TW561072B - Cleaning nozzle - Google Patents

Cleaning nozzle Download PDF

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Publication number
TW561072B
TW561072B TW091120336A TW91120336A TW561072B TW 561072 B TW561072 B TW 561072B TW 091120336 A TW091120336 A TW 091120336A TW 91120336 A TW91120336 A TW 91120336A TW 561072 B TW561072 B TW 561072B
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TW
Taiwan
Prior art keywords
cleaning
cleaning liquid
liquid
gas
port
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Application number
TW091120336A
Other languages
Chinese (zh)
Inventor
Shuichi Suehiro
Haruo Arashi
Original Assignee
Soshio Kk
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Publication date
Application filed by Soshio Kk filed Critical Soshio Kk
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Publication of TW561072B publication Critical patent/TW561072B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/20Arrangements for agitating the material to be sprayed, e.g. for stirring, mixing or homogenising
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0483Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/14Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas designed for spraying particulate materials
    • B05B7/1481Spray pistols or apparatus for discharging particulate material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Nozzles (AREA)

Abstract

This invention is to provide a cleaning nozzle with which gaseous fine particles contained in a jetted cleaning liquid are made small sized, have high density and are uniformized. This cleaning nozzle possesses a stirring section having at least a cleaning liquid supply port and a liquid discharge port and a mixing section communicating with the stirring section through the liquid discharge port and having a gas supply port and a cleaning liquid jetting port. In the stirring section, the cleaning liquid supplied from the cleaning liquid supply port is stirred and collides with the inside wall of the stirring section to produce the gaseous fine particles and the liquid containing the gaseous fine particles is discharged from the liquid discharge port. In the mixing section, the liquid supplied from the liquid discharge port and containing the gaseous fine particles is mixed with gas supplied from the gas supply port and jetted from the cleaning liquid jetting port.

Description

561072 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(彳) 【發明所屬的技術領域】 本發明是關於適合用來淸洗平板顯示器、半導體相關 零件、及光相關零件等的精密零件的洗淨用噴嘴。 【習知技術】 在平板顯示器、半導體相關零件、及光相關零件等的 精密零件的淸洗方面,需要完全地去除細微的灰塵、及微 粒等。例如,在平板顯示器、半導體相關零件等方面,近 年來,由於高積集化、高密度化的進步,所以這些精密零 件的洗淨,會將亞微米程度的微粒子作爲去除對象。而對 於這種精密零件的洗淨,也要求要不會損傷到具有細微的 圖案等的精密零件的表面。因此,藉由使用高壓洗淨用噴 嘴將洗淨液與氣體混合,讓洗淨液成爲細微的粒子,藉由 將已微粒化的洗淨液噴射到被洗淨物來將其洗淨,或藉由 使用刷子刷洗表面來將其洗淨。 第5圖是顯示使用於這種洗淨過程的洗淨用噴嘴的一 個例子的說明圖。在該洗淨用噴嘴5 0,在其內部是設置 有用來混合洗淨液與氣體的混合室2。在混合室2,是設 置有:洗淨液供給口 3、氣體供給口 5、及洗淨液噴出口 6。在淸洗時,會從洗淨液供給口 3供給溶劑、淸洗劑、 純水等的洗淨液,從氣體供給口 5供給壓縮空氣等的氣體 。藉由氣體的供給壓力讓洗淨液與氣體在混合室2的內部 混合且微粒子化。而且,藉由將微粒子化的洗淨液從洗淨 液噴出口 6噴射到洗淨對象,來淸洗洗淨對象物。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) — " -4- (請先閲讀背面之注意事項再填寫本頁)561072 Printed A7 B7 by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention (彳) [Technical Field to which the Invention belongs] The present invention relates to precision for cleaning flat panel displays, semiconductor-related parts, and light-related parts. Nozzle for cleaning parts. [Know-how] For the cleaning of precision parts such as flat panel displays, semiconductor-related parts, and light-related parts, it is necessary to completely remove fine dust and particles. For example, in the fields of flat panel displays and semiconductor-related parts, in recent years, due to the advancement of higher accumulation and higher density, the cleaning of these precision parts will remove submicron-level particles. In order to clean such precision parts, it is required that the surfaces of the precision parts with fine patterns and the like not be damaged. Therefore, the cleaning liquid is mixed with the gas by using a high-pressure cleaning nozzle, so that the cleaning liquid becomes fine particles, and the micronized cleaning liquid is sprayed onto the object to be cleaned, or Wash the surface by brushing it with a brush. Fig. 5 is an explanatory view showing an example of a cleaning nozzle used in such a cleaning process. The cleaning nozzle 50 is provided with a mixing chamber 2 for mixing a cleaning liquid and a gas therein. The mixing chamber 2 is provided with a cleaning liquid supply port 3, a gas supply port 5, and a cleaning liquid ejection port 6. During rinsing, a cleaning liquid such as a solvent, a cleaning agent, and pure water is supplied from the cleaning liquid supply port 3, and a gas such as compressed air is supplied from the gas supply port 5. The cleaning liquid and the gas are mixed in the mixing chamber 2 by the supply pressure of the gas, and the particles are made into particles. The micronized washing liquid is sprayed onto the washing target from the washing liquid discharge port 6 to wash the washing target. This paper size applies to China National Standard (CNS) A4 (210X297 mm) — " -4- (Please read the precautions on the back before filling this page)

