CN101041775A - 一种荧光粉及其制造方法和所制成的电光源 - Google Patents

一种荧光粉及其制造方法和所制成的电光源 Download PDF

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CN101041775A
CN101041775A CNA200610065812XA CN200610065812A CN101041775A CN 101041775 A CN101041775 A CN 101041775A CN A200610065812X A CNA200610065812X A CN A200610065812XA CN 200610065812 A CN200610065812 A CN 200610065812A CN 101041775 A CN101041775 A CN 101041775A
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fluorescent material
light led
white light
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CN100590173C (zh
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庄卫东
龙震
胡运生
黄小卫
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Grirem Advanced Materials Co Ltd
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Beijing General Research Institute for Non Ferrous Metals
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Abstract

一种可被紫外、紫光或蓝光LED有效激发而发可见光的荧光粉及其制造方法和所制成的电光源。该荧光粉同时含有稀土、硅、碱土金属、卤素、氧,以及铝或镓,其化学式为aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,M为Ca、Sr和Ba中至少一种,M’为Al和Ga中至少一种,A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,X为F和Cl中至少一种,R为Ce、Eu、Tb和Mn中至少一种,0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,0.6≤e≤2.4。本发明的荧光粉具有激发波长范围广、高效、均匀、无杂相、稳定等特点,制造方法简单、无污染、成本低。用本发明的荧光粉配合紫外、紫光或蓝光LED可制成新型的电光源。

Description

一种荧光粉及其制造方法和所制成的电光源
技术领域
本发明涉及一种可被紫外、紫光或蓝光LED(Light Emitting Diode)有效激发的荧光粉及其所制造方法和所制成的电光源。
背景技术
发光二极管LED由于具有体积小、发热量低、耗电量小、寿命长、反应速度快、环保、可平面封装、易开发成轻薄短小产品等优点,在指示灯、装饰灯、信号灯等领域有广泛应用。近年来,由于蓝色、紫色及紫外LED的迅猛发展,使得其应用于照明领域成为可能。
白光LED的产生方式有两种:第一种方法是将红、绿、蓝三种LED组合产生白光;第二种方法就是用LED去激发荧光粉混合形成白光,即用蓝光LED配合发黄光的荧光粉,或者用蓝光LED配合发绿色光和发红色光两种荧光粉,或者用紫光或紫外LED去激发红、绿、蓝三种荧光粉等。
在这些白光LED的产生方式中,利用蓝光LED配合YAG黄光荧光粉产生白光的技术已经相当成熟,专利CN97196762对这种荧光粉和白光LED有详细的报道。但是目前由YAG荧光粉制成的白光LED商品的发光效率只有15-30lm/W,节能效果还不是很明显,没有大面积地应用于普通照明领域,因而具有良好发光性能的新型荧光粉是国内外研究的热点。
德国专利文献DE19730005曾经报道过一种硅酸盐-硼酸盐荧光粉,该荧光粉为(Y,La)1-x-y-zCexGdyTbz(Mg,Zn,Gd)1-pMnpB5-q-s(Al,Ga)qXsO10。专利GB1334838和GB1326868及GB1379949中所涉及的硅酸盐荧光粉是被应用于飞点扫描荧光粉,其发射主峰在370-430nm之间。Barry(J.Electrochem.Soc.,1968,115:1181-1184)较详细地报道了一种碱土金属硅酸盐荧光粉,这种荧光粉在蓝光激发下可发射出黄色光,性能与YAG荧光粉相近,美国专利文献US20040051111将这种荧光粉应用到白光LED的制备中。
发明内容
本发明的目的是提供一种化学性质稳定、发光性能好、可被紫外、紫光或蓝光LED有效激发的荧光粉。
本发明的另一个目的是提供一种可被紫外、紫光或蓝光LED有效激发的荧光粉制造方法。
本发明的再一个目的是提供一种利用这种荧光粉所制备的电光源。
为实现上述目的,本发明采取以下技术方案:
一种荧光粉,该荧光粉同时含有稀土、硅、碱土金属、卤素、氧,以及铝或镓,其中,所述的稀土为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,以及Ce、Eu和Tb中至少一种;所述的碱土金属为Mg、Ca、Sr和Ba中至少一种;所述的卤素为F和Cl中至少一种。本发明的LED荧光粉,提高荧光粉的转换效率,从而提高白光LED的发光效率。
本发明的荧光粉的化学式为:aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,
