CN100574956C - 焊接底金属并在焊接过程中形成低氧化物涂层的方法 - Google Patents
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Abstract
提出焊接底金属并在焊接过程中形成低氧化物涂层的方法。用于焊接喷枪(54)的局部环境单元(10),包括具有顶面和底面(24)的圆环(12),其中圆环(12)适合于被固定在喷枪(54)的外周(15)上;和多个放射状位于圆环(12)周围的流体通道(20),包括多个在圆环(12)的底面(24)上的开口,这些开口与向此处提供真空的真空源(26)流体连通。该局部环境单元(10)的使用允许局部粘结涂层的沉积,并使得与焊接修补过程相关的步骤数目最小化。例如,局部环境单元(10)的使用允许焊接,并在焊接操作中低氧化物粘结涂层的形成,借此在焊接操作后就不再需要将底金属(52)放入一个单独的喷射单元中,以沉积粘结涂层。
Description
技术领域
本发明总体上涉及如焊接和等离子体喷涂的工艺和装置,诸如希望用于制造、恢复或修复金属物件的工艺和装置。本发明尤其涉及一种制备低氧化粘结层的焊接工艺和装置,以及在焊接过程中提供粘结涂层的方法。
背景技术
多种金属都使用于工业应用中。当这些应用包括操作条件的要求时,通常需要特殊金属。例如,燃气轮机内的元件在高温环境下操作。许多这样的元件是由镍基和钴基超合金形成的。因为这些元件必须经受在约1100℃~约1150℃范围下连续工作的温度,所以这些超合金常常涂覆有热障涂层(TBC)系统。这些涂层系统通常包括直接施加到超合金底金属的下部粘结涂层,和覆盖该粘结涂层的陶瓷基保护涂层。对于喷气式发动机来说,涂层被施加到各种超合金的表面,如涡轮叶片和导流叶片、燃烧室衬套和燃烧室喷嘴。
与其他燃气轮机部件一样,燃气轮机操作者发现定期修补热障涂层部分以使其恢复到理想条件是非常值得的。通常,如果该零件可以修补,就要经过包括各种操作的修补循环。该修补循环可以包括如下操作,焊接修补以填充裂缝和/或恢复接点公差,铜焊修补以填充裂缝和/或恢复或改变导流叶片的等级,接点修补以恢复磨损触头,和其它步骤。修补循环还包括粘结涂层以及热障涂层的再施加。相应地,修补过程通常包括需要不同装置设备的各种或处理步骤。例如,可以利用各种焊接装配和焊接的特殊加工工艺来进行焊接,以修补底金属。焊接之后可以施用粘结涂层,通常要求将需要修补的部分转移到喷射单元。因此,需要两个独立的操作来影响焊接修补和等离子体喷射涂层如粘结涂层的应用。
TBC系统的效果常常用它从其所保护的底金属上分层之前所能经受的热循环次数来衡量。总的来说,涂层效力随所经受温度的升高而降低。TBC的失效常常归咎于与粘结涂层多少有关的不足或缺陷,如,粘结涂层的微观结构或粘结涂层-底金属界面或粘结涂层-TBC界面的失效。因此,粘结涂层性能的小心控制对于底金属足够且延长的保护来说是很重要的。
目前工艺中的一个问题是,粘结涂层在普通热喷涂过程中容易受空气氧化。氧化产物通常被包括在涂层中,而且得到的粘结涂层通常较硬且更耐磨。然而,涂层中氧化物的存在对腐蚀性、强度和机加工性能造成不利影响。尽管发展了各种工艺如HVOF来改善涂层的其它性能,如密度、多孔性及其它,但是,这些方法相对昂贵,而且由于很容易就会在其等离子体供料束中引入氧气,因此提供一种在涂层过程中形成氧化物的固有机理。此外,如上所述,通常需要使用单独受控喷射单元,以在涂层过程中移动部件。
发明内容
本文公开的是用于焊接喷枪的局部环境单元。该局部环境单元包括具有顶面和底面的圆环,其中圆环适合于被固定在喷枪外周上;多个放射状布置在圆环周围的流体通道,包括多个在圆底面上与向此处提供真空的真空源流体连通的开口。