561072 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(2 ) 【發明欲解決的課題】 可是,這種洗淨用噴嘴對於近年.來高積集化的精密零 件的淸洗有一些缺點。也就是說,這種洗淨用噴嘴,用來 將洗淨液微粒子化然後將其噴射出去的大部分的動力是依 賴液體或氣體的供給壓力。因此,爲了要將洗淨液微粒子 化成非常細微的尺寸,而以需要的噴出壓力噴出,而需要 非常高的液體或氣體的供給壓力。因此,需要8 0 k g以 上的高壓泵浦,而可能會導致淸洗作業的高成本化。 在如上述的洗淨噴嘴,會有所噴射的洗淨液的微粒的 尺寸太大,微粒的密度不夠,且噴射的洗淨液的微粒不均 勻這樣的缺點。因此,在要淸洗近年來高積集化的精密零 件的時候,就無法完全去除附著在細微的圖案上的亞微米 程度尺寸的灰塵或微粒,而無法得到所需要的洗淨效果。 而在爲了要得到足夠的洗淨效果,而將氣體的供給壓力更 增大的情況,有可能會對精密零件的細微的圖案造成損傷 。而提高氣體的供給壓力的話,會浪費額外的淸洗液,而 讓洗淨成本過高。 而除了噴嘴以外,使用刷子來洗淨表面也會有缺點, 刷子中的微粒的殘渣會傷到表面。而低頻的超音波雖然可 除去微米以上的髒東西,用高頻可除去亞微米的髒東西, 可是會有損傷到洗淨物,且讓超音波震動器、震動頭造成 損傷,且成本變高的缺點。 本發明的目的,就是要改善上述傳統的洗淨用噴嘴所 具有的缺點,能讓噴射出的洗淨液所含有的氣體微粒的尺 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁)561072 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (2) [Questions to be solved by the invention] However, this cleaning nozzle has been used for the cleaning of high-precision precision parts in recent years. Some disadvantages. In other words, most of the motive power for this cleaning nozzle to atomize the cleaning solution and spray it out depends on the supply pressure of liquid or gas. Therefore, in order to reduce the fine particles of the washing liquid to a very fine size, the liquid is ejected at a required discharge pressure, and a very high supply pressure of liquid or gas is required. Therefore, a high-pressure pump of 80 kg or more is required, which may increase the cost of the cleaning operation. In the cleaning nozzle as described above, there are disadvantages that the size of the particles of the sprayed cleaning solution is too large, the density of the particles is insufficient, and the particles of the sprayed cleaning solution are not uniform. Therefore, when cleaning high-precision precision parts in recent years, it is impossible to completely remove submicron-sized dust or particles adhering to fine patterns, and the desired cleaning effect cannot be obtained. In order to obtain a sufficient cleaning effect, if the supply pressure of the gas is further increased, the fine patterns of precision parts may be damaged. Increasing the supply pressure of the gas will waste additional cleaning solution and make the cleaning cost too high. In addition to the nozzle, there are disadvantages to using a brush to clean the surface, and the residue of particles in the brush can hurt the surface. Although the low-frequency ultrasonic waves can remove the dirt of more than micrometers, and the high-frequency waves can remove the sub-micrometers of dirt, it will damage the washings, and cause damage to the ultrasonic vibrator and vibrating head, and the cost will increase Shortcomings. The purpose of the present invention is to improve the shortcomings of the above-mentioned conventional cleaning nozzles, so that the size and paper size of the gas particles contained in the sprayed cleaning liquid can be adapted to the Chinese National Standard (CNS) A4 (210X297) Li) (Please read the notes on the back before filling in this page)

-5- 經濟部智慧財產局員工消費合作社印製 561072 A7 _;_ B7 五、發明説明(3 ) 寸較小,讓微粒的量很大且很均勻。 【用以解決課題的手段】 用以解決上述課題的本發明,是洗淨用噴嘴,其特徵 爲:是具備有:至少具有洗淨液供給口與液體排出口的攪 拌室、以及藉由上述液體排出口與該攪拌室連通,且具有 氣體供給口與洗淨液噴出口的混合室;上述攪拌室,會將 從上述洗淨液供給口所供給的洗淨液加以攪拌,藉由使其 衝撞攪拌室內壁來生成氣體微粒,而將含有氣體微粒的液 體從上述液體排出口排出;上述混合室,會將從上述液體 排出口所供給的含有氣體微粒的液體與從氣體供給口所供 給的氣體加以混合,來從上述洗淨液噴出口將洗淨液噴出 〇 藉由具備有能攪拌洗淨液來生成氣體微粒的攪拌室, 即使氣體的供給壓力低於以往的洗淨噴嘴,還是可將洗淨 液中的氣體微粒化至非常細微的尺寸大小,能以所需要的 噴射壓力供給到被洗淨物。而由於最初是將洗淨液中的氣 體在攪拌室中微粒子化,所以所生成的洗淨液的氣體的微 粒子,與以往的相比其尺寸大小是更細微且密度高且很均 勻,也提昇了洗淨效果。於是,就可均勻且高精度地洗淨 具有細微的精密圖案的零件、元件等。並且由於洗淨液中 的氣體微粒是較以往更細微的尺寸大小,所以不會損傷到 精密零件的表面,也不會浪費額外的洗淨液。 在這種情況,上述攪拌室是藉由具有開口部的隔板而 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)-5- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 _; _ B7 V. Description of the invention (3) The size is small, which makes the amount of particles large and uniform. [Means for solving the problems] The present invention for solving the above problems is a cleaning nozzle, which is characterized by comprising a stirring chamber having at least a cleaning liquid supply port and a liquid discharge port, and the above The liquid discharge port communicates with the stirring chamber, and has a mixing chamber having a gas supply port and a washing liquid ejection port; the stirring chamber stirs the washing liquid supplied from the washing liquid supply port, and makes it Gas particles are collided by collision with the inner wall of the agitation chamber, and the liquid containing the gas particles is discharged from the liquid discharge port. The mixing chamber discharges the liquid containing the gas particles supplied from the liquid discharge port and the liquid supplied from the gas supply port. The gas is mixed to spray the cleaning liquid from the cleaning liquid ejection port. By having a stirring chamber capable of agitating the cleaning liquid to generate gas particles, the gas can be supplied even if the supply pressure of the gas is lower than the conventional cleaning nozzle. The gas in the cleaning solution is atomized to a very fine size and can be supplied to the object to be cleaned at a required spray pressure. In the beginning, the gas in the cleaning solution was micronized in the stirring chamber. Therefore, the particle size of the generated gas in the cleaning solution is finer, denser and more uniform than in the past. Wash effect. As a result, parts, components, etc. having a fine precision pattern can be cleaned uniformly and with high accuracy. In addition, since the gas particles in the cleaning liquid are smaller in size than in the past, the surface of precision parts will not be damaged, and additional cleaning liquid will not be wasted. In this case, the agitating chamber mentioned above has a partition with an opening. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page)