其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,
M为Ca、Sr和Ba中至少一种,
M’为Al和Ga中至少一种,
A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,
X为F和Cl中至少一种,
R为Ce、Eu、Tb和Mn中至少一种,
0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,0.6≤e≤2.4。
本发明的可被紫外、紫光或蓝光LED有效激发的荧光粉,该荧光粉具有激发波长范围广、高效、稳定等特点。利用该荧光粉可以制成的电光源。
本发明涉及制备该荧光粉的方法包括以下步骤:
(1)、按化学式aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,M为Ca、Sr和Ba中至少一种,M’为Al和Ga中至少一种,A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,X为F和Cl中至少一种,R为Ce、Eu、Tb和Mn中至少一种,0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,0.6≤e≤2.4进行配料,以含Ln的金属或化合物或盐,含M和M’的金属或化合物或盐,含A的卤化物,含R的化合物和盐,硅的化合物或盐为原料,并适当添加过量的上述某种化合物或盐当作助熔剂,研细,混合均匀形成混合料;
(2)、将步骤(1)得到的混合料在还原气氛中进行高温焙烧;
(3)、将步骤(2)得到的焙烧产物再经后处理过程,即制得本发明的荧光粉。
在所述步骤(1)中,所述的化合物包括相对应的氧化物、氢氧化物;所述的盐包括相对应的碳酸盐、硝酸盐、有机酸盐等。
在所述步骤(1)中,相对于所要制成的荧光粉的总重量,助熔剂的含量为0.001-20wt%。
在所述步骤(1)中,研磨可以在乙醇、丙酮等溶液中进行。
在所述步骤(2)中,高温焙烧可以一次,或多次。
在所述步骤(2),每次高温焙烧温度为500~1600℃。
在所述步骤(2)中,每次高温焙烧时间为0.5~15小时。
在所述步骤(3)中,后处理过程包括破碎、气流粉碎、除杂、烘干、分级。
在所述步骤(3)中,后处理中除杂过程包括酸洗、碱洗或水洗。
在所述步骤(3)中,后处理中分级过程可采用沉降法、筛分法、水力分级、气流分级等方法中的一种或几种。
本发明合成的荧光粉在蓝光、紫光或紫外光激发下发出峰值在500-600nm的宽带可见光,半峰宽大于30nm。本发明涉及的荧光粉合成方法简单,易于操作,无污染,成本低。本发明的荧光粉可与蓝光、紫光或紫外光LED相匹配,或再混合其它类型的荧光粉,用于白光LED的制备,能量转换率高;也可与蓝光、紫光或紫外光LED相匹配,或再混合其它类型的荧光粉,制备色彩鲜艳的彩色LED。因此,采用本发明的荧光粉可以制成下述电光源。
一种电光源,至少含有紫外光、或紫光、或蓝光LED和本发明的荧光粉,该荧光粉同时含有稀土、硅、碱土金属、卤素、氧,以及铝或镓,其中,所述的稀土为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,以及Ce、Eu和Tb中至少一种;所述的碱土金属为Mg、Ca、Sr和Ba中至少一种;所述的卤素为F和Cl中至少一种。
该荧光粉的化学式为aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,
其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,
M为Ca、Sr和Ba中至少一种,
M’为Al和Ga中至少一种,
A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,
X为F和Cl中至少一种,
R为Ce、Eu、Tb和Mn中至少一种,
0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,1≤e≤2。
本发明的特点是:
1、提出了一种新的荧光粉组成,该荧光粉性质稳定、发光效率高。
2、提出了该荧光粉的制造方法,该方法易于操作、无污染、成本低。
3、提出了一种新的利用该荧光粉制成的电光源,该光源寿命长、发光效率高。
附图说明
图1为实施例1的激发光谱
图2为实施例1的发射光谱
具体实施方式
以下用实施例对本发明的LED荧光粉及其制造方法和所制成的电光源作进一步的说明,将有助于对本发明的产品和制造方法作进一步的理解,本发明的保护范围不受这些实施例的限定,本发明的保护范围由权利要求书来决定。
实施例1
本实施例的LED荧光粉产品经分析其化学式为1.47Y2O3·BaO·2.48Al2O3·1.03SiO2·0.03BaF2:0.03Ce,0.01Eu。其制造方法为按化学计量比称取Y2O3(4N),BaO(4N),Al2O3(4N),CeO2(4N),Eu2O3(4N).SiO2(4N),BaF2(AR),其中,SiO2和BaF2既作为反应助熔剂又为荧光粉组成的一部分,助熔剂的添加量为所要制成的荧光粉的总重量的18wt%。将上述原料混磨均匀以后,在1450℃在还原气氛中保温3小时,所得产品经破碎、水洗除杂、过筛、烘干,即得本发明的荧光粉。其发射光谱和激发光谱见图1,从图1可知,该荧光粉能被350-480nm波段的光有效激发而发射主峰波长位于544nm的黄光。其相对发射强度见表1。
实施例2
