN200710194737A CN101214484B CN 101214484 B CN101214484 B CN 101214484B CN 2007101947371 A CN2007101947371 A CN 2007101947371A CN 200710194737 A CN200710194737 A CN 200710194737A CN 101214484 B CN101214484 B CN 101214484B
- Authority
- CN
- China
- Prior art keywords
- gas
- cleaning
- stream
- channel unit
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Nozzles (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0001068 | 2007-01-04 | ||
KR1020070001068A KR100783763B1 (ko) | 2007-01-04 | 2007-01-04 | 기판 세정장치 |
KR1020070001068 | 2007-01-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101214484A CN101214484A (zh) | 2008-07-09 |
CN101214484B true CN101214484B (zh) | 2010-08-18 |
Family
ID=39140249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101947371A Expired - Fee Related CN101214484B (zh) | 2007-01-04 | 2007-11-29 | 基板清洗装置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100783763B1 (zh) |
CN (1) | CN101214484B (zh) |
TW (1) | TWI361457B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101229775B1 (ko) * | 2008-12-26 | 2013-02-06 | 엘지디스플레이 주식회사 | 기판 세정장치 |
KR101825231B1 (ko) * | 2009-11-03 | 2018-02-02 | 아라까와 가가꾸 고교 가부시끼가이샤 | 전자 부품의 세정 장치 및 세정 방법 |
CN105081930B (zh) * | 2015-08-12 | 2017-05-17 | 京东方科技集团股份有限公司 | 面板抛光装置和面板清洁设备 |
KR101966648B1 (ko) * | 2016-09-05 | 2019-08-14 | 주식회사 디엠에스 | 기판세정장치 |
CN106623189A (zh) * | 2016-12-19 | 2017-05-10 | 武汉华星光电技术有限公司 | 基板清洗设备 |
KR101833745B1 (ko) * | 2017-09-01 | 2018-03-02 | 류병길 | 다종의 디스플레이 패널을 위한 세정 장치, 이를 위한 혼합배출관 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100390661B1 (ko) * | 2001-07-19 | 2003-07-07 | (주)케이.씨.텍 | 유체분사장치 및 이를 갖는 세정장치 |
TW561072B (en) * | 2001-10-15 | 2003-11-11 | Soshio Kk | Cleaning nozzle |
US7018481B2 (en) | 2002-01-28 | 2006-03-28 | Kabushiki Kaisha Toshiba | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
KR100591475B1 (ko) | 2004-03-23 | 2006-06-20 | 주식회사 디엠에스 | 평판디스플레이용 세정장치 |
-
2007
- 2007-01-04 KR KR1020070001068A patent/KR100783763B1/ko not_active IP Right Cessation
- 2007-11-19 TW TW096143660A patent/TWI361457B/zh not_active IP Right Cessation
- 2007-11-29 CN CN2007101947371A patent/CN101214484B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100783763B1 (ko) | 2007-12-07 |
CN101214484A (zh) | 2008-07-09 |
TW200830399A (en) | 2008-07-16 |
TWI361457B (en) | 2012-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140226 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140226 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100818 Termination date: 20201129 |