-6- 561072 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(4 ) 被分割成複數段較佳。 藉由將攪拌室分割成複數段,則可更提升將洗淨液中 的氣體予以微粒化的效率,且可以在噴出口將含有微小的 尺寸的氣體微粒的洗淨液噴射向被洗淨物。 上述洗淨液噴出口及液體排出口和開口部是細縫狀較 佳。 上述洗淨液噴出口及液體排出口和開口部是細縫狀的 話,洗淨液就會從洗淨液噴出口均勻地噴出,同時可均勻 地淸洗較廣大的範圍。因此,特別適合於平板狀顯示器等 的基板狀的被洗淨物的淸洗。 在這種情況,上述洗淨液噴出口及液體排出口和開口 部,依照從上述攪拌室的上流段至混合室的洗淨液噴出口 的順序,其開口面積越來、越小 這樣一來,藉由把微粒子化的洗淨液所通過的開口部 隨著從上流側到下流側也就是從攪拌室的上流段到混合室 的洗淨液噴出口是作成讓面積越來越小,而能有效率地生 成微小的氣體微粒,能以足夠的排出壓力將洗淨液供給到 被洗淨物。 上述混合室是具有複數的氣體供給口,是將從該氣體 供給口所供給的複數種類的氣體、與從上述氣體放出口所 供給的含有氣體微粒的液體加以混合,而將洗淨液從上述 洗淨液噴出口噴出。 藉由在混合室設置複數的氣體供給口,則可以使複數 種的氣體與含有氣體微粒的液體混合,而因應洗淨目的, 本紙張尺度適用中國國家標準(CNS ) A4規格(210X29?公釐) ' ' (請先閱讀背面之注意事項再填寫本頁)-6- 561072 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy V. Invention Description (4) It is better to be divided into plural segments. By dividing the stirring chamber into a plurality of sections, the efficiency of atomizing the gas in the cleaning liquid can be further improved, and the cleaning liquid containing minute gas particles can be sprayed toward the object to be cleaned at the ejection port. . It is preferable that the cleaning liquid ejection outlet, the liquid discharge outlet, and the opening are slit-shaped. If the above-mentioned cleaning liquid ejection outlet and the liquid discharge outlet and the opening are slit-shaped, the cleaning liquid will be uniformly ejected from the cleaning liquid ejection outlet, and at the same time, a relatively wide range can be cleaned. Therefore, it is particularly suitable for cleaning substrate-like objects to be cleaned, such as flat-panel displays. In this case, the opening area of the cleaning liquid ejection outlet, the liquid discharge outlet, and the opening portion in the order from the upper stage of the stirring chamber to the cleaning liquid ejection outlet of the mixing chamber becomes smaller and smaller. As the opening through which the micronized cleaning solution passes is made from the upstream side to the downstream side, that is, the cleaning liquid ejection outlet from the upper section of the stirring chamber to the mixing chamber, the area is made smaller and smaller, and It can efficiently generate minute gas particles, and can supply the cleaning liquid to the object to be cleaned at a sufficient discharge pressure. The mixing chamber is provided with a plurality of gas supply ports, and a plurality of types of gases supplied from the gas supply port are mixed with a liquid containing gas particles supplied from the gas discharge port, and the cleaning liquid is removed from the above. The cleaning liquid is sprayed out. By providing a plurality of gas supply ports in the mixing chamber, a plurality of gases can be mixed with a liquid containing gas particles, and according to the purpose of cleaning, this paper size applies the Chinese National Standard (CNS) A4 specification (210X29? ) '' (Please read the notes on the back before filling this page)

561072 經濟部智慧財產局員工消費合作社印製 A7 ____B7五、發明説明(5 ) 來將所需要的混合氣體用於洗淨過程。 在這種情況,上述混合室是具有單數或複數的固體供 給口,是可將從該固體供給口所供給的一種或複數種類的 固體、與從上述液體放出口所供給的含有氣體微粒的液體 加以混合,而將洗淨液從上述洗淨液噴出口噴出。 藉由在混合室設置固體供給口,則可因應目的將所需 要的固體混合在洗淨液。因此,例如將合成樹脂製的微小 粒狀物、粉狀物等混合在洗淨液中,就可因應需要將洗淨 力強化。而固體供給口也可以用氣體及液體來進行固體供 給。 上述洗淨液供給口、氣體供給口、與固體供給口,可 以供給施加了波動的洗淨液、氣體及固體。 藉由供給施加了波動的洗淨液、氣體及固體,則可以 利用這些波動的相互作用來提高洗淨效果。 【發明實施型態】 接下來參照圖面來說明本發明的實施型態,可是本發 明並不限定於此。 第1圖是顯示本發明的洗淨用噴嘴的其中一個例子的 說明圖。在本發明的洗淨用噴嘴1 0的內部,是設置有攪 拌室1與混合室2的兩個空間。攪拌室1,是具有洗淨液 供給口 3與細縫狀的洗淨液噴出口 6,是藉由液體排出口 4而與攪拌室1連通在一起。與液體排出口 4相比洗淨液 噴出口 6的面積較小。可是有時候洗淨液噴出口 6的面積 本纸張尺度適用中國國家標準(CNS ) A4規格(210X297公釐1 (請先閱讀背面之注意事項再填寫本頁)561072 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ____B7 V. Invention Description (5) Use the required mixed gas for the cleaning process. In this case, the mixing chamber is a singular or plural solid supply port, and is one or plural kinds of solids that can be supplied from the solid supply port, and a liquid containing gas particles supplied from the liquid discharge port. They are mixed and the cleaning liquid is ejected from the cleaning liquid ejection port. By providing a solids supply port in the mixing chamber, the required solids can be mixed with the washing liquid according to the purpose. Therefore, if, for example, fine particles, powders, or the like made of synthetic resin are mixed in a cleaning solution, the cleaning power can be enhanced as necessary. The solid supply port can also be used to supply solids with gas or liquid. The cleaning liquid supply port, gas supply port, and solid supply port can supply the cleaning liquid, gas, and solid to which fluctuations are applied. By supplying the cleaning liquid, gas, and solid to which fluctuations are applied, the interaction of these fluctuations can be used to improve the cleaning effect. [Inventive embodiment] Next, an embodiment of the present invention will be described with reference to the drawings, but the present invention is not limited to this. Fig. 1 is an explanatory view showing an example of a cleaning nozzle of the present invention. Inside the cleaning nozzle 10 of the present invention, there are two spaces in which a stirring chamber 1 and a mixing chamber 2 are provided. The stirring chamber 1 is provided with a washing liquid supply port 3 and a slit-shaped washing liquid discharge port 6 and communicates with the stirring chamber 1 through a liquid discharge port 4. The area of the cleaning liquid discharge port 6 is smaller than that of the liquid discharge port 4. However, sometimes the area of the cleaning liquid ejection outlet 6 is the size of this paper applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm 1 (please read the precautions on the back before filling this page)