本实施例的LED荧光粉产品经分析其化学式为1.47Y2O3·BaO·2.47Al2O3·1.03SiO2·0.06BaF2:0.04Ce,0.03Eu。按化学计量比称取Y2O3(4N),BaO(4N),Al2O3(4N),CeO2(4N),Eu2O3(4N),SiO2(4N),BaF2(AR),其中,SiO2和BaF2既作为反应助熔剂又为荧光粉组成的一部分,助熔剂的添加量为所要制成的荧光粉的总重量的10wt%。其制造方法与实施例1基本相同,但采取两次焙烧,第一次在1400℃在还原气氛中保温2小时,然后经破碎和过筛后,再装入坩埚进行第二次焙烧,焙烧条件为在1550℃在还原气氛中保温2小时,所得产品经破碎、水洗除杂、过筛、烘干,即得本发明的荧光粉。其相对发光强度见表1。
实施例3-实施例72
这些实施例的LED荧光粉产品经分析其化学式如表1所示。这些荧光粉的制备方法与实施例2基本相同。这些荧光粉的相对发光强度见表1。
                  表1实施例1-72的化学式及其发光强度
实施例 化学式        相对强度(%)
  330nm激发  460nm激发
1     1.47Y2O3·BaO·2.48Al2O3·1.03SiO2·0.03BaF2:0.03Ce,0.01Eu 100 100
2     1.47Y2O3·BaO·2.47Al2O3·1.03SiO2·0.06BaF2:0.04Ce,0.03Eu 105 106
3     Y2O3·0.48Sm2O3·BaO·2.45Al2O3·1.09SiO2·0.06BaF2:0.03Ce,0.04Eu 96 97
4     La2O3·0.22Gd2O3·0.25Sm2O3·BaO·2.44Al2O3·1.12SiO2·0.06BaF2:0.06Ce,0.01Eu,0.001Tb 94 94
5     2.0Y2O3·BaO·1.0Al2O3·0.05Ga2O3·2.5SiO2·0.36BaF2:0.07Ce,0.03Eu,0.001Tb 90 91
6     1.91Y2O3·BaO·2.0Al2O3·1.06SiO2·0.1LiF:0.09Ce,0.02Eu,0.001Tb 104 106
7     1.34Pr2O3·BaO·2.5Al2O3·1.09SiO2·0.16LiCl:0.01Ce,0.08Eu,0.002Tb 108 110
8     0.818Y2O3·BaO·3.0Al2O3·1.12SiO2·0.2NaF:0.1Ce,0.04Eu,0.003Tb 106 105
9     0.297Y2O3·BaO·3.5Al2O3·1.15SiO2·0.2NaCl:0.12Ce,0.02Eu,0.004Tb 103 104
  10     0.01Y2O3·BaO·4.0Al2O3·0.01SiO2·   112  115
  0.918KF:0.02Ce,0.1Eu,0.001Tb
11   1.473Nd2O3·BaO·2.79Al2O3·0.05SiO2·0.37KCl:0.02Ce,0.11Eu,0.002Tb 91 92
12   1.471Y2O3·BaO·2.81Al2O3·0.1SiO2·0.28MgF2:0.1Ce,0.12Eu,0.003Mn 90 89
13   1.472Y2O3·BaO·2.61Al2O3·0.5SiO2·0.28MgCl2:0.13Ce,0.01Eu,0.001Mn 82 84
14   1.482Y2O3·BaO·2.215Al2O3·1.0SiO2·0.57CaF2:0.01Ce,0.12Eu,0.004Mn 94 95
15   1.133Ho2O3·BaO·2.2Al2O3·2.0SiO2·0.3CaCl2:0.1Ce,0.02Eu,0.001Tb 97 96
16   0.8Y2O3·BaO·0.42Al2O3·3.0SiO2·0.16SrF2:0.01Ce,0.1Eu,0.003Tb 89 92
17   1.47Y2O3·BaO·2.42Al2O3·SiO2·0.16SrCl2:0.1Ce,0.04Eu 88 89
18   Yb2O3·0.47Gd2O3·BaO·2.24Al2O3·1.36SiO2·0.16LiF:0.13Ce,0.01Eu 92 93
19   Y2O3·0.44Gd2O3·BaO·2.25Al2O3·1.39SiO2·0.16LiCl:0.08Ce,0.09Eu 91 93
20   Y2O3·0.44Gd2O3·BaO·2.21Al2O3·1.42SiO2·0.16NaF:0.09Ce,0.02Eu 94 95
21   Y2O3·0.41Gd2O3·BaO·2.195Al2O3·1.45SiO2·0.16NaCl:0.15Ce,0.13Eu 88 89
22   Y2O3·0.41Gd2O3·BaO·2.18Al2O3·1.48SiO2·0.16KF:0.01Ce,0.01Eu 91 92
23   Y2O3·0.38Gd2O3·CaO·2.42Al2O3·1.48SiO2·0.16KCl:0.03Ce,0.03Eu 86 87
24   Y2O3·0.38Gd2O3·CaO·2.165Al2O3·1.51SiO2·0.16MgF2:0.08Ce,0.002Tb 94 95
25   Y2O3·0.35Sc2O3·CaO·2.15Al2O3·1.54SiO2·0.16MgCl2:0.02Ce,0.005Tb 89 91
26     Y2O3·0.35Gd2O3·CaO·2.3Al2O3·1.12SiO2·0.16CaF2:0.04Ce,0.001Tb 102 101
27     Y2O3·0.32Gd2O3·CaO·2.135Al2O3·1.57SiO2·0.16CaCl2:0.07Ce,0.08Eu 92 93
28     Y2O3·0.32La2O3·CaO·2.12Al2O3·1.6SiO2·0.16SrF2:0.02Ce,0.12Eu 89 90
29     Y2O3·0.29Gd2O3·CaO·2.105Al2O3·1.63SiO2·0.16SrCl2:0.14Ce,0.02Eu 87 88
