CN100390933C - 气体供给装置、基板处理装置及供给气体设定方法 - Google Patents

气体供给装置、基板处理装置及供给气体设定方法 Download PDF

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Publication number
CN100390933C
CN100390933C CNB2005101303873A CN200510130387A CN100390933C CN 100390933 C CN100390933 C CN 100390933C CN B2005101303873 A CNB2005101303873 A CN B2005101303873A CN 200510130387 A CN200510130387 A CN 200510130387A CN 100390933 C CN100390933 C CN 100390933C
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CN
China
Prior art keywords
gas
lateral
additional gas
supply
pressure ratio
Prior art date
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Expired - Fee Related
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CNB2005101303873A
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English (en)
Chinese (zh)
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CN1787170A (zh
Inventor
水泽兼悦
伊藤惠贵
伊藤昌秀
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN1787170A publication Critical patent/CN1787170A/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support

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  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
CNB2005101303873A 2004-12-09 2005-12-09 气体供给装置、基板处理装置及供给气体设定方法 Expired - Fee Related CN100390933C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004357292 2004-12-09
JP2004357292A JP4358727B2 (ja) 2004-12-09 2004-12-09 ガス供給装置，基板処理装置及び供給ガス設定方法

Publications (2)

Publication Number Publication Date
CN1787170A CN1787170A (zh) 2006-06-14
CN100390933C true CN100390933C (zh) 2008-05-28

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CNB2005101303873A Expired - Fee Related CN100390933C (zh) 2004-12-09 2005-12-09 气体供给装置、基板处理装置及供给气体设定方法

Country Status (4)

Country Link
JP (1) JP4358727B2 (https=)
KR (1) KR100753692B1 (https=)
CN (1) CN100390933C (https=)
TW (1) TWI441254B (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4550507B2 (ja) 2004-07-26 2010-09-22 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP4895167B2 (ja) * 2006-01-31 2012-03-14 東京エレクトロン株式会社 ガス供給装置，基板処理装置，ガス供給方法
US20080078746A1 (en) 2006-08-15 2008-04-03 Noriiki Masuda Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium
JP5211450B2 (ja) * 2006-08-15 2013-06-12 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP5192214B2 (ja) 2007-11-02 2013-05-08 東京エレクトロン株式会社 ガス供給装置、基板処理装置および基板処理方法
JP5378706B2 (ja) * 2008-05-22 2013-12-25 東京エレクトロン株式会社 プラズマ処理装置及びそれに用いられる処理ガス供給装置
JP5452133B2 (ja) * 2009-08-27 2014-03-26 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
JP5562712B2 (ja) * 2010-04-30 2014-07-30 東京エレクトロン株式会社 半導体製造装置用のガス供給装置
JP5689294B2 (ja) 2010-11-25 2015-03-25 東京エレクトロン株式会社 処理装置
JP5792563B2 (ja) 2011-08-31 2015-10-14 東京エレクトロン株式会社 プラズマエッチング方法及びプラズマエッチング装置
JP2014003234A (ja) * 2012-06-20 2014-01-09 Tokyo Electron Ltd プラズマ処理装置、及びプラズマ処理方法
JP6034655B2 (ja) 2012-10-25 2016-11-30 東京エレクトロン株式会社 プラズマ処理装置
JP6030994B2 (ja) 2013-05-15 2016-11-24 東京エレクトロン株式会社 プラズマエッチング装置及びプラズマエッチング方法
US9620417B2 (en) 2014-09-30 2017-04-11 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method of manufacturing fin-FET devices
CN107771353B (zh) * 2015-05-17 2022-02-01 恩特格里斯公司 气柜
JP6502779B2 (ja) * 2015-07-29 2019-04-17 東京エレクトロン株式会社 ガス供給系のバルブのリークを検査する方法
JP7073710B2 (ja) 2017-01-20 2022-05-24 東京エレクトロン株式会社 プラズマ処理装置
CH713539A1 (fr) * 2017-03-03 2018-09-14 Pelco Sarl Mélangeur de gaz automatique.
JP7296854B2 (ja) * 2019-11-07 2023-06-23 東京エレクトロン株式会社 ガス供給方法及び基板処理装置
WO2021146099A1 (en) 2020-01-13 2021-07-22 Lam Research Corporation Multizone gas distribution plate for trench profile optimization
JP7507065B2 (ja) * 2020-11-09 2024-06-27 東京エレクトロン株式会社 処理装置及び処理方法
JP7727528B2 (ja) * 2021-12-23 2025-08-21 東京エレクトロン株式会社 プラズマ処理装置
CN117198848A (zh) * 2022-06-01 2023-12-08 长鑫存储技术有限公司 气体分配装置、等离子体处理装置及方法
CN114774887A (zh) * 2022-06-22 2022-07-22 拓荆科技(北京)有限公司 气体传输装置、方法和半导体沉积设备

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136098A (ja) * 1991-11-15 1993-06-01 Seiko Epson Corp 半導体装置の製造装置及び半導体装置の製造方法
JPH09289170A (ja) * 1996-04-23 1997-11-04 Sony Corp 半導体製造装置
US5916369A (en) * 1995-06-07 1999-06-29 Applied Materials, Inc. Gas inlets for wafer processing chamber
US20010013363A1 (en) * 1999-04-22 2001-08-16 Hirofumi Kitayama Apparatus and method for feeding gases for use in semiconductor manufacturing
CN1477681A (zh) * 2002-08-20 2004-02-25 东京毅力科创株式会社 等离子体蚀刻方法及装置
US20040050326A1 (en) * 2002-09-12 2004-03-18 Thilderkvist Karin Anna Lena Apparatus and method for automatically controlling gas flow in a substrate processing system

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4127779B2 (ja) * 2002-08-28 2008-07-30 株式会社神戸製鋼所 熱間等方圧加圧装置および熱間等方圧加圧方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136098A (ja) * 1991-11-15 1993-06-01 Seiko Epson Corp 半導体装置の製造装置及び半導体装置の製造方法
US5916369A (en) * 1995-06-07 1999-06-29 Applied Materials, Inc. Gas inlets for wafer processing chamber
JPH09289170A (ja) * 1996-04-23 1997-11-04 Sony Corp 半導体製造装置
US20010013363A1 (en) * 1999-04-22 2001-08-16 Hirofumi Kitayama Apparatus and method for feeding gases for use in semiconductor manufacturing
CN1477681A (zh) * 2002-08-20 2004-02-25 东京毅力科创株式会社 等离子体蚀刻方法及装置
US20040050326A1 (en) * 2002-09-12 2004-03-18 Thilderkvist Karin Anna Lena Apparatus and method for automatically controlling gas flow in a substrate processing system

Also Published As

Publication number Publication date
CN1787170A (zh) 2006-06-14
TWI441254B (zh) 2014-06-11
JP4358727B2 (ja) 2009-11-04
KR20060065510A (ko) 2006-06-14
TW200633049A (en) 2006-09-16
KR100753692B1 (ko) 2007-08-30
JP2006165399A (ja) 2006-06-22

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