-8- 經濟部智慧財產局員工消費合作社印製 561072 A7 B7_^_ 五、發明説明(6 ) 也會比液體排出口 4的面積要更大。 本發明的洗淨噴嘴1 〇的特徵’是除了在第5圖所示 的以往的洗淨噴嘴5 0所設置的混合室2之外’還另外設 置有能攪拌洗淨液來將其氣體微粒化的攪泮室1 ° 以往的洗淨用噴嘴,如第5圖所示’是在混合室2將 直接供給的洗淨液與氣體混合,所以在混合室2內所生成 的洗淨液中的氣體微粒的尺寸,是根據從氣體供給口 5所 供給的氣體的供給壓力,其尺寸比較大,會生成不均勻的 氣體微粒。因此,爲了要得到滿足需求的更小尺寸的氣體 微粒,需要非常大的氣體供給壓力。 另一方面,在本發明的洗淨用噴嘴中,如第1圖所示 ,首先在攪拌室1,是藉由將從洗淨液供給口 3所供給的 洗淨液加以攪拌使其衝撞攪拌室1的內壁來生成氣體微粒 。以2 0 0 L /m i η程度的流量從洗淨液供給口 3所供 給的洗淨液,會在攪拌室1內被攪拌,會衝撞其內壁而被 打亂。打亂了的洗淨液,會與溶在洗淨液中的氣體與當初 存在於攪拌室1內的空氣等一起在攪拌室1內攪拌混合, 而產生氣體微粒。含有該氣體微粒的液體,會被輸送到從 細縫狀的液體排出口 4連通的混合室2。 在混合室2中,是將含有該氣體微粒的液體與從氣體 供給口 5所供給的氣體混合,從細縫狀的洗淨液噴出口 6 與氣體混合而成爲洗淨液噴出。在本發明的洗淨用噴嘴 1 0,在混合室的前段的攪拌室1,洗淨液已經被氣體微 粒子化了。因此,不會像以往的洗淨用噴嘴,僅藉由專門 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ:Ζ97公釐) (請先閱讀背面之注意事項再填寫本頁)-8- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 B7 _ ^ _ 5. The description of the invention (6) will also be larger than the area of the liquid discharge port 4. The feature of the cleaning nozzle 10 of the present invention is that “apart from the mixing chamber 2 provided in the conventional cleaning nozzle 50 shown in FIG. 5”, a cleaning liquid can be stirred to separate the gas particles. As shown in Fig. 5, the conventional cleaning nozzle is mixed with the cleaning liquid directly supplied with the gas in the mixing chamber 2. Therefore, in the cleaning liquid generated in the mixing chamber 2, The size of the gas particles is based on the supply pressure of the gas supplied from the gas supply port 5, and its size is relatively large, and uneven gas particles are generated. Therefore, in order to obtain smaller-sized gas particles that meet the demand, a very large gas supply pressure is required. On the other hand, in the cleaning nozzle of the present invention, as shown in FIG. 1, first, in the stirring chamber 1, the cleaning liquid supplied from the cleaning liquid supply port 3 is stirred to cause collision. The inner wall of the chamber 1 generates gas particles. The cleaning liquid supplied from the cleaning liquid supply port 3 at a flow rate of about 200 L / m i η is stirred in the stirring chamber 1 and may collide with the inner wall and be disturbed. The scrambled washing liquid is stirred and mixed in the stirring chamber 1 together with the gas dissolved in the washing solution and the air and the like existing in the stirring chamber 1 to generate gas particles. The liquid containing the gas particles is sent to the mixing chamber 2 which is communicated from the slit-shaped liquid discharge port 4. In the mixing chamber 2, the liquid containing the gas fine particles is mixed with the gas supplied from the gas supply port 5, and is mixed with the gas from the slit-shaped washing liquid discharge port 6 to be discharged as a washing liquid. In the cleaning nozzle 10 of the present invention, in the stirring chamber 1 at the front stage of the mixing chamber, the cleaning liquid has been micronized by the gas. Therefore, unlike the conventional cleaning nozzles, only the paper size applies the Chinese National Standard (CNS) A4 specification (210 ×: Z97 mm) (please read the precautions on the back before filling this page)

