LU53900A1 - - Google Patents

Info

Publication number
LU53900A1
LU53900A1 LU53900DA LU53900A1 LU 53900 A1 LU53900 A1 LU 53900A1 LU 53900D A LU53900D A LU 53900DA LU 53900 A1 LU53900 A1 LU 53900A1
Authority
LU
Luxembourg
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU53900A1 publication Critical patent/LU53900A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Catalysts (AREA)
  • Chemically Coating (AREA)
LU53900D 1966-06-20 1967-06-16 LU53900A1 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55858366A 1966-06-20 1966-06-20

Publications (1)

Publication Number Publication Date
LU53900A1 true LU53900A1 (xx) 1967-10-04

Family

ID=24230124

Family Applications (1)

Application Number Title Priority Date Filing Date
LU53900D LU53900A1 (xx) 1966-06-20 1967-06-16

Country Status (7)

Country Link
US (1) US3462288A (xx)
BE (1) BE700145A (xx)
CH (1) CH496104A (xx)
DE (1) DE1621227B2 (xx)
GB (1) GB1122359A (xx)
LU (1) LU53900A1 (xx)
NL (1) NL146222B (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828774B1 (xx) * 1968-05-18 1973-09-04
US3639139A (en) * 1968-10-07 1972-02-01 Dow Chemical Co Aluminum plating process
US3655433A (en) * 1970-07-06 1972-04-11 Standard Oil Co Platable polymers
US3787225A (en) * 1971-05-10 1974-01-22 Dow Chemical Co Aluminum plating process
US3751288A (en) * 1971-06-23 1973-08-07 Dow Chemical Co Solidifying a thin layer of metal on plastic film
US3836385A (en) * 1972-02-02 1974-09-17 Dow Chemical Co Cyclic sulfonium zwitterion-titanium catalysts for aluminum plating process
US3969555A (en) * 1972-03-30 1976-07-13 The Dow Chemical Company Aluminum plating corrosion resistance
US3895131A (en) * 1974-02-21 1975-07-15 Xerox Corp Electroless coating method
US4132816A (en) * 1976-02-25 1979-01-02 United Technologies Corporation Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator
DE2635798C3 (de) * 1976-08-09 1980-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum stromlosen katalytischen Abscheiden von Aluminium, Katalysierbad und Aluminierbad
US4489102A (en) * 1983-04-04 1984-12-18 At&T Technologies, Inc. Radiation-stimulated deposition of aluminum
US4923717A (en) * 1989-03-17 1990-05-08 Regents Of The University Of Minnesota Process for the chemical vapor deposition of aluminum
US5273775A (en) * 1990-09-12 1993-12-28 Air Products And Chemicals, Inc. Process for selectively depositing copper aluminum alloy onto a substrate
US5191099A (en) * 1991-09-05 1993-03-02 Regents Of The University Of Minnesota Chemical vapor deposition of aluminum films using dimethylethylamine alane
US5885321A (en) * 1996-07-22 1999-03-23 The United States Of America As Represented By The Secretary Of The Navy Preparation of fine aluminum powders by solution methods
JP3920802B2 (ja) * 2003-03-28 2007-05-30 Ｊｓｒ株式会社 配線、電極およびそれらの形成方法
JP2011529126A (ja) * 2008-07-24 2011-12-01 コヴィオ インコーポレイテッド アルミニウムインク及びその製造方法、アルミニウムインクを堆積する方法、並びにアルミニウムインクの印刷及び／又は堆積により形成されたフィルム
US9803283B1 (en) * 2013-10-18 2017-10-31 Hrl Laboratories, Llc Method of electroless deposition of aluminum or aluminum alloy, an electroless plating composition, and an article including the same
CN104003444B (zh) * 2014-06-16 2015-11-18 攀钢集团攀枝花钢铁研究院有限公司 一种制备二氯氧钒的方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL225795A (xx) * 1957-03-14
US3206326A (en) * 1961-11-27 1965-09-14 Ethyl Corp Aluminum intermittent plating process

Also Published As

Publication number Publication date
NL146222B (nl) 1975-06-16
BE700145A (xx) 1967-12-19
NL6708057A (xx) 1967-12-21
DE1621227A1 (de) 1971-04-29
US3462288A (en) 1969-08-19
DE1621227B2 (de) 1972-08-17
GB1122359A (en) 1968-08-07
CH496104A (de) 1970-09-15

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