CN100475769C - 多官能光引发剂 - Google Patents

多官能光引发剂 Download PDF

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Publication number
CN100475769C
CN100475769C CN02824160.6A CN02824160A CN100475769C CN 100475769 C CN100475769 C CN 100475769C CN 02824160 A CN02824160 A CN 02824160A CN 100475769 C CN100475769 C CN 100475769C
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CN
China
Prior art keywords
compound
chr
photoinitiator
formula
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN02824160.6A
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English (en)
Chinese (zh)
Other versions
CN1599713A (zh
Inventor
罗杰·爱德华·伯罗
罗伯特·斯蒂芬·戴维森
肖恩·劳伦斯·赫利希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
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Coates Brothers and Co Ltd
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Publication date
Application filed by Coates Brothers and Co Ltd filed Critical Coates Brothers and Co Ltd
Publication of CN1599713A publication Critical patent/CN1599713A/zh
Application granted granted Critical
Publication of CN100475769C publication Critical patent/CN100475769C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/708—Ethers
    • C07C69/712—Ethers the hydroxy group of the ester being etherified with a hydroxy compound having the hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Holo Graphy (AREA)
  • Adhesives Or Adhesive Processes (AREA)
CN02824160.6A 2001-10-18 2002-09-24 多官能光引发剂 Expired - Fee Related CN100475769C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0125099.2A GB0125099D0 (en) 2001-10-18 2001-10-18 Multi-functional photoinitiators
GB0125099.2 2001-10-18

Publications (2)

Publication Number Publication Date
CN1599713A CN1599713A (zh) 2005-03-23
CN100475769C true CN100475769C (zh) 2009-04-08

Family

ID=9924137

Family Applications (1)

Application Number Title Priority Date Filing Date
CN02824160.6A Expired - Fee Related CN100475769C (zh) 2001-10-18 2002-09-24 多官能光引发剂

Country Status (9)

Country Link
US (1) US7166647B2 (enExample)
EP (1) EP1438282B1 (enExample)
JP (1) JP4943632B2 (enExample)
CN (1) CN100475769C (enExample)
AT (1) ATE372316T1 (enExample)
DE (1) DE60222283T2 (enExample)
ES (1) ES2292804T3 (enExample)
GB (1) GB0125099D0 (enExample)
WO (1) WO2003033452A1 (enExample)