-9- 561072 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明(7 ) 供給的氣體的壓力來將洗淨液微粒子化,就不需要過度提 高所供給的氣體的壓力。並且,由於是將已含有氣體微粒 的洗淨液與氣體混合將其供給到洗淨對象物,所以洗淨液 會成爲均勻的氣體混合液體,其微粒子的大小可以比以往 更細微。因此,能夠以高洗淨效率淸洗,可以防止對被洗 淨物造成損傷。而由於可以減小所供給的氣體的壓力,所 以可以減少使用的洗淨液的流量,能夠減低洗淨成本。 在第1圖所示的洗淨用噴嘴1 0,雖然是設置有兩個 氣體供給口 5,而並不是一定要供給同一種類的氣體,可 因應實際的使用目的,例如,從其中一方的氣體供給口供 給壓縮空氣,從另一方的氣體供給口供給其他的氣體(二 氧化碳)等,將兩者與從液體排出口 4所供給的含有氣體 微粒的液體混合在一起,然後將其從洗淨液噴出口 6噴出 。而所供給的氣體也可以從相同的供給口供給來作爲混合 氣體(例如空氣與二氧化碳等)。或者,設置另外的氣體 供給口,並且也可以供給複數種類的氣體來混合使用。 洗淨液是從細縫狀的洗淨液噴出口 6噴出,而被供給 到被洗淨物。洗淨液噴出口 6,由於具有細縫狀,所以即 使在淸洗平板顯示器、半導體相關零件等的基板形狀的物 件的時候,可以均勻地淸洗很大的範圍。當洗淨液到達被 洗淨物時,含有氣體微粒的洗淨液中的氣體在被洗淨物表 面被壓潰,同時產生微弱的超音波,可以有效率地去除附 著在表面的微粒、髒東西,不會對精密的圖案造成損傷。 第2圖是本發明的洗淨用噴嘴的其他型態的顯示圖。 本銀「張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) (請先閲讀背面之注意事項再填寫本頁)-9- 561072 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (7) The pressure of the supplied gas is used to atomize the cleaning solution, so there is no need to excessively increase the pressure of the supplied gas. In addition, since the cleaning liquid containing gas particles is mixed with the gas and supplied to the object to be cleaned, the cleaning liquid becomes a uniform gas mixed liquid, and the size of the particles can be made finer than before. Therefore, it is possible to rinse with high washing efficiency, and to prevent damage to the object to be cleaned. Since the pressure of the supplied gas can be reduced, the flow rate of the cleaning liquid used can be reduced, and the cleaning cost can be reduced. Although the cleaning nozzle 10 shown in FIG. 1 is provided with two gas supply ports 5, it is not necessary to supply the same type of gas, and it can be used according to the actual use purpose, for example, from one of the gases The supply port supplies compressed air, and the other gas (carbon dioxide) is supplied from the other gas supply port. The two are mixed with the liquid containing the gas particles supplied from the liquid discharge port 4 and then they are removed from the washing liquid. The ejection port 6 ejects. The supplied gas can also be supplied from the same supply port as a mixed gas (for example, air and carbon dioxide). Alternatively, another gas supply port is provided, and plural kinds of gases may be supplied for mixing and use. The cleaning liquid is discharged from the slit-shaped cleaning liquid discharge port 6 and is supplied to the object to be cleaned. The cleaning liquid discharge port 6 has a slit shape, so that even when cleaning substrate-shaped objects such as flat panel displays and semiconductor-related parts, a wide range can be cleaned uniformly. When the cleaning solution reaches the object to be cleaned, the gas in the cleaning solution containing gas particles is crushed on the surface of the object to be cleaned, and a weak ultrasonic wave is generated at the same time, which can effectively remove the particles and dirt attached to the surface. Things will not cause damage to delicate patterns. Fig. 2 is a view showing another form of the cleaning nozzle of the present invention. The Bank's "Zhang scale is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) (Please read the precautions on the back before filling out this page)

-10- 經濟部智慧財產局員工消費合作社印製 561072 A7 B7 五、發明説明(8 ) 在該型態中,攪拌室1是藉由具有開口部8的隔板7而被 分割成複數段。洗淨液噴出口 6及液體排出口 4,與第1 圖的洗淨用噴嘴1 0同樣的是作成細縫狀,且是作成與開 口部8同樣的細縫狀。而開口部8、液體排出口 4、及洗 淨液噴出口 6,最好是作成從攪拌室1的最下段(上流段 )到混合室2的洗淨液噴出口 6是讓開口面積越來越小。 在藉由該洗淨用噴嘴2 0來進行淸洗時,首先,是從 洗淨液供給口 3把洗淨液供給到用隔板7所分割的攪拌室 1的下段側,與第1圖的洗淨用噴嘴同樣的,是藉由擾·拌 洗淨液使其衝撞下段側的攪拌室1的內壁來生成氣體微粒 。含有該氣體微粒的液體是從隔板7的開口部8移向攪拌 室1的上段側,在這裡也是反覆進行與下段側相同的攪拌 、衝撞動作。在該攪拌室1的上段側,會再使已經在下段 側含有氣體微粒的洗淨液進行攪拌、衝撞,而得到成爲更 細微的粒子的洗淨液。將含有這種更細微的氣體微粒的液 體從較開口部8更小的細縫狀的液體排出口 4排出,讓其 與混合室2內的氣體混合,將其朝向被洗淨物噴出。 在該第2圖的型態中,雖然攪拌室1是藉由一個隔板 7被分割成兩段,也可以藉由設置複數的隔板7,來將攪 拌室分割成更多段。即使在這種情況,開口部8從上段到 下段作成讓其面積越來越小較佳,就可以將洗淨液有效率 地與氣體微粒混合而噴出。 第3圖是顯示本發明的洗淨用噴嘴的其他型態的說明 圖。在該型態中,在混合室2是設置有固體供給口 9。當 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐] (請先閲讀背面之注意事項再填寫本頁)-10- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 B7 V. Description of the Invention (8) In this type, the stirring chamber 1 is divided into a plurality of sections by a partition plate 7 having an opening 8. The cleaning liquid ejection port 6 and the liquid discharge port 4 are formed in the same slit shape as the cleaning nozzle 10 in Fig. 1, and are formed in the same slit shape as the opening portion 8. The opening 8, the liquid discharge port 4, and the cleaning liquid ejection port 6 are preferably formed from the lowermost stage (upstream section) of the stirring chamber 1 to the cleaning liquid ejection port 6 of the mixing chamber 2 so that the opening area increases. The smaller. When washing with the cleaning nozzle 20, first, the cleaning liquid is supplied from the cleaning liquid supply port 3 to the lower side of the stirring chamber 1 divided by the partition plate 7, as shown in FIG. In the same manner, the cleaning nozzle is made by disturbing and agitating the cleaning liquid and colliding with the inner wall of the stirring chamber 1 on the lower side to generate gas particles. The liquid containing the gas particles is moved from the opening portion 8 of the partition plate 7 to the upper stage side of the stirring chamber 1, and the same stirring and collision operations as the lower stage side are performed repeatedly here. On the upper side of the stirring chamber 1, the cleaning liquid that already contains gas particles on the lower side is stirred and collided to obtain a cleaning liquid that becomes finer particles. The liquid containing such finer gas particles is discharged from the slit-shaped liquid discharge port 4 which is smaller than the opening 8 and is mixed with the gas in the mixing chamber 2 to be ejected toward the object to be cleaned. In the form of the second figure, although the stirring chamber 1 is divided into two sections by one partition plate 7, a plurality of partition plates 7 may be provided to divide the mixing chamber into more sections. Even in this case, it is preferable that the opening portion 8 is made smaller and smaller from the upper portion to the lower portion, so that the cleaning liquid can be efficiently mixed with the gas particles and sprayed. Fig. 3 is an explanatory view showing another form of the cleaning nozzle of the present invention. In this mode, a solid supply port 9 is provided in the mixing chamber 2. When this paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page)