本文同时还公开了焊接枪和局部环境单元的结合,该结合包括:一包括位于壳体内的永久电极的焊接枪,其中壳体包括惰性气体通过的流体通道;和固定在焊接枪外周上的局部环境单元,局部环境单元包括限定焊接枪壳体并具有顶面和底面的圆环,其中该圆环还包括多个径向配置在圆环周围的流体通道,该圆环具有多个在该环底面上与向该处提供真空的真空源流体连通的开口。
一种焊接底金属并在焊接过程中形成低氧化物粘结涂层的工艺过程,该过程包括在被焊接的底金属上的一区域周围圆周地维持惰性气氛,其中维持惰性气氛的步骤包括在带局部环境单元的等离子体弧周围沿圆周形成真空;焊接所述底金属并在底金属区内形成熔池,其中熔池具有前缘和尾缘;在熔池固化时或固化在底金属上有效地形成一粘结涂层的数量之前选择性地在尾缘处沉积粉末。
根据另一个实施例,形成低氧化物的过程包括:在工件顶上形成等离子体弧;在带局部环境单元的等离子体弧周围圆周地形成真空,其中局部环境单元包括与等离子体喷枪的外周边接合以形成等离子体弧的圆环,该圆环包括多个流体通道,其开口位于底金属上方以使得微粒、未反应的粉末、臭氧和来自底金属的烟气被真空抽走;将运载气体中的粉末传递到工件以产生低氧化物涂层。
上述和其他特征以下面的详细描述和附图作为例证。
附图说明
现在参照附图,其中相同的元件有相似的编号。
图1是一个局部环境单元和等离子体喷枪的部分透视图;
图2是图1中局部环境单元的俯视图;
图3是图1中局部环境单元的仰视图;
图4是等离子体转移弧形焊矩系统的示意图;和
图5是根据本发明制成的粘结涂层的显微照片,其氧化物含量为10%。
具体实施方式
现在参照图1~3,示出了总体上用10标记的局部环境单元,用于在控制气氛下实现如等离子体转移弧(PTA)或气体保护钨极弧(GTA)焊接工艺的焊接操作。诸如PTA和GTA焊接工艺的焊接方法通常在永久钨极电极附近通入惰性气体,如氩气、氦气和类似气体,这是本领域公知的。惰性气体保护电极,并且通常保护由通过将底金属暴露在等离子体下而形成的熔池。局部环境单元10消除了用于控制焊接喷枪和等同体周围气氛的单独喷射单元的需要,增加了焊接操作的多功能性,这是有利的,这里将对其进行讨论。局部环境单元在熔池周围提供了均匀的真空,用以从底金属上移开污染物,并提供一用于臭氧、未反应的粉末、烟气和其它类似物的排出机构。
该局部环境单元10包括圆环12。该圆环12的内径优选为有螺纹,尺寸能容纳焊接喷枪14的外径,该焊接喷枪具有互补螺纹的外表面16,用于将圆环12螺纹连接到喷枪14上。如箭头18所示的多个液体管道形成于圆环12内。如图所示,这些多个液体管道18包括八个径向固定在圆环12外周上并且与位于圆底面24的入口22流体连通的管子20。液体通道优选在圆环12周围均匀间隔开,以提供均匀、受控的真空。尽管图示为八个管子,但可以依据所需要的结构和应用来使用更多或更少的管子。此外,位于圆底面24且与管20流体连通的入口22的数量可以根据所需要的应用来增加或减少。
圆环12可以包括一圆内的环形通道(未示出),各个流体通道18在其中同时或择一地流体连通,如图所示,每个流体通道18代表一个单独的通道。真空源26与通道18流体连通,以向该处提供真空。采用这种方式,在局部环境单于10进行与焊接操作,如PTA焊接操作相关的操作过程中,焊接期间臭氧、微粒物质、烟气和类似物的连续移开能有利地完成。因为局部环境单元10直接固定在焊接喷枪20上,真空开口非常接近熔池或者底金属以被等离子体涂覆。关于各种现有喷射技术中使用单独喷射单元来控制环境的必要性不再需要,因为该局部环境单元在等离子体弧和熔池的周围提供了一个容器中心。以这种方式使用单元10,使最后的用户能够将局部等离子体喷射作为焊接修复工艺的一部分,例如,借此提供显著的商业优势。更重要的是,低氧化物粘结涂层利用喷枪结合局部环境单元10来形成。这些优点将在下面更详细地论述。
