CH496104A - Verfahren zum Abscheiden einer Aluminiumschicht - Google Patents

Verfahren zum Abscheiden einer Aluminiumschicht

Info

Publication number
CH496104A
CH496104A CH866167A CH866167A CH496104A CH 496104 A CH496104 A CH 496104A CH 866167 A CH866167 A CH 866167A CH 866167 A CH866167 A CH 866167A CH 496104 A CH496104 A CH 496104A
Authority
CH
Switzerland
Prior art keywords
aluminum
catalyst
dependent
substrate
solution
Prior art date
Application number
CH866167A
Other languages
German (de)
English (en)
Inventor
Leroy Schmidt Donald
Hellmann Reinhold
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of CH496104A publication Critical patent/CH496104A/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Catalysts (AREA)
  • Chemically Coating (AREA)
CH866167A 1966-06-20 1967-06-19 Verfahren zum Abscheiden einer Aluminiumschicht CH496104A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55858366A 1966-06-20 1966-06-20

Publications (1)

Publication Number Publication Date
CH496104A true CH496104A (de) 1970-09-15

Family

ID=24230124

Family Applications (1)

Application Number Title Priority Date Filing Date
CH866167A CH496104A (de) 1966-06-20 1967-06-19 Verfahren zum Abscheiden einer Aluminiumschicht

Country Status (7)

Country Link
US (1) US3462288A (xx)
BE (1) BE700145A (xx)
CH (1) CH496104A (xx)
DE (1) DE1621227B2 (xx)
GB (1) GB1122359A (xx)
LU (1) LU53900A1 (xx)
NL (1) NL146222B (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828774B1 (xx) * 1968-05-18 1973-09-04
US3639139A (en) * 1968-10-07 1972-02-01 Dow Chemical Co Aluminum plating process
US3655433A (en) * 1970-07-06 1972-04-11 Standard Oil Co Platable polymers
US3787225A (en) * 1971-05-10 1974-01-22 Dow Chemical Co Aluminum plating process
US3751288A (en) * 1971-06-23 1973-08-07 Dow Chemical Co Solidifying a thin layer of metal on plastic film
US3836385A (en) * 1972-02-02 1974-09-17 Dow Chemical Co Cyclic sulfonium zwitterion-titanium catalysts for aluminum plating process
US3969555A (en) * 1972-03-30 1976-07-13 The Dow Chemical Company Aluminum plating corrosion resistance
US3895131A (en) * 1974-02-21 1975-07-15 Xerox Corp Electroless coating method
US4132816A (en) * 1976-02-25 1979-01-02 United Technologies Corporation Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator
DE2635798C3 (de) * 1976-08-09 1980-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum stromlosen katalytischen Abscheiden von Aluminium, Katalysierbad und Aluminierbad
US4489102A (en) * 1983-04-04 1984-12-18 At&T Technologies, Inc. Radiation-stimulated deposition of aluminum
US4923717A (en) * 1989-03-17 1990-05-08 Regents Of The University Of Minnesota Process for the chemical vapor deposition of aluminum
US5273775A (en) * 1990-09-12 1993-12-28 Air Products And Chemicals, Inc. Process for selectively depositing copper aluminum alloy onto a substrate
US5191099A (en) * 1991-09-05 1993-03-02 Regents Of The University Of Minnesota Chemical vapor deposition of aluminum films using dimethylethylamine alane
US5885321A (en) * 1996-07-22 1999-03-23 The United States Of America As Represented By The Secretary Of The Navy Preparation of fine aluminum powders by solution methods
JP3920802B2 (ja) * 2003-03-28 2007-05-30 Jsr株式会社 配線、電極およびそれらの形成方法
KR20110046439A (ko) * 2008-07-24 2011-05-04 코비오 인코포레이티드 알루미늄 잉크 및 이의 제조 방법, 알루미늄 잉크 증착 방법 및 알루미늄 잉크의 인쇄 및/또는 증착에 의해 형성된 필름
US9803283B1 (en) * 2013-10-18 2017-10-31 Hrl Laboratories, Llc Method of electroless deposition of aluminum or aluminum alloy, an electroless plating composition, and an article including the same
CN104003444B (zh) * 2014-06-16 2015-11-18 攀钢集团攀枝花钢铁研究院有限公司 一种制备二氯氧钒的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE565564A (xx) * 1957-03-14
US3206326A (en) * 1961-11-27 1965-09-14 Ethyl Corp Aluminum intermittent plating process

Also Published As

Publication number Publication date
DE1621227A1 (de) 1971-04-29
DE1621227B2 (de) 1972-08-17
GB1122359A (en) 1968-08-07
BE700145A (xx) 1967-12-19
NL146222B (nl) 1975-06-16
LU53900A1 (xx) 1967-10-04
NL6708057A (xx) 1967-12-21
US3462288A (en) 1969-08-19

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Legal Events

Date Code Title Description
PL Patent ceased