30     Y2O3·0.29Pr2O3·CaO·2.09Al2O3·1.66SiO2·0.16BaCl2:0.02Ce,0.02Eu 93 94
31     Y2O3·0.26Sm2O3·CaO·2.125Al2O3·1.74SiO2·0.01LiF:0.06Ce,0.06Eu 100 101
32     Y2O3·0.26Sm2O3·CaO·2.11Al2O3·1.75SiO2·0.03LiCl:0.09Ce,0.08Eu 98 100
33     Y2O3·0.23Sm2O3·CaO·2.095Al2O3·1.75SiO2·0.06NaF:0.06Ce,0.07Eu 102 103
34     Y2O3·0.23Sm2O3·CaO·2.08Al2O3·1.74SiO2·0.1NaCl:0.05Ce,0.08Eu 96 97
35     Y2O3·0.2Sm2O3·CaO·2.065Al2O3·1.67SiO2·0.2KF:0.16Ce,0.13Eu 97 98
36     Y2O3·0.2Sm2O3·CaO·2.05Al2O3·1.6SiO2·0.3KCl:0.15Ce,0.13Eu 101 102
37     Y2O3·0.47Sm2O3·CaO·2.23Al2O3·0.9SiO2·0.4MgF2:0.13Ce,0.1Eu 96 97
38     Y2O3·0.47Nd2O3·CaO·2.035Al2O3·1.43SiO2·0.5MgCl2:0.04Ce,0.04Eu 96 95
39     Y2O3·0.47Sm2O3·CaO·2.02Al2O3·1.36SiO2·0.6CaF2:0.02Ce,0.03Eu 91 92
40     Y2O3·0.47Sm2O3·CaO·2.005Al2O3·1.29SiO2·0.7CaCl2:0.12Ce,0.03Eu 86 87
    41     Y2O3·0.47Sm2O3·CaO·1.99Al2O3·     88     89
    1.22SiO2·0.8SrF2:0.13Ce,0.04Eu
42     Y2O3·0.47Sm2O3·CaO·2.46Al2O3·0.18SiO2·0.9SrCl2:0.14Ce,0.05Eu 85 86
43     Y2O3·0.47Ho2O3·CaO·2.45Al2O3·0.1SiO2·1.0BaCl2:0.06Ce,0.06Eu 96 97
44     1.47Y2O3·CaO·2.39Al2O3·0.05Ga2O3·1.08SiO2·0.1LiF:0.08Ce,0.05Eu 99 100
45     0.01Y2O3·CaO·3.84Al2O3·0.05Ga2O3·1.00SiO2·0.2LiCl:0.11Ce,0.02Eu 103 102
46     0.05Yb2O3·CaO·3.36Al2O3·0.05Ga2O3·1.3SiO2·0.3NaF:0.1Ce,0.05Eu 108 107
47     0.1Y2O3·CaO·3.74Al2O3·0.05Ga2O3·0.82SiO2·0.4NaCl:0.1Ce,0.03Eu 93 94
48     0.5Y2O3·CaO·3.33Al2O3·0.05Ga2O3·0.74SiO2·0.5KF:0.09Ce,0.02Eu 90 91
49     1.0Y2O3·CaO·2.82Al2O3·0.05Ga2O3·0.66SiO2·0.6KCl:0.08Ce 85 86
50     2.0Y2O3·CaO·1.81Al2O3·0.05Ga2O3·0.55SiO2·0.7MgF2:0.1Eu 96 97
51     0.01Sc2O3·SrO·3.79Al2O3·0.05Ga2O3·0.44SiO2·0.8MgCl2:0.007Ce,0.01Eu 100 100
52     0.05Y2O3·SrO·3.74Al2O3·0.05Ga2O3·0.36SiO2·0.9CaF2:0.06Ce,0.04Eu 93 92
53     0.1Y2O3·SrO·3.68Al2O3·0.05Ga2O3·0.28SiO2·1.0CaCl2:0.06Ce,0.03Eu 96 97
54     0.5Y2O3·SrO·3.27Al2O3·0.05Ga2O3·1.2SiO2·0.1SrF2:0.07Ce,0.04Eu 94 94
55     1.0La2O3·SrO·2.76Al2O3·0.05Ga2O3·1.12SiO2·0.2SrCl2:0.09Ce,0.03Eu 90 91
56     2.0Y2O3·SrO·1.75Al2O3·0.05Ga2O3·1.04SiO2·0.3BaCl2:0.1Ce,0.1Eu 105 106
57     0.47Pr2O3·0.5Gd2O3·0.5Sm2O3·SrO·2.3Al2O3·1.34SiO2·0.06BaF2:0.1Ce,0.11Eu 90 90
58     0.47Y2O3·Gd2O3·SrO·2.29Al2O3·1.36SiO2·0.06BaF2:0.07Ce,0.02Eu 89 88
59     0.47Y2O3·Gd2O3·SrO·2.23Al2O3·1.38SiO2·0.12LiF:0.12Ce,0.02Eu 87 86
60     0.47Nd2O3·Gd2O3·SrO·2.22Al2O3·1.4SiO2·0.12LiCl:0.02Ce,0.11Eu 86 87
61     0.44Y2O3·Gd2O3·SrO·2.21Al2O3·1.42SiO2·0.12NaF:0.02Ce,0.02Eu 87 85
62     0.44Y2O3·Gd2O3·SrO·2.2Al2O3·1.44SiO2·0.12NaCl:0.08Ce,0.08Eu 85 84
63     0.41Y2O3·Gd2O3·SrO·2.19Al2O3·1.43SiO2·0.12KF:0.07Ce,0.01Eu 83 84
