CN100492649C - 具有紧凑像素布局的图像传感器 - Google Patents
具有紧凑像素布局的图像传感器 Download PDFInfo
- Publication number
- CN100492649C CN100492649C CNB2005101260473A CN200510126047A CN100492649C CN 100492649 C CN100492649 C CN 100492649C CN B2005101260473 A CNB2005101260473 A CN B2005101260473A CN 200510126047 A CN200510126047 A CN 200510126047A CN 100492649 C CN100492649 C CN 100492649C
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- CN
- China
- Prior art keywords
- active area
- imageing sensor
- driving transistors
- transistor
- drain region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/813—Electronic components shared by multiple pixels, e.g. one amplifier shared by two pixels
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020050051555 | 2005-06-15 | ||
| KR1020050051555A KR100718781B1 (ko) | 2005-06-15 | 2005-06-15 | 콤팩트 픽셀 레이아웃을 갖는 cmos 이미지 센서 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1881599A CN1881599A (zh) | 2006-12-20 |
| CN100492649C true CN100492649C (zh) | 2009-05-27 |
Family
ID=37519706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101260473A Expired - Lifetime CN100492649C (zh) | 2005-06-15 | 2005-11-24 | 具有紧凑像素布局的图像传感器 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US7700950B2 (enExample) |
| JP (2) | JP5183875B2 (enExample) |
| KR (1) | KR100718781B1 (enExample) |
| CN (1) | CN100492649C (enExample) |
| TW (1) | TWI299902B (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8508638B2 (en) | 2005-03-14 | 2013-08-13 | Intellectual Ventures Ii Llc | 3T pixel for CMOS image sensors with low reset noise and low dark current generation utilizing parametric reset |
| KR100718781B1 (ko) | 2005-06-15 | 2007-05-16 | 매그나칩 반도체 유한회사 | 콤팩트 픽셀 레이아웃을 갖는 cmos 이미지 센서 |
| US7671314B2 (en) * | 2005-07-09 | 2010-03-02 | Samsung Electronics Co., Ltd. | Image sensor including active pixel sensor array with photoelectric conversion region |
| KR100778854B1 (ko) * | 2005-12-29 | 2007-11-22 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서 및 그 제조방법 |
| KR100688589B1 (ko) * | 2006-03-10 | 2007-03-02 | 삼성전자주식회사 | 필 팩터가 증대된 이미지 센서 및 그의 제조방법 |
| KR100826941B1 (ko) * | 2006-07-28 | 2008-05-02 | 엠텍비젼 주식회사 | 이미지 센서의 배치 구조 |
| KR100829383B1 (ko) * | 2006-12-27 | 2008-05-13 | 동부일렉트로닉스 주식회사 | 시모스 이미지 센서 |
| KR100922931B1 (ko) | 2006-12-27 | 2009-10-22 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서 및 그 제조 방법 |
| US7924333B2 (en) | 2007-08-17 | 2011-04-12 | Aptina Imaging Corporation | Method and apparatus providing shared pixel straight gate architecture |
| US7989749B2 (en) * | 2007-10-05 | 2011-08-02 | Aptina Imaging Corporation | Method and apparatus providing shared pixel architecture |
| US20090102211A1 (en) * | 2007-10-22 | 2009-04-23 | Amir Antar | Portable pet waste receptacle |
| KR101393633B1 (ko) | 2007-10-31 | 2014-05-09 | 삼성디스플레이 주식회사 | 엑스레이 검출 패널, 엑스레이 검출기 및 엑스레이검출기의 구동 방법 |
| US20090237540A1 (en) * | 2008-03-20 | 2009-09-24 | Micron Technology, Inc. | Imager method and apparatus having combined gate signals |
| US7833819B2 (en) | 2008-07-23 | 2010-11-16 | Aptina Imaging Corporation | Method and apparatus for decreasing storage node parasitic charge in active pixel image sensors |
| US8350939B2 (en) | 2008-10-01 | 2013-01-08 | Micron Technology, Inc. | Vertical 4-way shared pixel in a single column with internal reset and no row select |
| KR101211085B1 (ko) | 2008-12-03 | 2012-12-12 | 한국전자통신연구원 | 공유 포토 다이오드 이미지 센서 |
