CN100570814C - 用于形成嵌段共聚物图形的方法及相应的半导体结构 - Google Patents
用于形成嵌段共聚物图形的方法及相应的半导体结构 Download PDFInfo
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- CN100570814C CN100570814C CN200710008274.5A CN200710008274A CN100570814C CN 100570814 C CN100570814 C CN 100570814C CN 200710008274 A CN200710008274 A CN 200710008274A CN 100570814 C CN100570814 C CN 100570814C
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- polymer blocks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24488—Differential nonuniformity at margin
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/2457—Parallel ribs and/or grooves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
- Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Graft Or Block Polymers (AREA)
- Formation Of Insulating Films (AREA)
- Element Separation (AREA)
Abstract
Description
Claims (37)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/345,812 US7347953B2 (en) | 2006-02-02 | 2006-02-02 | Methods for forming improved self-assembled patterns of block copolymers |
US11/345,812 | 2006-02-02 |
Publications (2)
Publication Number | Publication Date |
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CN101013662A CN101013662A (zh) | 2007-08-08 |
CN100570814C true CN100570814C (zh) | 2009-12-16 |
Family
ID=38320999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710008274.5A Active CN100570814C (zh) | 2006-02-02 | 2007-01-26 | 用于形成嵌段共聚物图形的方法及相应的半导体结构 |
Country Status (4)
Country | Link |
---|---|
US (3) | US7347953B2 (zh) |
JP (1) | JP5241106B2 (zh) |
CN (1) | CN100570814C (zh) |
TW (1) | TWI434297B (zh) |
Families Citing this family (106)
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JP3940546B2 (ja) * | 1999-06-07 | 2007-07-04 | 株式会社東芝 | パターン形成方法およびパターン形成材料 |
JP3793040B2 (ja) * | 2001-05-09 | 2006-07-05 | 株式会社東芝 | 記録媒体およびその製造方法 |
WO2003007399A2 (en) * | 2001-07-09 | 2003-01-23 | Plastic Logic Limited | Low melting point polymer alignment |
US6746825B2 (en) * | 2001-10-05 | 2004-06-08 | Wisconsin Alumni Research Foundation | Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates |
EP1400555A1 (en) * | 2002-09-17 | 2004-03-24 | Kawamura Institute Of Chemical Research | Water-soluble block copolymer and production method therefor |
US7030495B2 (en) * | 2004-03-19 | 2006-04-18 | International Business Machines Corporation | Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby |
US6930322B1 (en) * | 2004-03-26 | 2005-08-16 | Matsushita Electric Industrial Co., Ltd. | Combination insulator and organic semiconductor formed from self-assembling block co-polymers |
JP4297831B2 (ja) * | 2004-04-28 | 2009-07-15 | 独立行政法人科学技術振興機構 | 配向の制御されたミクロ相分離構造膜の製法 |
US8287957B2 (en) * | 2004-11-22 | 2012-10-16 | Wisconsin Alumni Research Foundation | Methods and compositions for forming aperiodic patterned copolymer films |
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JP2007208255A (ja) | 2007-08-16 |
US7709079B2 (en) | 2010-05-04 |
US7347953B2 (en) | 2008-03-25 |
US20080102252A1 (en) | 2008-05-01 |
US7820270B2 (en) | 2010-10-26 |
CN101013662A (zh) | 2007-08-08 |
JP5241106B2 (ja) | 2013-07-17 |
TWI434297B (zh) | 2014-04-11 |
TW200802421A (en) | 2008-01-01 |
US20070175859A1 (en) | 2007-08-02 |
US20090297778A1 (en) | 2009-12-03 |
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