64     0.41Y2O3·Gd2O3·SrO·2.42Al2O3·1.18SiO2·0.12KCl:0.01Ce,0.03Eu 83 83
65     0.38Y2O3·Gd2O3·SrO·2.19Al2O3·1.46SiO2·0.06MgF2:0.08Ce,0.10Eu 89 91
66     0.38Y2O3·Gd2O3·SrO·2.18Al2O3·1.48SiO2·0.06MgCl2:0.1Ce,0.1Eu,0.1Tb 88 87
67     0.35Y2O3·Gd2O3·SrO·1.46Al2O3·1.96SiO2·0.06CaF2:0.16Ce 105 104
68     0.35Pr2O3·Gd2O3·SrO·2.17Al2O3·1.5SiO2·0.06CaCl2:0.12Ce,0.12Eu 81 84
69     0.32Y2O3·Gd2O3·SrO·2.12Al2O3·1.6SiO2·0.06SrF2:0.12Ce,0.10Eu 82 83
70     0.32Y2O3·Gd2O3·SrO·2.07Al2O3·1.7SiO2·0.06SrCl2:0.08Ce,0.12Eu 78 79
71     0.29Y2O3·Gd2O3·SrO·2.02Al2O3·1.8SiO2·0.06BaF2:0.06Ce,0.10Eu 80 78
72     0.29Nd2O3·Gd2O3·SrO·1.97Al2O3·1.9SiO2·0.06BaCl2:0.08Ce,0.10Eu 86 84
实施例73
使用实施例1的荧光粉制造白光LED电光源的实施例。
实施过程:称取实施例1所得荧光粉调浆后,涂敷在蓝光芯片上,焊接好电路,用树脂封结,所得固态光源即为本发明的白光LED电光源。
综上所述,本发明的荧光粉具有激发波长范围广、高效、均匀、无杂相、稳定等特点,其制造方法简单、无污染、成本低。用本发明的荧光粉配合紫外、紫光或蓝光LED可制成新型的电光源。

Claims (13)

1、一种荧光粉,其特征在于:荧光粉同时含有稀土、硅、碱土金属、卤素、氧,以及铝或镓,其中,所述的稀土为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,以及Ce、Eu和Tb中至少一种;所述的碱土金属为Mg、Ca、Sr和Ba中至少一种;所述的卤素为F和Cl中至少一种。
2、根据权利要求1所述的一种荧光粉,其特征在于:荧光粉的化学式为:aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,
其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,
M为Ca、Sr和Ba中至少一种,
M’为Al和Ga中至少一种,
A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,
X为F和Cl中至少一种,
R为Ce、Eu、Tb和Mn中至少一种,
0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,0.6≤e≤2.4。
3、一种制造权利要求2所述的白光LED用荧光粉的方法,其特征在于:
该方法包括以下步骤:
(1)分别以含Ln的金属或化合物或盐,含M和M’的金属或化合物或盐,含A的卤化物,含R的化合物和盐,硅的化合物或盐为原料,且按上述材料的化学式组成及化学式表达要求的摩尔配比称取相应原料;并添加上述化合物和盐中的一种或几种作为助熔剂,研细,混合均匀形成混合料;
(2)将步骤(1)得到的混合体在还原气氛中进行高温焙烧;
(3)将步骤(2)得到焙烧产物再经后处理过程,即制得本发明的荧光粉。
4、根据权利要求3所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(1)中,所述的化合物包括相对应的氧化物、氢氧化物;所述的盐包括相对应的碳酸盐、硝酸盐、有机酸盐。
5、根据权利要求3所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(1)中,相对于所要制成的荧光粉的总重量,助熔剂的含量为0.001-20wt%。
6、根据权利要求3所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(2)中,高温焙烧为一次,或几次。
7、根据权利要求6所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(2)中,每次高温焙烧温度为500~1600℃。
8、根据权利要求6或7所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(2)中,每次高温焙烧时间为0.5~15小时。
9、根据权利要求3所述的制造白光LED用荧光粉的方法,其特征在于:所述步骤(3)中,后处理过程包括破碎、气流粉碎、除杂、烘干、分级。
10、根据权利要求9所述的制造白光LED用荧光粉的方法,其特征在于:所述的除杂过程包括酸洗、碱洗或水洗。
11、根据权利要求9所述的制造白光LED用荧光粉的方法,其特征在于:所述的分级过程采用沉降法、筛分法、水力分级和气流分级方法中的至少一种。
12、一种电光源,其特征在于:至少含有紫外、紫光或蓝光LED芯片和以下所述的荧光粉,该荧光粉同时含有稀土、硅、碱土金属、卤素、氧,以及铝或镓,其中,所述的稀土为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,以及Ce、Eu和Tb中至少一种;所述的碱土金属为Mg、Ca、Sr和Ba中至少一种;所述的卤素为F和Cl中至少一种。
13、一种电光源,其特征在于:至少含有紫外、紫光或蓝光LED芯片和以下所述的荧光粉aLn2O3·MO·bM’2O3·fSiO2·cAXe:dR,其中,Ln为Sc、Y、La、Pr、Nd、Gd、Ho、Yb和Sm中至少一种,