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GB2396153A (en) * 2002-12-12 2004-06-16 Sun Chemical Bv Sulfonium salts useful as cationic photoinitiators in energy-curable compositions and processes of preparing cured polymeric compositions
US7538144B2 (en) 2004-07-15 2009-05-26 Agfa Graphics, N.V. Photoreactive polymers
US7795324B2 (en) 2004-07-15 2010-09-14 Agfa Graphics, N.V. Radiation curable compositions
US7507773B2 (en) 2004-07-15 2009-03-24 Agfa Graphics N.V. Radiation curable compositions
US7875698B2 (en) 2004-07-15 2011-01-25 Agfa Graphics Nv Polymeric initiators
WO2008019527A1 (en) * 2006-08-08 2008-02-21 Insight High Technology Co., Ltd. Phenyl benzophenone derivates and uses as photoinitiators
CN100569731C (zh) * 2006-08-08 2009-12-16 北京英力科技发展有限公司 苯基二苯甲酮衍生物及其作为光引发剂的用途
US20080250739A1 (en) * 2006-11-08 2008-10-16 Nova Chemicals Inc. Foamed plastic structures
CN101434543B (zh) * 2007-02-12 2011-09-14 北京英力科技发展有限公司 多官能二苯甲酮衍生物及其作为光引发剂的用途
WO2008098414A1 (en) * 2007-02-12 2008-08-21 Insight High Technology Co., Ltd. Polyfunctional benzophenone derivates and uses as photoinitiators thereof
FR2935705B1 (fr) * 2008-09-05 2010-10-29 Univ De Technologie De Compiegne Procede de preparation de polymeres a empreintes moleculaires (pem) par polymerisation radicalaire
DE102008054611A1 (de) * 2008-12-15 2010-06-17 Evonik Röhm Gmbh Verfahren zur Herstellung von methacrylierten Benzophenonen
JP2010209183A (ja) 2009-03-09 2010-09-24 Fujifilm Corp インク組成物及びインクジェット記録方法
WO2011001928A1 (ja) 2009-06-29 2011-01-06 Dic株式会社 マイケル付加反応物及び活性エネルギー線硬化性組成物
JP5832430B2 (ja) 2009-07-06 2015-12-16 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ポリマーに固定されたビスアシルホスフィンオキシド
US8697768B2 (en) 2010-09-22 2014-04-15 Michelman, Inc. Energy curable overprint varnish and coated product
EP2738159B1 (en) 2011-07-29 2018-04-18 Insight High Technology (Beijing) Co., Ltd. Mercapto-benzophenone compounds, compositions and preparation methods thereof
CN102811999A (zh) * 2011-10-24 2012-12-05 北京英力科技发展有限公司 二苯甲酮类大分子光引发剂
EP2604663B1 (en) 2011-12-16 2017-08-09 Agfa Graphics N.V. Curable liquids and inkjet inks for food packaging applications
EP2617783A1 (en) * 2012-01-20 2013-07-24 Cytec Surface Specialties, S.A. Photo-reactive Binder
EP2617705A1 (en) 2012-01-20 2013-07-24 Cytec Surface Specialties, S.A. Amino Photo-Reactive Binder
JP5758832B2 (ja) * 2012-03-30 2015-08-05 富士フイルム株式会社 活性線硬化型インクジェットインク組成物、インクジェット記録方法、及び、印刷物
JP5676512B2 (ja) * 2012-03-30 2015-02-25 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、印刷物
WO2014018826A1 (en) 2012-07-27 2014-01-30 Sun Chemical Corporation Ketocoumarins as photoinitiators and photosensitizers in inks
JP5642125B2 (ja) * 2012-08-24 2014-12-17 富士フイルム株式会社 インクジェット記録方法
JP5752725B2 (ja) * 2013-02-22 2015-07-22 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、印刷物
EP2992044B1 (en) * 2013-05-03 2022-01-12 Uponor Innovation AB Polyolefin pipe
CN105392809B (zh) * 2013-07-23 2017-07-25 湛新比利时股份有限公司 聚合的光引发剂
JP6440944B2 (ja) * 2014-02-17 2018-12-19 太陽インキ製造株式会社 光硬化性組成物および成形品
EP3122824B1 (en) * 2014-03-28 2020-08-19 Sun Chemical Corporation Low migration radiation curable inks
GB2525453A (en) 2014-04-23 2015-10-28 Uponor Innovation Ab Polyolefin pipe
US9957402B2 (en) 2014-05-15 2018-05-01 Dic Corporation Compound, active energy ray curable composition, cured article thereof, printing ink, and inkjet recording ink
US10106629B2 (en) 2014-05-30 2018-10-23 Igm Resins Italia S.R.L. Multifunctional acylphosphine oxide photoinitiators
CN105315387A (zh) * 2014-07-29 2016-02-10 安徽皖科新科技发展有限公司 改性二苯甲酮光引发剂与制备方法
TW201632993A (zh) 2015-01-05 2016-09-16 巴地斯顏料化工廠 Ｌｅｄ可固化之低遷移光起始劑
CN107873025A (zh) 2015-04-07 2018-04-03 施密德吕纳股份公司 功能化光引发剂
CN109153653B (zh) 2016-05-13 2022-06-28 Dic株式会社 新型化合物、光固化性组合物、其固化物、印刷油墨和使用了该印刷油墨的印刷物
KR102562153B1 (ko) * 2017-08-09 2023-07-31 아이지엠 그룹 비.브이. 다관능성 중합체 광개시제
EP3626471A1 (en) 2018-09-24 2020-03-25 Agfa Nv Laser markable compositions
EP3626472A1 (en) 2018-09-24 2020-03-25 Agfa Nv Laser markable compositions
WO2020243559A1 (en) 2019-05-31 2020-12-03 Oregon State University Pressure sensitive adhesives made from uv curing of plant oil-based polyesters
US20250234767A1 (en) * 2023-03-23 2025-07-17 Beijing Boe Technology Development Co., Ltd. Initiator, quantum dot light-emitting layer and manufacturing method thereof, light-emitting device, display device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5407971A (en) * 1992-02-10 1995-04-18 Minnesota Mining And Manufacturing Company Radiation crosslinked elastomers

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5495691A (en) * 1978-01-13 1979-07-28 Toyo Ink Mfg Co Ltd Photocurable resin composition
JPH06263812A (ja) 1993-03-12 1994-09-20 Toyo Ink Mfg Co Ltd 共重合性光開始剤組成物および光硬化性被覆組成物
US6369123B1 (en) 1995-08-14 2002-04-09 3M Innovative Properties Company Radiation-crosslinkable elastomers and photocrosslinkers therefor
GB9613114D0 (en) * 1996-06-21 1996-08-28 Lambson Fine Chemicals Limited Photoinitiators

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5407971A (en) * 1992-02-10 1995-04-18 Minnesota Mining And Manufacturing Company Radiation crosslinked elastomers

Also Published As

Publication number Publication date
US7166647B2 (en) 2007-01-23
EP1438282B1 (en) 2007-09-05
US20050037277A1 (en) 2005-02-17
JP2005505615A (ja) 2005-02-24
EP1438282A1 (en) 2004-07-21
JP4943632B2 (ja) 2012-05-30
WO2003033452A1 (en) 2003-04-24
ES2292804T3 (es) 2008-03-16
DE60222283T2 (de) 2008-06-26
CN1599713A (zh) 2005-03-23
DE60222283D1 (de) 2007-10-18
GB0125099D0 (en) 2001-12-12
ATE372316T1 (de) 2007-09-15

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C06 Publication
PB01 Publication
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SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
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ASS Succession or assignment of patent right

Owner name: SUN CHEMICAL CO., LTD.

Free format text: FORMER OWNER: KOCI BROTHER PUBLICATION CO., LTD.

Effective date: 20090814

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20090814

Address after: Holland Weesp

Patentee after: Sun Chemical Corp.

Address before: Kent County

Patentee before: Coates Brothers PLC

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090408

Termination date: 20160924