现在参照附图4,该图示出了适于焊接金属工件52的典范性的等离子体转移弧(PTA)焊炬系统50。系统50总体上包括一等离子体转移弧焊炬54,气体供应源58、60,粉末给料供应或漏斗62。焊炬54包括一电源66,其中一连接在焊炬54上的电导线68和连接在提供电接地的工件52上的另一电导线70。气体供应源58使用导管72与焊炬54流体连通,以向焊炬54供应保护气体和/或等离子体气体,如氩气或氩气与氦气的混合气体、或类似气体,用来形成等离子体,并在熔池和等离子体弧周围提供合适的保护气体。局部环境单元10被示位于焊炬54的外周,并与真空源26流体连通。
等离子气体通常以公知的方式供给到焊炬54的环形腔中,环绕并隔离电极头以形成引弧。保护气体通常被供给到焊炬的下部,并依据环形路径分布以充分保护在焊接操作过程中产生的熔池,使其免受任何外部化学污染物,如氧气。局部环境单元的使用进一步加强了对外部污染物的保护,以从底金属移开烟气、臭氧、多余的粉末和其他物。气体供应源60向漏斗62提供了用于将粉末运送到焊炬54中的运载气体,优选氩气或氮气。
粉末漏斗62与焊炬54流体连通,并从粉末漏斗62接收粉末74,且经过流体导管78从气体供应源60接收运载气体76,如氩气或氮气。运载气体76以低于受控流速提供,用来将粉末74传送给焊炬54。粉末通常是金属装填物微粒,用于粘结涂层,可以包括Ni、Cr、Co、Bo、Fe、W和WC,根据所需要的应用进行具体的选择。
管状的排除物挡板或边缘典型地可以环绕着喷枪喷嘴,以容纳平衡容量的保护气体并取代那里的氧气。在这种情况下,局部环境单元10固定在边缘上。保护气体提供了一个暂时排除区域,在这个区域内等离子体弧76被维持并接收喷射进来对工件12焊接或覆层的粉末。尽管边缘与基本单元10结合能提供一个涂层中降低的氧含量水平,但是等离子体环境下,氧气的存在完全消失,借此提供了沉淀低氧化物粘结涂层的能力以及阻止氧化物粉末进入粘结涂层结合的能力。因此,粘结涂层中氧化物的水平将显著降低,密度显著增加。
为了形成如粘结涂层这样的涂层,对经过弧的氩气离子化以建立等离子体弧,氩气经过的弧是由永久钨极电极(-)和工件之间形成的。该弧通常被称为“转移弧”。该转移弧受等离子体喷嘴约束,得到温度在约10000℃至约15000℃的“等离子体柱”。由弧释放的能量与当前使用的弧和弧长度成比例。粉状金属以受控的速度经过注射口被供给到等离子体流中和/或周围,随后被弧加热到熔融状态。熔融的材料被放置在底金属上。
等离子体能量和粉末供给速度之间的联系决定了熔化工件所需维持的“弧能量”的数量。其结果是,达到了对进入工件中深度的极好的控制。保护气体经过大的外部喷嘴被输送,保护等离子体周围的底金属区域免受氧化。精心制作的冷却系统典型地用来以本领域技术人员公知的方式将等离子体焊炬的温度维持在可以接受的水平。
如上所述,局部环境单元10与焊接喷枪一起提供了在需要沉淀粘结涂层、外涂层或类似的应用中氧化物水平的进一步降低。粘结涂层的基本目的是为随后的热障涂层涂覆在金属底金属提供改善的粘着力。粘结涂层,如MCrAlY,被施加到元件超合金底金属部分作为第一层,其中M为Fe、Ni、Co,或Ni和Co的混合物或另一种金属或合金,如铪和硅或扩散铝化物,通常该元件超合金底金属为镍基或钴基超合金底金属。粘结涂层可以抗氧化和抗腐蚀,并且能作为外涂层的力学粘结表面。外涂层的一个例子是为防止金属与燃气轮机共有的热气流发生反应的热障涂层。
粘结涂层的厚度取决于多种因素,如成分所需要的抗氧化和抗腐蚀的能力以及材料的成本。零件的形状和尺寸同样也要考虑,因为粘结层的厚度不能超过尺寸公差。零件的重量限制是考虑的一个附加因素(尤其对于机翼而言),因为粘结涂层会增加元件的一些重量。总的来说,厚度应在约50微米至约500微米的范围内,优选在约100微米至约400微米的范围内。在特别优选的实施例中,厚度应在约200微米至约300微米的范围内。