M为Ca、Sr和Ba中至少一种,
M’为Al和Ga中至少一种,
A为Li、Na、K、Mg、Ca、Sr和Ba中至少一种,
X为F和Cl中至少一种,
R为Ce、Eu、Tb和Mn中至少一种,
0.01≤a≤2,0.35≤b≤4,0.01≤c≤1,0.01≤d≤0.3,0.01≤f≤3,0.6≤e≤2.4。
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101307228B (zh) * 2008-02-29 2011-11-30 中国计量学院 氯铝硅酸盐荧光粉及其制备方法
CN105670626A (zh) * 2015-12-21 2016-06-15 厦门百嘉祥微晶材料科技股份有限公司 一种超大粒径YAG:Ce3+黄色荧光粉及其制备方法
CN116875303A (zh) * 2023-06-02 2023-10-13 常熟理工学院 一种铝酸盐基红发光材料及其制备方法、应用

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101182416B (zh) * 2006-11-13 2010-09-22 北京有色金属研究总院 含二价金属元素的铝酸盐荧光粉及制造方法和发光器件
US8329060B2 (en) * 2008-10-22 2012-12-11 General Electric Company Blue-green and green phosphors for lighting applications
US8703016B2 (en) 2008-10-22 2014-04-22 General Electric Company Phosphor materials and related devices
KR20100070731A (ko) 2008-12-18 2010-06-28 삼성전자주식회사 할로실리케이트 형광체, 이를 포함하는 백색 발광 소자
JP5391946B2 (ja) * 2009-09-07 2014-01-15 日亜化学工業株式会社 蛍光体及びそれを用いた発光装置並びに蛍光体の製造方法
CN101705095B (zh) * 2009-09-21 2011-08-10 四川新力光源有限公司 黄光余辉材料及其制备方法和使用它的led照明装置
KR101098006B1 (ko) * 2009-09-29 2011-12-23 한국화학연구원 (할로)실리케이트계 형광체 및 이의 제조방법
WO2011123538A2 (en) * 2010-03-31 2011-10-06 Osram Sylvania Inc. Phosphor and leds containing same
US8932486B2 (en) 2011-04-07 2015-01-13 Performance Indicator, Llc Persistent phosphors of alkaline earths modified by halides and 3d ions
CN104342156B (zh) * 2013-07-30 2016-08-10 宁波升谱光电股份有限公司 一种荧光粉及其制备方法和含该荧光粉的发光器件
CN103980900B (zh) * 2014-06-04 2015-05-20 重庆理工大学 一种硅酸盐蓝光荧光粉及其制备方法
EP4131502A4 (en) * 2020-03-31 2023-09-20 Panasonic Intellectual Property Management Co., Ltd. SOLID ELECTROLYTE MATERIAL, BATTERY THEREOF AND METHOD FOR PRODUCING A SOLID ELECTROLYTE MATERIAL

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US446538A (en) * 1891-02-17 Cultivator
GB1326868A (en) 1971-04-16 1973-08-15 Tokyo Shibaura Electric Co Cathode ray tube for a flying spot scanner
BE786655A (fr) 1971-07-24 1973-01-24 Philips Nv Tube a rayons cathodiques muni d'un silicate luminescent
BE789747A (fr) 1971-10-07 1973-04-05 Philips Nv Ecran luminescent
JP2897355B2 (ja) * 1990-07-05 1999-05-31 株式会社ニコン アライメント方法,露光装置,並びに位置検出方法及び装置
US5591958A (en) * 1993-06-14 1997-01-07 Nikon Corporation Scanning exposure method and apparatus
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JP3555230B2 (ja) * 1994-05-18 2004-08-18 株式会社ニコン 投影露光装置
JPH08250402A (ja) * 1995-03-15 1996-09-27 Nikon Corp 走査型露光方法及び装置
PT877070E (pt) 1996-01-22 2003-08-29 Kasei Optonix Fosforo fotossensivel
