CN101107280B - 包含感光氟化物的组合物及其用途 - Google Patents

包含感光氟化物的组合物及其用途 Download PDF

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Publication number
CN101107280B
CN101107280B CN2005800455491A CN200580045549A CN101107280B CN 101107280 B CN101107280 B CN 101107280B CN 2005800455491 A CN2005800455491 A CN 2005800455491A CN 200580045549 A CN200580045549 A CN 200580045549A CN 101107280 B CN101107280 B CN 101107280B
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China
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group
carbon atoms
composition
alkyl groups
formula
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Expired - Fee Related
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CN2005800455491A
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English (en)
Chinese (zh)
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CN101107280A (zh
Inventor
刘军钪
乔治·G·I·摩尔
马克·J·佩莱里特
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09J133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
CN2005800455491A 2004-12-29 2005-12-28 包含感光氟化物的组合物及其用途 Expired - Fee Related CN101107280B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US64026004P 2004-12-29 2004-12-29
US60/640,260 2004-12-29
PCT/US2005/047403 WO2006071981A1 (en) 2004-12-29 2005-12-28 Compositions containing photosensitive fluorochemical and uses thereof

Publications (2)

Publication Number Publication Date
CN101107280A CN101107280A (zh) 2008-01-16
CN101107280B true CN101107280B (zh) 2011-07-06

Family

ID=36190705

Family Applications (1)

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CN2005800455491A Expired - Fee Related CN101107280B (zh) 2004-12-29 2005-12-28 包含感光氟化物的组合物及其用途

Country Status (10)

Country Link
US (1) US7682771B2 (https=)
EP (1) EP1833862B1 (https=)
JP (1) JP5074207B2 (https=)
KR (1) KR101290491B1 (https=)
CN (1) CN101107280B (https=)
AT (1) ATE423150T1 (https=)
DE (1) DE602005012868D1 (https=)
ES (1) ES2321537T3 (https=)
RU (1) RU2007123778A (https=)
WO (1) WO2006071981A1 (https=)

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US8012542B2 (en) * 2005-12-30 2011-09-06 E.I. Du Pont De Nemours And Company Fluoropolymer coating compositions containing adhesive polymers and substrate coating process
US7553540B2 (en) 2005-12-30 2009-06-30 E. I. Du Pont De Nemours And Company Fluoropolymer coated films useful for photovoltaic modules
US7754838B2 (en) * 2006-08-08 2010-07-13 E.I. Du Pont De Nemours And Company Poly(meth)acrylamides and poly(meth)acrylates containing fluorinated amide
CA2671991A1 (en) * 2006-12-21 2008-07-03 E. I. Du Pont De Nemours And Company Crosslinkable vinyl fluoride copolymers
US8168297B2 (en) * 2007-04-23 2012-05-01 E. I. Du Pont De Nemours And Company Fluoropolymer coated film, process for forming the same, and fluoropolymer liquid composition
WO2008154345A1 (en) * 2007-06-06 2008-12-18 3M Innovative Properties Company Fluorinated ether compositions and methods of using the same
US8629089B2 (en) 2008-12-18 2014-01-14 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated ether compositions
CN102471237A (zh) * 2009-06-30 2012-05-23 旭硝子株式会社 表面处理剂、物品及含氟醚化合物
US9334423B2 (en) * 2012-08-31 2016-05-10 Basf Se Compositions comprising an acrylic block copolymer and a UV-curable copolymer and methods of making and using the same
CN105073909B (zh) * 2012-12-20 2019-05-21 3M创新有限公司 包含具有紫外线吸收基团的低聚物的含氟聚合物组合物
SG11201504914SA (en) 2012-12-20 2015-07-30 3M Innovative Properties Co Copolymers including ultraviolet absorbing groups and fluoropolymer compositions including them
JP6294513B2 (ja) 2014-06-25 2018-03-14 スリーエム イノベイティブ プロパティズ カンパニー 少なくとも１つのオリゴマーを含むフルオロポリマー組成物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
US9994732B1 (en) 2014-09-12 2018-06-12 Steven Martin Johnson Polysilazane and fluoroacrylate coating composition
CN105647502B (zh) * 2014-11-10 2018-09-04 中国石油天然气股份有限公司 一种稠油降粘剂及其制备方法
CN107709385B (zh) 2015-06-25 2020-06-12 3M创新有限公司 包含紫外光吸收基团的共聚物和包含该共聚物的组合物
JP6645800B2 (ja) * 2015-10-22 2020-02-14 株式会社ブリヂストン 粘着シート及び粘着シートの製造方法
US10562065B1 (en) 2015-11-03 2020-02-18 Newtech Llc Systems and methods for application of polysilazane and fluoroacrylate coating compositions
US10584264B1 (en) 2016-02-25 2020-03-10 Newtech Llc Hydrophobic and oleophobic coating compositions
CN107513127A (zh) * 2016-06-17 2017-12-26 默克专利股份有限公司 含氟聚合物
WO2018178814A1 (en) 2017-03-27 2018-10-04 3M Innovative Properties Company Film constructions and articles
CN109758970B (zh) * 2018-12-12 2021-03-23 衢州学院 一种纳米纤维素基含氟高分子表面活性剂及其制备方法
DE102019106081B4 (de) * 2019-03-11 2024-05-08 Joanneum Research Forschungsgesellschaft Mbh Oligomere Hexafluorpropylenoxidderivate
JP7549448B2 (ja) * 2019-08-02 2024-09-11 三菱ケミカル株式会社 共重合体、硬化性重合体組成物、硬化物、積層体
JP7676789B2 (ja) * 2021-01-29 2025-05-15 三菱ケミカル株式会社 共重合体、硬化性組成物、硬化物、積層体

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WO1999016809A1 (en) * 1997-09-29 1999-04-08 Minnesota Mining And Manufacturing Company Specific fluorinated ethers as reaction medium
US6395459B1 (en) * 2000-09-29 2002-05-28 Eastman Kodak Company Method of forming a protective overcoat for imaged elements and related articles
US20040204555A1 (en) * 2003-04-09 2004-10-14 Nobuhisa Noda Resin composition, optical filter and plasma display

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US6395459B1 (en) * 2000-09-29 2002-05-28 Eastman Kodak Company Method of forming a protective overcoat for imaged elements and related articles
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Also Published As

Publication number Publication date
ES2321537T3 (es) 2009-06-08
DE602005012868D1 (de) 2009-04-02
WO2006071981A1 (en) 2006-07-06
JP2008527091A (ja) 2008-07-24
US7682771B2 (en) 2010-03-23
ATE423150T1 (de) 2009-03-15
RU2007123778A (ru) 2009-02-10
US20060199029A1 (en) 2006-09-07
KR101290491B1 (ko) 2013-07-26
JP5074207B2 (ja) 2012-11-14
EP1833862A1 (en) 2007-09-19
CN101107280A (zh) 2008-01-16
EP1833862B1 (en) 2009-02-18
KR20070103396A (ko) 2007-10-23

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Granted publication date: 20110706

Termination date: 20191228