-11 - 經濟部智慧財產局員工消費合作社印製 561072 A7 B7 五、發明説明(9 ) 進行淸洗時,會因應被洗淨物的狀態、洗淨目的等從該固 體供給口 9把粒狀或粉狀的固體等供給到混合室2內。藉 此,例如在想要強化洗淨力時,則將粉狀合成樹脂等混入 到洗淨液中,則可以強化洗淨力。或者,分別將其他氣體 或固體供給到複數的氣體供給口及固體供給口,也可以混 合使用。固體與氣體可以分別從個別的供給口供給,也可 以預先將其混合,再將其供給到混合室2。 供給到本發明的洗淨用噴嘴的洗淨液、氣體、及固體 並不一定要用定壓來供給。例如,使用間歇泵浦等一邊給 予波動一邊供給洗淨液,從氣體供給口所供給的氣體也一 邊給予波動一邊供給,利用這些波動的相互作用則可以提 高洗淨效果。 第4圖是顯示本發明的洗淨用噴嘴的其他例子的說明 圖。在該型態中,是在混合室2的內部設置有攪拌室1的 構造。在該洗淨用噴嘴40,是與前述的第1圖〜第3圖 的洗淨用噴嘴同樣的,從洗淨液供給口 3供給到混合室2 內的攪拌室1的洗淨液,在攪拌室1內會成爲含有氣體微 粒的液體,含有該氣體微粒的液體會從噴嘴狀的液體排出 口 4被排出到混合室2,會與從氣體供給口 5所供給的氣 體混合,而從洗淨液噴出口 6噴出。 本發明並不限定於上述實施型態。上述實施型態如例 子所示,具有實質上與本發明的申請專利範圍所記載的技 術思想相同的構造,能達到同樣的作用效果的構造,不管 怎樣都包含在本發明的技術範圍。 本紙張尺度適用中國國家標準(CMS ) A4規格(210X297公釐) (.請先閲讀背面之注意事項再填寫本頁)-11-Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 B7 V. Description of the invention (9) When washing, the granules will be granulated from the solid supply port according to the state of the object to be washed and the purpose of cleaning. Or powdery solids are supplied into the mixing chamber 2. Accordingly, for example, when it is desired to enhance the cleaning power, a powdery synthetic resin or the like is mixed into the cleaning solution to enhance the cleaning power. Alternatively, other gases or solids may be separately supplied to a plurality of gas supply ports and solid supply ports, and they may be used in combination. The solid and gas may be supplied from separate supply ports, or they may be mixed in advance and then supplied to the mixing chamber 2. The cleaning liquid, gas, and solids supplied to the cleaning nozzle of the present invention are not necessarily supplied at a constant pressure. For example, a batch pump or the like is used to supply a cleaning liquid while giving a wave, and a gas supplied from a gas supply port is also supplied while a wave is supplied. The interaction of these waves can improve the cleaning effect. Fig. 4 is an explanatory view showing another example of the cleaning nozzle of the present invention. In this configuration, the stirring chamber 1 is provided inside the mixing chamber 2. The cleaning nozzle 40 is the same as the cleaning nozzles of FIGS. 1 to 3 described above, and the cleaning liquid supplied from the cleaning liquid supply port 3 to the mixing chamber 1 in the mixing chamber 2 is The stirring chamber 1 becomes a liquid containing gas particles, and the liquid containing the gas particles is discharged from the nozzle-shaped liquid discharge port 4 to the mixing chamber 2 and is mixed with the gas supplied from the gas supply port 5 to be washed from The clean liquid discharge port 6 is discharged. The invention is not limited to the embodiments described above. As shown in the example, the above-mentioned embodiment has a structure that is substantially the same as the technical idea described in the patent application scope of the present invention, and a structure that can achieve the same effect, but is included in the technical scope of the present invention in any case. This paper size applies the Chinese National Standard (CMS) A4 specification (210X297 mm) (. Please read the precautions on the back before filling this page)

-12- 經濟部智慧財產局員工消費合作社印製 561072 A7 B7 五、發明説明(1〇 ) 例如,在上述中,雖然洗淨液噴出口、液體排出口、 開口部是以細縫狀的結構來說明,可是本發明不限於此, 即使是圓形或方形等的孔口形狀也可以。而在圖面中雖然 是記載著讓噴出口朝向上方的例子,可是其使用型態,噴 出口朝向下方或是朝向橫向都可以。 【發明效果】 如以上的詳細說明,藉由本發明的洗淨噴嘴,即使是 與以往相同的氣體供給量、也可以提高最終的洗淨液的噴 出壓力。而由於洗淨液含有比以往更小的尺寸的均勻氣體 微粒,所以能夠非常均勻且有效率的淸洗近年來具有微細 的圖案的平板顯示器相關零件、半導體相關零件等。並且 可以減少所使用的洗淨液量。 【圖面說明】 第1圖是顯示本發明的洗淨噴嘴的一例的說明圖。· 第2圖是顯示本發明的洗淨噴嘴的另外一例的說明圖 〇 第3圖是顯示本發明的洗淨噴嘴的另外一例的說明圖 〇 第4圖是領示本發明的洗淨噴嘴的另外一例的說明圖 〇 第5圖是顯示以往的洗淨噴嘴的一例的說明圖。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 一 ' -13: (請先閱讀背面之注意事項再填寫本頁}-12- Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 B7 V. Description of the Invention (10) For example, in the above, although the cleaning liquid ejection outlet, liquid discharge outlet, and opening are in the form of a slit It should be noted that the present invention is not limited to this, and may be a circular or square orifice shape. In the drawing, although the example in which the discharge port is directed upward is described, in the usage mode, the discharge port may be directed downward or may be oriented in the lateral direction. [Effects of the Invention] As described in detail above, the cleaning nozzle of the present invention can increase the discharge pressure of the final cleaning liquid even with the same gas supply amount as in the past. Since the cleaning liquid contains uniform gas particles of a smaller size than in the past, it is possible to perform a very uniform and efficient cleaning of flat panel display related parts and semiconductor related parts having fine patterns in recent years. In addition, the amount of cleaning liquid used can be reduced. [Description of Drawings] Fig. 1 is an explanatory view showing an example of a cleaning nozzle of the present invention. Figure 2 is an explanatory view showing another example of the cleaning nozzle of the present invention. Figure 3 is an explanatory view showing another example of the cleaning nozzle of the present invention. Figure 4 is a view showing the cleaning nozzle of the present invention. FIG. 5 is an explanatory diagram showing an example of a conventional cleaning nozzle. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) I -13: (Please read the precautions on the back before filling this page}