| JP4760915B2 (ja) * | 2009-01-08 | 2011-08-31 | ソニー株式会社 | 固体撮像素子 |
| KR20120047368A (ko) * | 2010-11-02 | 2012-05-14 | 삼성전자주식회사 | 이미지 센서 |
| JP5864990B2 (ja) * | 2011-10-03 | 2016-02-17 | キヤノン株式会社 | 固体撮像装置およびカメラ |
| KR102017713B1 (ko) | 2012-05-31 | 2019-09-03 | 삼성전자주식회사 | 시모스 이미지 센서 |
| JP6231741B2 (ja) | 2012-12-10 | 2017-11-15 | キヤノン株式会社 | 固体撮像装置およびその製造方法 |
| US9287313B2 (en) | 2013-03-12 | 2016-03-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Active pixel sensor having a raised source/drain |
| US9190435B2 (en) * | 2014-03-09 | 2015-11-17 | Himax Imaging Limited | Shared active pixel sensor |
| KR102366416B1 (ko) | 2014-08-11 | 2022-02-23 | 삼성전자주식회사 | Cmos 이미지 센서 |
| JP6213743B2 (ja) * | 2014-10-08 | 2017-10-18 | パナソニックIpマネジメント株式会社 | 撮像装置およびその駆動方法 |
| KR101908286B1 (ko) * | 2017-02-23 | 2018-10-16 | (주)멜파스 | 커패시턴스 검출 방법 및 이를 이용하는 커패시턴스 검출 장치 |
| KR102651393B1 (ko) * | 2019-04-05 | 2024-03-27 | 에스케이하이닉스 주식회사 | 쉴딩 배선을 갖는 이미지 센서 |
| KR20200118723A (ko) * | 2019-04-08 | 2020-10-16 | 삼성전자주식회사 | 픽셀 그룹들을 포함하는 이미지 센서 및 이를 포함하는 전자 장치 |
| CN113629090B (zh) * | 2021-08-17 | 2024-10-15 | 思特威(上海)电子科技股份有限公司 | 一种像素、图像传感器及其制备方法、图像采集装置 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US5625210A (en) | 1995-04-13 | 1997-04-29 | Eastman Kodak Company | Active pixel sensor integrated with a pinned photodiode |
| JPH10256520A (ja) * | 1997-03-14 | 1998-09-25 | Toshiba Corp | 増幅型固体撮像装置 |
| US6160281A (en) | 1997-02-28 | 2000-12-12 | Eastman Kodak Company | Active pixel sensor with inter-pixel function sharing |
| US6107655A (en) | 1997-08-15 | 2000-08-22 | Eastman Kodak Company | Active pixel image sensor with shared amplifier read-out |
| JP3496918B2 (ja) | 1997-12-26 | 2004-02-16 | キヤノン株式会社 | 固体撮像装置 |
| JPH11312822A (ja) | 1998-04-28 | 1999-11-09 | Seiko Instruments Inc | イメージセンサー |
| US6466266B1 (en) | 1998-07-28 | 2002-10-15 | Eastman Kodak Company | Active pixel sensor with shared row timing signals |
| TW398078B (en) | 1998-10-02 | 2000-07-11 | United Microelectronics Corp | Manufacturing method of CMOS image sensor |
| US6657665B1 (en) * | 1998-12-31 | 2003-12-02 | Eastman Kodak Company | Active Pixel Sensor with wired floating diffusions and shared amplifier |
| TW486816B (en) | 1999-05-21 | 2002-05-11 | United Microelectronics Corp | Structure and manufacturing method of image sensor |
| US6326652B1 (en) * | 1999-06-18 | 2001-12-04 | Micron Technology, Inc., | CMOS imager with a self-aligned buried contact |
| US6423944B2 (en) * | 2000-01-25 | 2002-07-23 | Ngk Spark Plug Co., Ltd. | Ceramic heater and glow plug with reference zone and condensed zone of ceramics and conductive particles dispersed therein |
| US6407440B1 (en) * | 2000-02-25 | 2002-06-18 | Micron Technology Inc. | Pixel cell with high storage capacitance for a CMOS imager |
| JP4721380B2 (ja) * | 2000-04-14 | 2011-07-13 | キヤノン株式会社 | 固体撮像装置および撮像システム |
| TW488034B (en) | 2001-06-15 | 2002-05-21 | United Microelectronics Corp | Structure of complementary metal oxide semiconductor image sensor and its manufacturing method |
| KR100399952B1 (ko) | 2001-11-16 | 2003-09-29 | 주식회사 하이닉스반도체 | 암전류를 감소시키기 위한 이미지센서의 제조 방법 |
| JP3944829B2 (ja) | 2002-01-17 | 2007-07-18 | ソニー株式会社 | 固体撮像装置およびその駆動方法 |
| CN1437263A (zh) | 2002-02-05 | 2003-08-20 | 双汉科技股份有限公司 | 可降低暗电流的互补式金氧半图像传感器结构及其布局方法 |
| US6835593B2 (en) * | 2002-08-01 | 2004-12-28 | Rohm Co., Ltd. | Method for manufacturing semiconductor device |