在一个实施例中,粘结涂层在焊接操作的过程中同时沉积下来。焊接操作通常包括使用局部环境单元10和焊接枪一起如前述方式在底金属上形成熔池。熔池为熔融状态,具有前缘和尾缘。适于形成粘结涂层的粉末有选择地沉积在尾缘上,熔池的尾缘比前缘温度低。粉末在固化之前立即沉积,或在固化的同时沉积在尾缘。采用这种方式,粉末不需完全融解在熔池中就可以形成具有高抗张强度的大体离散的粘结涂层。得到的粘结涂层适于在那里热喷涂TBC。局部环境单元10以上述方式减少了粘结涂层中的氧化物含量,并借此提供了致密的粘结涂层。有利的是,由于焊接过程中粘结涂层的沉积消除了在焊接操作完成后热喷涂粘结涂层中通常用到的单独步骤,所以循环时间减少了。
尽管参照示范性的实施例对本发明进行了描述,但是本领域技术人员应当这样理解,各种改变和对其等同替换都没有脱离本公开内容的范围。此外,在本发明教导下,为适应特殊场合或材料所做出的各种修改都没有离开本发明的实质范围。因此,并无意将本公开内容限于如设想用于实施本公开内容的最佳实施方式那样公开的特定实施例,但是,本公开内容将包括落在所附权利要求书的范围中的全部实施例。
零件表
10单元
12圆环
14喷枪
16外表面
18流体通道
20管
22入口
24底面
26真空源
30底金属
50系统
52工件
54焊炬
58气体供应源
60气体供应源
62粉末给料供应/漏斗
66电源
68电导线
70电导线
72导管
74粉末
76运载气体
78流体导管
Claims (7)
1.一种焊接底金属并在焊接过程中形成低氧化物粘结涂层的工艺方法,包括:
在待焊接的底金属(52)区周围维持惰性气氛,其中维持该惰性气氛的步骤包括以局部环境单元(10)在等离子体转移弧周围形成真空;
焊接底金属(52),并在待焊接的底金属(52)区内形成熔池,其中该熔池具有前缘和尾缘;
在该熔池固化时或固化在底金属(52)上形成一粘结涂层之前,选择性地在该尾缘处沉积粉末。
2.如权利要求1所述的工艺方法,其特征在于:形成该熔池的步骤包括在等离子体转移弧工具(54)中形成等离子体,并使待焊接的底金属区的一部分暴露给该等离子体。
3.如权利要求1或2所述的工艺方法,其特征在于还包括在该粘结涂层上沉积一热障涂层。
4.如权利要求2所述的工艺方法,其特征在于:在等离子体转移弧工具(54)中形成该等离子体的步骤包括,在等离子体转移弧工具(54)中的电极和底金属(52)之间形成等离子弧,并通过该等离子弧引入惰性气体。
5.如权利要求1或2所述工艺方法,其特征在于:该粘结涂层包括MCrAlY,其中M选自由Fe、Ni、Co与Ni与Co的混合物组成的组群。
6.如权利要求1或2所述工艺方法,其特征在于,包括在底金属顶上形成该等离子体转移弧和以运载气体方式将粉末输送到该底金属以产生该粘结涂层。
7.一种按照前述任一权利要求的工艺方法涂以粘结层并修复的涡轮机部件。
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JP4731150B2 (ja) | 2011-07-20 |
EP1524061A2 (en) | 2005-04-20 |
EP1524061A3 (en) | 2005-08-03 |
EP1524061B1 (en) | 2008-07-09 |
US20050077272A1 (en) | 2005-04-14 |
JP2005146413A (ja) | 2005-06-09 |
DE602004014868D1 (de) | 2008-08-21 |
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US6963044B2 (en) | 2005-11-08 |
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