經濟部智慧財產局員工消費合作社印製 561072 A7 B7 五、發明説明(H ) 【圖號說明】 1 :攪拌室 2 :混合室 3 :洗淨液供給口 4 :液體排出口 5:氣體供給口 6 :洗淨液噴出口 7 :隔板 8 :開口部 9 :固體供給口 10、20、30、40、50:洗淨用噴嘴 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁)Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 561072 A7 B7 V. Description of the invention (H) [Illustration of drawing number] 1: Mixing chamber 2: Mixing chamber 3: Washing liquid supply port 4: Liquid discharge port 5: Gas supply port 6: Washing liquid discharge port 7: Separator 8: Opening 9: Solid supply port 10, 20, 30, 40, 50: Washing nozzle This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ) (Please read the notes on the back before filling this page)

-14--14-

Claims (1)

561072 A8 B8 C8 D8 六、申請專利範圍 1 1 · 一種洗淨用噴嘴,是洗淨用噴嘴,其特徵爲: 是具備有:至少具有洗淨液供給口與液體排出口的攪 (請先閲讀背面之注意事項再填寫本頁) 拌室、以及藉由上述液體排出口與該攪拌室連通,且具有 氣體供給口與洗淨液噴出口的混合室;上述攪拌室,會將 從上述洗淨液供給口所供給的洗淨液加以攪拌,藉由使其 衝撞攪拌室內壁來生成氣體微粒,而將含有氣體微粒的液 體從上述液體排出口排出;上述混合室,會將從上述液體 排出口所供給的含有氣體微粒的液體與從氣體供給口所供 給的氣體加以混合,來從上述洗淨液噴出口噴出洗淨液。 2 ·如申請專利範圍第1項的洗淨用噴嘴,其中上述 攪拌室,是藉由具有開口部的隔板而被分割成複數段。 3 ·如申請專利範圍第1項的洗淨用噴嘴,其中上述 洗淨液噴出口、液體排出口、與開口部,是細縫狀的。 4 ·如申請專利範圍第2項的洗淨用噴嘴,其中上述 洗淨液噴出口、液體排出口、與開口部,是細縫狀的。 經濟部智慧財產局員工消費合作社印製 5 ·如申請專利範圍第1項的洗淨用噴嘴,其中上述 開口部、液體排出口、與洗淨液噴出口,是依照從上述攪 拌室的上流段到混合室的洗淨液噴出口的順序,其開口面 積越來越小。 6 ·如申請專利範圍第2項的洗淨用噴嘴,其中上述 開口部、液體排出口、與洗淨液噴出口,是依照從上述攪 拌室的上流段到混合室的洗淨液噴出口的順序,其開口面 積越來越小。 7 ·如申請專利範圍第3項的洗淨用噴嘴,其中上述 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -15 - 561072 A8 B8 C8 D8 々、申請專利範圍 2 (請先閱讀背面之注意事項再填寫本頁) 開口部、液體排出口、與洗淨液噴出口,是依照從上述攪 拌室的上流段到混合室的洗淨液噴出口的順序,其開口面 積越來越小。 8 ·如申請專利範圍第4項的洗淨用噴嘴,其中上述 開口部、液體排出口、與洗淨液噴出口,是依照從上述攪 拌室的上流段到混合室的洗淨液噴出口的順序,其開口面 積越來越小。 9 ·如申請專利範圍第1、2、3、4、5、6、7 或8項的洗淨用噴嘴,其中上述混合室具有複數的氣體供 給口,是將從該氣體供給口所供給的複數種類的氣體、與 從上述液體排出口所供給的含有氣體微粒的液體加以混合 ,而從上述洗淨液噴出口噴出洗淨液。 1 ◦.如申請專利範圍第1、2、3、4、5、6、 7或8項的洗淨用噴嘴,其中上述混合室具有單數或複數 的固體供給口,是將從該固體供給口所供給的一種或複數 種類的固體、與從上述液體排出口所供給的含有氣體微粒 的液體加以混合,而從上述洗淨液噴出口噴出洗淨液。 經濟部智慧財產局員工消費合作社印製 1 1 .如申請專利範圍第9項的洗淨用噴嘴,其中上 述混合室具有單數或複數的固體供給口,是將從該固體供 給口所供給的一種或複數種類的固體、與從上述液體排出 口所供給的含有氣體微粒的液體加以混合,而從上述洗淨 液噴出口噴出洗淨液。 1 2 ·如申請專利範圍第1、2、3、4、5、6、 7或8項的洗淨用噴嘴,其中上述洗淨液供給口、氣體供 本尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -16 - 561072 A8 B8 C8 D8 ___ 六、申請專利範圍 3 給口、與固體供給口,是供給分別施加了波動的洗淨液、 氣體、與固體。 1 3 .如申請專利範圍第9項的洗淨用噴嘴’其中上 述洗淨液供給口、氣體供給口、與固體供給口’是供給分 別施加了波動的洗淨液、氣體、與固體。 1 4 ·如申請專利範圍第1 0項的洗淨用噴嘴’其中 上述洗淨液供給口、氣體供給口、與固體供給口’是供給 分別施加了波動的洗淨液、氣體、與固體。 1 5 ·如申請專利範圍第1 1項的洗淨用噴嘴’其中 上述洗淨液供給口、氣體供給口、與固體供給口’是供給 分別施加了波動的洗淨液、氣體、與固體。 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -17-561072 A8 B8 C8 D8 6. Scope of patent application 1 1 · A cleaning nozzle is a cleaning nozzle, which is characterized by: It has at least a cleaning liquid supply port and a liquid discharge port (please read first Note on the back, please fill in this page again) Mixing chamber, and the mixing chamber that communicates with the stirring chamber through the liquid discharge port, and has a gas supply port and a cleaning liquid ejection port; the above stirring chamber will clean from the above The cleaning liquid supplied from the liquid supply port is agitated, and it is made to collide with the inner wall of the stirring chamber to generate gas particles, and the liquid containing the gas particles is discharged from the liquid discharge port; the mixing chamber is discharged from the liquid discharge port. The supplied gas-containing microparticle-containing liquid is mixed with the gas supplied from the gas supply port, and the cleaning liquid is ejected from the cleaning liquid ejection port. 2. The cleaning nozzle according to item 1 of the patent application range, wherein the stirring chamber is divided into a plurality of sections by a partition having an opening. 3. The cleaning nozzle according to item 1 of the scope of the patent application, wherein the cleaning liquid ejection port, the liquid discharge port, and the opening are slit-shaped. 4. The cleaning nozzle according to item 2 of the patent application scope, wherein the cleaning liquid ejection port, the liquid discharge port, and the opening are narrow slits. Printed by the Employees ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs5. If the cleaning nozzle of item 1 of the scope of the patent application is applied, the opening, the liquid discharge port, and the cleaning liquid discharge port are in accordance with the upstream section from the mixing chamber The order of the openings of the cleaning liquid to the mixing chamber is smaller and smaller. 