CN1244018C (zh) * 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands Bv In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
US6381013B1 (en) * 1997-06-25 2002-04-30 Northern Edge Associates Test slide for microscopes and method for the production of such a slide
JPH1116816A (ja) * 1997-06-25 1999-01-22 Nikon Corp 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
DE19730005C2 (de) * 1997-07-12 1999-11-25 Walter Tews Silikat-Borat-Leuchtstoffe
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
US6819414B1 (en) * 1998-05-19 2004-11-16 Nikon Corporation Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method
US6036586A (en) * 1998-07-29 2000-03-14 Micron Technology, Inc. Apparatus and method for reducing removal forces for CMP pads
DE69930398T2 (de) * 1999-09-20 2006-10-19 Nikon Corp. Belichtungssystem mit einem parallelen Verbindungsmechanismus und Belichtungsverfahren
US6627112B2 (en) * 1999-12-24 2003-09-30 Sumitomo Chemical Company, Limited Phosphor for vacuum ultraviolet excited light emitting device
US20020041377A1 (en) * 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
AT410266B (de) 2000-12-28 2003-03-25 Tridonic Optoelectronics Gmbh Lichtquelle mit einem lichtemittierenden element
EP1231514A1 (en) * 2001-02-13 2002-08-14 Asm Lithography B.V. Measurement of wavefront aberrations in a lithographic projection apparatus
TWI302549B (en) * 2001-10-05 2008-11-01 Shinetsu Chemical Co Perfluoropolyether-modified silane, surface treating agent, and antireflection filter
US6828542B2 (en) * 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
CN1492284A (zh) * 2002-06-14 2004-04-28 Asml 有光学元件的光刻投射装置、器件的生产方法及其器件
JP4263453B2 (ja) * 2002-09-25 2009-05-13 パナソニック株式会社 無機酸化物及びこれを用いた発光装置
US7383843B2 (en) * 2002-09-30 2008-06-10 Lam Research Corporation Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
CN101424883B (zh) * 2002-12-10 2013-05-15 株式会社尼康 曝光设备和器件制造法
JP2004231786A (ja) * 2003-01-30 2004-08-19 Tosoh Corp 蛍光体及び発光素子
KR101940892B1 (ko) * 2003-06-13 2019-01-21 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
JP4343597B2 (ja) * 2003-06-25 2009-10-14 キヤノン株式会社 露光装置及びデバイス製造方法
JP2005019616A (ja) * 2003-06-25 2005-01-20 Canon Inc 液浸式露光装置
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
DE60308161T2 (de) * 2003-06-27 2007-08-09 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
EP1494074A1 (en) * 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1470598A (zh) * 2003-07-08 2004-01-28 重庆上游发光材料有限公司 一种晶格缺陷可调控型长余辉发光材料