| WO2004021444A1 (en) | 2002-08-30 | 2004-03-11 | Koninklijke Philips Electronics N.V. | Image sensor, camera system comprising the image sensor and method of manufacturing such a device |
| JP3720036B2 (ja) * | 2002-10-11 | 2005-11-24 | 岩手東芝エレクトロニクス株式会社 | Cmosイメージセンサ |
| JP3988189B2 (ja) * | 2002-11-20 | 2007-10-10 | ソニー株式会社 | 固体撮像装置 |
| US6730899B1 (en) | 2003-01-10 | 2004-05-04 | Eastman Kodak Company | Reduced dark current for CMOS image sensors |
| KR100558528B1 (ko) | 2003-09-25 | 2006-03-10 | 동부아남반도체 주식회사 | 시모스 이미지 센서 및 그 제조방법 |
| US7443437B2 (en) * | 2003-11-26 | 2008-10-28 | Micron Technology, Inc. | Image sensor with a gated storage node linked to transfer gate |
| JP2005153791A (ja) | 2003-11-27 | 2005-06-16 | Koyo Seiko Co Ltd | ラックピニオン式舵取装置及びラック軸の製造方法 |
| JP4553612B2 (ja) * | 2004-03-18 | 2010-09-29 | ルネサスエレクトロニクス株式会社 | 撮像素子およびそれを備えた撮像装置 |
| US20060255380A1 (en) * | 2005-05-10 | 2006-11-16 | Nan-Yi Lee | CMOS image sensor |
| US7898010B2 (en) * | 2004-07-01 | 2011-03-01 | Micron Technology, Inc. | Transparent conductor based pinned photodiode |
| KR100674925B1 (ko) * | 2004-12-07 | 2007-01-26 | 삼성전자주식회사 | 허니콤 구조의 능동 픽셀 센서 |
| JP4585964B2 (ja) * | 2004-12-16 | 2010-11-24 | パナソニック株式会社 | 固体撮像装置 |
| US7446357B2 (en) * | 2005-05-11 | 2008-11-04 | Micron Technology, Inc. | Split trunk pixel layout |
| US7830437B2 (en) * | 2005-05-11 | 2010-11-09 | Aptina Imaging Corp. | High fill factor multi-way shared pixel |
| KR100718781B1 (ko) * | 2005-06-15 | 2007-05-16 | 매그나칩 반도체 유한회사 | 콤팩트 픽셀 레이아웃을 갖는 cmos 이미지 센서 |
-
2005
- 2005-06-15 KR KR1020050051555A patent/KR100718781B1/ko not_active Expired - Lifetime
- 2005-10-26 US US11/260,010 patent/US7700950B2/en active Active
- 2005-11-03 TW TW094138646A patent/TWI299902B/zh active
- 2005-11-24 CN CNB2005101260473A patent/CN100492649C/zh not_active Expired - Lifetime
-
2006
- 2006-01-26 JP JP2006017038A patent/JP5183875B2/ja active Active
-
2010
- 2010-03-16 US US12/725,396 patent/US8044446B2/en not_active Expired - Lifetime
-
2011
- 2011-09-22 US US13/240,300 patent/US8217437B2/en not_active Expired - Lifetime
-
2012
- 2012-06-06 JP JP2012129174A patent/JP5486639B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060131265A (ko) | 2006-12-20 |
| KR100718781B1 (ko) | 2007-05-16 |
| TWI299902B (en) | 2008-08-11 |
| US7700950B2 (en) | 2010-04-20 |
| US20060284177A1 (en) | 2006-12-21 |
| US20120007157A1 (en) | 2012-01-12 |
| JP2006352070A (ja) | 2006-12-28 |
| JP2012199581A (ja) | 2012-10-18 |
| CN1881599A (zh) | 2006-12-20 |
| TW200644228A (en) | 2006-12-16 |
| JP5183875B2 (ja) | 2013-04-17 |
| JP5486639B2 (ja) | 2014-05-07 |
| US8217437B2 (en) | 2012-07-10 |
| US8044446B2 (en) | 2011-10-25 |
| US20100171157A1 (en) | 2010-07-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: KONO SCIENCE CO., LTD. Free format text: FORMER OWNER: MAGNACHIP SEMICONDUCTOR LTD Effective date: 20090710 |
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| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20090710 Address after: Delaware Patentee after: CROSSTEK CAPITAL, LLC Address before: North Chungcheong Province Patentee before: MagnaChip Semiconductor, Ltd. |
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| CX01 | Expiry of patent term |
Granted publication date: 20090527 |
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| CX01 | Expiry of patent term |