6. The cleaning nozzle according to item 2 of the scope of the patent application, wherein the opening, the liquid discharge port, and the cleaning liquid ejection port are in accordance with the cleaning liquid ejection port from the upper section of the stirring chamber to the mixing chamber. In sequence, the opening area is getting smaller and smaller. 7 · If the cleaning nozzle in item 3 of the scope of patent application, the above paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -15-561072 A8 B8 C8 D8 々, scope of patent application 2 (please (Read the precautions on the back before filling in this page.) The openings, liquid discharge ports, and cleaning liquid ejection ports follow the order from the upper section of the mixing chamber to the cleaning liquid ejection port of the mixing chamber. Coming smaller. 8. The cleaning nozzle according to item 4 of the scope of the patent application, wherein the opening, the liquid discharge port, and the cleaning liquid ejection port are in accordance with the cleaning liquid ejection port from the upper section of the stirring chamber to the mixing chamber. In sequence, the opening area is getting smaller and smaller. 9 · If the cleaning nozzles in the scope of patent application No. 1, 2, 3, 4, 5, 6, 7, or 8 are provided, the mixing chamber has a plurality of gas supply ports and is supplied from the gas supply ports. A plurality of types of gas are mixed with a liquid containing gas particles supplied from the liquid discharge port, and the cleaning liquid is ejected from the cleaning liquid ejection port. 1 ◦. For the cleaning nozzles in the scope of patent application No. 1, 2, 3, 4, 5, 6, 7, or 8, wherein the mixing chamber has a singular or plural solid supply port, the solid supply port The supplied one or more kinds of solids are mixed with the liquid containing gas particles supplied from the liquid discharge port, and the washing liquid is ejected from the washing liquid ejection port. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 1. If the cleaning nozzle of item 9 of the scope of the patent application is applied, the mixing chamber has a singular or plural solid supply port, which is a type supplied from the solid supply port Or a plurality of kinds of solids are mixed with a liquid containing gas particles supplied from the liquid discharge port, and the cleaning liquid is ejected from the cleaning liquid ejection port. 1 2 · If the cleaning nozzle No. 1, 2, 3, 4, 5, 6, 7, or 8 of the scope of the patent application is applied, the above-mentioned cleaning liquid supply port and gas supply are applicable to China National Standard (CNS) A4 Specifications (210X297 mm) -16-561072 A8 B8 C8 D8 ___ Sixth, the scope of patent application 3 The supply port and the solid supply port are used to supply the cleaning liquid, gas, and solid to which fluctuations are respectively applied. 1 3. The cleaning nozzle 'according to item 9 of the scope of the patent application, wherein the cleaning liquid supply port, gas supply port, and solid supply port' are used to supply cleaning liquid, gas, and solid to which fluctuations are respectively applied. 1 4 · The cleaning nozzle ′ of item 10 of the scope of the patent application, wherein the above-mentioned cleaning liquid supply port, gas supply port, and solid supply port ′ supply cleaning liquid, gas, and solid to which fluctuations are respectively applied. 1 5 · The cleaning nozzle ′ according to item 11 of the scope of the patent application, wherein the cleaning liquid supply port, gas supply port, and solid supply port ′ are used to supply cleaning liquid, gas, and solid to which fluctuations are respectively applied. (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -17-
TW091120336A 2001-10-15 2002-09-05 Cleaning nozzle TW561072B (en)

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KR100783763B1 (en) * 2007-01-04 2007-12-07 주식회사 디엠에스 Substrate cleaning apparatus
CN103223403A (en) * 2013-04-07 2013-07-31 苏州市建诚装饰材料有限公司 Cleaning device for gummed metering roll
KR20160141276A (en) 2015-05-29 2016-12-08 (주)에스겔 Container typed movable facilities system
KR101910497B1 (en) * 2015-11-25 2018-10-22 주식회사 캠프런 Gas switchgear for cleaning module of beverage distribution head
KR101921604B1 (en) * 2015-11-25 2018-11-23 인텔렉추얼디스커버리 주식회사 Beverage distribution head integrating cleaning module
KR101908999B1 (en) * 2016-11-25 2018-10-17 주식회사 캠프런 Coupler for cleaning module of beverage distribution head and preventing beerstone formation and gas-induced foamy beer-spurting phenomenon
KR101917612B1 (en) * 2017-11-29 2019-01-29 주식회사 캠프런 Gas switchgear for cleaning module of beverage distribution head

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