US7738074B2 (en) * 2003-07-16 2010-06-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1500982A1 (en) * 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7779781B2 (en) * 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005057294A (ja) * 2003-08-07 2005-03-03 Asml Netherlands Bv インタフェースユニット、該インタフェースユニットを含むリソグラフィ投影装置、及びデバイス製造方法
TWI263859B (en) * 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
TWI245163B (en) * 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE10339839A1 (de) * 2003-08-29 2005-03-24 General Electric Co. Leuchtstoffmischungen für Leuchtstofflampen
JP4378136B2 (ja) * 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
JP3870182B2 (ja) * 2003-09-09 2007-01-17 キヤノン株式会社 露光装置及びデバイス製造方法
DE60302897T2 (de) * 2003-09-29 2006-08-03 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1519230A1 (en) * 2003-09-29 2005-03-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158211B2 (en) * 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005136374A (ja) * 2003-10-06 2005-05-26 Matsushita Electric Ind Co Ltd 半導体製造装置及びそれを用いたパターン形成方法
EP1524557A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1524558A1 (en) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) * 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
EP1531362A3 (en) * 2003-11-13 2007-07-25 Matsushita Electric Industrial Co., Ltd. Semiconductor manufacturing apparatus and pattern formation method
DE10355301B3 (de) * 2003-11-27 2005-06-23 Infineon Technologies Ag Verfahren zur Abbildung einer Struktur auf einen Halbleiter-Wafer mittels Immersionslithographie
JP2005175034A (ja) * 2003-12-09 2005-06-30 Canon Inc 露光装置
JP4308638B2 (ja) * 2003-12-17 2009-08-05 パナソニック株式会社 パターン形成方法
KR101257960B1 (ko) * 2004-06-04 2013-04-24 칼 짜이스 에스엠테 게엠베하 광학적 결상 시스템의 결상 품질을 측정하기 위한 시스템
WO2006012234A2 (en) 2004-06-25 2006-02-02 Sarnoff Corporation Nitride phosphors and devices
JP2006270057A (ja) * 2005-02-28 2006-10-05 Canon Inc 露光装置
TWI267944B (en) * 2005-08-03 2006-12-01 Ind Tech Res Inst Non-volatile memory device and fabricating method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101307228B (zh) * 2008-02-29 2011-11-30 中国计量学院 氯铝硅酸盐荧光粉及其制备方法
CN105670626A (zh) * 2015-12-21 2016-06-15 厦门百嘉祥微晶材料科技股份有限公司 一种超大粒径YAG:Ce3+黄色荧光粉及其制备方法
CN105670626B (zh) * 2015-12-21 2017-11-10 厦门百嘉祥微晶材料科技股份有限公司 一种超大粒径YAG:Ce3+黄色荧光粉及其制备方法
CN116875303A (zh) * 2023-06-02 2023-10-13 常熟理工学院 一种铝酸盐基红发光材料及其制备方法、应用

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KR20080110857A (ko) 2008-12-19
US20090050918A1 (en) 2009-02-26
DE112007000656T5 (de) 2009-02-12
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